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11. 发明申请

US20090204983A1 MASTER DISK EXPOSING APPARATUS AND THE ADJUSTING METHOD THEREFOR 有权
标题翻译：主磁盘曝光装置及其调整方法
公开(公告)号：US20090204983A1
公开(公告)日：2009-08-13
申请号：US12294164
申请日：2007-03-22
申请人： Masahiro Katsumura
发明人： Masahiro Katsumura
IPC分类号： G11B17/028
CPC分类号： H01J37/3045 , B82Y10/00 , B82Y40/00 , G11B5/743 , G11B5/82 , G11B5/84 , G11B5/855 , G11B5/865 , G11B7/261 , G11B9/10 , H01J37/3174 , H01J2237/3045
摘要： A master disk exposing apparatus having: a turntable for rotating a master disk; moving means for horizontally moving the turntable in at least one direction; beam irradiating means for irradiating an electron beam toward the turntable, thereby forming a beam spot onto the turntable or the master disk; beam deflecting means for deflecting the beam; and control means for controlling the moving means, the beam irradiating means, and the beam deflecting means, wherein the control means includes initializing means for executing an initial operation to drive at least either the moving means or the beam deflecting means and make an origin of the beam spot coincide with a rotational center of the turntable at the time of activation. An apparatus and a method for easily adjusting a deviation between an origin of an irradiating position of the recording beam and the rotational center of the turntable are, thus, provided.
摘要翻译：一种主盘曝光装置，具有：用于旋转主盘的转盘; 用于沿至少一个方向水平移动转台的移动装置; 光束照射装置，用于向转盘辐射电子束，从而在光盘或母盘上形成光斑; 用于偏转光束的光束偏转装置; 以及用于控制移动装置，光束照射装置和光束偏转装置的控制装置，其中控制装置包括初始化装置，用于执行初始操作以驱动移动装置或光束偏转装置中的至少一个，光束点在激活时与转台的旋转中心重合。因此，提供了用于容易地调节记录光束的照射位置的原点与转台的旋转中心之间的偏差的装置和方法。

12. 发明申请

US20070286036A1 Electron Beam Recording Apparatus 有权
标题翻译：电子束记录装置
公开(公告)号：US20070286036A1
公开(公告)日：2007-12-13
申请号：US10594056
申请日：2005-03-22
申请人： Masahiro Katsumura
发明人： Masahiro Katsumura
IPC分类号： G11B5/84
CPC分类号： G11B5/59655 , B82Y10/00 , G11B5/743 , G11B5/855
摘要： An electron beam recording apparatus provided with control means for forming a latent image in a resist layer on a disk substrate corresponding to a predetermined pattern by controlling the irradiation position of an electron beam irradiation unit on the surface of the resist layer in accordance with the rotation angle of the disk substrate by a rotational drive unit, the shift position by a shift drive unit and the recording data that represent the predetermined pattern, and beam-adjusting means for irradiating an electron beam so as to spread over a plurality of tracks in the direction of traversing the tracks in response to the irradiation position control due to the control means, and an electron beam recording method using the apparatus.
摘要翻译：一种电子束记录装置，其具有控制装置，用于根据旋转方向控制电子束照射单元的表面上的电子束照射单元的照射位置，在与预定图案相对应的盘基片上的抗蚀剂层中形成潜像通过旋转驱动单元的盘基片的角度，由移位驱动单元的移位位置和表示预定图案的记录数据，以及用于照射电子束以便分散在多个轨道上的光束调节装置响应于由于控制装置的照射位置控制而横越轨道的方向，以及使用该装置的电子束记录方法。

13. 发明授权

US07065034B2 Optical disc and apparatus for manufacturing a master disc therefor 失效
公开(公告)号：US07065034B2
公开(公告)日：2006-06-20
申请号：US11057597
申请日：2005-02-15
申请人： Masahiro Katsumura
发明人： Masahiro Katsumura
IPC分类号： G11B7/24 , B32B3/02
CPC分类号： H01J37/09 , B82Y10/00 , B82Y40/00 , G11B7/00736 , G11B7/261 , H01J37/3174 , H01J2237/31776
摘要： A master-disc-manufacturing apparatus includes an electron-beam emitting portion for emitting an electron beam, an electron-beam converging portion for converging an electron beam, a retarding voltage applying portion for applying a substrate with a negative potential having a magnitude of decelerating the electron beam, and a vacuum atmosphere producing portion for evacuating a chamber to produce a vacuum atmosphere therein.

14. 发明申请

US20050201261A1 Optical disc and apparatus for manufacturing a master disc therefor 失效
公开(公告)号：US20050201261A1
公开(公告)日：2005-09-15
申请号：US11057597
申请日：2005-02-15
申请人： Masahiro Katsumura
发明人： Masahiro Katsumura
IPC分类号： G11B7/24 , G11B7/007 , G11B7/26 , H01J37/09
CPC分类号： H01J37/09 , B82Y10/00 , B82Y40/00 , G11B7/00736 , G11B7/261 , H01J37/3174 , H01J2237/31776
摘要： A master-disc-manufacturing apparatus includes an electron-beam emitting portion for emitting an electron beam, an electron-beam converging portion for converging an electron beam, a retarding voltage applying portion for applying a substrate with a negative potential having a magnitude of decelerating the electron beam, and a vacuum atmosphere producing portion for evacuating a chamber to produce a vacuum atmosphere therein.

15. 发明授权

US06849390B2 Stamper-forming electrode material, stamper-forming thin film, and method of manufacturing optical disk 失效
标题翻译：压模形成用电极材料，压模成形薄膜及其制造方法
公开(公告)号：US06849390B2
公开(公告)日：2005-02-01
申请号：US10061273
申请日：2002-02-04
申请人： Masahiro Katsumura , Tetsuya Iida , Nobuhiro Oda , Takashi Ueno
发明人： Masahiro Katsumura , Tetsuya Iida , Nobuhiro Oda , Takashi Ueno
IPC分类号： B81C1/00 , C25D1/10 , G11B7/26 , B32B3/00
CPC分类号： C25D1/10 , B81C99/009 , B81C2201/0128 , B81C2201/032
摘要： A stamper-forming electrode material contains Cu as its main ingredient and at least one other element, preferably Ag and/or Ti. It is preferred that the Ag content be 10.0 wt % or less and that the Ti content be 5.0 wt % or less. A stamper-forming thin film is made of this stamper-forming electrode material, whereby its corrosion resistance is improved to suppress damage to itself, and a high-quality stamper can hence be formed.
摘要翻译：压模形成电极材料包含Cu作为其主要成分和至少一种其它元素，优选Ag和/或Ti。 Ag含量优选为10.0重量％以下，Ti含量为5.0重量％以下。压模形成薄膜由该压模形成用电极材料制成，由此其耐腐蚀性得到改善以抑制其自身的损伤，因此可以形成高质量的压模。

16. 发明授权

US5179547A Phase change optical information recording medium including means for preventing movement of the recorded portion 失效
标题翻译：相位变化光信息记录介质，包括防止记录部分运动的手段
公开(公告)号：US5179547A
公开(公告)日：1993-01-12
申请号：US706164
申请日：1991-05-28
申请人： Toshihiro Komaki , Hideo Kudo , Tomonori Ishizuki , Ryoichi Hirota , Masahiro Katsumura , Seishi Maita
发明人： Toshihiro Komaki , Hideo Kudo , Tomonori Ishizuki , Ryoichi Hirota , Masahiro Katsumura , Seishi Maita
IPC分类号： G11B7/00 , G11B7/007 , G11B7/013 , G11B7/24 , G11B7/26 , G11B7/30
CPC分类号： G11B7/24085 , G11B7/24 , G11B7/26
摘要： On the phase change optical information recording medium, a plurality of protection pits each smaller than one pit on the pre-pit region are provided over the entire data region of the recording film at least on its surface. Therefore, even when overwriting is repeatedly performed, the reproduced data waveform is distorted less frequently and data error is reduced. By forming the group of protection pits, the adhesive strength between the phase change recording film and the protective film can be increased, and the reliability of exfoliating strength can be improved.

17. 发明授权

US08335146B2 Master disk exposing apparatus and the adjusting method therefor 有权
标题翻译：主盘曝光装置及其调整方法
公开(公告)号：US08335146B2
公开(公告)日：2012-12-18
申请号：US12294164
申请日：2007-03-22
申请人： Masahiro Katsumura
发明人： Masahiro Katsumura
IPC分类号： G11B17/03
CPC分类号： H01J37/3045 , B82Y10/00 , B82Y40/00 , G11B5/743 , G11B5/82 , G11B5/84 , G11B5/855 , G11B5/865 , G11B7/261 , G11B9/10 , H01J37/3174 , H01J2237/3045
摘要： A master disk exposing apparatus having: a turntable for rotating a master disk; moving means for horizontally moving the turntable in at least one direction; beam irradiating means for irradiating an electron beam toward the turntable, thereby forming a beam spot onto the turntable or the master disk; beam deflecting means for deflecting the beam; and control means for controlling the moving means, the beam irradiating means, and the beam deflecting means, wherein the control means includes initializing means for executing an initial operation to drive at least either the moving means or the beam deflecting means and make an origin of the beam spot coincide with a rotational center of the turntable at the time of activation. An apparatus and a method for easily adjusting a deviation between an origin of an irradiating position of the recording beam and the rotational center of the turntable are, thus, provided.
摘要翻译：一种主盘曝光装置，具有：用于旋转主盘的转盘; 用于沿至少一个方向水平移动转台的移动装置; 光束照射装置，用于向转盘辐射电子束，从而在光盘或母盘上形成光斑; 用于偏转光束的光束偏转装置; 以及用于控制移动装置，光束照射装置和光束偏转装置的控制装置，其中控制装置包括初始化装置，用于执行初始操作以驱动移动装置或光束偏转装置中的至少一个，光束点在激活时与转台的旋转中心重合。因此，提供了用于容易地调节记录光束的照射位置的原点与转台的旋转中心之间的偏差的装置和方法。

18. 发明申请

US20100009025A1 MOLD FOR PATTERN TRANSFER 审中-公开
标题翻译：模式转换模式
公开(公告)号：US20100009025A1
公开(公告)日：2010-01-14
申请号：US12294822
申请日：2007-03-22
申请人： Masahiro Katsumura
发明人： Masahiro Katsumura
IPC分类号： B29C43/02
CPC分类号： B29C59/022 , B29C33/38 , B29C33/42 , B29C2791/006 , B81C99/009 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G11B5/743 , G11B5/82 , G11B5/855 , H01L21/0273
摘要： A mold of this invention comprises a base portion, and a pattern portion provided so as to protrude from a main face of the base portion, the base portion and the pattern portion being formed from different materials. By this means, a mold with the rigidity to withstand pressing forces during pattern transfer is provided.
摘要翻译：本发明的模具包括基部和设置成从基部的主面突出的图案部分，基部和图案部分由不同的材料形成。通过这种方式，提供了在图案转印期间具有抵抗挤压力的刚性的模具。

19. 发明授权

US07554896B2 Electron beam recording apparatus 有权
标题翻译：电子束记录装置
公开(公告)号：US07554896B2
公开(公告)日：2009-06-30
申请号：US10594056
申请日：2005-03-22
申请人： Masahiro Katsumura
发明人： Masahiro Katsumura
IPC分类号： G11B7/00
CPC分类号： G11B5/59655 , B82Y10/00 , G11B5/743 , G11B5/855
摘要： An electron beam recording apparatus provided with control means for forming a latent image in a resist layer on a disk substrate corresponding to a predetermined pattern by controlling the irradiation position of an electron beam irradiation unit on the surface of the resist layer in accordance with the rotation angle of the disk substrate by a rotational drive unit, the shift position by a shift drive unit and the recording data that represent the predetermined pattern, and beam-adjusting means for irradiating an electron beam so as to spread over a plurality of tracks in the direction of traversing the tracks in response to the irradiation position control due to the control means, and an electron beam recording method using the apparatus.
摘要翻译：一种电子束记录装置，其具有控制装置，用于根据旋转方向控制电子束照射单元的表面上的电子束照射单元的照射位置，在与预定图案相对应的盘基片上的抗蚀剂层中形成潜像通过旋转驱动单元的盘基片的角度，由移位驱动单元的移位位置和表示预定图案的记录数据，以及用于照射电子束以便分散在多个轨道上的光束调节装置响应于由于控制装置的照射位置控制而横越轨道的方向，以及使用该装置的电子束记录方法。

20. 发明授权

US07276692B2 Beam adjusting sample, beam adjusting method and beam adjusting device 有权
标题翻译：光束调整样品，光束调节方法和光束调节装置
公开(公告)号：US07276692B2
公开(公告)日：2007-10-02
申请号：US10679416
申请日：2003-10-07
申请人： Masahiro Katsumura , Yoshiaki Kojima , Yasumitsu Wada , Hiroaki Kitahara
发明人： Masahiro Katsumura , Yoshiaki Kojima , Yasumitsu Wada , Hiroaki Kitahara
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , H01J2237/21
摘要： A beam adjusting sample having a flat surface being like a plate and having two edges orthogonal to each other is employed. A beam is applied to the beam adjusting sample to detect an amount of the beam passing through the beam adjusting sample. The beam vertically scans the two edges.
摘要翻译：采用具有平板表面并具有彼此正交的两个边缘的平坦表面的光束调节样品。光束被施加到光束调整样本以检测通过光束调节样本的光束的量。光束垂直扫描两个边缘。

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