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11. 发明申请

US20100190324A1 REDUCING PHOTORESIST LAYER DEGRADATION IN PLASMA IMMERSION ION IMPLANTATION 失效
标题翻译：降低等离子体沉积物植入中的光电层降解
公开(公告)号：US20100190324A1
公开(公告)日：2010-07-29
申请号：US12550142
申请日：2009-08-28
申请人： MARTIN A. HILKENE , Kartik Santhanam , Yen B. Ta , Peter I. Porshnev , Majeed A. Foad
发明人： MARTIN A. HILKENE , Kartik Santhanam , Yen B. Ta , Peter I. Porshnev , Majeed A. Foad
IPC分类号： H01L21/265
CPC分类号： H01L21/2236 , H01L21/31138
摘要： A method of plasma immersion ion implantation of a workpiece having a photoresist mask on its top surface prevents photoresist failure from carbonization of the photoresist. The method includes performing successive ion implantation sub-steps, each of the ion implantation sub-steps having a time duration over which only a fractional top portion of the photoresist layer is damaged by ion implantation. After each one of the successive ion implantation sub-steps, the fractional top portion of the photoresist is removed while leaving the remaining portion of the photoresist layer in place by performing an ashing sub-step. The number of the successive ion implantation sub-steps is sufficient to reach a predetermined ion implantation dose in the workpiece.
摘要翻译：在其顶表面上具有光致抗蚀剂掩模的工件的等离子体浸没离子注入的方法防止光致抗蚀剂从光致抗蚀剂的碳化失效。该方法包括执行连续的离子注入子步骤，每个离子注入子步骤具有仅通过离子注入损坏光致抗蚀剂层的仅部分顶部的持续时间。在连续离子注入子步骤中的每一个之后，去除光致抗蚀剂的分数顶部，同时通过执行灰化子步骤留下光致抗蚀剂层的剩余部分就位。连续离子注入子步骤的数量足以在工件中达到预定的离子注入剂量。

12. 发明授权

US09376746B2 Demagnetization of magnetic media by C doping for HDD patterned media application 有权
标题翻译：通过C掺杂磁性介质对HDD图案媒体应用进行退磁
公开(公告)号：US09376746B2
公开(公告)日：2016-06-28
申请号：US13715786
申请日：2012-12-14
申请人： Martin A. Hilkene , Roman Gouk , Matthew D. Scotney-Castle , Peter I. Porshnev
发明人： Martin A. Hilkene , Roman Gouk , Matthew D. Scotney-Castle , Peter I. Porshnev
IPC分类号： C23C14/48 , C23C14/04
CPC分类号： C23C14/5826 , C23C14/042 , C23C14/0605 , C23C14/48 , C23C14/5873 , G11B5/62 , G11B5/85 , G11B5/851 , G11B5/858
摘要： Embodiments described herein provide methods and apparatus for treating a magnetic substrate having an imprinted, oxygen-reactive mask formed thereon by implanting ions into a magnetically active surface of the magnetic substrate through the imprinted oxygen-reactive mask, wherein the ions do not reduce the oxygen reactivity of the mask, and removing the mask by exposing the substrate to an oxygen-containing plasma. The mask may be amorphous carbon, through which carbon-containing ions are implanted into the magnetically active surface. The carbon-containing ions, which may also contain hydrogen, may be formed by activating a mixture of hydrocarbon gas and hydrogen. A ratio of the hydrogen and the hydrocarbon gas may be selected or adjusted to control the ion implantation.
摘要翻译：本文所述的实施方案提供了用于处理具有通过印刷的氧反应性掩模将离子注入到磁性基底的磁性活性表面中的其上形成有印记的氧反应性掩模的磁性基底的方法和装置，其中离子不会减少氧掩模的反应性，以及通过将衬底暴露于含氧等离子体来除去掩模。掩模可以是无定形碳，将含碳离子注入到磁性活性表面中。也可以含有氢的含碳离子可以通过活化烃气体和氢气的混合物而形成。可以选择或调节氢气和烃气体的比例以控制离子注入。

13. 发明申请

US20120196155A1 RESIST FORTIFICATION FOR MAGNETIC MEDIA PATTERNING 有权
标题翻译：用于磁介质图形的电阻强化
公开(公告)号：US20120196155A1
公开(公告)日：2012-08-02
申请号：US13193539
申请日：2011-07-28
申请人： Christopher D. Bencher , Roman Gouk , Steven Verhaverbeke , Li-Qun Xia , Yong-Won Lee , Matthew D. Scotney-Castle , Martin A. Hilkene , Peter I. Porshnev
发明人： Christopher D. Bencher , Roman Gouk , Steven Verhaverbeke , Li-Qun Xia , Yong-Won Lee , Matthew D. Scotney-Castle , Martin A. Hilkene , Peter I. Porshnev
IPC分类号： G11B5/64 , C23C16/50 , C23C16/04 , B05D5/00 , B82Y10/00
CPC分类号： G11B5/85 , G11B5/743 , G11B5/855
摘要： A method and apparatus for forming magnetic media substrates is provided. A patterned resist layer is formed on a substrate having a magnetically susceptible layer. A conformal protective layer is formed over the patterned resist layer to prevent degradation of the pattern during subsequent processing. The substrate is subjected to an energy treatment wherein energetic species penetrate portions of the patterned resist and conformal protective layer according to the pattern formed in the patterned resist, impacting the magnetically susceptible layer and modifying a magnetic property thereof. The patterned resist and conformal protective layers are then removed, leaving a magnetic substrate having a pattern of magnetic properties with a topography that is substantially unchanged.
摘要翻译：提供了一种形成磁性介质基板的方法和装置。在具有磁敏感层的基板上形成图案化的抗蚀剂层。在图案化的抗蚀剂层上形成保形层，以防止后续处理期间图案的劣化。对衬底进行能量处理，其中能量物质根据形成在图案化抗蚀剂中的图案穿透图案化抗蚀剂和保形层的部分，撞击磁敏感层并改变其磁性。然后去除图案化的抗蚀剂和共形保护层，留下具有基本上不变的形貌的磁性质图案的磁性基底。

14. 发明授权

US08354035B2 Method for removing implanted photo resist from hard disk drive substrates 有权
标题翻译：从硬盘驱动器基板上去除植入光刻胶的方法
公开(公告)号：US08354035B2
公开(公告)日：2013-01-15
申请号：US12821400
申请日：2010-06-23
申请人： Martin A. Hilkene , Majeed A. Foad , Matthew D. Scotney-Castle , Roman Gouk , Steven Verhaverbeke , Peter I. Porshnev
发明人： Martin A. Hilkene , Majeed A. Foad , Matthew D. Scotney-Castle , Roman Gouk , Steven Verhaverbeke , Peter I. Porshnev
IPC分类号： B44C1/22
CPC分类号： G11B5/84 , G03F7/427
摘要： A method of removing resist material from a substrate having a magnetically active surface is provided. The substrate is disposed in a processing chamber and exposed to a fluorine-containing plasma formed from a gas mixture having a reagent, an oxidizing agent, and a reducing agent. A cleaning agent may also be included. The substrate may be cooled by back-side cooling or by a cooling process wherein a cooling medium is provided to the processing chamber while the plasma treatment is suspended. Substrates may be flipped over for two-sided processing, and multiple substrates may be processed concurrently.
摘要翻译：提供了从具有磁性活性表面的基板去除抗蚀剂材料的方法。将基板设置在处理室中并暴露于由具有试剂，氧化剂和还原剂的气体混合物形成的含氟等离子体。还可以包括清洁剂。衬底可以通过背面冷却或通过冷却过程冷却，其中在等离子体处理被暂停时将冷却介质提供给处理室。衬底可以翻转以进行双面处理，并且可以同时处理多个衬底。

15. 发明申请

US20110006034A1 METHOD FOR REMOVING IMPLANTED PHOTO RESIST FROM HARD DISK DRIVE SUBSTRATES 有权
标题翻译：从硬盘驱动器基板移除嵌入式照相器的方法
公开(公告)号：US20110006034A1
公开(公告)日：2011-01-13
申请号：US12821400
申请日：2010-06-23
申请人： Martin A. Hilkene , Majeed A. Foad , Matthew D. Scotney-Castle , Roman Gouk , Steven Verhaverbeke , Peter I. Porshnev
发明人： Martin A. Hilkene , Majeed A. Foad , Matthew D. Scotney-Castle , Roman Gouk , Steven Verhaverbeke , Peter I. Porshnev
IPC分类号： G11B5/84
CPC分类号： G11B5/84 , G03F7/427
摘要： A method of removing resist material from a substrate having a magnetically active surface is provided. The substrate is disposed in a processing chamber and exposed to a fluorine-containing plasma formed from a gas mixture having a reagent, an oxidizing agent, and a reducing agent. A cleaning agent may also be included. The substrate may be cooled by back-side cooling or by a cooling process wherein a cooling medium is provided to the processing chamber while the plasma treatment is suspended. Substrates may be flipped over for two-sided processing, and multiple substrates may be processed concurrently.
摘要翻译：提供了从具有磁性活性表面的基板去除抗蚀剂材料的方法。将基板设置在处理室中并暴露于由具有试剂，氧化剂和还原剂的气体混合物形成的含氟等离子体。还可以包括清洁剂。衬底可以通过背面冷却或通过冷却过程冷却，其中在等离子体处理被暂停时将冷却介质提供给处理室。衬底可以翻转以进行双面处理，并且可以同时处理多个衬底。

16. 发明授权

US08658242B2 Resist fortification for magnetic media patterning 有权
标题翻译：磁性介质图案抗蚀强化
公开(公告)号：US08658242B2
公开(公告)日：2014-02-25
申请号：US13193539
申请日：2011-07-28
申请人： Christopher D. Bencher , Roman Gouk , Steven Verhaverbeke , Li-Qun Xia , Yong-Won Lee , Matthew D. Scotney-Castle , Martin A. Hilkene , Peter I. Porshnev
发明人： Christopher D. Bencher , Roman Gouk , Steven Verhaverbeke , Li-Qun Xia , Yong-Won Lee , Matthew D. Scotney-Castle , Martin A. Hilkene , Peter I. Porshnev
IPC分类号： B05D5/12
CPC分类号： G11B5/85 , G11B5/743 , G11B5/855
摘要： A method and apparatus for forming magnetic media substrates is provided. A patterned resist layer is formed on a substrate having a magnetically susceptible layer. A conformal protective layer is formed over the patterned resist layer to prevent degradation of the pattern during subsequent processing. The substrate is subjected to an energy treatment wherein energetic species penetrate portions of the patterned resist and conformal protective layer according to the pattern formed in the patterned resist, impacting the magnetically susceptible layer and modifying a magnetic property thereof. The patterned resist and conformal protective layers are then removed, leaving a magnetic substrate having a pattern of magnetic properties with a topography that is substantially unchanged.
摘要翻译：提供了一种形成磁性介质基板的方法和装置。在具有磁敏感层的基底上形成图案化的抗蚀剂层。在图案化的抗蚀剂层上形成保形层，以防止后续处理期间图案的劣化。对衬底进行能量处理，其中能量物质根据形成在图案化抗蚀剂中的图案穿透图案化抗蚀剂和保形层的部分，撞击磁敏感层并改变其磁性。然后去除图案化的抗蚀剂和共形保护层，留下具有基本上不变的形貌的磁性质图案的磁性基底。

17. 发明申请

US20130164455A1 DEMAGNETIZATION OF MAGNETIC MEDIA BY C DOPING FOR HDD PATTERNED MEDIA APPLICATION 有权
标题翻译：用于硬盘图形媒体应用程序的磁性介质的去磁
公开(公告)号：US20130164455A1
公开(公告)日：2013-06-27
申请号：US13715786
申请日：2012-12-14
申请人： Martin A. Hilkene , Roman Gouk , Matthew D. Scotney-Castle , Peter I. Porshnev
发明人： Martin A. Hilkene , Roman Gouk , Matthew D. Scotney-Castle , Peter I. Porshnev
IPC分类号： C23C14/48
CPC分类号： C23C14/5826 , C23C14/042 , C23C14/0605 , C23C14/48 , C23C14/5873 , G11B5/62 , G11B5/85 , G11B5/851 , G11B5/858
摘要： Embodiments described herein provide methods and apparatus for treating a magnetic substrate having an imprinted, oxygen-reactive mask formed thereon by implanting ions into a magnetically active surface of the magnetic substrate through the imprinted oxygen-reactive mask, wherein the ions do not reduce the oxygen reactivity of the mask, and removing the mask by exposing the substrate to an oxygen-containing plasma. The mask may be amorphous carbon, through which carbon-containing ions are implanted into the magnetically active surface. The carbon-containing ions, which may also contain hydrogen, may be formed by activating a mixture of hydrocarbon gas and hydrogen. A ratio of the hydrogen and the hydrocarbon gas may be selected or adjusted to control the ion implantation.
摘要翻译：本文所述的实施方案提供了用于处理具有通过印刷的氧反应性掩模将离子注入到磁性基底的磁性活性表面中的其上形成有印记的氧反应性掩模的磁性基底的方法和装置，其中离子不会减少氧掩模的反应性，以及通过将衬底暴露于含氧等离子体来除去掩模。掩模可以是无定形碳，将含碳离子注入到磁性活性表面中。也可以含有氢的含碳离子可以通过活化烃气体和氢气的混合物而形成。可以选择或调节氢气和烃气体的比例以控制离子注入。

18. 发明授权

US08288257B2 Doping profile modification in P3I process 有权
标题翻译： P3I过程中掺杂型材修改
公开(公告)号：US08288257B2
公开(公告)日：2012-10-16
申请号：US12606897
申请日：2009-10-27
申请人： Matthew D. Scotney-Castle , Majeed A. Foad , Peter I. Porshnev
发明人： Matthew D. Scotney-Castle , Majeed A. Foad , Peter I. Porshnev
IPC分类号： H01L21/425
CPC分类号： H01L21/2236 , H01J37/32412
摘要： Methods for implanting material into a substrate by a plasma immersion ion implanting process are provided. In one embodiment, a method for implanting material into a substrate includes providing a substrate into a processing chamber, the substrate comprising a substrate surface having a material layer formed thereon, generating a first plasma of a non-dopant processing gas, exposing the material layer to the plasma of the non-dopant processing gas, generating a second plasma of a dopant processing gas including a reacting gas adapted to produce dopant ions, and implanting dopant ions from the plasma into the material layer. The method may further include a cleaning or etch process.
摘要翻译：提供了通过等离子体浸没离子注入工艺将材料注入衬底的方法。在一个实施例中，用于将材料注入衬底的方法包括将衬底提供到处理室中，所述衬底包括其上形成有材料层的衬底表面，产生非掺杂剂处理气体的第一等离子体，暴露材料层涉及非掺杂剂处理气体的等离子体，产生掺杂剂处理气体的第二等离子体，所述掺杂剂处理气体包括适于产生掺杂剂离子的反应气体，以及将等离子体中的掺杂剂离子注入材料层。该方法还可以包括清洁或蚀刻工艺。

19. 发明授权

US08129261B2 Conformal doping in P3I chamber 有权
标题翻译： P3I室中的保形掺杂
公开(公告)号：US08129261B2
公开(公告)日：2012-03-06
申请号：US12606877
申请日：2009-10-27
申请人： Peter I. Porshnev , Matthew D. Scotney-Castle , Majeed A. Foad
发明人： Peter I. Porshnev , Matthew D. Scotney-Castle , Majeed A. Foad
IPC分类号： H01L21/265 , H01L21/302 , H01L21/322
CPC分类号： H01L21/2236 , H01J37/32412
摘要： Methods for implanting ions into a substrate by a plasma immersion ion implanting process are provided. In one embodiment, a method for implanting ions into a substrate includes providing a substrate into a processing chamber, the substrate comprising substrate surface having one or more features formed therein and each feature having one or more horizontal surfaces and one or more vertical surfaces, generating a plasma from a gas mixture including a reacting gas adapted to produce ions, depositing a material layer on the substrate surface and on at least one horizontal surface of the substrate feature, implanting ions from the plasma into the substrate by an isotropic process into at least one horizontal surface and into at least one vertical surface, and etching the material layer on the substrate surface and the at least one horizontal surface by an anisotropic process.
摘要翻译：提供了通过等离子体浸没离子注入工艺将离子注入衬底的方法。在一个实施例中，用于将离子注入到衬底中的方法包括将衬底提供到处理室中，所述衬底包括具有形成在其中的一个或多个特征的衬底表面，并且每个特征具有一个或多个水平表面和一个或多个垂直表面，来自包括适于产生离子的反应气体的气体混合物的等离子体，在衬底表面上沉积材料层和在衬底特征的至少一个水平表面上，通过各向同性方法将离子从等离子体注入到衬底中至少一个水平表面并且进入至少一个垂直表面，并且通过各向异性工艺蚀刻衬底表面上的材料层和至少一个水平表面。

20. 发明申请

US20110127156A1 CHAMBER FOR PROCESSING HARD DISK DRIVE SUBSTRATES 审中-公开
标题翻译：用于加工硬盘驱动基板的机箱
公开(公告)号：US20110127156A1
公开(公告)日：2011-06-02
申请号：US12955619
申请日：2010-11-29
申请人： Majeed A. Foad , Martin A. Hilkene , Peter I. Porshnev , Jose Antonio Marin , Matthew D. Scotney-Castle
发明人： Majeed A. Foad , Martin A. Hilkene , Peter I. Porshnev , Jose Antonio Marin , Matthew D. Scotney-Castle
IPC分类号： C23C14/34
CPC分类号： G11B5/8404
摘要： An apparatus for forming a magnetic pattern in a magnetic storage substrate. A chamber comprises a chamber wall that defines an internal volume, a substrate support in the internal volume of the chamber, a gas distributor disposed in a wall region of the chamber facing the substrate support, a compact energy source for ionizing a portion of the process gas provided to the chamber, and a throttle valve having a z-actuated gate member with a sealing surface for covering an outlet portal of the chamber. Ions are accelerated toward the substrate support by an electrical bias, amplifying the ion density of the process gas. A substrate disposed on the substrate support is bombarded by the ions to alter a magnetic property of the substrate surface.
摘要翻译：一种用于在磁存储基板中形成磁图案的装置。室包括限定内部容积的室壁，室的内部体积中的衬底支撑件，布置在面向衬底支撑件的腔室的壁区域中的气体分配器，用于使过程的一部分电离的紧凑能量源提供给腔室的气体以及具有z致动门构件的节流阀，其具有用于覆盖腔室出口的密封表面。离子通过电偏压加速朝向衬底支撑，从而放大工艺气体的离子密度。设置在基板支撑体上的基板被离子轰击以改变基板表面的磁性。

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