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    • 11. 发明授权
    • Tabular grain silver halide emulsion with uniform epitaxial deposition
    • 具有均匀外延沉积的片状卤化银乳剂
    • US06593072B1
    • 2003-07-15
    • US10027285
    • 2001-12-21
    • Tommie L. Royster, Jr.
    • Tommie L. Royster, Jr.
    • G03C1005
    • G03C1/09G03C1/0051G03C2001/03511G03C2001/03552G03C2200/03G03C2200/43G03C2200/59
    • A process of sensitizing a tabular grain emulsion containing the steps of (i) providing a tabular grain host emulsion comprised of a dispersing medium and silver halide grains including tabular grains having {111} major faces and an aspect ratio of at least 2, which contain greater than 50 mole percent bromide, based on silver, and which account for greater than 50 percent of total grain projected area; (ii) adding a thiosulfonate compound of the following Formula I at the surface of the tabular grains of the host emulsion: Z1SO2SZ2  (I) where Z1 represents is a substituted or unsubsituted aliphatic, aromatic, or heterocyclic group, and Z2 represents a substituted or unsubsituted aliphatic, aromatic, or heterocyclic group, or a monovalent metal or organic cation, where Z1 and Z2 may combine together to form a ring structure or either of Z1 or Z2 may comprise a polymeric backbone wherein the thiosulfonate group may be repeated; and (iii) adding silver and halide ions, where the halide ions include at least, chloride ions, to the tabular grain host emulsion in an amount of from 0.5-7 mole percent based on total silver of the tabular grain host emulsion to precipitate silver halide protrusions forming epitaxial junctions with up to 50 percent of the surface area of the tabular grains essentially at only the corners of the tabular grains, the protrusions having an isomorphic face centered cubic crystal structure and including at least a 10 mole percent higher chloride ion concentration than the host tabular grains.
    • 包含以下步骤致敏的片状颗粒乳剂的方法:(i)提供由分散介质和卤化银颗粒组成的片状颗粒主体乳液,所述分散介质和卤化银颗粒包括具有{111}主面和纵横比至少为2的片状颗粒,其含有 大于50摩尔百分比的溴,基于银,占总颗粒投影面积的大于50%;(ii)在主乳液的片状颗粒的表面加入下式I的硫代磺酸酯化合物:其中 Z 1表示取代或未取代的脂族,芳族或杂环基团,Z 2表示取代或未取代的脂族,芳族或杂环基团或一价金属或有机阳离子,其中Z 1和Z 2可以结合在一起形成环结构 或Z 1或Z 2中的任一个可以包含聚合物主链,其中可以重复硫代磺酸根基团; 和(iii)将银和卤离子添加到片状颗粒主体乳液中至少包含氯离子的银和卤离子的量为基于片状颗粒主体乳液的总银的0.5-7摩尔%,以沉淀出银 卤化物突起形成外延结,其中片状颗粒的表面积高达50%,基本上仅在片状颗粒的角落处,突起具有同构的面心立方晶体结构,并且包括至少10摩尔%的较高氯离子浓度 比主体平片状谷物。
    • 17. 发明授权
    • Process for doping silver halide emulsion grains with Group 8 transition metal shallow electron trapping dopant, selenium dopant, and gallium dopant, and doped silver halide emulsion
    • 用8号过渡金属浅电子俘获掺杂剂,硒掺杂剂和镓掺杂剂掺杂卤化银乳剂颗粒的方法和掺杂的卤化银乳剂
    • US06740483B1
    • 2004-05-25
    • US10426264
    • 2003-04-30
    • Tommie L. Royster, Jr.
    • Tommie L. Royster, Jr.
    • G03C1005
    • G03C1/08G03C1/005G03C1/0051G03C2001/03511G03C2001/0854G03C2200/03
    • A process for incorporating dopants in a silver halide emulsion is described comprising precipitating silver halide emulsion grains in a reaction vessel, wherein at least one gallium dopant, at least one Group 8 metal dopant, and at least one selenium dopant are introduced into the reaction vessel during precipitation of the silver halide grains; where the gallium dopant is introduced in the form of a gallium halide coordination complex of the formula (I): [RxNHy]3GaX6 wherein R represents a lower alkyl group of from 1-3 carbon atoms; X is Cl, Br, or I; and x is from 1-3, y is from 1-3, and x+y=4; and the Group 8 metal dopant satisfies the formula (II): [ML6]n wherein n is −2, −3 or −4; M is a Fe+2, Ru+2, or Os+2 ion; and L6 represents bridging ligands which can be independently selected, provided that at least four of the ligands are anionic ligands, and at least one of the ligands is a cyano ligand or a ligand more electronegative than a cyano ligand. In another embodiment, this invention is directed towards silver halide emulsions formed by such process. In a still further aspect, this invention is directed towards a photographic element comprised of a support, and a silver halide emulsion layer coated on the support comprised of an emulsion obtained by the process of the invention.
    • 描述了在卤化银乳剂中掺入掺杂剂的方法,其包括在反应容器中沉淀卤化银乳剂颗粒,其中将至少一种镓掺杂剂,至少一种第8族金属掺杂剂和至少一种硒掺杂剂引入反应容器 在卤化银颗粒沉淀期间; 其中镓掺杂剂以式(I)的卤化镓配位络合物的形式引入:其中R表示1-3个碳原子的低级烷基; X是Cl,Br或I; x为1-3,y为1-3,x + y = 4; 并且第8族金属掺杂剂满足式(II):其中n为-2,3或-4; M是Fe 2+,Ru 2+或Os +离子; 并且L6表示可以独立选择的桥连配体,条件是至少四个配体是阴离子配体,并且至少一个配体是氰基配体或比氰基配体更具有负电性的配体。 在另一个实施方案中,本发明涉及通过这种方法形成的卤化银乳剂。 在另一方面,本发明涉及由支撑体和涂覆在由本发明的方法获得的乳液组成的载体上的卤化银乳剂层的照相元件。