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    • 11. 发明授权
    • Manufacturing method of thin film transistor array substrate
    • 薄膜晶体管阵列基板的制造方法
    • US07176074B1
    • 2007-02-13
    • US11463595
    • 2006-08-10
    • Fu-Yuan ShiauYu-Liang Wen
    • Fu-Yuan ShiauYu-Liang Wen
    • H01L21/84
    • H01L21/32139H01L21/31144H01L27/1255H01L27/1288Y10S438/95
    • A manufacturing method of thin film transistor array substrate is provided. A substrate, whereon first, second, and third poly-silicon islands, a gate insulating layer, a plurality of first, second, and third gates, and a first passivation layer have been formed, is provided. A third patterned photoresist layer is formed on the first passivation layer by using a third half-tone mask. A first ion implantation process is performed with the third patterned photoresist layer as mask to form first sources/drains. A portion of the thickness of the third patterned photoresist layer is removed, and then portions of the first passivation layer and the gate insulating layer are removed with the third patterned photoresist layer as mask to form the first patterned passivation layer. The third patterned photoresist layer is removed. First, second and third source/drain conductive layers, a second patterned passivation layer, and pixel electrodes are formed in sequence.
    • 提供薄膜晶体管阵列基板的制造方法。 提供了第一,第二和第三多晶硅岛,栅极绝缘层,多个第一,第二和第三栅极以及第一钝化层的衬底。 通过使用第三半色调掩模在第一钝化层上形成第三图案化光致抗蚀剂层。 使用第三图案化光致抗蚀剂层作为掩模来执行第一离子注入工艺以形成第一源/漏。 去除第三图案化光致抗蚀剂层的厚度的一部分,然后用第三图案化光致抗蚀剂层作为掩模去除第一钝化层和栅极绝缘层的部分,以形成第一图案化钝化层。 去除第三图案化光致抗蚀剂层。 首先依次形成第二和第三源极/漏极导电层,第二图案化钝化层和像素电极。
    • 12. 发明申请
    • PIXEL STRUCTURE AND FABRICATION METHOD THEREOF
    • 像素结构和制造方法
    • US20080024702A1
    • 2008-01-31
    • US11460257
    • 2006-07-27
    • Fu-Yuan ShiauJune-Ming Chen
    • Fu-Yuan ShiauJune-Ming Chen
    • G02F1/1335
    • H01L27/1288G02F1/133555G02F1/136227G02F2001/136236H01L27/1214
    • A pixel structure and a fabricating method thereof are provided. The method includes providing a substrate; forming a gate and a gate insulating layer on the substrate, wherein the gate insulating layer covers the gate; forming a semiconductor layer and a conductor layer over the substrate; providing a half tone mask (HTM); forming a patterned photoresist layer on the conductor layer by using the HTM; removing portions of the conductor layer and the semiconductor layer by using the patterned photoresist layer as a mask to form a source, a drain and a channel layer; removing the patterned photoresist layer; forming a patterned passivation layer over the substrate, which has a contact opening for exposing a portion of the drain; and forming a transparent pixel electrode on the substrate, which is electrically connected to the drain via the contact opening.
    • 提供了像素结构及其制造方法。 该方法包括提供基板; 在所述基板上形成栅极和栅极绝缘层,其中所述栅极绝缘层覆盖所述栅极; 在衬底上形成半导体层和导体层; 提供半色调蒙版(HTM); 通过使用HTM在导体层上形成图案化的光致抗蚀剂层; 通过使用图案化的光致抗蚀剂层作为掩模去除导体层和半导体层的部分以形成源极,漏极和沟道层; 去除图案化的光致抗蚀剂层; 在衬底上形成图案化的钝化层,其具有用于暴露漏极的一部分的接触开口; 以及在所述基板上形成透明像素电极,所述透明像素电极经由所述接触开口电连接到所述漏极。
    • 14. 发明申请
    • Electrostatic discharge protection structure and thin film transistor substrate including the same
    • 静电放电保护结构和包括其的薄膜晶体管基板
    • US20070091218A1
    • 2007-04-26
    • US11163605
    • 2005-10-25
    • Chin-Hai HuangHong-Tian YuFu-Yuan Shiau
    • Chin-Hai HuangHong-Tian YuFu-Yuan Shiau
    • G02F1/1333
    • G02F1/136204G02F1/13454
    • An electrostatic discharge protection structure contains a short ring surrounding a display region comprising pixel electrodes and thin film transistors, a plurality of switching elements disposed between the display region and the short ring corresponding to the scan lines and data lines, at least one of which is turned on to electrically connect the short ring and the scan lines and the data lines for introducing electrostatic charges to the short ring when a specific amount of electrostatic charges accumulate on the scan lines and the data lines, a conducting wire electrically connecting a storage capacitor line and the short ring, and a floating conductive pattern crossing over and not contacting the conducting wire, thereby assisting the electrostatic charges in distributing in the floating conductive pattern. Thus, an electrostatic discharge protection can be performed efficiently without increasing the substrate size.
    • 静电放电保护结构包括围绕包括像素电极和薄膜晶体管的显示区域的短环,多个开关元件设置在与扫描线和数据线对应的显示区域和短环之间,其中至少一个是 打开时,当在扫描线和数据线上累积特定量的静电电荷时,将短环和扫描线以及用于引入静电电荷的数据线电连接到短环;导线,电连接存储电容线 和短环,以及与导电线交叉并且不接触的浮动导电图案,从而辅助静电电荷分布在浮动导电图案中。 因此,可以在不增加基板尺寸的情况下有效地执行静电放电保护。
    • 15. 发明申请
    • LIQUID CRYSTAL DISPLAY DEVICE AND INSPECTION METHOD THEREOF
    • 液晶显示装置及其检测方法
    • US20060197890A1
    • 2006-09-07
    • US10906712
    • 2005-03-03
    • Ming-Zen WuFu-Yuan ShiauYu-Liang WenHuang-Chang Wang
    • Ming-Zen WuFu-Yuan ShiauYu-Liang WenHuang-Chang Wang
    • G02F1/1335
    • G02F1/1309G02F1/1339
    • A liquid crystal display (LCD) panel and inspection method thereof. The LCD panel includes a first substrate having a reflective material layer formed on a first side of the first substrate; a second substrate having a black matrix formed on a first side of the second substrate, the first side of the second substrate face on to the first side of the first substrate; and a liquid crystal layer sandwiched between the first substrate and the second substrate; wherein the second substrate has at least one inspection area allowing light to pass to the first side of the first substrate. The inspection method includes: passing light through the inspection area to the first side of the first substrate; and inspecting cell process parameters of the LCD panel through light reflected from the first side of the first substrate.
    • 液晶显示器(LCD)面板及其检查方法。 LCD面板包括:第一基板,其具有形成在第一基板的第一侧上的反射材料层; 第二基板,其具有形成在所述第二基板的第一侧上的黑矩阵,所述第二基板的所述第一侧面朝向所述第一基板的所述第一侧; 以及夹在所述第一基板和所述第二基板之间的液晶层; 其中所述第二基板具有允许光通过所述第一基板的所述第一侧的至少一个检查区域。 检查方法包括:将光通过检查区域传送到第一基板的第一侧; 以及通过从第一基板的第一侧反射的光来检查LCD面板的单元工艺参数。
    • 17. 发明授权
    • Liquid crystal display device and inspection method thereof
    • 液晶显示装置及其检查方法
    • US07411643B2
    • 2008-08-12
    • US10906712
    • 2005-03-03
    • Ming-Zen WuFu-Yuan ShiauYu-Liang WenHuang-Chang Wang
    • Ming-Zen WuFu-Yuan ShiauYu-Liang WenHuang-Chang Wang
    • G02F1/1335G02F1/1339G02F1/1333
    • G02F1/1309G02F1/1339
    • A liquid crystal display (LCD) panel and inspection method thereof. The LCD panel includes a first substrate having a reflective material layer formed on a first side of the first substrate; a second substrate having a black matrix formed on a first side of the second substrate, the first side of the second substrate face on to the first side of the first substrate; and a liquid crystal layer sandwiched between the first substrate and the second substrate; wherein the second substrate has at least one inspection area allowing light to pass to the first side of the first substrate. The inspection method includes: passing light through the inspection area to the first side of the first substrate; and inspecting cell process parameters of the LCD panel through light reflected from the first side of the first substrate.
    • 液晶显示器(LCD)面板及其检查方法。 LCD面板包括:第一基板,其具有形成在第一基板的第一侧上的反射材料层; 第二基板,其具有形成在所述第二基板的第一侧上的黑矩阵,所述第二基板的所述第一侧面朝向所述第一基板的所述第一侧; 以及夹在所述第一基板和所述第二基板之间的液晶层; 其中所述第二基板具有允许光通过所述第一基板的所述第一侧的至少一个检查区域。 检查方法包括:将光通过检查区域传送到第一基板的第一侧; 以及通过从第一基板的第一侧反射的光来检查LCD面板的单元工艺参数。