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    • 16. 发明申请
    • Non-volatile memory device and method of fabricating the same
    • 非易失性存储器件及其制造方法
    • US20090273054A1
    • 2009-11-05
    • US12382106
    • 2009-03-09
    • Suk-pil KimWon-joo KimSeung-hoon Lee
    • Suk-pil KimWon-joo KimSeung-hoon Lee
    • H01L29/68
    • H01L27/115H01L27/11206H01L27/24
    • A non-volatile memory device and methods of fabricating the device according to example embodiments involve a stacked layer structure. The non-volatile memory device may include at least one first horizontal electrode including a first sidewall and a second sidewall; at least one second horizontal electrode including a third sidewall and a fourth sidewall; wherein the third sidewall may be disposed to face the first sidewall; at least one vertical electrode may be interposed between the first sidewall and the third sidewall, in such a way as to cross or intersect each of the at least one first and second horizontal electrodes, and; at least one data storage layer that may be capable of locally storing a change of electrical resistance may be interposed where the at least one first horizontal electrode and the at least one vertical electrode cross or intersect and where the at least one horizontal electrode and the at least one vertical electrodes cross or intersect.
    • 根据示例实施例的非易失性存储器件和制造器件的方法涉及堆叠层结构。 非易失性存储器件可以包括至少一个包括第一侧壁和第二侧壁的第一水平电极; 至少一个第二水平电极,包括第三侧壁和第四侧壁; 其中所述第三侧壁可以被设置为面对所述第一侧壁; 至少一个垂直电极可以插入在第一侧壁和第三侧壁之间,以便使得至少一个第一和第二水平电极中的每一个交叉或相交, 可以插入至少一个能够局部存储电阻变化的数据存储层,其中至少一个第一水平电极和至少一个垂直电极交叉或相交,并且其中至少一个水平电极和at 至少一个垂直电极交叉或相交。