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    • 12. 发明授权
    • Method of reading an NVM cell that utilizes a gated diode
    • 读取利用门控二极管的NVM单元的方法
    • US07978519B2
    • 2011-07-12
    • US12884567
    • 2010-09-17
    • Yuri MirgorodskiPeter J. HopperRoozbeh Parsa
    • Yuri MirgorodskiPeter J. HopperRoozbeh Parsa
    • G11C11/34G11C16/04G11C16/06
    • G11C16/10H01L27/11558H01L29/66825H01L29/7881
    • A method of reading an NVM cell structure formed on a deep well of N-type semiconductor material, wherein the NVM cell structure includes a PMOS transistor formed in an N-type well, the PMOS transistor including spaced-apart p-type source and drain region defining an n-type cannel region therebetween, an NMOS transistor formed in a P-type well that is adjacent to the N-type well, the NMOS transistor including spaced-apart n-type source and drain regions defining a p-type channel region therebetween, a conductive floating gate that includes a first section that extends over the n-type channel region of the PMOS transistor and is separated therefrom by intervening dielectric material and a second section that extends over the p-type channel region and is separated therefrom by intervening dielectric material, and a conductive control gate formed over at least a portion of the second section of the floating gate and is separated therefrom by intervening dielectric material, the method comprising: biasing the deep N-type well at a preselected read voltage; holding the source region of the PMOS transistor at the read voltage; holding the drain of the PMOS transistor at ground; and holding the control gate at ground for a preselected read time.
    • 一种读取在N型半导体材料的深阱中形成的NVM单元结构的方法,其中所述NVM单元结构包括形成在N型阱中的PMOS晶体管,所述PMOS晶体管包括间隔开的p型源极和漏极 区域,其间形成n型沟道区域,形成在与N型阱相邻的P型阱中的NMOS晶体管,所述NMOS晶体管包括间隔开的n型源极和漏极区,其限定p型沟道 导电浮置栅极,其包括在PMOS晶体管的n型沟道区域上延伸并且通过中间介电材料分离的第一部分和在p型沟道区域上延伸并与其分离的第二部分的第一部分 通过插入电介质材料和导电控制栅极形成在浮动栅极的第二部分的至少一部分上,并通过介电材料与其分离,该方法com 奖励:以预选的读取电压偏置深N型阱; 将PMOS晶体管的源极区域保持在读取电压; 将PMOS晶体管的漏极保持在地; 并将控制门保持在地面以进行预选的读取时间。
    • 13. 发明申请
    • METHOD OF ERASING AN NVM CELL THAT UTILIZES A GATED DIODE
    • 消除使用栅极二极管的NVM电池的方法
    • US20110007574A1
    • 2011-01-13
    • US12884519
    • 2010-09-17
    • Yuri MirgorodskiPeter J. HopperRoozbeh Parsa
    • Yuri MirgorodskiPeter J. HopperRoozbeh Parsa
    • G11C16/04
    • G11C16/10H01L27/11558H01L29/66825H01L29/7881
    • A method of erasing an NVM cell structure formed on a deep well of N-type semiconductor material, wherein the NVM cell structure includes a PMOS transistor formed in an N-type well, the PMOS transistor including spaced-apart p-type source and drain regions defining an n-type channel region therebetween, an NMOS transistor formed in a P-type well that is adjacent to the N-type well, the NMOS transistor including spaced-apart n-type source and rain regions defining a p-type channel region therebetween, a conductive floating gate that includes a first section that extends over the n-type channel region of the PMOS transistor and is separated therefrom by intervening dielectric material and a second section that extends over the p-type channel region and is separated therefrom by intervening dielectric material, and a conductive control gate formed over at least a portion of the second section of the floating gate and separated therefrom by intervening dielectric material, the erasing method comprising: biasing the deep N-type well at a selected erase voltage; holding the source and drain regions of the PMOS transistor at the erase voltage or floating; and holding the control gate at ground for a preselected erase time.
    • 一种擦除形成在N型半导体材料的深阱中的NVM单元结构的方法,其中NVM单元结构包括形成在N型阱中的PMOS晶体管,PMOS晶体管包括间隔开的p型源极和漏极 在它们之间限定n型沟道区的区域,形成在与N型阱相邻的P型阱中的NMOS晶体管,NMOS晶体管包括间隔开的n型源和限定p型沟道的雨区 导电浮置栅极,其包括在PMOS晶体管的n型沟道区域上延伸并且通过中间介电材料分离的第一部分和在p型沟道区域上延伸并与其分离的第二部分的第一部分 通过插入介电材料和导电控制栅极形成在浮动栅极的第二部分的至少一部分上,并通过介电材料与其隔开, 包括:在所选择的擦除电压下偏置所述深N型阱; 将PMOS晶体管的源极和漏极区域保持在擦除电压或浮置; 并将控制门保持在地面以进行预先选择的擦除时间。
    • 14. 发明授权
    • Apparatus and method for storing analog information in EEPROM memory
    • 用于将模拟信息存储在EEPROM存储器中的装置和方法
    • US07233521B1
    • 2007-06-19
    • US11078761
    • 2005-03-11
    • Yuri MirgorodskiPeter J. HopperVladislav VashshencoPhilipp Lindorfer
    • Yuri MirgorodskiPeter J. HopperVladislav VashshencoPhilipp Lindorfer
    • G11C11/34
    • G11C27/005G11C11/5621G11C16/0441G11C16/10
    • A storage device that is capable of receiving an analog signal and storing it as a digital signal. The storage device includes an input node configured to receive an analog input voltage and two non-volatile storage cells. A second non-volatile memory cell is coupled to receive the analog input signal from the input node. The second non-volatile memory cell is capable of being programmed to a one of a plurality of programming states. The first non-volatile memory cell, which is coupled to the second non-volatile memory cell, is also capable of being programmed to one of a plurality of programming states. During operation, the second non-volatile memory cell and the first non-volatile memory cell are both programmed to a selected second programming state indicative of the magnitude of the analog input voltage. The first programming state and the second programming state are together are indicative of a digital value commensurate with the magnitude of the analog input voltage.
    • 一种能够接收模拟信号并将其存储为数字信号的存储装置。 存储装置包括被配置为接收模拟输入电压的输入节点和两个非易失性存储单元。 第二非易失性存储单元被耦合以从输入节点接收模拟输入信号。 第二非易失性存储单元能够被编程为多个编程状态之一。 耦合到第二非易失性存储单元的第一非易失性存储单元也能够被编程为多个编程状态之一。 在操作期间,第二非易失性存储器单元和第一非易失性存储器单元都被编程为指示模拟输入电压的大小的选择的第二编程状态。 第一编程状态和第二编程状态一起表示与模拟输入电压的大小相称的数字值。
    • 16. 发明授权
    • NVM PMOS-cell with one erased and two programmed states
    • NVM PMOS单元具有一个擦除和两个编程状态
    • US07113427B1
    • 2006-09-26
    • US11076711
    • 2005-03-09
    • Yuri MirgorodskiPeter J. HopperVladislav VashchenkoPhilipp Lindorfer
    • Yuri MirgorodskiPeter J. HopperVladislav VashchenkoPhilipp Lindorfer
    • G11C16/04
    • G11C11/5628G11C16/12G11C16/3459H01L27/115H01L29/7881
    • NVM cell for storing three levels of charge: one erased and two programmed states. The cell comprises a transistor structure providing a gate current versus gate voltage curve having a shape with a flat region or a second peak. To provide such a structure, one embodiment combines two parallel transistors having different threshold voltages, and another embodiment uses one transistor with variable doping. The gate current curve provides two programming zones. Programming the first state includes applying a voltage across a channel, ramping up a gate voltage in the first programming zone, followed by ramping it back down. Programming the second state comprises applying a voltage across a channel, ramping up a gate voltage past the first programming zone and into the second programming zone, followed by ramping it back down. Ramping the voltage back down may optionally be preceded by turning off the voltage across the channel.
    • 用于存储三个电荷电平的NVM单元:一个擦除和两个编程状态。 该单元包括提供具有平坦区域或第二峰值的形状的栅极电流对栅极电压曲线的晶体管结构。 为了提供这样的结构,一个实施例组合了具有不同阈值电压的两个并联晶体管,另一实施例使用一个具有可变掺杂的晶体管 栅极电流曲线提供两个编程区域。 对第一状态进行编程包括在一个通道上施加电压,使第一个编程区中的栅极电压升高,然后将其向下斜坡。 对第二状态进行编程包括在通道上施加电压,将栅极电压升高到第一编程区并进入第二编程区,然后将其向下斜坡。 可以选择先将电压降低,然后关闭通道上的电压。