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    • 18. 发明申请
    • Peelable photoresist for carbon nanotube cathode
    • 用于碳纳米管阴极的可剥离光致抗蚀剂
    • US20060252163A1
    • 2006-11-09
    • US11341300
    • 2006-01-27
    • Zvi YanivMohshi YangDongsheng Mao
    • Zvi YanivMohshi YangDongsheng Mao
    • H01L21/00
    • H01J9/025B82Y10/00B82Y30/00B82Y40/00C01B32/15H01J31/127H01J2201/30469
    • A method for forming a field emission cathode device is disclosed using a peelable photoresist with standard photolithography processes for patterning a deposition mask, except that the peelable photoresist can be peeled away in dry form. The method offers standard photoresist accuracy with the advantage of high patterning resolution for producing carbon nanotube (CNT) field emitter displays. Example methods using a single peelable photoresist layer, and using two distinct layers of photoresist and peelable film, are presented. Since the method does not require wet processes after CNT deposition, it ensures enhanced CNT emitter performance. In addition, an activation process that liberates CNTs can be performed just before a tape lamination and peeling process step. In this manner, all superfluous nanoparticle material remains confined between the tape and photoresist films, which are removed together and properly discarded.
    • 公开了一种用于形成场发射阴极器件的方法,其中使用具有用于图案化沉积掩模的标准光刻工艺的可剥离光致抗蚀剂,除了可剥离光致抗蚀剂可以以干燥形式剥离。 该方法提供标准的光刻胶精度,具有高图案分辨率用于生产碳纳米管(CNT)场发射体显示器的优点。 提出了使用单个可剥离光致抗蚀剂层并使用两个不同的光致抗蚀剂层和可剥离膜的示例方法。 由于该方法在CNT沉积后不需要湿法工艺,因此确保了CNT发射极性能的提高。 此外,可以在胶带层压和剥离处理步骤之前执行释放CNT的活化过程。 以这种方式,所有多余的纳米颗粒材料保持限制在带和光致抗蚀剂膜之间,它们被一起去除并被适当地丢弃。