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    • 11. 发明授权
    • Method for doping quantum dots
    • 掺杂量子点的方法
    • US07192850B2
    • 2007-03-20
    • US11024801
    • 2004-12-30
    • Hsueh-Shih ChenDai-Luon LoChien-Ming ChenGwo-Yang Chang
    • Hsueh-Shih ChenDai-Luon LoChien-Ming ChenGwo-Yang Chang
    • H01L21/00
    • B82Y30/00B82Y10/00C23C18/08H01L21/02409H01L21/02439H01L21/0256H01L21/02581H01L21/02601H01L21/02628Y10S977/774
    • A doping method for forming quantum dots is disclosed, which includes following steps: providing a first precursor solution for a group II element and a second precursor solution for a group VI element; heating and mixing the first precursor solution and the second precursor solution for forming a plurality of II–VI compound cores of the quantum dots dispersing in a melting mixed solution; and injecting a third precursor solution for a group VI element and a forth precursor solution with at least one dopant to the mixed solution in turn at a fixed time interval in order to form quantum dots with multi-shell dopant; wherein the dopant described here is selected from a group consisting of transitional metal and halogen elements. This method of the invention can dope the dopants in the inner quantum dot and enhance the emission intensity efficiently.
    • 公开了一种用于形成量子点的掺杂方法,其包括以下步骤:为第Ⅵ族元素提供第一前体溶液和为Ⅵ族元素提供第二前体溶液; 加热和混合第一前体溶液和第二前体溶液,以形成分散在熔融混合溶液中的量子点的多个II-VI化合物核心; 并且以固定的时间间隔依次向所述混合溶液中注入具有至少一种掺杂剂的第Ⅵ族元素和第四前体溶液的第三前体溶液,以形成具有多壳掺杂剂的量子点; 其中这里描述的掺杂剂选自由过渡金属和卤素元素组成的组。 本发明的这种方法可以掺杂在内量子点中并有效地提高发射强度。
    • 17. 发明申请
    • Apparatus for manufacturing a quantum-dot element
    • 用于制造量子点元件的装置
    • US20060289853A1
    • 2006-12-28
    • US11187828
    • 2005-07-25
    • Hsueh-Shih ChenDai-Luon LoGwo-Yang ChangChien-Ming Chen
    • Hsueh-Shih ChenDai-Luon LoGwo-Yang ChangChien-Ming Chen
    • H01L31/00
    • C23C14/22B82Y10/00B82Y30/00H01L21/6715
    • An apparatus for manufacturing a quantum-dot element is disclosed. The apparatus includes a reaction chamber for evaporating or sputtering at least one electrode layer or at least one buffer layer on the substrate. The substrate-supporting base is located inside the reaction chamber for fixing the substrate. The atomizer has a gas inlet and a sample inlet. More specifically, the gas inlet and the sample inlet feed the atomizer respectively with a gas and a precursor solution having a plurality of functionalized quantum dots, and thereby form a quantum-dot layer on the substrate. The apparatus of the present invention can form a quantum dot layer with uniformly distributed quantum dots and integrate the processes for forming a quantum-dot layer, a buffer layer, and an electrode layer together at the same chamber. Therefore, the quality of produced element can be substantially improved.
    • 公开了一种用于制造量子点元件的装置。 该装置包括用于在衬底上蒸发或溅射至少一个电极层或至少一个缓冲层的反应室。 基板支撑基座位于反应室内部,用于固定基板。 雾化器具有气体入口和样品入口。 更具体地,气体入口和样品入口分别向雾化器供给具有多个官能化量子点的气体和前体溶液,从而在衬底上形成量子点层。 本发明的装置可以形成具有均匀分布的量子点的量子点层,并将在量子点层,缓冲层和电极层的形成过程集成在一起。 因此,可以显着提高生产元件的质量。