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    • 13. 发明授权
    • Liquid processing apparatus, liquid processing method and storage medium
    • 液体处理装置,液体处理方法和储存介质
    • US08671875B2
    • 2014-03-18
    • US12540219
    • 2009-08-12
    • Shuichi NagamineNaofumi KishitaSatoshi BiwaKouji Fujimura
    • Shuichi NagamineNaofumi KishitaSatoshi BiwaKouji Fujimura
    • B05B13/04B05C11/00
    • H01L21/67051G03F7/162G03F7/3021H01L21/6715H01L21/67178
    • Disclosed is a liquid processing apparatus capable of increasing the number of arranged substrate retainers without increasing the total exhaust amount of the liquid processing apparatus. A N-number (N is an integer identical to or greater than three) of cup bodies are inhaled and exhausted in total exhaust amount E through a plurality of separate exhaustion passage each having a first damper, and through a common exhaustion passage connected in common downstream of the separate exhaustion passages. The first dampers are configured such that an external air is received from the cup body in a first intake amount of external air E1 for one of the cup bodies where a chemical liquid nozzle is placed at a setting location facing a wafer, and an external air is received from each of the other cup bodies in a second intake amount of external air E2 less than the first amount E1 and the intake amount of external air from both each of the other cup bodies and each of branched passages equals (E−E1)/(n−1).
    • 公开了一种液体处理装置,其能够增加布置的基板保持件的数量,而不增加液体处理装置的总排气量。 通过具有第一阻尼器的多个分开的排气通道,并且通过共同连接的共同的排气通道吸入并排出具有总排气量E的杯体的N数(N是等于或大于3的整数) 在分开的排气通道的下游。 第一阻尼器构造成使得外部空气从杯体中以第一吸入量的外部空气E1接收,用于杯形体之一,其中化学液体喷嘴位于面向晶片的设置位置处,并且外部空气 从每个其他杯体的第二吸入量小于第一量E1的外部空气E2和来自两个其他杯体和每个分支通道的外部空气的吸入量等于(E-E1) /(n-1)。