专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

11. 发明申请

US20060188756A1 Substrate for information recording media and manufacturing method thereof, information recording medium, and starting material glass plate 有权
标题翻译：用于信息记录介质的基板及其制造方法，信息记录介质和起始材料玻璃板
公开(公告)号：US20060188756A1
公开(公告)日：2006-08-24
申请号：US11407586
申请日：2006-04-20
申请人： Masamichi Kezuka , Koji Okuhata , Kensuki Matsuno , Takeo Watanabe
发明人： Masamichi Kezuka , Koji Okuhata , Kensuki Matsuno , Takeo Watanabe
IPC分类号： G11B5/706
CPC分类号： G11B5/7315 , C03C19/00 , G11B5/8404 , G11B7/00 , G11B11/10589
摘要： A substrate for use as a disk substrate in a hard disk drive or the like, an information recording medium such as a magnetic disk, and a starting material glass plate which is a starting material of the substrate for information recording media. The forming conditions of the starting material glass plate are controlled such that the starting material glass plate has a long-wavelength waviness of not more than 6 nm. This starting material glass plate is polished so as to have a long-wavelength waviness of not more than 6 nm using CeO2 abrasive grains having a mean grain diameter of not less than 0.01 μm and a 90% diameter of the volume grain size distribution of not less than 0.02 μm. The resulting substrate for an information recording medium has an excellent planarity, can be obtained in a short time and with a low polishing amount, and the resulting information recording medium is able to cope with increased data zone recording density.
摘要翻译：用作硬盘驱动器等中的盘基板的基板，诸如磁盘的信息记录介质和作为用于信息记录介质的基板的起始材料的起始材料玻璃板。控制起始材料玻璃板的成形条件使原料玻璃板的长波长波长不大于6nm。使用平均粒径为0.01μm以上且直径为90％的CeO 2 2磨粒，对原料玻璃板进行抛光，使其长波长波长不大于6nm 的体积粒径分布不小于0.02μm。所得信息记录介质的基板具有优异的平面性，可以在短时间内以低抛光量获得，并且所得到的信息记录介质能够应对增加的数据区记录密度。

12. 发明授权

US07065984B2 Substrate for information recording media and manufacturing method thereof, information recording medium, and starting material glass plate 有权
标题翻译：用于信息记录介质的基板及其制造方法，信息记录介质和起始材料玻璃板
公开(公告)号：US07065984B2
公开(公告)日：2006-06-27
申请号：US10300383
申请日：2002-11-20
申请人： Masamichi Kezuka , Koji Okuhata , Kensuki Matsuno , Takeo Watanabe
发明人： Masamichi Kezuka , Koji Okuhata , Kensuki Matsuno , Takeo Watanabe
IPC分类号： C03B18/02 , C03C19/00
CPC分类号： G11B5/7315 , C03C19/00 , G11B5/8404 , G11B7/00 , G11B11/10589
摘要： A substrate for use as a disk substrate in a hard disk drive or the like, an information recording medium such as a magnetic disk, and a starting material glass plate which is a starting material of the substrate for information recording media. The forming conditions of the starting material glass plate are controlled such that the starting material glass plate has a long-wavelength waviness of not more than 6 nm. This starting material glass plate is polished so as to have a long-wavelength waviness of not more than 6 nm using CeO2 abrasive grains having a mean grain diameter of not less than 0.0l μm and a 90% diameter of the volume grain size distribution of not less than 0.02 μm. The resulting substrate for an information recording medium has an excellent planarity, can be obtained in a short time and with a low polishing amount, and the resulting information recording medium is able to cope with increased data zone recording density.
摘要翻译：用作硬盘驱动器等中的盘基板的基板，诸如磁盘的信息记录介质和作为用于信息记录介质的基板的起始材料的起始材料玻璃板。控制起始材料玻璃板的成形条件使原料玻璃板的长波长波长不大于6nm。使用平均粒径不小于0.01μm的CeO 2×2磨粒和90％的平均粒径，研磨该原料玻璃板，使其长波长波长不大于6nm。体积粒径分布的直径不小于0.02μm。所得信息记录介质的基板具有优异的平面性，可以在短时间内以低抛光量获得，并且所得到的信息记录介质能够应对增加的数据区记录密度。

13. 发明授权

US07033150B2 Hermetic type compressor 失效
标题翻译：密封式压缩机
公开(公告)号：US07033150B2
公开(公告)日：2006-04-25
申请号：US10425931
申请日：2003-04-30
申请人： Tsutomu Nozaki , Nobuo Abe , Kensuke Kato , Takeo Watanabe
发明人： Tsutomu Nozaki , Nobuo Abe , Kensuke Kato , Takeo Watanabe
IPC分类号： F04B39/10
CPC分类号： F04B39/125 , F04B39/122 , Y10S417/902
摘要： A high-performance hermetic type compressor in which the influence of a cylinder bore deformation caused during assembly is reduced and the sealing tightness between a piston and a cylinder block is improved. A bore hole in the cylinder block has a hollow portion. Depth H1 of the hollow portion is larger than thickness H2 of compression space V at the moment when the pressure in the compression space V reaches the discharge pressure level Pd.
摘要翻译：一种高性能密封型压缩机，其中组装期间引起的气缸孔变形的影响减小，并且提高了活塞和气缸体之间的密封性。气缸体中的钻孔具有中空部分。中空部的深度H 1大于压缩空间V的压力达到排出压力水平Pd时的压缩空间V的厚度H 2。

14. 发明授权

US5646291A Process for the manufacture of 2-phenyl-4,5-oxazoledione 4-phenylhydrazone derivatives 失效
标题翻译： 2-苯基-4,5-恶唑二酮4-苯腙衍生物的制备方法
公开(公告)号：US5646291A
公开(公告)日：1997-07-08
申请号：US431573
申请日：1995-05-01
申请人： Hajime Hoshi , Kazuhiko Sunagawa , Takeo Watanabe
发明人： Hajime Hoshi , Kazuhiko Sunagawa , Takeo Watanabe
IPC分类号： C09B26/02 , C07D263/18
CPC分类号： C09B26/02
摘要： A process for manufacturing derivatives of 2-phenyl-4,5-oxazoledione 4-phenylhyrazone is disclosed. The process comprises reacting a derivative of a benezenediazonium salt, a hippuric acid derivative, and acetic anhydride in the presence of a neutralizing agent to effect the cyclization reaction for the formation of the oxazolone ring and the succeeding diazo-coupling reaction. The process does not require the conventional separate, independent step for the preparation of a solution of a hippuric acid derivative and acetic anhydride, thus eliminating the quick heating and quenching procedures and further avoiding the loss of the hippuric acid derivative due to decomposition of the oxazolone derivative. There is thus obtained a high yield of the desired product in a short period of time.
摘要翻译：公开了一种制备2-苯基-4,5-恶唑二酮4-苯基腙的衍生物的方法。该方法包括在中和剂存在下使衍生重氮盐，马尿酸衍生物和乙酸酐的衍生物进行反应，以进行恶唑酮环的形成和后续的重氮偶合反应的环化反应。该方法不需要用于制备马尿酸衍生物和乙酸酐的常规独立的独立步骤，因此消除了快速加热和淬灭程序，并进一步避免了由于恶唑酮分解导致的马尿酸衍生物的损失衍生物。因此在短时间内获得了高产率的所需产物。

15. 发明授权

US4973353A 1,5-diphenyl-1H-1,2,4-triazole-3-carboxamide derivatives and herbicidal composition containing the same 失效
标题翻译： 1,5-二苯基-1H-1,2,4-三唑-3-甲酰胺衍生物和含有它们的除草组合物
公开(公告)号：US4973353A
公开(公告)日：1990-11-27
申请号：US162699
申请日：1988-03-01
申请人： Takafumi Shida , Hideo Arabori , Takeo Watanabe , Yoshikazu Kubota , Isao Ichinose , Yoichi Kanda , Shiro Yamazaki , Hiroyasu Shinkawa
发明人： Takafumi Shida , Hideo Arabori , Takeo Watanabe , Yoshikazu Kubota , Isao Ichinose , Yoichi Kanda , Shiro Yamazaki , Hiroyasu Shinkawa
IPC分类号： A01N43/653 , C07C205/34 , C07C205/35 , C07C217/76 , C07D249/10
CPC分类号： C07C205/34 , A01N43/653 , C07C205/35 , C07C217/76 , C07D249/10
摘要： Disclosed herein is a derivative of 1,5-diphenyl-1H-1,2,4-triazole-3-carboxamide represented by the formula (I): ##STR1## wherein R is a straight-chain alkyl group having 1 to 10 carbon atoms which is non-substituted or substituted with 1 to 19 fluorine atoms, a branched alkyl group having 3 to 10 carbon atoms which is non-substituted or substituted with 1 to 19 fluorine atoms, a cyclic alkyl group having 3 to 10 carbon atoms, an alkyl group having 1 to 3 carbon atoms which is substituted with an alicyclic structure having 3 to 7 carbon atoms, a phenyl group or an aralkyl group having 7 to 9 carbon atoms; X.sup.1 is a halogen or an alkyl group having 1 to 3 carbon atoms; X.sup.2 is a hydrogen, a halogen or an alkyl group having 1 to 3 carbon atoms; Y.sup.1 is a hydrogen or a fluorine; and Y.sup.2 is a hydrogen or a fluorine, and the herbicidal compositions containing said derivatives as active ingredient therefor.The derivative of 1,5-diphenyl-1H-1,2,4-triazole-3-carboxamide represented by the formula (I) of the present invention is the compound having high herbicidal activity and also showing excellent selectivity for killing weeds alone without doing any serious harm to the crops such as rice, wheat and corn.

16. 发明授权

US4902805A Derivatives of dihydrotriazole, and herbicidal compositions containing the same as an active ingredient 失效
标题翻译：二氢三唑衍生物和含有其作为活性成分的除草组合物
公开(公告)号：US4902805A
公开(公告)日：1990-02-20
申请号：US820948
申请日：1986-01-21
申请人： Takafumi Shida , Takeo Watanabe , Shiro Yamazaki , Hiroyasu Shinkawa , Keigo Satake
发明人： Takafumi Shida , Takeo Watanabe , Shiro Yamazaki , Hiroyasu Shinkawa , Keigo Satake
IPC分类号： A01N43/653 , C07D249/10 , C07D405/04
CPC分类号： C07D405/04 , A01N43/653 , C07D249/10
摘要： Disclosed herein are a derivative of dihydrotriazole represented by the general formula (I): ##STR1## wherein R.sup.1 represents an amino group, lower alkoxy group, or lower alkyl amino group, R.sup.2 represents a hydrogen atom, halogen atom, or lower alkyl group and R.sup.3 represents a hydrogen atom, lower alkyl group, benzyl group, furyl group, phenyl group or phenyl group substituted with a halogen atom, hydroxyl group, carboxyl group, methoxycarbonyl group, lower alkyl group or lower alkoxy group, and a herbicidal composition containing as an active ingredient at least one of the derivatives of dihydrotriazole.
摘要翻译：本文公开了由通式（I）表示的二氢三唑衍生物：其中R 1表示氨基，低级烷氧基或低级烷基氨基，R 2表示氢原子，卤原子或低级烷基，R 3表示氢原子，低级烷基，苄基，呋喃基，苯基或被卤素原子，羟基，羧基，甲氧基羰基，低级烷基或低级烷氧基取代的苯基，除草组合物，其含有作为活性成分的二氢三唑衍生物中的至少一种。

17. 发明申请

US20090042123A1 CALIXRESORCINARENE COMPOUND, PHOTORESIST BASE COMPRISING THE SAME, AND COMPOSITION THEREOF 审中-公开
标题翻译：加合物化合物，包含它们的光催化剂基料及其组合物
公开(公告)号：US20090042123A1
公开(公告)日：2009-02-12
申请号：US11915754
申请日：2006-05-26
申请人： Hiroo Kinoshita , Takeo Watanabe , Hirotoshi Ishii , Takanori Owada
发明人： Hiroo Kinoshita , Takeo Watanabe , Hirotoshi Ishii , Takanori Owada
IPC分类号： G03C1/73 , C07C39/15 , G03F7/20
CPC分类号： C07C69/736 , C07C2603/92 , G03F7/0392 , G03F7/0397
摘要： A calixresorcinarene compound represented by the following formula (1): wherein eight Rs are n (n is an integer of 1 to 7) substituents that are one or more types of substituents selected from groups represented by the following formula (2), and m (m is an integer shown by 8-n) hydrogen atoms; and R's, which may be the same or different, are each a straight-chain aliphatic hydrocarbon group having 2 to 12 carbon atoms, a branched aliphatic hydrocarbon group having 3 to 12 carbon atoms, a phenyl group, a p-phenylphenyl group, a p-tert-butylphenyl group, and an aromatic group represented by the following formula (3), or a substituent formed by combining two or more of these substituents: wherein R″ is a hydrogen atom or a substituent selected from the substituents represented by the formula (2).
摘要翻译：由下式（1）表示的光学间苯二酚化合物：其中8个R为n（n为1〜7的整数）的取代基，其为选自下述式（2）所示的基团的一种以上的取代基，m （m为8-n所示的整数）氢原子; R可以相同或不同，分别为碳原子数2〜12的直链脂肪族烃基，碳原子数3〜12的支链脂肪族烃基，苯基，对苯基苯基，对苯基苯基对叔丁基苯基和由下式（3）表示的芳族基团，或通过组合这些取代基中的两个或更多个而形成的取代基：其中R“是氢原子或选自由公式（2）。

18. 发明申请

US20080181387A1 TELEPHONE SYSTEM AND SERVER APPARATUS 审中-公开
标题翻译：电话系统和服务器设备
公开(公告)号：US20080181387A1
公开(公告)日：2008-07-31
申请号：US12021837
申请日：2008-01-29
申请人： Takeo Watanabe
发明人： Takeo Watanabe
IPC分类号： H04M7/00
CPC分类号： H04M3/5183 , H04M2207/203
摘要： According to one embodiment, a telephone system includes a plurality of telephone exchange apparatuses which execute exchange processing among a plurality of telephone terminals and a server apparatus which is connected to the plurality of telephone exchange apparatuses via transmission paths, receives a call information event to specify a plurality of telephone terminals to be call-connected, and executes a computer supported telephony application with prescribed standards regarding call state management of the plurality of telephone terminals, wherein the server apparatus includes a controller which returns a telephone terminal which has become an extra state of the standards to a state in the standards, when the sate in the standards changes into the extra state of the standards in a state in which call connections among a plurality of telephone terminals connected to telephone exchange apparatuses different from one another.
摘要翻译：根据一个实施例，电话系统包括执行多个电话终端之间的交换处理的多个电话交换设备和经由传输路径连接到多个电话交换设备的服务器设备，接收呼叫信息事件以指定要呼叫连接的多个电话终端，并且执行关于多个电话终端的呼叫状态管理的规定标准的计算机支持的电话应用，其中，服务器装置包括控制器，该控制器返回已成为额外状态的电话终端当标准中的状态在连接到电话交换设备的多个电话终端之间的呼叫连接彼此不同的状态下变为标准的额外状态时，标准中的状态变为标准的额外状态。

19. 发明申请

US20070077512A1 Resist composition for electron beam or euv 有权
标题翻译：电子束或euv的抗蚀剂组成
公开(公告)号：US20070077512A1
公开(公告)日：2007-04-05
申请号：US10574073
申请日：2004-10-20
申请人： Takeo Watanabe , Hideo Hada , Hiroo Kinoshita
发明人： Takeo Watanabe , Hideo Hada , Hiroo Kinoshita
IPC分类号： G03C1/00
CPC分类号： G03F7/0048 , G03F7/0397 , Y10S430/106 , Y10S430/114 , Y10S430/118 , Y10S430/12 , Y10S430/143 , Y10S430/146
摘要： A resist composition and a method of forming a resist pattern that enable contamination within the exposure apparatus to be prevented in lithography processes using an electron beam or EUV (extreme ultraviolet light). In this method, an organic solvent containing, as the principal component, one or more compounds selected from a group consisting of propylene glycol monomethyl ether (PGME), methyl amyl ketone (MAK), butyl acetate (BuOAc), and 3-methyl methoxy propionate (MMP) is used as the resist solvent.
摘要翻译：在使用电子束或EUV（极紫外光）的光刻工艺中，抗蚀剂组合物和形成能够防止曝光装置内的污染的抗蚀剂图案的方法。在该方法中，含有选自丙二醇单甲基醚（PGME），甲基戊基酮（MAK），乙酸丁酯（BuOAc）和3-甲基甲氧基中的一种或多种化合物作为主要成分的有机溶剂丙酸盐（MMP）用作抗蚀剂溶剂。

20. 发明授权

US06783840B2 Resist ink composition 失效
标题翻译：抵抗墨水组成
公开(公告)号：US06783840B2
公开(公告)日：2004-08-31
申请号：US09959522
申请日：2001-10-29
申请人： Takeo Watanabe , Takashi Sato , Hirotaka Tagoshi
发明人： Takeo Watanabe , Takashi Sato , Hirotaka Tagoshi
IPC分类号： C08G6526
CPC分类号： H05K3/287 , G03F7/038 , G03F7/0382 , H05K3/4676 , Y10T428/24917
摘要： The present invention provides a resist ink composition comprising a compound (a) having at least one oxetanyl group and at least one epoxy group within the same molecule and a compound (b) capable of initiating cationic polymerization under irradiation by an active energy ray and/or under heat. This resist ink composition has high photosensitivity and enables the final curing by a brief heating and the cured film exhibits good physical properties.
摘要翻译：本发明提供一种抗蚀剂油墨组合物，其包含在同一分子内具有至少一个氧杂环丁烷基和至少一个环氧基的化合物（a）和能够通过活性能量射线照射的能够引发阳离子聚合的化合物（b）和/ 或在加热下。该抗蚀剂油墨组合物具有高的光敏性，并且能够通过短暂加热进行最终固化，并且固化膜表现出良好的物理性能。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式