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11. 发明专利

DE10304116A1 未知
公开(公告)号：DE10304116A1
公开(公告)日：2004-03-11
申请号：DE10304116
申请日：2003-01-31
申请人： ZEISS CARL SMT AG
发明人： TOTZECK MICHAEL , KAMENOV VLADIMIR , GRUNER TORALF
IPC分类号： G02B1/02 , G02B5/30 , G02B13/14 , G03F7/20

12. 发明专利

DE10253353A1 Objective with doubly refracting lenses especially a projection objective for microphotolithography and compensation process has two different sets of doubly refracting lenses 未知
$Objective with doubly refracting lenses especially a projection objective for microphotolithography and compensation process has two different sets of doubly refracting lenses$
公开(公告)号：DE10253353A1
公开(公告)日：2004-03-11
申请号：DE10253353
申请日：2002-11-14
申请人： ZEISS CARL SMT AG
发明人： TOTZECK MICHAEL , KRAEHMER DANIEL , KAMENOV VLADIMIR , ULRICH WILHELM
IPC分类号： G02B1/02 , G02B5/30 , G02B13/14 , G03F7/20
摘要： An objective, especially a projection objective for microlithography comprises two sets of doubly refracting lenses of different materials or having different material orientation such that the path difference between the orthogonal polarized rays is less than one quarter wavelength. An objective, especially a projection objective for microlithography comprises two sets of doubly refracting lenses (L108,109,129,130) and (L101-107,110-128) of different materials or material orientation. A main ray (9) and outermost aperture cone (5,7) arise having a path difference for two orthogonal polarized conditions but after passing through the lenses the path difference is less than one quarter wavelength. The outermost opening angle is at least 70% of maximum and the volume of the first lenses is not greater than 20% of the total lens volume. Independent claims are also included for the following: (a) an objective having calcium fluoride and barium fluoride lens groups; (b) a process for compensating for double refraction; (c) a process for semiconductor element production;and (d) a further objective as above

13. 发明专利

DE102005041938A1 未知
公开(公告)号：DE102005041938A1
公开(公告)日：2007-03-08
申请号：DE102005041938
申请日：2005-09-03
申请人： ZEISS CARL SMT AG
发明人： KAMENOV VLADIMIR , KRAEHMER DANIEL , GRUNER TORALF
IPC分类号： G03F7/20

14. 发明专利

AU2003254550A1 CATADIOPTRIC PROJECTION LENS AND METHOD FOR COMPENSATING THE INTRINSIC BIREFRINGENCE IN A LENS OF THIS TYPE 未知
公开(公告)号：AU2003254550A1
公开(公告)日：2004-04-30
申请号：AU2003254550
申请日：2003-07-21
申请人： ZEISS CARL SMT AG
发明人： ALBERT MICHAEL , KAMENOV VLADIMIR
IPC分类号： G02B17/08 , G03F7/20
摘要： A catadioptric projection lens for use in microlithographic projection-exposure apparatus includes a plurality of refractive optical elements having intrinsic birefringence both in a catadioptric part and in a dioptric part adjacent to the image plane. Because these refractive optical elements in the catadioptric part and in the dioptric part are decoupled from one another with respect to polarisation by a polarisation-sensitive reflective layer, the catadioptric part and the dioptric part are compensated separately from one another with respect to intrinsic birefringence.

15. 发明专利

AU2003298405A1 OPTIMIZATION METHOD FOR AN OBJECTIVE WITH FLUORIDE CRYSTAL LENSES AND OBJECTIVE WITH FLUORIDE CRYSTAL LENSES 未知
公开(公告)号：AU2003298405A1
公开(公告)日：2004-03-29
申请号：AU2003298405
申请日：2003-08-19
申请人： ZEISS CARL SMT AG
发明人： TOTZECK MICHAEL , KAMENOV VLADIMIR , GRUNER TORALF
IPC分类号： G02B1/02 , G02B5/30 , G02B13/14 , G03F7/20

16. 发明专利

AU2002364974A1 OBJECTIVE WITH BIREFRINGENT LENSES 未知
公开(公告)号：AU2002364974A1
公开(公告)日：2004-03-29
申请号：AU2002364974
申请日：2002-12-20
申请人： ZEISS CARL SMT AG
发明人： TOTZECK MICHAEL , KAMENOV VLADIMIR , KRAHMER DANIEL , ULRICH WILHELM
IPC分类号： G02B1/02 , G02B5/30 , G02B13/14 , G02B13/18 , G03F7/20 , H01L21/027
摘要： Objective ( 1, 601 ), in particular a projection objective for a microlithography projection apparatus, with first birefringent lenses (L108, L109, L129, L130) and with second birefringent lenses (L101-L107, L110-L128). The first lenses (L108, L109, L129, L130) are distinguished from the second lenses (L101-L107, L110-L128) by the lens material used or by the material orientation. After passing through the first lenses (L108, L109, L129, L130) and the second lenses (L101-L107, L110-L128), an outer aperture ray ( 5, 7 ) and a principal ray ( 9 ) are subject to optical path differences for two mutually orthogonal states of polarization. The difference between these optical path differences is smaller than 25% of the working wavelength. In at least one first lens (L129, L130), the aperture angle of the outer aperture ray ( 5, 7 ) is at least 70% of the largest aperture angle occurring for said aperture ray in all of the first lenses (L108, L109, L129, L130) and second lenses (L101-L107, L110-L128). This arrangement has the result that the first lenses (L108, L109, L129, L130) have a combined material volume of no more than 20% of the combined total material volume of the first lenses (L108, L109, L129, L130) and second lenses (L101-L107, L110-L128).

17. 发明专利

AU2003242756A8 Catadioptric reduction objective 未知
公开(公告)号：AU2003242756A8
公开(公告)日：2004-01-06
申请号：AU2003242756
申请日：2003-06-25
申请人： ZEISS CARL SMT AG
发明人： BRUNOTTE MARTIN , DITTMANN OLAF , MECKING BIRGIT , KAMENOV VLADIMIR , GRUNER TORALF
IPC分类号： G02B13/24 , G02B13/14 , G02B17/08 , G03F7/20 , H01L21/027

18. 发明专利

DE102009037077B3 Katadioptrisches Projektionsobjektiv 未知
公开(公告)号：DE102009037077B3
公开(公告)日：2011-02-17
申请号：DE102009037077
申请日：2009-08-13
申请人： ZEISS CARL SMT AG
发明人： KAMENOV VLADIMIR , EPPLE ALEXANDER , GRUNER TORALF , SCHICKETANZ THOMAS
IPC分类号： G02B17/08 , G02B13/14 , G03F7/20
摘要： Katadioptrisches Projektionsobjektiv (1) für die Mikrolithographie zur Abbildung eines Objektfeldes (3) in einer Objektebene (5) auf ein Bildfeld (7) in einer Bildebene (9) mit einem ersten Teilobjektiv (11) zum Abbilden des Objektfeldes auf ein erstes reelles Zwischenbild (13), mit einem zweiten Teilobjektiv (15) zum Abbilden des ersten Zwischenbildes auf ein zweites reeles Zwischenbild (17), und mit einem dritten Teilobjektiv (19) zum Abbilden des zweiten Zwischenbildes auf das Bildfeld. Das zweite Teilobjektiv ist ein katadioptrisches Objektiv mit genau einem Konkavspiegel und mit mindestens einer Linse (L21, L22). Es sind ein erster Faltspiegel (23) zum Ablenken der von der Objektebene kommenden Strahlung in der Richtung des Konkavspiegels und ein zweiter Faltspiegel (25) zum Ablenken er Richtung der Bildebene vorgesehen. Dabei weist mindestens eine Fläche einer Linse (L21, L22) des zweiten Teilobjektivs eine Antireflex-Beschichtung auf, welche für eine Arbeitswellenlänge zwischen 150 nm und 250 nm und für einen Inzidenzwinkelbereich zwischen 0° und 30° eine Reflektivität kleiner als 0,2% aufweist. Alternativ oder zusätzlich sind alle Flächen der Linsen des zweiten Teilobjektivs derart ausgestaltet, dass die Abweichung von der Randstrahl-Konzentrizität größer als oder gleich 20° ist.

19. 发明专利

DE102006027787A1 Projection exposure system operating method for microlithography, involves considering influence of optical characteristics of system or dependent parameters that are computed based on modes and object structure during system operation 未知
公开(公告)号：DE102006027787A1
公开(公告)日：2007-01-18
申请号：DE102006027787
申请日：2006-06-16
申请人： ZEISS CARL SMT AG
发明人： KRAEMER DANIEL , CONRADI OLAF , GRUNER TORALF , DIECKMANN NILS , SCHWAB MARKUS , TOTZECK MICHAEL , DITTMANN OLAF , KAMENOV VLADIMIR
IPC分类号： G03F7/20 , G02B13/14 , G02B17/08
摘要： The method involves illuminating an object with a light of an operating wavelength of a projection exposure system based on several adjustable illuminating modes. The light causes changes in an optical unit (4) of the system for influencing the optical characteristics of the system. The influence of the optical characteristics of the system or dependent parameters are considered during operation of the system. The parameters are approximately computed based on the modes and the structure of the object. Independent claims are also included for the following: (1) a projection exposure system for projection a structure of an object arranged in an object plane on a substrate that is arranged in an image plane (2) an illuminating system for a projection exposure system (3) a method for manufacturing a projection exposure system for projecting a structure of an object arranged in an object plane on a substrate that is arranged in an image plane.

20. 发明专利

AU2003242756A1 CATADIOPTRIC REDUCTION OBJECTIVE 未知
公开(公告)号：AU2003242756A1
公开(公告)日：2004-01-06
申请号：AU2003242756
申请日：2003-06-25
申请人： ZEISS CARL SMT AG
发明人： KAMENOV VLADIMIR , BRUNOTTE MARTIN , MECKING BIRGIT , DITTMANN OLAF , GRUNER TORALF
IPC分类号： G02B13/24 , G02B13/14 , G02B17/08 , G03F7/20 , H01L21/027

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