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    • 16. 发明申请
    • Method for forming a memory device with at least one memory cell, in particular a phase change memory cell, and memory device
    • 用于形成具有至少一个存储单元,特别是相变存储单元的存储器件和存储器件的方法
    • US20070287251A1
    • 2007-12-13
    • US11449050
    • 2006-06-08
    • Ulrike Gruening-von Schwerin
    • Ulrike Gruening-von Schwerin
    • H01L21/336
    • H01L45/144H01L27/2436H01L45/06H01L45/1226H01L45/1675
    • A method for forming a memory device with at least one memory cell, the memory cell including a volume of switching active material is disclosed. The method includes the process of depositing a first layer of insulating material on a substrate, depositing a layer of switching active material on the layer of insulating material, patterning the layer of switching active material to form volumes of switching active material. A second layer of insulating material is deposited. Vias are formed in the layers of the first insulating material, the switching active material and the second layer of insulating material in one method process. The vias are filled with a conductive material to form first and second electrode contacts for electrically coupling the volumes of switching active material. Furthermore the invention relates to a memory device produced by using this method.
    • 公开了一种用于形成具有至少一个存储单元的存储器件的方法,所述存储器单元包括一定量的开关活性材料。 该方法包括在衬底上沉积第一绝缘材料层的过程,在绝缘材料层上沉积切换活性材料层,使开关活性材料层形成图案以形成体积的开关活性材料。 沉积第二层绝缘材料。 在一个方法工艺中,在第一绝缘材料,开关活性材料和第二绝缘材料层的层中形成通孔。 通孔填充有导电材料以形成用于电耦合开关活性材料体积的第一和第二电极触点。 此外,本发明涉及使用该方法制造的存储器件。