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11. 发明授权

US07648584B2 Method and apparatus for removing contamination from substrate 失效
标题翻译：去除基材污染的方法和装置
公开(公告)号：US07648584B2
公开(公告)日：2010-01-19
申请号：US11336215
申请日：2006-01-20
申请人： Erik M. Freer , John M. de Larios , Katrina Mikhaylichenko , Michael Ravkin , Mikhail Korolik , Fred C. Redeker , Clint Thomas , John Parks
发明人： Erik M. Freer , John M. de Larios , Katrina Mikhaylichenko , Michael Ravkin , Mikhail Korolik , Fred C. Redeker , Clint Thomas , John Parks
IPC分类号： B08B7/00
CPC分类号： H01L21/02057 , B05D3/10 , B08B7/02 , C11D1/04 , C11D3/042 , C11D3/044 , C11D3/18 , C11D3/2079 , C11D3/222 , C11D3/225 , C11D3/3765 , C11D9/00 , C11D9/02 , C11D9/267 , C11D11/0047 , C11D17/0004 , C11D17/0013 , C11D17/0017 , C11D17/003 , C11D17/041 , C23G1/00 , C23G1/18 , G03F7/42 , G03F7/423 , H01L21/02052 , H01L21/02096 , H01L21/31133 , H01L21/67051 , H01L21/67057 , H01L21/6708 , H01L21/67086
摘要： A cleaning material is disposed over a substrate. The cleaning material includes solid components dispersed within a liquid medium. A force is applied to the solid components within the liquid medium to bring the solid components within proximity to contaminants present on the substrate. The force applied to the solid components can be exerted by an immiscible component within the liquid medium. When the solid components are brought within sufficient proximity to the contaminants, an interaction is established between the solid components and the contaminants. Then, the solid components are moved away from the substrate such that the contaminants having interacted with the solid components are removed from the substrate.
摘要翻译：清洁材料设置在基板上。清洁材料包括分散在液体介质中的固体组分。将力施加到液体介质中的固体组分以使固体组分接近存在于基底上的污染物。施加到固体组分的力可以通过液体介质中的不混溶组分施加。当固体组分被充分接近污染物时，在固体组分和污染物之间建立了相互作用。然后，将固体组分从衬底移开，使得与固体组分相互作用的污染物从衬底上除去。

12. 发明申请

US20090308413A1 APPARATUS AND SYSTEM FOR CLEANING A SUBSTRATE 有权
标题翻译：用于清洁基板的装置和系统
公开(公告)号：US20090308413A1
公开(公告)日：2009-12-17
申请号：US11532493
申请日：2006-09-15
申请人： Erik M. Freer , John M. de Larios , Katrina Mikhaylichenko , Michael Ravkin , Mikhail Korolik , Fred C. Redeker , Clint Thomas , John Parks
发明人： Erik M. Freer , John M. de Larios , Katrina Mikhaylichenko , Michael Ravkin , Mikhail Korolik , Fred C. Redeker , Clint Thomas , John Parks
IPC分类号： B08B3/08
CPC分类号： H01L21/67051 , B08B3/003 , B08B3/02
摘要： An apparatus for cleaning a substrate is disclosed. The apparatus having a first head unit and a second head unit. The first head unit is positioned proximate to the surface of the substrate and has a first row of channels defined within configured to supply a foam to the surface of the substrate. The second head unit is positioned substantially adjacent to the first head unit and proximate to the surface of the substrate. A second and a third row of channels are defined within the second head unit. The second row of channels is configured to supply a fluid to the surface of the substrate. The third row of channels is configured to apply a vacuum to the surface of the substrate.
摘要翻译：公开了一种用于清洁衬底的设备。该装置具有第一头单元和第二头单元。第一头单元定位成接近基底的表面，并且具有限定在构造成向基底的表面提供泡沫的第一排通道。第二头单元被定位成基本上与第一头单元相邻并且靠近衬底的表面。第二和第三行通道被限定在第二头单元内。第二排通道被配置成向衬底的表面提供流体。第三排通道被配置为向基板的表面施加真空。

13. 发明申请

US20090145464A1 Proximity head with angled vacuum conduit system, apparatus and method 有权
标题翻译：接近头带有倾斜的真空管道系统，设备和方法
公开(公告)号：US20090145464A1
公开(公告)日：2009-06-11
申请号：US11731532
申请日：2007-03-30
申请人： Michael Ravkin , John M. de Larios , Fred C. Redeker , Mikhail Korolik , Erik M. Freer
发明人： Michael Ravkin , John M. de Larios , Fred C. Redeker , Mikhail Korolik , Erik M. Freer
IPC分类号： B08B3/10 , B08B3/04 , B08B9/027 , B08B5/04
CPC分类号： H01L21/67051
摘要： A proximity head including a head surface. The head surface including a first flat region and a plurality of first conduits. Each one of the plurality of first conduits being defined by corresponding one of a plurality of first discrete holes. The plurality of first discrete holes residing in the head surface and extending through the first flat region. The head surface also including a second flat region and a plurality of second conduits. The plurality of second conduits being defined by a corresponding plurality of second discrete holes that reside in the head surface and extend through the second flat region. The head surface also including a third flat region disposed between and adjacent to the first flat region and the second flat region and a plurality of third conduits. The plurality of third conduits being defined by a corresponding plurality of third discrete holes that reside in the head surface and extend through the third flat region. The third conduits being formed at a first angle relative to the third flat region. The first angle being between 30 and 60 degrees. A system and method for processing a substrate with a proximity head is also described.
摘要翻译：包括头表面的接近头。头表面包括第一平坦区域和多个第一管道。多个第一导管中的每一个由多个第一离散孔中的对应的一个限定。多个第一离散孔位于头表面并延伸穿过第一平坦区域。头表面还包括第二平坦区域和多个第二管道。多个第二导管由位于头表面中并延伸穿过第二平坦区域的相应多个第二离散孔限定。头表面还包括设置在第一平坦区域和第二平坦区域之间并与之相邻的第三平坦区域和多个第三导管。多个第三导管由位于头表面中并延伸穿过第三平坦区域的对应的多个第三离散孔限定。第三导管相对于第三平坦区域以第一角度形成。第一个角度在30到60度之间。还描述了用于处理具有邻近头的衬底的系统和方法。

14. 发明申请

US20080245390A1 Method for cleaning semiconductor wafer surfaces by applying periodic shear stress to the cleaning solution 审中-公开
标题翻译：通过向清洗溶液施加周期性剪切应力来清洁半导体晶片表面的方法
公开(公告)号：US20080245390A1
公开(公告)日：2008-10-09
申请号：US11732603
申请日：2007-04-03
申请人： Erik M. Freer , John M. de Larios , Michael Ravkin , Mikhail Korolik , Fritz C. Redeker
发明人： Erik M. Freer , John M. de Larios , Michael Ravkin , Mikhail Korolik , Fritz C. Redeker
IPC分类号： B08B3/12
CPC分类号： B08B3/12 , H01L21/67051 , H01L21/67057
摘要： Systems and methods for cleaning particulate contaminants adhered to wafer surfaces are provided. A cleaning media including dispersed coupling elements suspended within the cleaning media is applied over a wafer surface. External energy is applied to the cleaning media to generate periodic shear stresses within the media. The periodic shear stresses impart momentum and/or drag forces on the coupling elements causing the coupling elements to interact with the particulate contaminants to remove the particulate contaminants from the wafer surfaces.
摘要翻译：提供了清洁附着在晶片表面上的颗粒污染物的系统和方法。包括悬浮在清洁介质内的分散的耦合元件的清洁介质被施加在晶片表面上。外部能量被施加到清洁介质以在介质内产生周期性剪切应力。周期性剪切应力赋予耦合元件上的动量和/或阻力，导致耦合元件与颗粒污染物相互作用以从晶片表面去除颗粒污染物。

15. 发明申请

US20080171292A1 Methods for Providing a Confined Liquid for Immersion Lithography 失效
标题翻译：提供浸没液相色谱液体的方法
公开(公告)号：US20080171292A1
公开(公告)日：2008-07-17
申请号：US12055219
申请日：2008-03-25
申请人： David Hemker , Fred C. Redeker , John Boyd , John M. de Larios , Michael Ravkin , Mikhail Korolik
发明人： David Hemker , Fred C. Redeker , John Boyd , John M. de Larios , Michael Ravkin , Mikhail Korolik
IPC分类号： G03F7/00
CPC分类号： G03F7/70341 , Y10S134/902
摘要： A method for processing a substrate is provided which includes generating a meniscus on the surface of the substrate and applying photolithography light through the meniscus to enable photolithography processing of a surface of the substrate.
摘要翻译：提供了一种用于处理衬底的方法，其包括在衬底的表面上产生弯月面并且通过弯月面施加光刻光以实现衬底表面的光刻处理。

16. 发明授权

US07383601B2 Substrate brush scrubbing and proximity cleaning-drying sequence using compatible chemistries, and method, apparatus, and system for implementing the same 失效
标题翻译：使用兼容化学物质的底物刷洗涤和邻近清洁干燥顺序，以及用于实施相同化学品的方法，装置和系统
公开(公告)号：US07383601B2
公开(公告)日：2008-06-10
申请号：US11413916
申请日：2006-04-27
申请人： Michael Ravkin , John M. de Larios
发明人： Michael Ravkin , John M. de Larios
IPC分类号： B08B1/04 , B08B3/00
CPC分类号： B08B1/04 , B08B3/04 , H01L21/67046 , Y10S134/902
摘要： In one embodiment, a substrate preparation system is provided. The system includes a brush, a front head, and a back head. The brush is configured to brush scrub a back surface of a substrate using a brush scrubbing chemistry. The front head is defined in close proximity to a front surface of the substrate while the back head is defined in close proximity to the back surface of the substrate. The back head is positioned substantially opposite to the front head. The front head and the back head are applied as a pair to the substrate when the brush is apart from the substrate.
摘要翻译：在一个实施方案中，提供了底物制备系统。该系统包括刷子，前头部和后头部。刷被配置为使用刷洗化学物质刷洗基材的背面。前头被限定在紧邻衬底的前表面的位置，而后头部被限定为紧邻衬底的背面。后头位于与前头大致相对的位置。当刷子离开基板时，前头和后头一对被施加到基底。

17. 发明授权

US07367345B1 Apparatus and method for providing a confined liquid for immersion lithography 失效
标题翻译：用于提供用于浸没光刻的限制液体的装置和方法
公开(公告)号：US07367345B1
公开(公告)日：2008-05-06
申请号：US10834548
申请日：2004-04-28
申请人： David Hemker , Fred C. Redeker , John Boyd , John M. de Larios , Michael Ravkin , Mikhail Korolik
发明人： David Hemker , Fred C. Redeker , John Boyd , John M. de Larios , Michael Ravkin , Mikhail Korolik
IPC分类号： B08B3/10 , B08B7/04 , G03C5/00
CPC分类号： G03F7/70341 , Y10S134/902
摘要： A method for processing a substrate is provided which includes generating a meniscus on the surface of the substrate and applying photolithography light through the meniscus to enable photolithography processing of a surface of the substrate.
摘要翻译：提供了一种用于处理衬底的方法，其包括在衬底的表面上产生弯月面并且通过弯月面施加光刻光以实现衬底表面的光刻处理。

18. 发明授权

US08522799B2 Apparatus and system for cleaning a substrate 有权
标题翻译：用于清洁衬底的装置和系统
公开(公告)号：US08522799B2
公开(公告)日：2013-09-03
申请号：US11532493
申请日：2006-09-15
申请人： Erik M. Freer , John M. de Larios , Katrina Mikhaylichenko , Michael Ravkin , Mikhail Korolik , Fred C. Redeker , Clint Thomas , John Parks
发明人： Erik M. Freer , John M. de Larios , Katrina Mikhaylichenko , Michael Ravkin , Mikhail Korolik , Fred C. Redeker , Clint Thomas , John Parks
IPC分类号： B08B3/00
CPC分类号： H01L21/67051 , B08B3/003 , B08B3/02
摘要： An apparatus for cleaning a substrate is disclosed. The apparatus having a first head unit and a second head unit. The first head unit is positioned proximate to the surface of the substrate and has a first row of channels defined within configured to supply a foam to the surface of the substrate. The second head unit is positioned substantially adjacent to the first head unit and proximate to the surface of the substrate. A second and a third row of channels are defined within the second head unit. The second row of channels is configured to supply a fluid to the surface of the substrate. The third row of channels is configured to apply a vacuum to the surface of the substrate.
摘要翻译：公开了一种用于清洁衬底的设备。该装置具有第一头单元和第二头单元。第一头单元定位成接近基底的表面，并且具有限定在构造成向基底的表面提供泡沫的第一排通道。第二头单元被定位成基本上与第一头单元相邻并且靠近衬底的表面。第二和第三行通道被限定在第二头单元内。第二排通道被配置成向衬底的表面提供流体。第三排通道被配置为向基板的表面施加真空。

19. 发明申请

US20120145202A1 Cleaning Compound and Method and System for Using the Cleaning Compound 审中-公开
标题翻译：清洁剂及使用清洁剂的方法和系统
公开(公告)号：US20120145202A1
公开(公告)日：2012-06-14
申请号：US13396047
申请日：2012-02-14
申请人： Erik M. Freer , John M. de Larios , Katrina Mikhay Iichenko , Michael Ravkin , Mikhail Korolik , Fred C. Redeker
发明人： Erik M. Freer , John M. de Larios , Katrina Mikhay Iichenko , Michael Ravkin , Mikhail Korolik , Fred C. Redeker
IPC分类号： B08B3/04
CPC分类号： H01L21/02052 , B08B7/02 , C11D3/2079 , C11D9/02 , C11D9/26 , C11D9/267 , C11D11/0047 , C11D17/0013 , C11D17/0017 , C23G1/18 , G03F7/425 , G03F7/426 , H05K3/26
摘要： A cleaning compound is provided. The cleaning compound includes about 0.1 weight percent to about 10 weight percent of a fatty acid dispersed in water. The cleaning compound includes an amount of a base sufficient to bring a pH of the fatty acid water solution to about a level where above about 50% of the dispersed fatty acid is ionized. A method for cleaning a substrate, a system for cleaning a substrate, and a cleaning solution prepared by a process are also provided.
摘要翻译：提供清洁化合物。清洁化合物包括分散在水中的约0.1重量％至约10重量％的脂肪酸。清洁化合物包括一定量的足以使脂肪酸水溶液的pH达到大约50％的分散脂肪酸被离子化的水平的碱。还提供了清洁基板的方法，用于清洁基板的系统以及通过工艺制备的清洁溶液。

20. 发明授权

US07862662B2 Method and material for cleaning a substrate 有权
标题翻译：清洗基材的方法和材料
公开(公告)号：US07862662B2
公开(公告)日：2011-01-04
申请号：US11532491
申请日：2006-09-15
申请人： Erik M. Freer , John M. de Larios , Katrina Mikhaylichenko , Michael Ravkin , Mikhail Korolik , Fred C. Redeker
发明人： Erik M. Freer , John M. de Larios , Katrina Mikhaylichenko , Michael Ravkin , Mikhail Korolik , Fred C. Redeker
IPC分类号： B08B3/00
CPC分类号： H01L21/02052 , B08B3/04 , B08B7/00 , C11D11/0047 , C11D17/0013 , C11D17/0017 , G03F1/82 , H01L21/02057 , H01L21/02096 , H01L21/67051
摘要： Methods for cleaning using a tri-state body are disclosed. A substrate having a particle deposited thereon is provided. A tri-state body that has a solid portion, liquid portion, and a gas portion is generated. A force is applied over the tri-state body to promulgate an interaction between the solid portion and the particle. The tri-state body is removed along with the particle from the surface of the substrate. The interaction between the solid portion and the particle causing the particle to be removed along with the tri-state body.
摘要翻译：公开了使用三态体进行清洁的方法。提供了沉积有颗粒的基板。产生具有固体部分，液体部分和气体部分的三态体。在三态体上施加力以发出固体部分和颗粒之间的相互作用。将三态体与来自衬底表面的颗粒一起去除。固体部分和颗粒之间的相互作用导致颗粒与三态体一起被去除。

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