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    • 11. 发明申请
    • CONTROL APPARATUS FOR AUTOMATIC TRANSMISSION
    • 自动变速器控制装置
    • US20120232764A1
    • 2012-09-13
    • US13510533
    • 2010-11-19
    • Yasushi InagawaShintaro KamedaAtsuhiro SaekiTakahiro MatsudaHidekazu ArakiHiroyuki OkudaYuji Yasui
    • Yasushi InagawaShintaro KamedaAtsuhiro SaekiTakahiro MatsudaHidekazu ArakiHiroyuki OkudaYuji Yasui
    • B60W10/06B60W10/10F16H59/36
    • F02D29/02F16H59/48F16H61/061F16H63/502F16H2061/0087Y10T477/60Y10T477/73
    • In a control apparatus for an automatic transmission, it is configured to calculate a change amount (ΔNC estimation value) of an output rotational speed of the transmission (S10); calculate an average (I phase initial average G) of the change amount of the output rotational speed over a predetermined period of an initial inertia (I) phase of shifting; calculate an average (after-shift average G) of a vehicle acceleration after the completion of the shifting, assuming that the change amount of the output rotational speed indicates the vehicle acceleration G; calculate a difference (I phase initial G) between the average of the change amount of the output rotational speed and the average of the vehicle acceleration; incrementally and decrementally correct the desired value of the transmission torque of the frictional engaging element such that the calculated difference falls within a predetermined range; and control supply of hydraulic pressure to the frictional engaging element such that it becomes the corrected desired value (S14 to S20). With this, since the vehicle acceleration at shifting is estimated and evaluated and based thereon, variation in the transmission torque of the frictional engaging element, etc., is learned, it becomes possible to fully exploit the potential of the frictional engaging element, thereby improving a feel given to the vehicle occupant(s) at shifting.
    • 在自动变速器的控制装置中,构成为计算变速器的输出转速的变化量(&Dgr; NC估计值)(S10)。 计算在初始惯性(I)相位移动的预定周期内的输出转速的变化量的平均值(I相初始平均值G) 假设输出转速的变化量表示车辆加速度G,计算完成变速后的车辆加速度的平均值(变速后平均值G) 计算输出转速的变化量的平均值与车辆加速度的平均值之间的差(I相初始G) 递增地和递减地校正摩擦接合元件的传递扭矩的期望值,使得所计算的差落在预定范围内; 并且控制向摩擦接合元件供应液压以使其成为校正的期望值(S14至S20)。 由此,由于估计和评估了换档时的车辆加速度,并且基于此,学习了摩擦接合元件等的传递扭矩的变化,所以可以充分利用摩擦接合元件的电位,从而改善 给予车辆乘员的转移感觉。
    • 19. 发明授权
    • Optical information recording/reproducing apparatus
    • 光信息记录/重放装置
    • US08203924B2
    • 2012-06-19
    • US12430142
    • 2009-04-27
    • Takahiro Matsuda
    • Takahiro Matsuda
    • G11B7/00
    • G11B19/125G11B7/08582G11B17/028G11B17/0282G11B2007/0006
    • There is provided an optical information recording/reproducing apparatus having an optical disc drive unit for driving an optical disc mounted, a hologram disc drive unit for driving a hologram disc mounted, a disc discrimination device for discriminating which of an optical disc and a hologram disc was mounted, a selection device of the disc drive unit for selecting an optical disc drive unit, when discriminated to be an optical disc, by the disc discrimination device, while selecting a hologram disc drive unit, when discriminated to be a hologram disc, by the disc discrimination device, and a drive device of the disc drive unit for driving the disc drive unit selected by the selection device of the disc drive unit.
    • 提供了一种具有用于驱动安装的光盘的光盘驱动单元的光学信息记录/再现装置,用于驱动安装的全息图盘的全息图盘驱动单元,用于鉴别光盘和全息光盘中的哪一个的盘识别装置 安装时,当通过盘识别装置识别为光盘时选择光盘驱动单元的盘驱动单元的选择装置,同时当被选择为全息图盘驱动单元时,通过 盘识别装置和用于驱动由盘驱动单元的选择装置选择的盘驱动单元的盘驱动单元的驱动装置。
    • 20. 发明授权
    • Polishing head, polishing apparatus and polishing method for semiconductor wafer
    • 半导体晶片的抛光头,抛光装置和抛光方法
    • US07740521B2
    • 2010-06-22
    • US11884833
    • 2006-03-01
    • Hiromasa HashimotoYasuharu ArigaHisashi MasumuraKouzi KitagawaToshimasa KubotaTakahiro Matsuda
    • Hiromasa HashimotoYasuharu ArigaHisashi MasumuraKouzi KitagawaToshimasa KubotaTakahiro Matsuda
    • B24B1/00B24B21/18
    • B24B37/30
    • The present invention provides a polishing head 1 comprising a carrier 3, a guide ring 4, a dress ring 5, and a head body 2, wherein the head body 2 is rotatable, and holds the carrier 3, the guide ring 4, and the dress ring 5; the head body 2 has a reversed-bowl shape and has a hollow 8; the dress ring, and at least the guide ring or the carrier are held by being coupled to a lower brim of the head body via a diaphragm 6; the hollow of the head body is sealed. During polishing, the pressure of the sealed hollow is adjusted with a pressure regulating mechanism 9 communicating with the hollow, thereby elastically deforming the diaphragm. As a result, a wafer W can be polished while the wafer and the dress ring are pressed with a given pressing force against a polishing pad 11 on a turn table 12 with rotating the wafer held by the carrier and the dress ring. Consequently, there is provided a polishing head or the like with which excessive polishing in the outer periphery of a semiconductor wafer can be prevented and generation of impressions or scratches in the edge portion of the wafer can be prevented effectively.
    • 本发明提供了一种抛光头1,其包括载体3,导向环4,连接环5和头部主体2,其中头部主体2可旋转,并且保持载体3,导向环4和 连衣裙5; 头体2具有倒碗形状并具有中空部8; 连接环,并且至少导向环或载体通过隔膜6联接到头本体的下边缘; 头体的中空被密封。 在抛光期间,通过与中空部连通的压力调节机构9来调节密封空心的压力,从而使隔膜弹性变形。 结果,晶片W可以被抛光,同时通过旋转由载体和连接环保持的晶片,在给定的压力下对转台12上的抛光垫11施加压力。 因此,提供了可以防止在半导体晶片的外周中进行过度抛光并且可以有效地防止在晶片的边缘部分产生印模或划痕的抛光头等。