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11. 发明公开

EP1918983A1 STAGE APPARATUS AND EXPOSURE APPARATUS 审中-公开
标题翻译： Belichtungsvorrichtung und Immersionsbelichtungsverfahren
公开(公告)号：EP1918983A1
公开(公告)日：2008-05-07
申请号：EP06782282.5
申请日：2006-08-03
申请人： NIKON CORPORATION
发明人： SHIBAZAKI, Yuichi c/o NIKON CORPORATION
IPC分类号： H01L21/027 , G03F7/20 , H01L21/68
CPC分类号： G03F9/7007 , G03F7/70341 , G03F7/70725 , H01L21/682
摘要： A wafer stage (WST) and a measurement stage (MST) are configured so that they are movable along an upper surface of a base plate (21), and water (Lq) is transferred therebetween by bringing the stages proximate to one another and moving them integrally in the Y directions. An alignment system (45) measures mutually proximate edge parts of the wafer stage (WST) and the measurement stage (MST), and a focus leveling detection system (64) measures a step in the Z directions in a state wherein the wafer stage (WST) and the measurement stage (MST) are proximate to one another. When both stages are brought proximate to one another, the relative position between the wafer stage (WST) and the measurement stage (MST) is adjusted based on the measurement results.
摘要翻译：晶片台（WST）和测量台（MST）被构造成使得它们可以沿着基板（21）的上表面移动，并且水（Lq）在它们之间转移，通过使台阶彼此靠近并移动他们在Y方向一体。对准系统（45）测量晶片台（WST）和测量台（MST）的彼此相邻的边缘部分，并且焦点调平检测系统（64）在晶片台（ WST）和测量级（MST）彼此接近。当两个阶段彼此接近时，基于测量结果来调整晶片台（WST）和测量台（MST）之间的相对位置。

12. 发明申请

WO2013026368A1 一种干涉曝光装置及方法审中-公开
公开(公告)号：WO2013026368A1
公开(公告)日：2013-02-28
申请号：PCT/CN2012/080258
申请日：2012-08-16
申请人：上海微电子装备有限公司 , 许琦欣 , 王帆
发明人：许琦欣 , 王帆
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： G03F7/70208 , G01B11/14 , G01B11/26 , G03F7/70408 , G03F7/70775 , G03F9/7007
摘要：一种干涉曝光装置，包括：光源（100），用于提供曝光光束；匀光扩束单元（200），用于对光源发出的光束进行准直或整形；干涉头（300），包括至少两组光栅（303），用于将曝光光束形成至少两束干涉光束并会聚于基底表面形成一干涉曝光图形，光栅（303）的周期及位置与待曝光的图形的周期及分布特征相一致；运动承载单元（406），用于提供基底至少三自由度运动；测量单元（500），用于获得干涉头坐标系与运动承载单元坐标系的夹角，以便在对基底曝光之前依据测量单元（500）的测量结果对运动承载单元（406）的曝光位置进行调整。

13. 发明公开

EP3204825A1 OPTISCHES SYSTEM ZUR LITHOGRAFISCHEN STRUKTURERZEUGUNG 有权转让
标题翻译：选择系统ZUR LITHOGRAFISCHEN STRUKTURERZEUGUNG
公开(公告)号：EP3204825A1
公开(公告)日：2017-08-16
申请号：EP15767470.6
申请日：2015-09-22
申请人： Carl Zeiss AG
发明人： HÜBNER, Philipp , KRAMPERT, Gerhard , RICHTER, Stefan , MAPPES, Timo
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/70383 , G03F7/70683 , G03F9/7007 , G03F9/7011
摘要： An optical system (1) for producing lithographic structures has a projection lens system (8) for guiding a structure-producing writing light bundle in a write focus (9) in the region of a substrate surface (10) in a substrate plane (12). A deflection device (5) is used for deflecting the write focus (9) of the writing light bundle within a writing field (13) in the region of the substrate surface (10). A preview lens system (14) is used to image a preview field (15) in the region of the substrate surface (10). The preview field (15) has an area which is larger than an area of the write field (13) by at least a factor of 10. The projection lens system (8) and the preview lens system (14) are supported by a common frame (16). A substrate holder (18) can be displaced in a plane (x, y) parallel to the substrate surface (10) in two degrees (x, y) of translational freedom. Furthermore, the system (1) has a control unit (27) comprising a memory (28) in which relative coordinates of a position of the write field (13) relative to the position of the preview field (15) are stored. The result is an optical system, wherein a positioning of a substrate, which is processed while producing the lithographic structure, is achieved with good target accuracy.
摘要翻译：公开了一种用于制造光刻结构的光学系统。还公开了一种用于确定写入场的位置相对于这种光学系统中的预览场的位置的相对坐标的方法以及使用这种光学系统制造光刻结构的方法。

14. 发明公开

EP1918983A4 STAGE APPARATUS AND EXPOSURE APPARATUS 审中-公开
标题翻译：舞台装置和曝光装置
公开(公告)号：EP1918983A4
公开(公告)日：2010-03-31
申请号：EP06782282
申请日：2006-08-03
申请人： NIPPON KOGAKU KK
发明人： SHIBAZAKI YUICHI
IPC分类号： H01L21/027 , G03F7/20 , H01L21/68
CPC分类号： G03F9/7007 , G03F7/70341 , G03F7/70725 , H01L21/682
摘要： A wafer stage (WST) and a measurement stage (MST) are configured so that they are movable along an upper surface of a base plate (21), and water (Lq) is transferred therebetween by bringing the stages proximate to one another and moving them integrally in the Y directions. An alignment system (45) measures mutually proximate edge parts of the wafer stage (WST) and the measurement stage (MST), and a focus leveling detection system (64) measures a step in the Z directions in a state wherein the wafer stage (WST) and the measurement stage (MST) are proximate to one another. When both stages are brought proximate to one another, the relative position between the wafer stage (WST) and the measurement stage (MST) is adjusted based on the measurement results.

15. 发明公开

EP1080393A1 VERFAHREN ZUR MESSUNG DER LAGE VON STRUKTUREN AUF EINER MASKENOBERFLÄCHE 审中-公开
标题翻译：法测量结构的位置在屏幕表面
公开(公告)号：EP1080393A1
公开(公告)日：2001-03-07
申请号：EP99917765.2
申请日：1999-03-03
申请人： Leica Microsystems Wetzlar GmbH
发明人： BLÄSING-BANGERT, Carola
IPC分类号： G03F1/00 , G03F9/00 , G03F7/20
CPC分类号： G03F9/7007 , G03F7/70716 , G06T7/60
摘要： The invention relates to a method for measuring structures on a surface of a mask in which the mask is mounted in an image evaluating coordinate measuring device on a measuring table. Said measuring table can be perpendicularly displaced in relation to the optical axis of an imaging measuring system in a manner which is interferometrically measurable. In addition, a mask coordinate system which is assigned to the mask is aligned in relation to a measuring device coordinate system by using alignment marks. The specified position of the structures is predetermined in the mask coordinate system. In addition to the actual position of the structures in the mask coordinate system, the position of at least two outer edges of the mask which are perpendicular to one another is also measured in the mask coordinate system.

16. 发明公开

EP3404488A1 METHOD OF MEASURING A TARGET, METROLOGY APPARATUS, LITHOGRAPHIC CELL, AND TARGET 审中-公开
公开(公告)号：EP3404488A1
公开(公告)日：2018-11-21
申请号：EP17171935.4
申请日：2017-05-19
申请人： ASML Netherlands B.V.
发明人： CRAMER, Hugo, Augustinus, Joseph
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/70633 , G01B11/26 , G03F7/70616 , G03F7/70625 , G03F7/7085 , G03F9/7007
摘要： Methods and apparatus for measuring a target formed on a substrate are disclosed. The target (80) comprises an alignment structure (76A-D) and a metrology structure (84). In one method, a first measurement process is performed that comprises illuminating the target with first radiation and detecting radiation resulting from scattering of the first radiation from the target. A second measurement process comprises illuminating the target with second radiation and detecting radiation resulting from scattering of the second radiation from the target. The first measurement process detects a position of the alignment structure. The second measurement process uses the position of the alignment structure detected by the first measurement process to align a radiation spot (82) of the second radiation onto a desired location within the metrology structure.

17. 发明公开

EP3040779A1 A maskless exposure apparatus with alignment 审中-公开
标题翻译：澳门特色
公开(公告)号：EP3040779A1
公开(公告)日：2016-07-06
申请号：EP14200630.3
申请日：2014-12-30
申请人： VISITECH AS
发明人： Jørgensen, Trond , Kirkhorn, Endre , Tafjord, Øyvind
IPC分类号： G03F9/00
CPC分类号： G03F9/7096 , G03F9/7007 , G03F9/7065 , G03F9/7088
摘要： A maskless exposure apparatus comprises a light source (302) providing an exposure beam (306); a light modulator (302) modulating the exposure beam (306)according to an exposure pattern;an exposure optical system (303, 304, 308) delivering the modulated exposure beam as an image (311) provided by the light modulator onto a substrate (307); and a measurement system (303, 304, 305, 308, 309) configured to measure a position of an alignment mark previously patterned on the substrate. The exposure optical system and the measurement system have at least partially concurrent optical paths.
摘要翻译：无掩模曝光装置包括提供曝光光束（306）的光源（302）; 将曝光光束（306）根据曝光图案进行调制的光调制器（302）;将调制曝光光束作为由光调制器提供的图像（311）输送到基板上的曝光光学系统（303,304,308） 307）; 以及被配置为测量先前在衬底上图案化的对准标记的位置的测量系统（303,304,305,308,309）。曝光光学系统和测量系统具有至少部分同时的光路。

18. 发明公开

EP2560191A4 SEMICONDUCTOR SUBSTRATE HAVING DOT MARKINGS, AND METHOD FOR PRODUCING SAME 审中-公开
标题翻译：根据上述制造点标记和方法半导体衬底
公开(公告)号：EP2560191A4
公开(公告)日：2013-09-25
申请号：EP12775424
申请日：2012-06-22
申请人： PANASONIC CORP
发明人： USUI YUKIYA
IPC分类号： H01L21/02 , G03F9/00 , H01L21/306 , H01L23/544 , H01L31/02 , H01L31/04
CPC分类号： H01L29/06 , G03F9/7007 , H01L21/30604 , H01L23/544 , H01L31/02 , H01L2223/54413 , H01L2223/5442 , H01L2223/54433 , H01L2223/54453 , H01L2924/0002 , H01L2924/00

19. 发明申请

WO2014202517A3 METHOD AND DEVICE FOR DETERMINING A REFERENCE POINT OF AN ORIENTATION MARKING ON A SUBSTRATE OF A PHOTOLITHOGRAPHIC MASK IN AN AUTOMATED MANNER 审中-公开
标题翻译： METHOD AND APPARATUS FOR AUTOMATED确定登记号码的一个参考点ON A SUBSTRATE光刻掩模
公开(公告)号：WO2014202517A3
公开(公告)日：2015-02-26
申请号：PCT/EP2014062533
申请日：2014-06-16
申请人： ZEISS CARL SMS GMBH
发明人： BUDACH MICHAEL , SCHÖNBERGER RALF , JÖST MICHAEL
IPC分类号： G03F9/00 , G01B11/00
CPC分类号： G01B11/14 , G03F7/70141 , G03F9/7007 , G03F9/7088
摘要： The invention relates to a method for determining a reference point of an orientation marking on a substrate of a photolithographic mask in an automated manner, comprising the following steps: (a) performing a first line scan within a start region of the substrate in a first direction on a surface of the substrate, wherein the orientation marking is arranged within the start region, in order to find a first element of the orientation marking; (b) performing a second line scan within the start region in at least one second direction on the surface of the substrate, which at least one second direction intersects with the first direction, in order to find a second element of the orientation marking; (c) estimating the reference point of the orientation marking from the found first element and the found second element of the orientation marking; and (d) imaging a target region around the estimated reference point of the orientation marking in order to determine the reference of the orientation marking, wherein the imaging is performed with a higher resolution than the performance of the line scans in steps (a) and (b).
摘要翻译：本发明涉及自动确定光刻掩模的衬底上的对准标记的参考点，其包含以下步骤的方法：（a）所述基材的起始范围内以第一方向在基板的一个表面上执行第一线扫描，其中，所述对准标记设置用于定位的第一构件的对准标记的开始区域内; （B）在至少一个第二方向上的衬底的表面上的启动区域内执行的第二扫描线，相交的第一方向上，以定位对准标记的第二元素; （C）估计从所述检索到的第一元件和对准标记的发现第二元件的对准标记的参考点; 和（d）成像围绕对准标记的估计出的基准点的目标区域周围，用于确定对准标记的参考点，其中以更高的分辨率比确实在步骤执行行扫描的映射的（a）和（b）。

20. 发明申请

WO2007018127A1 ステージ装置及び露光装置审中-公开
标题翻译：阶段装置和曝光装置
公开(公告)号：WO2007018127A1
公开(公告)日：2007-02-15
申请号：PCT/JP2006/315422
申请日：2006-08-03
申请人：株式会社ニコン , 柴崎祐一
发明人：柴崎祐一
IPC分类号： H01L21/027 , G03F7/20 , H01L21/68
CPC分类号： G03F9/7007 , G03F7/70341 , G03F7/70725 , H01L21/682
摘要：　ウェハステージ（ＷＳＴ）及び計測ステージ（ＭＳＴ）は、ベース盤（２１）上面に沿って移動可能に構成されており、互いに接近して一体となってＹ方向に移動することで水（Ｌｑ）の受け渡しを行う。アライメント系（４５）はウェハステージ（ＷＳＴ）と計測ステージ（ＭＳＴ）との互いに近接するエッジ部を測定し、フォーカス・レベリング検出系（６４）はウェハステージ（ＷＳＴ）及び計測ステージ（ＭＳＴ）の互いに近接した状態におけるＺ方向の段差を測定する。両ステージを近接させる場合には、これらの測定結果に基づいてウェハステージ（ＷＳＴ）と計測ステージ（ＭＳＴ）との相対位置が調整される。
摘要翻译：晶片台（WST）和测量台（MST）可沿着基板（21）的上表面移动，并且当阶段在Y方向一起移动时，执行水的输送和接收（Lq）对彼此。对准系统（45）测量晶片台（WST）和测量台（MST）彼此靠近的边缘，并且聚焦/调平检测系统（64）在状态下测量Z方向上的台阶其中晶片台（WST）和测量台（MST）彼此靠近。当阶段彼此靠近时，根据测量结果调整晶片台（WST）和测量台（MST）的相对位置。

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