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    • 11. 发明申请
    • Optical semiconductor devices on InP substrate
    • InP衬底上的光学半导体器件
    • US20070051937A1
    • 2007-03-08
    • US11500292
    • 2006-08-08
    • Katsumi KishinoIchiro NomuraKoshi TamamuraHitoshi Nakamura
    • Katsumi KishinoIchiro NomuraKoshi TamamuraHitoshi Nakamura
    • H01L29/06
    • H01S5/347B82Y20/00H01L31/0296H01L31/035236H01L33/06H01L33/28H01S5/0218H01S2304/02
    • The present invention aims at providing a structure in which a high p-type carrier concentration of 1×1017 cm−3 or more is obtained in a material in which, although it shows normally p-type conductivity, a carrier concentration smaller than 1×1017 cm−3 is only obtained. Also, the present invention aims at providing highly reliable semiconductor element and device each of which has excellent characteristics such as light emitting characteristics and a long lifetime. Each specific layer, i.e., each ZnSe0.53Te0.47 layer (2ML) is inserted between host layers, i.e., Mg0.5Zn0.29Cd0.21Se layers (each having 10ML (atomic layer) thickness) each of which is lattice matched to an InP substrate. In this case, each specific layer in which a sufficient carrier concentration of 1×1018 cm−3 or more is obtained when a single layer is inserted at suitable intervals. As a result, a sufficient hole concentration of 1×1017 cm−3 or more is obtained in the overall crystal in a material in which a hole concentration smaller than 1×1017 cm−3 has been only conventionally obtained.
    • 本发明的目的在于提供一种结构,其中在其中显示出1×10 17 -3 -3以上的高p型载流子浓度的材料中获得 通常是p型导电性,仅获得小于1×10 17 cm -3的载流子浓度。 另外,本发明的目的在于提供高度可靠的半导体元件和器件,其各自具有优异的特性,例如发光特性和长寿命。 每个特定层,即每个ZnSe 0.53 Te 0.47层(2ML)被插入到主体层之间,即Mg 0.5 Zn 2+ 每个都具有与InP衬底晶格匹配的Se层(每个具有10ML(原子层)厚度)。 在这种情况下,当以适当的间隔插入单层时,获得其中足够的载流子浓度为1×10 18 cm -3以上的特定层。 结果,在其中空穴浓度小于1×10 6Ω的材料中,在整个晶体中获得足够的空穴浓度为1×10 17 cm -3以上的空穴浓度。 只有传统上获得了17厘米-3 -3。
    • 12. 发明授权
    • Optical semiconductor devices on InP substrate
    • InP衬底上的光学半导体器件
    • US07772586B2
    • 2010-08-10
    • US11500292
    • 2006-08-08
    • Katsumi KishinoIchiro NomuraKoshi TamamuraHitoshi Nakamura
    • Katsumi KishinoIchiro NomuraKoshi TamamuraHitoshi Nakamura
    • H01L33/00
    • H01S5/347B82Y20/00H01L31/0296H01L31/035236H01L33/06H01L33/28H01S5/0218H01S2304/02
    • The present invention aims at providing a structure in which a high p-type carrier concentration of 1×1017 cm−3 or more is obtained in a material in which, although it shows normally p-type conductivity, a carrier concentration smaller than 1×1017 cm−3 is only obtained. Also, the present invention aims at providing highly reliable semiconductor element and device each of which has excellent characteristics such as light emitting characteristics and a long lifetime.Each specific layer, i.e., each ZnSe0.53Te0.47 layer (2 ML) is inserted between host layers, i.e., Mg0.5Zn0.29Cd0.21Se layers (each having 10 ML (atomic layer) thickness) each of which is lattice matched to an InP substrate. In this case, each specific layer in which a sufficient carrier concentration of 1×1018 cm−3 or more is obtained when a single layer is inserted at suitable intervals. As a result, a sufficient hole concentration of 1×1017 cm−3 or more is obtained in the overall crystal in a material in which a hole concentration smaller than 1×1017 cm−3 has been only conventionally obtained.
    • 本发明的目的在于提供一种结构,其中虽然其表现出正常的p型导电性,但载流子浓度小于1×10 7的材料,其中获得1×1017cm-3以上的高p型载流子浓度 仅获得1017厘米-3。 另外,本发明的目的在于提供高度可靠的半导体元件和器件,其各自具有优异的特性,例如发光特性和长寿命。 每个特定层,即每个ZnSe0.53Te0.47层(2ML)被插入在主层之间,即Mg0.5Zn0.29Cd0.21Se层(每层具有10ML(原子层)厚度),每层具有格子匹配 到InP衬底。 在这种情况下,当以适当的间隔插入单层时,获得其中1×10 18 cm -3以上的载流子浓度足够的每个特定层。 结果,在通常获得的空穴浓度小于1×1017cm-3的材料中,在整个晶体中获得足够的空穴浓度为1×10 17 cm -3以上。
    • 13. 发明授权
    • II-VI compound semiconductor crystal and photoelectric conversion device
    • II-VI化合物半导体晶体和光电转换器件
    • US07045871B2
    • 2006-05-16
    • US11115182
    • 2005-04-27
    • Katsumi KishinoIchiro NomuraSong-Bek CheKenji Sato
    • Katsumi KishinoIchiro NomuraSong-Bek CheKenji Sato
    • H01L31/272
    • H01L33/28H01L31/0296
    • Since a ZnTe-base compound semiconductor crystal was designed so as to have, on a ZnTe-base compound semiconductor layer, an n-type contact layer which includes a superlattice layer having n-type CdSe and n-type ZnTe grown with each other or a ZnCdSeTe-graded layer, it was made possible to raise carrier concentration of the n-type contact layer, and to control the conductivity type in a relatively easy manner.Moreover, formation of a CdSe/ZnTe superlattice layer or a ZnCdSeTe-graded layer between the contact layer and an electrode can prevent electric resistance from being increased due to difference in the energy gaps. Since CdSe and ZnTe, composing the CdSe/ZnTe superlattice or ZnCdSeTe composition-graded layer, have relatively close lattice constants, formation thereof is less likely to adversely affect the crystallinity of the semiconductor crystal, which is advantageous in obtaining the semiconductor crystal with an excellent quality.
    • 由于ZnTe基化合物半导体晶体被设计成在ZnTe基化合物半导体层上具有n型接触层,该n型接触层包括彼此生长的具有n型CdSe和n型ZnTe的超晶格层,或者 ZnCdSeTe梯度层,可以提高n型接触层的载流子浓度,并以相对容易的方式控制导电类型。 此外,在接触层和电极之间形成CdSe / ZnTe超晶格层或ZnCdSeTe梯度层可以防止由于能隙的差异而导致的电阻增加。 由于构成CdSe / ZnTe超晶格或ZnCdSeTe组成梯度层的CdSe和ZnTe具有相对较近的晶格常数,所以其形成不太可能不利地影响半导体晶体的结晶度,这有利于获得具有优异的半导体晶体 质量。
    • 14. 发明申请
    • II-VI compound semiconductor crystal and photoelectric conversion device
    • II-VI化合物半导体晶体和光电转换器件
    • US20050189553A1
    • 2005-09-01
    • US11115182
    • 2005-04-27
    • Katsumi KishinoIchiro NomuraSong-Bek CheKenji Sato
    • Katsumi KishinoIchiro NomuraSong-Bek CheKenji Sato
    • H01L31/0296H01L33/06H01L33/28H01L33/40H01L29/22
    • H01L33/28H01L31/0296
    • Since a ZnTe-base compound semiconductor crystal was designed so as to have, on a ZnTe-base compound semiconductor layer, an n-type contact layer which includes a superlattice layer having n-type CdSe and n-type ZnTe grown with each other or a ZnCdSeTe-graded layer, it was made possible to raise carrier concentration of the n-type contact layer, and to control the conductivity type in a relatively easy manner. Moreover, formation of a CdSe/ZnTe superlattice layer or a ZnCdSeTe-graded layer between the contact layer and an electrode can prevent electric resistance from being increased due to difference in the energy gaps. Since CdSe and ZnTe, composing the CdSe/ZnTe superlattice or ZnCdSeTe composition-graded layer, have relatively close lattice constants, formation thereof is less likely to adversely affect the crystallinity of the semiconductor crystal, which is advantageous in obtaining the semiconductor crystal with an excellent quality.
    • 由于ZnTe基化合物半导体晶体被设计成在ZnTe基化合物半导体层上具有n型接触层,该n型接触层包括彼此生长的具有n型CdSe和n型ZnTe的超晶格层,或者 ZnCdSeTe梯度层,可以提高n型接触层的载流子浓度,并以相对容易的方式控制导电类型。 此外,在接触层和电极之间形成CdSe / ZnTe超晶格层或ZnCdSeTe梯度层可以防止由于能隙的差异而导致的电阻增加。 由于构成CdSe / ZnTe超晶格或ZnCdSeTe组成梯度层的CdSe和ZnTe具有相对较近的晶格常数,所以其形成不太可能不利地影响半导体晶体的结晶度,这有利于获得具有优异的半导体晶体 质量。
    • 15. 发明授权
    • II-VI compound semiconductor crystal
    • II-VI化合物半导体晶体
    • US06933519B2
    • 2005-08-23
    • US10381880
    • 2002-08-02
    • Katsumi KishinoIchiro NomuraSong-Bek CheKenji Sato
    • Katsumi KishinoIchiro NomuraSong-Bek CheKenji Sato
    • H01L31/0296H01L33/06H01L33/28H01L33/40H01L29/06
    • H01L33/28H01L31/0296
    • The present invention relates to a II-VI compound semiconductor crystal comprising an n-type contact layer which includes a superlattice layer comprising n-type CdSe and n-type ZnTe stacked with each other, on a ZnTe-base compound semiconductor layer; a A II-VI compound semiconductor crystal comprising an n-type contact layer which includes an n-type ZnCdSeTe composition-graded layer in which composition of Zn, Cd, Se and Te is gradually varies, on a ZnTe-base compound semiconductor layer; a II-VI compound semiconductor crystal comprising a p-type contact layer which includes a superlattice layer comprising p-type CdSe and p-type ZnTe stacked with each other, on a CdSe-base compound semiconductor layer; and a II-VI compound semiconductor crystal comprising a p-type contact layer which includes a p-type ZnCdSeTe composition-graded layer in which composition of Zn, Cd, Se and Te is gradually varied, on a CdSe-base compound semiconductor layer.
    • 本发明涉及包含n型接触层的II-VI族化合物半导体晶体,所述n型接触层包括在ZnTe基化合物半导体层上彼此堆叠的包含n型CdSe和n型ZnTe的超晶格层; 包括在ZnTe基化合物半导体层上包含Zn,Cd,Se和Te的组成逐渐变化的n型ZnCdSeTe组成梯度层的n型接触层的A II-VI化合物半导体晶体; 包括p型接触层的II-VI族化合物半导体晶体,其包含在CdSe基化合物半导体层上彼此堆叠的包含p型CdSe和p型ZnTe的超晶格层; 以及包含在CdSe基化合物半导体层上包含Zn,Cd,Se和Te的组成逐渐变化的p型ZnCdSeTe组成分级层的p型接触层的II-VI族化合物半导体晶体。