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    • 15. 发明授权
    • Embedded capacitor core having a multiple-layer structure
    • 具有多层结构的嵌入式电容器芯
    • US07893359B2
    • 2011-02-22
    • US11470435
    • 2006-09-06
    • Shih-Hsien WuMin-Lin LeeShinn-Juh LayChih-Hao Chang
    • Shih-Hsien WuMin-Lin LeeShinn-Juh LayChih-Hao Chang
    • H05K1/16H05K1/18
    • H05K1/162H05K3/4611H05K2201/0209H05K2201/09309Y10T29/43Y10T29/49126
    • An embedded capacitor core including a first set of capacitors, a second set of capacitors, and an inter-layer dielectric film between the first set of capacitors and the second set of capacitors. The first set of capacitors includes: a first conductive pattern comprising at least two conductive electrodes; a second conductive pattern comprising at least two conductive electrodes corresponding to the two conductive electrodes of the first conductive pattern; and a first dielectric film between the first conductive pattern and the second conductive pattern. The second set of capacitors includes: a third conductive pattern comprising at least two conductive electrodes; a fourth conductive pattern comprising at least two conductive electrodes corresponding to the two conductive electrodes of the third conductive pattern; and a second dielectric film between the third conductive pattern and the fourth conductive pattern.
    • 一种嵌入式电容器芯,包括第一组电容器,第二组电容器和在第一组电容器和第二组电容器之间的层间电介质膜。 第一组电容器包括:包括至少两个导电电极的第一导电图案; 第二导电图案,包括对应于第一导电图案的两个导电电极的至少两个导电电极; 以及在第一导电图案和第二导电图案之间的第一电介质膜。 第二组电容器包括:包括至少两个导电电极的第三导电图案; 第四导电图案,包括对应于第三导电图案的两个导电电极的至少两个导电电极; 以及在第三导电图案和第四导电图案之间的第二电介质膜。
    • 20. 发明授权
    • Interconnection structure, apparatus therewith, circuit structure therewith
    • 互连结构,装置,其电路结构
    • US08853848B2
    • 2014-10-07
    • US13109016
    • 2011-05-17
    • Shih-Hsien Wu
    • Shih-Hsien Wu
    • H01L23/48H01L23/14H05K1/02H01L21/768H01L21/48H01L23/498
    • H05K1/0222H01L21/486H01L21/76898H01L23/147H01L23/49827H01L2924/0002H05K2201/096H01L2924/00
    • An interconnection structure is disposed between a first conductive layer and a second conductive layer substantially parallel to each other. The conductive layer includes a signal trace. The interconnection structure includes a conductor pillar and a shielding wall pillar. The conductor pillar goes through between the two conductive layers and is electrically connected to the signal trace of the first conductive layer. The shielding wall pillar is also disposed between the two conductive layers and located at a portion of an external region surrounding the conductor pillar and electrically coupled to the conductor pillar. The conductor pillar and the shielding wall pillar are disposed in pair or in group. The shielding wall pillar with a shape different from that of the conductor pillar would make the conductor pillar serve as a connection with a designed impedance and the capability of controlling impedance based on the special shape design thereof.
    • 互连结构设置在基本上彼此平行的第一导电层和第二导电层之间。 导电层包括信号迹线。 互连结构包括导体柱和屏蔽壁支柱。 导体柱通过两个导电层之间并与第一导电层的信号​​迹线电连接。 屏蔽壁柱也设置在两个导电层之间并且位于围绕导体柱的外部区域的一部分并且电耦合到导体柱。 导体柱和屏蔽壁支柱成对或组合配置。 具有与导体柱不同的形状的屏蔽壁支柱将导致导体柱与设计阻抗的连接以及基于其特殊形状设计来控制阻抗的能力。