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11. 发明专利

IE20040164A1 A method and system for detecting electrical arcing in a plasma process powered by an AC source 未知
公开(公告)号：IE20040164A1
公开(公告)日：2005-10-19
申请号：IE20040164
申请日：2004-03-16
申请人： SCIENT SYSTEMS RES LTD
发明人： MARTINEZ FRANCISCO , SCULLIN PAUL
IPC分类号： H05H1/46 , C23C14/00 , C23C14/54 , G01R23/00 , G09G3/10 , H01J37/32 , H01L21/3065
摘要： A method for detecting electrical arcing in a plasma process powered by an AC source comprises the steps of sampling at least one Fourier component of the AC source waveform distorted by the non-linear response of the plasma, determining when a change in amplitude of the component, irrespective of the direction of the change, exceeds any one of the plurality of different threshold levels, and determining the duration that each such threshold is exceeded. Each threshold is a predetermined fraction of a running average of the amplitude of the component.

12. 发明专利

IES20000498A2 A method of processing a high frequency signal containing multipe fundamental frequencies 未知
公开(公告)号：IES20000498A2
公开(公告)日：2001-08-08
申请号：IES20000498
申请日：2000-06-20
申请人： SCIENT SYSTEMS RES LTD
发明人： JOHN , JUSTIN , STEPHEN
IPC分类号： G01R17/00 , G01R19/00 , G01R25/00 , G06F17/10
摘要： A method of processing a high frequency signal containing at least two different fundamental frequencies F1 and F2 and their harmonic components in order to extract at least one harmonic component of each of the two fundamental frequencies comprises sampling the signal at two sampling frequencies CK1=F1 M1/N1) and CK2 = F2 (M2/N2), where M1 and N1 are a first pair of integers having no common factor and M2 and N2 are a second pair of integers having no common factor. The sample values resulting from sampling at CK1 are stored cyclically in a set of M1 memory locations such that the nth sample value is stored cumulatively in the remM1(n)the memory location, and the sampled values resulting from sampling at CK2 are stored cyclically in a set of M2 memory locations such that the nth sample value is stored cumulatively in the remM2(n)the memory location. The sampling is continued at each sampling frequency CK1 and CK2 until sufficient sample values have been stored in each memory location of the corresponding set M1 or M2 to substantially average out the other fundamental frequency(s) and its/their harmonic components. Finally, a Fourier analysis of the sample values in each set M1 and M2 of memory locations is performed to extract the said at least one harmonic component of each fundamental frequency F1 and F2.

13. 发明专利

IE20020142A1 Plasma chamber cleaning 未知
公开(公告)号：IE20020142A1
公开(公告)日：2003-09-03
申请号：IE20020142
申请日：2002-02-22
申请人： SCIENT SYSTEMS RES LTD
发明人： SCANLAN JOHN
IPC分类号： H01J37/32 , B08B9/08 , H01L21/306
摘要： A method for determining optimum plasma chamber cleaning cycles based on an electrical precursor signal. Polymer build up on the interior wall of a plasma chamber (1) during normal production runs is monitored by observing the phase of the fundamental RF signal on a pre-selected baseline process. At a predetermined level of this signal, the chamber processing is stopped and the chamber walls are cleaned.

14. 发明专利

DE10196356T1 未知
公开(公告)号：DE10196356T1
公开(公告)日：2003-06-12
申请号：DE10196356
申请日：2001-06-18
申请人： SCIENT SYSTEMS RES LTD
发明人： SCANLAN JOHN , DANIELS STEPHEN , LAWLER JUSTIN
IPC分类号： C23C16/50 , C23C16/52 , H01J37/32 , H01L21/205 , H01L21/3065 , H01L21/66

15. 发明专利

IE20010288A1 Endpoint Detection in the Etching of Dielectric Layers 未知
公开(公告)号：IE20010288A1
公开(公告)日：2002-10-02
申请号：IE20010288
申请日：2001-03-23
申请人： SCIENT SYSTEMS RES LTD
发明人： SCANLAN JOHN , HOPKINS MICHAEL
IPC分类号： H01L21/311 , H01L21/768 , H03M7/00 , H01L21/302
摘要： In a method of manufacturing a miniature multilayer device (10) a low open area dielectric layer (18) is selectively etched through to an underlying conductive region (16) using an electrically conducting medium such as a plasma (24). The endpoint of the etch process is determined by detecting the abrupt change in capacitance across the device (10) just as the final portion of the dielectric layer is removed.

16. 发明专利

IE20000565A1 A method for fault identification in a plasma process 未知
公开(公告)号：IE20000565A1
公开(公告)日：2002-01-09
申请号：IE20000565
申请日：2000-07-12
申请人： SCIENT SYSTEMS RES LTD
发明人： SCANLAN JOHN , DANIELS STEPHEN , LAWLER JUSTIN
IPC分类号： G01R17/00 , G01R19/00
摘要： A method of fault identification in a plasma process powered by an RF source comprises initially determining, in respect of a given baseline plasma process, the changes in magnitude of a plurality of Fourier components of the RF source resulting from changes in a plurality of the process input parameters from their baseline values. These magnitude changes are stored as reference data. During a subsequent production run, the plasma process is monitored for faults and if one is found the baseline process is repeated with input parameter values nominally the same as the original baseline values. The changes in the Fourier components from the original baseline values are determined and compared with the reference data to determine which input parameter(s) have changed.

17. 发明专利

IE20000564A1 RF current sensor 未知
公开(公告)号：IE20000564A1
公开(公告)日：2002-01-09
申请号：IE20000564
申请日：2000-07-12
申请人： SCIENT SYSTEMS RES LTD
发明人： HOPKINS MICHAEL B , MARTINEZ FRANCISCO , O'MORAIN CIARAN
IPC分类号： G01R1/00 , G01R23/02
摘要： A sensor for detecting RF current flowing in a conductor includes a layer (10) of insulating material with a hole (16) for the passage of the RF conductor (18) in a direction normal to the layer. A plurality of conductive tracks (20,22) on the opposite major surfaces of the layer is selectively joined by a plurality of through-holes each containing conductive material. The conductive material selectively connects the conductive elements (20,22) to form a plurality of loops disposed non-parallel to the layer (10) for inductive coupling to the RF conductor (18).

18. 发明专利

AU7443801A A method of signal sampling 未知
公开(公告)号：AU7443801A
公开(公告)日：2002-01-02
申请号：AU7443801
申请日：2001-06-18
申请人： SCIENT SYSTEMS RES LTD
发明人： HOPKINS MICHAEL B , OVERARD JEAN-MARC
IPC分类号： G01R17/00 , G01R19/00 , G01R25/00 , G06F17/10
摘要： A method of processing a high frequency signal containing at least two different fundamental frequencies F1 and F2 and their harmonic components in order to extract at least one harmonic component of each of the two fundamental frequencies comprises sampling the signal at two sampling frequencies CK1=F1(M1/N1) and CK2=F2(M2/N2), where M1 and N1 are a first pair of integers having no common factor and M2 and N2 are a second pair of integers having no common factor. The sample values resulting from sampling at CK1 are stored cyclically in a set of M1 memory locations such that the nth sample value is stored cumulatively in the remM1[n]th memory location, and the sampled values resulting from sampling at CK2 are stored cyclically in a set of M2 memory locations such that the nth sample value is stored cumulatively in the remM2[n]th memory location. The sampling is continued at each sampling frequency CK1 and CK2 until sufficient sample values have been stored in each memory location of the corresponding set M1 or M2 to substantially average out the other fundamental frequency(s) and its/their harmonic components. Finally, a Fourier analysis of the sample values in each set M1 and M2 of memory locations is performed to extract the said at least one harmonic component of each fundamental frequency F1 and F2.

19. 发明专利

AU7443601A Rf current sensor 未知
公开(公告)号：AU7443601A
公开(公告)日：2002-01-02
申请号：AU7443601
申请日：2001-06-18
申请人： SCIENT SYSTEMS RES LTD
发明人： HOPKINS MICHAEL B , O'MORAIN CIARAN , MARTINEZ FRANCISCO
IPC分类号： G01R15/18 , G01R29/08

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