专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

11. 发明申请

US20050072755A1 Single phase fluid imprint lithography method 有权
标题翻译：单相流体压印光刻法
公开(公告)号：US20050072755A1
公开(公告)日：2005-04-07
申请号：US10677639
申请日：2003-10-02
申请人： Ian McMackin , Nicholas Stacey , Daniel Babbs , Duane Voth , Michael Watts , Van Truskett , Frank Xu , Ronald Voisin , Pankaj Lad
发明人： Ian McMackin , Nicholas Stacey , Daniel Babbs , Duane Voth , Michael Watts , Van Truskett , Frank Xu , Ronald Voisin , Pankaj Lad
IPC分类号： B01D19/00 , B29C59/02 , C23F1/00 , G03F20060101 , G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S425/06 , Y10S425/815 , Y10S438/909
摘要： The present invention is directed toward a method for reducing pattern distortions in imprinting layers by reducing gas pockets present in a layer of viscous liquid deposited on a substrate. To that end, the method includes varying a transport of the gases disposed proximate to the viscous liquid. Specifically, the atmosphere proximate to the substrate wherein a pattern is to be recorded is saturated with gases that are either highly soluble, highly diffusive, or both with respect to the viscous liquid being deposited. Additionally, or in lieu of saturating the atmosphere, the pressure of the atmosphere may be reduced.
摘要翻译：本发明涉及通过减少存在于沉积在基底上的粘性液体层中的气穴来减少压印层中的图案失真的方法。为此，该方法包括改变靠近粘性液体设置的气体的输送。具体地，其中待记录图案的基板附近的气氛相对于被沉积的粘性液体是高度可溶的，高度扩散的或者两者都被饱和。另外，或者代替饱和气氛，可以降低气氛的压力。

12. 发明授权

US08854406B1 Collective marking of a surface by steering multiple laser beams generated by a laser controller 有权
标题翻译：通过转动由激光控制器产生的多个激光束来对表面进行集体标记
公开(公告)号：US08854406B1
公开(公告)日：2014-10-07
申请号：US14097273
申请日：2013-12-05
申请人： Ashot Mesropyan , Michael Watts
发明人： Ashot Mesropyan , Michael Watts
IPC分类号： B41J2/435 , B41J2/47 , B41J27/00
CPC分类号： B41J2/47 , B41J2/473
摘要： Disclosed are methods, systems, and/or apparatus for the collective marking of a surface by two or more laser beams generated by a laser controller. A method includes receiving one or more input signals from a controller of the laser system. The method also includes adjusting a first mirror through a first galvanometer scanner, a second minor through a second galvanometer scanner, a third mirror through a third galvanometer scanner, and a fourth mirror through a fourth galvanometer scanner based on the one or more input signals. The method further includes steering, through the first mirror and the second mirror, a first laser beam generated by the controller and transmitted to a marking head through a beam delivery vessel; and steering, through the third mirror and the fourth minor, a second laser beam generated by the controller and transmitted to the marking head through another beam delivery vessel.
摘要翻译：公开了用于通过由激光控制器产生的两个或更多个激光束来集体标记表面的方法，系统和/或设备。一种方法包括从激光系统的控制器接收一个或多个输入信号。该方法还包括通过第一电流计扫描器调整第一反射镜，通过第二检流计扫描器调整第二反射镜，通过第三检流计扫描器调整第三反射镜，以及基于所述一个或多个输入信号通过第四检流计扫描器调整第四反射镜。该方法还包括通过第一反射镜和第二反射镜转动由控制器产生的第一激光束，并通过光束输送容器传输到标记头; 以及通过所述第三反射镜和所述第四辅助转向由所述控制器产生的第二激光束，并通过另一个光束传送容器传送到所述标记头。

13. 发明申请

US20080085465A1 Polymerization Technique to Attenuate Oxygen Inhibition of Solidification of Liquids and Composition Therefor 有权
标题翻译：聚合技术降低液体及其组合物固化的氧气抑制
公开(公告)号：US20080085465A1
公开(公告)日：2008-04-10
申请号：US11858687
申请日：2007-09-20
申请人： Frank Xu , Edward Fletcher , Pankaj Lad , Michael Watts
发明人： Frank Xu , Edward Fletcher , Pankaj Lad , Michael Watts
IPC分类号： G03C1/73
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： The present invention includes a method of solidifying a polymerizable liquid to form a film on a substrate that features minimizing inhibition of the polymerization process by oxygen contained in the atmosphere surrounding the polymerizable liquid. To that end, the polymerizable liquid includes, inter alia, an initiator that consumes oxygen that interacts with the polymerizable liquid and generates additional free radicals to facilitate the polymerizable process.
摘要翻译：本发明包括固化可聚合液体以在基材上形成膜的方法，该方法的特征在于使包围在可聚合液体周围的气氛中的氧的聚合过程的抑制最小化。为此，可聚合液体尤其包括消耗与可聚合液体相互作用的氧的引发剂，并产生额外的自由基以促进可聚合过程。

14. 发明申请

US20060158651A1 Scatterometry alignment for imprint lithography 有权
标题翻译：刻印光刻的散射对准
公开(公告)号：US20060158651A1
公开(公告)日：2006-07-20
申请号：US11347198
申请日：2006-02-03
申请人： Michael Watts , Ian McMackin
发明人： Michael Watts , Ian McMackin
IPC分类号： G01B11/00
CPC分类号： B29C35/0888 , B29C59/022 , B29C59/026 , B29C2035/0827 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/00
摘要： Described are methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. Alignment of the template with a previously formed layer on a substrate, in one embodiment, is accomplished by using scatterometry.
摘要翻译：描述了通过压印光刻图案化衬底的方法。压印光刻是将液体分配到基板上的过程。使模板与液体接触并且液体被固化。固化液体包括在模板中形成的任何图案的印记。在一个实施例中，模板与衬底上预先形成的层的对准通过使用散射测量来实现。

15. 发明申请

US20060062922A1 Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor 审中-公开
标题翻译：聚合技术减弱了液体固化的氧气抑制及其组成
公开(公告)号：US20060062922A1
公开(公告)日：2006-03-23
申请号：US10948511
申请日：2004-09-23
申请人： Frank Xu , Edward Fletcher , Pankaj Lad , Michael Watts
发明人： Frank Xu , Edward Fletcher , Pankaj Lad , Michael Watts
IPC分类号： B05D3/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： The present invention includes a method of solidifying a polymerizable liquid to form a film on a substrate that features minimizing inhibition of the polymerization process by oxygen contained in the atmosphere surrounding the polymerizable liquid. To that end, the polymerizable liquid includes, inter alia, an initiator that consumes oxygen that interacts with the polymerizable liquid and generates additional free radicals to facilitate the polymerization process.
摘要翻译：本发明包括固化可聚合液体以在基材上形成薄膜的方法，其特征在于使包围在可聚合液体周围的气氛中的氧的聚合过程的抑制最小化。为此，可聚合液体尤其包括消耗与可聚合液体相互作用的氧的引发剂，并产生另外的自由基以促进聚合过程。

16. 发明申请

US20140292994A1 COLLECTIVE MARKING OF A SURFACE BY STEERING MULTIPLE LASER BEAMS GENERATED BY A LASER CONTROLLER 有权
标题翻译：通过转向由激光控制器产生的多个激光束来表征表面的集合标记
公开(公告)号：US20140292994A1
公开(公告)日：2014-10-02
申请号：US14097273
申请日：2013-12-05
申请人： Ashot Mesropyan , Michael Watts
发明人： Ashot Mesropyan , Michael Watts
IPC分类号： B41J2/47
CPC分类号： B41J2/47 , B41J2/473
摘要： Disclosed are methods, systems, and/or apparatus for the collective marking of a surface by two or more laser beams generated by a laser controller. A method includes receiving one or more input signals from a controller of the laser system. The method also includes adjusting a first mirror through a first galvanometer scanner, a second minor through a second galvanometer scanner, a third mirror through a third galvanometer scanner, and a fourth mirror through a fourth galvanometer scanner based on the one or more input signals. The method further includes steering, through the first mirror and the second mirror, a first laser beam generated by the controller and transmitted to a marking head through a beam delivery vessel; and steering, through the third mirror and the fourth minor, a second laser beam generated by the controller and transmitted to the marking head through another beam delivery vessel.
摘要翻译：公开了用于通过由激光控制器产生的两个或更多个激光束来集体标记表面的方法，系统和/或设备。一种方法包括从激光系统的控制器接收一个或多个输入信号。该方法还包括通过第一电流计扫描器调整第一反射镜，通过第二检流计扫描器调整第二反射镜，通过第三检流计扫描器调整第三反射镜，以及基于所述一个或多个输入信号通过第四检流计扫描器调整第四反射镜。该方法还包括通过第一反射镜和第二反射镜转动由控制器产生的第一激光束，并通过光束输送容器传输到标记头; 以及通过所述第三反射镜和所述第四辅助转向由所述控制器产生的第二激光束，并通过另一个光束传送容器传送到所述标记头。

17. 发明申请

US20070126150A1 Bifurcated contact printing technique 有权
标题翻译：分叉接触印刷技术
公开(公告)号：US20070126150A1
公开(公告)日：2007-06-07
申请号：US11303777
申请日：2005-12-16
申请人： Mahadevan GanapathiSubramanian , Byung-Jin Choi , Michael Miller , Nicholas Stacey , Michael Watts
发明人： Mahadevan GanapathiSubramanian , Byung-Jin Choi , Michael Miller , Nicholas Stacey , Michael Watts
IPC分类号： B29C43/02
CPC分类号： B29C43/021 , B29C33/444 , B29C43/003 , B29C43/50 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10T156/10
摘要： A method for spreading a conformable material between a substrate and a template having a mold. The method comprises positioning the mold to be in superimposition with the substrate defining a volume therebetween. A first sub-portion of the volume is charged with the conformable material through capillary action between the conformable material and one of the mold and the substrate. A second sub-portion of the volume is filled with the conformable material by creating a deformation in the mold.
摘要翻译：一种在基材和具有模具的模板之间铺展适形材料的方法。所述方法包括将所述模具定位成与所述基板重叠以限定其间的体积。体积的第一子部分通过适形材料和模具和基底之一中的毛细管作用装入适形材料。通过在模具中产生变形，体积的第二子部分由适形材料填充。

18. 发明申请

US20060245693A1 Precise and permanent modification of the resonant frequency of a dielectric microcavity and correction of frequency shifts in dielectric coupled-resonator filters 有权
标题翻译：电介质微腔的谐振频率的精确和永久性修改以及介质耦合谐振滤波器中频移的校正
公开(公告)号：US20060245693A1
公开(公告)日：2006-11-02
申请号：US11372643
申请日：2006-03-10
申请人： Tymon Barwicz , Michael Watts , Milos Popovic , Christina Manolatou
发明人： Tymon Barwicz , Michael Watts , Milos Popovic , Christina Manolatou
IPC分类号： G02B6/26
CPC分类号： G02B6/29343 , G01C19/66 , G02B6/12007 , G02B6/29361
摘要： A coupled resonator includes a plurality of resonators such that at least one of the resonators is modified so as to adjust the resonant frequency associated with the coupled resonator.
摘要翻译：耦合谐振器包括多个谐振器，使得至少一个谐振器被修改以便调节与耦合的谐振器相关联的谐振频率。

19. 发明申请

US20050275921A1 Hitless switch for high-density integrated optics 有权
标题翻译：无密钥开关用于高密度集成光学器件
公开(公告)号：US20050275921A1
公开(公告)日：2005-12-15
申请号：US11041350
申请日：2005-01-24
申请人： Hermann Haus , Eleanor Haus , Milos Popovic , Michael Watts , Chee Wong , Lionel Kimerling
发明人： Hermann Haus , Eleanor Haus , Milos Popovic , Michael Watts , Chee Wong , Lionel Kimerling
IPC分类号： G02B6/12 , G02B6/125 , G02B6/28 , G02B6/35 , G02F1/313 , H04J14/02 , H04Q11/00 , H04Q11/02 , G02F1/03 , G02F1/07
CPC分类号： H04J14/0206 , G02B6/125 , G02B6/3536 , G02B6/3546 , G02B6/3562 , G02B6/357 , G02B6/3576 , G02B6/3584 , G02B6/3596 , G02B2006/12145 , G02B2006/12159 , G02F1/3132 , G02F1/3136 , H04J14/0204 , H04J14/0212
摘要： An optical device includes a first and a second splitting device. Each of the first and second splitting devices have respective first and second input ports, respective first and second output ports, and a respective transfer matrix. A first optical waveguide is optically coupled to the first output port of the first splitting device and the first input port of the second splitting device. A second optical waveguide is optically coupled to the second output port of the first splitting device and the second input port of the second splitting device. The first and second optical waveguides are configured to introduce a phase shift of π radians to the optical radiation propagating through the first optical waveguide with respect to the optical radiation propagating through the second optical waveguide. The transfer matrix of the second splitting device is the diagonal transpose of the transfer matrix of the first splitting device and the transfer matrix of the second splitting device is substantially different from the transfer matrix of the first splitting device.
摘要翻译：光学装置包括第一和第二分割装置。第一和第二分离装置中的每一个具有相应的第一和第二输入端口，相应的第一和第二输出端口以及相应的传输矩阵。第一光波导光耦合到第一分离装置的第一输出端口和第二分离装置的第一输入端口。第二光波导光学耦合到第一分离装置的第二输出端口和第二分离装置的第二输入端口。第一和第二光波导被配置为相对于通过第二光波导传播的光辐射，将pi弧度的相移引入通过第一光波导传播的光辐射。第二分割装置的传送矩阵是第一分割装置的传送矩阵的对角线转置，并且第二分割装置的传送矩阵与第一分割装置的传送矩阵基本不同。

20. 发明申请

US20050192421A1 Composition for an etching mask comprising a silicon-containing material 有权
标题翻译：包含含硅材料的蚀刻掩模的组合物
公开(公告)号：US20050192421A1
公开(公告)日：2005-09-01
申请号：US10789319
申请日：2004-02-27
申请人： Frank Xu , Michael Miller , Michael Watts
发明人： Frank Xu , Michael Miller , Michael Watts
IPC分类号： C08L83/04 , C08L83/06
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： The present invention includes a composition for a silicon-containing material used as an etch mask for underlying layers. More specifically, the silicon-containing material may be used as an etch mask for a patterned imprinted layer comprising protrusions and recessions. To that end, in one embodiment of the present invention, the composition includes a hydroxyl-functional silicone component, a cross-linking component, a catalyst component, and a solvent. This composition allows the silicon-containing material to selectively etch the protrusions and the segments of the patterned imprinting layer in superimposition therewith, while minimizing the etching of the segments in superposition with the recessions, and therefore allowing an in-situ hardened mask to be created by the silicon-containing material, with the hardened mask and the patterned imprinting layer forming a substantially planarized profile.
摘要翻译：本发明包括用作下层的蚀刻掩模的含硅材料用组合物。更具体地，含硅材料可以用作包括突起和凹陷的图案化印记层的蚀刻掩模。为此，在本发明的一个实施方案中，组合物包括羟基官能的硅氧烷组分，交联组分，催化剂组分和溶剂。该组合物允许含硅材料与图案化压印层的突起和段的叠加选择性地蚀刻，同时最小化与凹陷叠加的段的蚀刻，并且因此允许形成原位硬化的掩模通过含硅材料，硬化的掩模和图案化的压印层形成基本平坦化的轮廓。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式