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    • 16. 发明授权
    • Optoelectronic component
    • 光电元件
    • US08987708B2
    • 2015-03-24
    • US12680324
    • 2008-08-06
    • Florian SchindlerBenjamin Claus KrummacherNorwin Von MalmDirk BerbenFrank JermannMartin Zachau
    • Florian SchindlerBenjamin Claus KrummacherNorwin Von MalmDirk BerbenFrank JermannMartin Zachau
    • H01L33/00H01L51/52H01L27/32
    • H01L51/5265H01L27/322
    • An optoelectronic component comprises an organic layer sequence (1), which emits an electromagnetic radiation (15) having a first wavelength spectrum during operation, and also a dielectric layer sequence (2) and a wavelength conversion region (3) in the beam path of the electromagnetic radiation (15) emitted by the organic layer sequence (1). The wavelength conversion region (3) is configured to convert at least partially electromagnetic radiation having the first wavelength spectrum into an electromagnetic radiation (16) having a second wavelength spectrum. The dielectric layer sequence (2) is arranged in the beam path of the electromagnetic radiation (15) emitted by the organic layer sequence between the organic layer sequence (1) and the wavelength conversion region (3) and is at least partially opaque to an electromagnetic radiation having a third wavelength spectrum, which corresponds to at least one part of the second wavelength spectrum.
    • 光电子部件包括在操作期间发射具有第一波长光谱的电磁辐射(15)的有机层序列(1),以及在光束路径中的介电层序列(2)和波长转换区域(3) 由有机层序列(1)发射的电磁辐射(15)。 波长转换区域(3)被配置为将具有第一波长频谱的至少部分电磁辐射转换成具有第二波长谱的电磁辐射(16)。 电介质层序列(2)被布置在有机层序列(1)和波长转换区域(3)之间由有机层序列发射的电磁辐射(15)的光束路径中,并且对于 具有对应于第二波长光谱的至少一部分的第三波长光谱的电磁辐射。
    • 19. 发明申请
    • Position measuring arrangement
    • 位置测量装置
    • US20110026041A1
    • 2011-02-03
    • US12804735
    • 2010-07-28
    • Florian SchindlerRobert KrausJoel HeersinkMichael Stepputat
    • Florian SchindlerRobert KrausJoel HeersinkMichael Stepputat
    • G01B11/14
    • G01S17/42G01S17/36
    • A position measuring arrangement that includes a retroreflector, a light source generating a lightbeam and a scanning unit that receives the lightbeam and generates a partially-divergent lightbeam. The scanning unit includes a scanning mirror that is mounted so it can be deflected in a reproducible manner around two different rotating axes that cross each other in a center of the scanning mirror so that a grid-like scanning of a two-dimensional spatial area by the partially-divergent lightbeam, in relation to which the retroreflector is arranged, takes place over a plurality of scanning tracks. The position measuring arrangement further including an interferometric distance measuring unit that includes a beam splitter element that splits the lightbeam generated by the light source in such a way that split lightbeams pass through a reference arm and a measuring arm at least once in each direction. The interferometric distance measuring unit includes an opto-electronic detector unit, through which a detection of distance-dependent signals from superimposed lightbeams from the reference arm and the measuring arm takes place when, at a time of optical contact between the scanning unit and the retroreflector, a back reflection of the lightbeam from the retroreflector in a direction of the scanning unit results.
    • 一种位置测量装置,包括后向反射器,产生光束的光源和接收光束并产生部分发散的光束的扫描单元。 扫描单元包括扫描反射镜,其被安装成可以以可再现的方式围绕扫描镜的中心彼此交叉的两个不同的旋转轴而偏转,使得二维空间区域的网格状扫描由 在多个扫描轨道上发生与后向反射器相关的部分发散的光束。 所述位置测量装置还包括干涉测距单元,所述干涉距离测量单元包括分束器元件,所述分束器元件以由所述光源产生的所述光束以使得所述分束光束在每个方向上至少一次穿过参考臂和测量臂的方式分离。 干涉距离测量单元包括光电检测器单元,当在扫描单元和后向反射器之间的光学接触时,发生来自参考臂和测量臂的叠加光束的距离相关信号的检测 导致来自后向反射器的光束在扫描单元的方向上的背面反射。