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11. 发明授权

US07771845B2 Organic electroluminescent device 有权
标题翻译：有机电致发光器件
公开(公告)号：US07771845B2
公开(公告)日：2010-08-10
申请号：US11374148
申请日：2006-03-14
申请人： Satoshi Sano , Tatsuya Igarashi , Toshihiro Ise , Takeshi Murakami , Seiji Ichijima
发明人： Satoshi Sano , Tatsuya Igarashi , Toshihiro Ise , Takeshi Murakami , Seiji Ichijima
IPC分类号： H01L51/54 , C09K11/06
CPC分类号： H01L51/5012 , H01L51/0081 , H01L51/0087 , H01L51/5016 , Y10S428/917
摘要： An organic electroluminescent device contains: a pair of electrodes; and an organic compound layer containing a light-emitting layer, the organic compound layer being between the electrodes, wherein the organic compound layer contains a platinum complex including specific structure.
摘要翻译：有机电致发光器件包括：一对电极; 和含有发光层的有机化合物层，有机化合物层在电极之间，其中有机化合物层含有具有特定结构的铂络合物。

12. 发明授权

US07758971B2 Organic electroluminescent device 有权
标题翻译：有机电致发光器件
公开(公告)号：US07758971B2
公开(公告)日：2010-07-20
申请号：US11410000
申请日：2006-04-25
申请人： Tatsuya Igarashi , Takeshi Murakami , Ikuo Kinoshita
发明人： Tatsuya Igarashi , Takeshi Murakami , Ikuo Kinoshita
IPC分类号： H01L51/54
CPC分类号： H01L51/5016 , C09K11/06 , C09K2211/1011 , C09K2211/1014 , C09K2211/1029 , C09K2211/1044 , C09K2211/1059 , C09K2211/185 , C09K2211/186 , C09K2211/188 , H01L51/0085 , H01L51/0087 , H05B33/14 , Y10S428/917
摘要： An organic electroluminescent device comprising: a pair of electrodes comprising a positive electrode and a negative electrode; and a plurality of organic compound layers including a light emitting layer between the pair of electrodes, wherein at least one layer containing a metal complex having a tridentate or more ligand is provided between the light emitting layer and the negative electrode.
摘要翻译：一种有机电致发光器件，包括：一对电极，包括正极和负极; 以及在所述一对电极之间包括发光层的多个有机化合物层，其中在所述发光层和所述负极之间设置至少一层含有具有三齿或更多配位体的金属络合物的层。

13. 发明授权

US07569838B2 Electron beam inspection system and inspection method and method of manufacturing devices using the system 有权
公开(公告)号：US07569838B2
公开(公告)日：2009-08-04
申请号：US12068484
申请日：2008-02-07
申请人： Kenji Watanabe , Hirosi Sobukawa , Nobuharu Noji , Tohru Satake , Shoji Yoshikawa , Tsutomu Karimata , Mamoru Nakasuji , Masahiro Hatakeyama , Takeshi Murakami , Yuichiro Yamazaki , Ichirota Nagahama , Takamitsu Nagai , Kazuyoshi Sugihara
发明人： Kenji Watanabe , Hirosi Sobukawa , Nobuharu Noji , Tohru Satake , Shoji Yoshikawa , Tsutomu Karimata , Mamoru Nakasuji , Masahiro Hatakeyama , Takeshi Murakami , Yuichiro Yamazaki , Ichirota Nagahama , Takamitsu Nagai , Kazuyoshi Sugihara
IPC分类号： H01J37/00 , H01J37/30
CPC分类号： H01J37/28 , H01J37/224 , H01J37/244 , H01J2237/006 , H01J2237/20221 , H01J2237/2445 , H01J2237/2817
摘要： An electron beam inspection system of the image projection type includes a primary electron optical system for shaping an electron beam emitted from an electron gun into a rectangular configuration and applying the shaped electron beam to a sample surface to be inspected. A secondary electron optical system converges secondary electrons emitted from the sample. A detector converts the converged secondary electrons into an optical image through a fluorescent screen and focuses the image to a line sensor. A controller controls the charge transfer time of the line sensor at which the picked-up line image is transferred between each pair of adjacent pixel rows provided in the line sensor in association with the moving speed of a stage for moving the sample.

14. 发明申请

US20090046113A1 Uneven streaks evaluation device, uneven streaks evaluation method, storage medium, and color filter manufacturing method 审中-公开
标题翻译：不均匀条纹评估装置，不均匀条纹评估方法，存储介质和滤色器制造方法
公开(公告)号：US20090046113A1
公开(公告)日：2009-02-19
申请号：US12220852
申请日：2008-07-29
申请人： Takeshi Murakami , Eiji Yamada
发明人： Takeshi Murakami , Eiji Yamada
IPC分类号： G09G5/02 , G06K9/40 , G03F1/00
CPC分类号： G06K9/40 , G06T5/002 , G09G3/006
摘要： A present uneven streaks evaluation device includes an evaluation data generation section for generating evaluation data, serving as an index for evaluating cyclic uneven streaks occurring on an evaluation target surface, in accordance with image data obtained by imaging the evaluation target surface to which light is emitted, wherein a one-dimensional projection processing section carries out a one-dimensional projection process with respect to light distribution included in the image data so that a projection direction is a direction including a vector of a direction in which uneven streaks occur, a power spectrum calculation section calculates a power spectrum in accordance with the light distribution having been subjected to the one-dimensional projection process, an integration processing section calculates an interval integral value of a preset cycle in accordance with the calculated power spectrum, and a noise component removing section removes a noise component included in the calculated interval integral value.
摘要翻译：本发明的不均匀条纹评价装置包括：评价数据生成部，其根据通过对发光的评价对象面进行成像而获得的图像数据，生成评价数据，作为用于评价在评价对象面上发生的循环不均匀条纹的指标其中，一维投影处理部对图像数据中包含的光分布进行一维投影处理，使得投影方向为包括发生不均匀条纹的方向的矢量的方向，功率谱计算部根据经过一维投影处理的光分布来计算功率谱，积分处理部根据计算出的功率谱计算预设周期的间隔积分值，噪声分量除去部去除包含的噪声成分计算间隔积分值。

15. 发明申请

US20080315090A1 Objective lens, electron beam system and method of inspecting defect 审中-公开
公开(公告)号：US20080315090A1
公开(公告)日：2008-12-25
申请号：US12219802
申请日：2008-07-29
申请人： Mamoru Nakasuji , Tohru Satake , Hirosi Sobukawa , Takeshi Murakami , Kenji Watanabe , Nobuharu Noji
发明人： Mamoru Nakasuji , Tohru Satake , Hirosi Sobukawa , Takeshi Murakami , Kenji Watanabe , Nobuharu Noji
IPC分类号： G01N23/00
CPC分类号： H01J37/141 , H01J2237/1534 , H01J2237/28
摘要： An electron beam system or a method for manufacturing a device using the electron beam system in which an electron beam can be irradiated at a high current density and a ratio of transmittance of a secondary electron beam of an image projecting optical system can be improved and which can be compact in size. The surface of the sample S is divided into plural stripe regions which in turn are divided into rectangle-shaped main fields. The main field is further divided into plural square-shaped subfields. The irradiation with the electron beams and the formation of a two-dimensional image are repeated in a unit of the subfields. A magnetic gap formed by the inner and outer magnetic poles of the objective lens is formed on the side of the sample, and an outer side surface and an inner side surface of each of the inner magnetic pole and the outer magnetic pole, respectively, forming the magnetic gap have each part of a conical shape with a convex having an angle of 45° or greater with respect to the optical axis.

16. 发明申请

US20080308729A1 Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former 有权
标题翻译：用于电子束检查的装置，其操作方法以及使用前者制造半导体器件的方法
公开(公告)号：US20080308729A1
公开(公告)日：2008-12-18
申请号：US12216160
申请日：2008-06-30
申请人： Toshifumi Kimba , Tohru Satake , Tsutomu Karimata , Kenji Watanabe , Nobuharu Noji , Takeshi Murakami , Masahiro Hatakeyama , Mamoru Nakasuji , Hirosi Sobukawa , Shoji Yoshikawa , Shin Oowada , Mutsumi Saito
发明人： Toshifumi Kimba , Tohru Satake , Tsutomu Karimata , Kenji Watanabe , Nobuharu Noji , Takeshi Murakami , Masahiro Hatakeyama , Mamoru Nakasuji , Hirosi Sobukawa , Shoji Yoshikawa , Shin Oowada , Mutsumi Saito
IPC分类号： G01N23/20
CPC分类号： H01J37/222 , G01N23/225 , G01N23/2251 , H01J37/06 , H01J37/073 , H01J37/185 , H01J37/20 , H01J37/244 , H01J37/28 , H01J2237/0216 , H01J2237/082 , H01J2237/2002 , H01J2237/2007 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2813 , H01J2237/2816 , H01J2237/2817 , H01L2224/48227 , H01L2924/01019 , H01L2924/01025 , H01L2924/01057 , H01L2924/01067 , H01L2924/01078 , H01L2924/10253 , H01L2924/12032 , H01L2924/3025 , H01L2924/00
摘要： A substrate inspection apparatus 1-1 (FIG. 1) of the present invention performs the following steps of: carrying a substrate “S” to be inspected into an inspection chamber 23-1; maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; moving successively said substrate by means of a stage 26-1 with at least one degree of freedom; irradiating an electron beam having a specified width; helping said electron beam reach to a surface of said substrate via a primary electron optical system 10-1; trapping secondary electrons emitted from said substrate via a secondary electron optical system 20-1 and guiding it to a detecting system 35-1; forming a secondary electron image in an image processing system based on a detection signal of a secondary electron beam obtained by said detecting system; detecting a defective location in said substrate based on the secondary electron image formed by said image processing system; indicating and/or storing said defective location in said substrate by CPU 37-1; and taking said completely inspected substrate out of the inspection chamber. Thereby, the defect inspection on the substrate can be performed successively with high level of accuracy and efficiency as well as with higher throughput.
摘要翻译：本发明的基板检查装置1-1（图1）执行以下步骤：将要检查的基板“S”运送到检查室23-1中; 在所述检查室中保持真空; 将所述检查室与振动隔离; 通过具有至少一个自由度的平台26-1连续移动所述衬底; 照射具有指定宽度的电子束; 帮助所述电子束经由一次电子光学系统10-1到达所述衬底的表面; 通过二次电子光学系统20-1捕获从所述衬底发射的二次电子并将其引导到检测系统35-1; 基于由所述检测系统获得的二次电子束的检测信号，在图像处理系统中形成二次电子图像; 基于由所述图像处理系统形成的二次电子图像检测所述基板中的缺陷位置; 通过CPU37-1指示和/或存储所述衬底中的所述缺陷位置; 并将完全检查的基板从检查室中取出。因此，可以以高水平的精度和效率以及更高的生产量连续地执行基板上的缺陷检查。

17. 发明授权

US07411191B2 Inspection system by charged particle beam and method of manufacturing devices using the system 有权
标题翻译：带电粒子束的检测系统及使用该系统的制造装置的方法
公开(公告)号：US07411191B2
公开(公告)日：2008-08-12
申请号：US11806573
申请日：2007-06-01
申请人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Masahiro Hatakeyama , Toshifumi Kimba , Hiroshi Sobukawa , Shoji Yoshikawa , Takeshi Murakami , Kenji Watanabe , Tsutomu Karimata , Shin Oowada , Mutsumi Saito , Yuichiro Yamazaki , Takamitsu Nagai , Ichirota Nagahama
发明人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Masahiro Hatakeyama , Toshifumi Kimba , Hiroshi Sobukawa , Shoji Yoshikawa , Takeshi Murakami , Kenji Watanabe , Tsutomu Karimata , Shin Oowada , Mutsumi Saito , Yuichiro Yamazaki , Takamitsu Nagai , Ichirota Nagahama
IPC分类号： H01J37/26
CPC分类号： H01J29/70 , G01N23/225 , G01N23/2251 , G01N23/227 , H01J37/06 , H01J37/073 , H01J37/141 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/266 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817 , H01L21/6719 , H01L21/67213
摘要： An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.
摘要翻译：电子束检查装置包括：电子光学装置70，具有用于从电子束源向一个电子束照射物体的电子 - 光学系统;以及用于检测由电子束投射的二次电子图像的检测器，光学系统; 用于相对于电子 - 光学系统保持和移动物体的平台系统50; 微型环境室20，用于向物体供应清洁气体，以防止灰尘与物体接触; 用于容纳平台装置的工作室31，工作室可控制为具有真空气氛; 设置在微环境室和工作室之间的至少两个装载室41,42适于独立控制以具有真空气氛; 以及用于通过装载室将物体传送到舞台系统的装载器60。

18. 发明授权

US07391036B2 Sample surface inspection apparatus and method 有权
公开(公告)号：US07391036B2
公开(公告)日：2008-06-24
申请号：US10511396
申请日：2003-04-17
申请人： Masahiro Hatakeyama , Kenji Watanabe , Takeshi Murakami , Tohru Satake , Nobuharu Noji
发明人： Masahiro Hatakeyama , Kenji Watanabe , Takeshi Murakami , Tohru Satake , Nobuharu Noji
IPC分类号： G01N13/10 , B05D1/36
CPC分类号： G03F7/162 , G01N23/225 , H01J37/285 , H01J2237/204 , H01J2237/2812 , H01J2237/2814 , H01J2237/2855 , H01J2237/2857
摘要： The present invention provides a surface inspection method and apparatus for inspecting a surface of a sample, in which a resistive film is coated on the surface, and a beam is irradiated to the surface having the resistive film coated thereon, to thereby conduct inspection of the surface of the sample. In the surface inspection method of the present invention, a resistive film having an arbitrarily determined thickness t1 is first coated on a surface of a sample. Thereafter, a part of the resistive film having the arbitrarily determined thickness t1 is dissolved in a solvent, to thereby reduce the thickness of the resistive film to a desired level. This enables precise control of a value of resistance of the resistive film and suppresses distortion of an image to be detected.

19. 发明授权

US07385197B2 Electron beam apparatus and a device manufacturing method using the same apparatus 有权
标题翻译：电子束装置和使用该装置的装置制造方法
公开(公告)号：US07385197B2
公开(公告)日：2008-06-10
申请号：US11175390
申请日：2005-07-07
申请人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Takeshi Murakami , Hirosi Sobukawa , Toru Kaga , Masahiro Hatakayama
发明人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Takeshi Murakami , Hirosi Sobukawa , Toru Kaga , Masahiro Hatakayama
IPC分类号： G01N23/00 , G01K7/00
CPC分类号： G01N23/2251 , H01J37/244 , H01J37/28 , H01J2237/14 , H01J2237/1508 , H01J2237/1526 , H01J2237/2447 , H01J2237/24592
摘要： Disclosed is an electron beam apparatus, in which a plurality of electron beams is formed from electrons emitted from an electron gun 21 and used to irradiate a sample surface via an objective lens 28, said apparatus comprising: a beam separator 27 for separating a secondary electron beams emanating from respective scanned regions on the sample from the primary electron beams; a magnifying electron lens 31 for extending a beam space between adjacent beams in the separated plurality of secondary electron beams; a fiber optical plate 32 for converting the magnified plurality of secondary electron beams to optical signals by a scintillator and for transmitting the signals; a photoelectric conversion device 35 for converting the optical signal to an electric signal; an optical zoom lens 33 for focusing the optical signal from the scintillator into an image on the photoelectric conversion device; and a rotation mechanism 36 for rotating the photoelectric conversion device 35 around the optical axis.
摘要翻译：公开了一种电子束装置，其中从电子枪21发射的电子形成多个电子束，并用于经由物镜28照射样品表面，所述装置包括：用于分离二次电子的光束分离器27 来自一次电子束的样品上的各扫描区域发出的光束; 用于在分离的多个二次电子束中的相邻光束之间延伸光束空间的放大电子透镜31; 用于通过闪烁体将放大的多个二次电子束转换为光信号并用于发送信号的光纤光学板32; 用于将光信号转换为电信号的光电转换装置35; 用于将来自闪烁体的光信号聚焦到光电转换装置上的图像的光学变焦透镜33; 以及用于使光电转换装置35围绕光轴旋转的旋转机构36。

20. 发明授权

US07351969B2 Electron beam inspection system and inspection method and method of manufacturing devices using the system 有权
标题翻译：电子束检查系统及使用该系统制造装置的检查方法和方法
公开(公告)号：US07351969B2
公开(公告)日：2008-04-01
申请号：US11290688
申请日：2005-12-01
申请人： Kenji Watanabe , Hirosi Sobukawa , Nobuharu Noji , Tohru Satake , Shoji Yoshikawa , Tsutomu Karimata , Mamoru Nakasuji , Masahiro Hatakeyama , Takeshi Murakami , Yuichiro Yamazaki , Ichirota Nagahama , Takamitsu Nagai , Kazuyoshi Sugihara
发明人： Kenji Watanabe , Hirosi Sobukawa , Nobuharu Noji , Tohru Satake , Shoji Yoshikawa , Tsutomu Karimata , Mamoru Nakasuji , Masahiro Hatakeyama , Takeshi Murakami , Yuichiro Yamazaki , Ichirota Nagahama , Takamitsu Nagai , Kazuyoshi Sugihara
IPC分类号： G21K7/00
CPC分类号： H01J37/28 , H01J37/224 , H01J37/244 , H01J2237/006 , H01J2237/20221 , H01J2237/2445 , H01J2237/2817
摘要： An electron beam inspection system of the image projection type includes a primary electron optical system for shaping an electron beam emitted from an electron gun into a rectangular configuration and applying the shaped electron beam to a sample surface to be inspected. A secondary electron optical system converges secondary electrons emitted from the sample. A detector converts the converged secondary electrons into an optical image through a fluorescent screen and focuses the image to a line sensor. A controller controls the charge transfer time of the line sensor at which the picked-up line image is transferred between each pair of adjacent pixel rows provided in the line sensor in association with the moving speed of a stage for moving the sample.
摘要翻译：图像投影型的电子束检查系统包括用于将从电子枪发射的电子束成形为矩形构造的一次电子光学系统，并将成形的电子束施加到要检查的样品表面。二次电子光学系统收敛从样品发射的二次电子。检测器通过荧光屏将会聚的二次电子转换成光学图像，并将图像聚焦到线传感器。一个控制器控制线传感器的电荷转移时间，该线传感器在行传感器中设置的每对相邻像素行之间与用于移动样本的平台的移动速度相关联地传送拾取线图像。

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