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    • 14. 发明申请
    • Alkaline developer for radiation sensitive compositions
    • 用于辐射敏感组合物的碱性显影剂
    • US20050106510A1
    • 2005-05-19
    • US10956871
    • 2004-10-01
    • Willi-Kurt GriesMarc Van DammePascal MeeusMario Boxhorn
    • Willi-Kurt GriesMarc Van DammePascal MeeusMario Boxhorn
    • G03C5/16G03F7/32
    • G03F7/322
    • The invention relates to an alkaline developer for irradiated radiation sensitive compositions, which developer is based on water and at least one inorganic salt having an alkaline reaction, wherein the developer has a pH of at least 11 and comprises at least three structurally different surfactants of formulae (A), (B) and (C), characterised in that the surfactant of formula (A) has one anionic group, the surfactant of formula (B) has two anionic groups, the surfactant of formula (C) is non-ionic and has at least one non-ionic hydrophilic group, and the concentration of each of the surfactants of formulae (A), (B) and (C) in the developer is at least 0.05 weight-% based on the total weight of the developer. The developer leads to less depositions and has a superior stability when used.
    • 本发明涉及一种用于辐照敏感组合物的碱性显影剂,该显色剂基于水和至少一种具有碱性反应的无机盐,其中显影剂的pH至少为11,并且包含至少三种结构不同的式 (A),(B)和(C),其特征在于式(A)的表面活性剂具有一个阴离子基团,式(B)的表面活性剂具有两个阴离子基团,式(C)的表面活性剂是非离子的 并且具有至少一个非离子亲水基团,并且显影剂中式(A),(B)和(C)的每种表面活性剂的浓度相对于显影剂的总重量为至少0.05重量% 。 开发人员的沉积少,在使用时具有优异的稳定性。
    • 17. 发明授权
    • Method for making positive working printing plates from a heat mode sensitive imaging element
    • 从热模式敏感成像元件制造正性印刷版的方法
    • US06248503B1
    • 2001-06-19
    • US09186613
    • 1998-11-06
    • Joan VermeerschMarc Van DammeAndreas ElsässerInge Claes
    • Joan VermeerschMarc Van DammeAndreas ElsässerInge Claes
    • G03F7004
    • B41C1/10B41C1/1008B41C1/1016B41C2210/02B41C2210/06B41C2210/14B41C2210/22B41C2210/24B41C2210/262
    • According to the present invention there is provided a method for making a lithographic printing plate comprising the steps of a) exposing imagewise to IR-radiation a heat mode imaging element having on a lithographic base with a hydrophilic surface a first layer including a polymer, soluble in an aqueous alkaline solution and a top layer on the same side of the lithographic base as the first layer which top layer is unpenetrable by an alkaline developer and contains a compound capable of converting light into heat, wherein said first layer and said top layer may be one and the same layer; and b) developing said imagewise exposed heat mode imaging element with said alkaline developer whereby the exposed areas of the first and the top layer, which may be the same, are dissolved and the unexposed areas of the first layer remain undissolved characterized in that said alkaline developer has a pH of at least 12 and a surface tension of at least 30 mN/m.
    • 根据本发明,提供了一种制备平版印刷版的方法,包括以下步骤:a)将具有亲水表面的光学成像元件的热模式成像元件成像曝光于包含聚合物的第一层,所述第一层可溶于 碱性水溶液和位于与第一层相同的一侧的顶层,该顶层不能被碱性显影剂穿透,并且含有能够将光转化成热的化合物,其中所述第一层和所述顶层可以是 同一层; 和b)用所述碱性显影剂显影所述成像曝光的热模式成像元件,由此第一层和顶层的可能相同的暴露区域被溶解,并且第一层的未曝光区域保持未溶解,其特征在于所述碱性显影剂 具有至少12的pH和至少30mN / m的表面张力。