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    • 11. 发明授权
    • Resistance change memory device
    • 电阻变化记忆装置
    • US07778062B2
    • 2010-08-17
    • US11761400
    • 2007-06-12
    • Haruki TodaKoichi Kubo
    • Haruki TodaKoichi Kubo
    • G11C11/00
    • G11C13/0011G11C13/0004G11C13/0007G11C13/0014G11C13/0016G11C13/004G11C13/0069G11C17/16G11C17/165G11C2013/0042G11C2013/009G11C2213/31G11C2213/32G11C2213/55G11C2213/56G11C2213/71G11C2213/72
    • A resistance change memory device including: a semiconductor substrate; at least one cell array formed above the semiconductor substrate, each memory cell having a stack structure of a variable resistance element and an access element, the access element having such an off-state resistance value in a certain voltage range that is ten times or more as high as that in a select state; and a read/write circuit formed on the semiconductor substrate as underlying the cell array for data reading and writing, wherein the variable resistance element comprises a recording layer composed of a composite compound containing at least two types of cation elements, at least one type of the cation element being a transition element having “d” orbit, in which electrons are incompletely filled, the shortest distance between adjacent cation elements being 0.32 nm or less.
    • 一种电阻变化存储器件,包括:半导体衬底; 形成在所述半导体衬底上的至少一个单元阵列,每个存储单元具有可变电阻元件和存取元件的堆叠结构,所述存取元件具有在十倍或更多的一定电压范围内的截止电阻值 与选择状态一样高; 以及形成在半导体基板上的用于数据读写的单元阵列下面的读/写电路,其中可变电阻元件包括由包含至少两种类型的阳离子元素的复合化合物组成的记录层,至少一种 阳离子元素是具有“d”轨道的过渡元素,其中电子未完全填充,相邻阳离子元素之间的最短距离为0.32nm以下。
    • 12. 发明授权
    • Phase change memory device
    • 相变存储器件
    • US07750334B2
    • 2010-07-06
    • US11958168
    • 2007-12-17
    • Haruki Toda
    • Haruki Toda
    • H01L29/02
    • G11C13/0004G11C5/02G11C7/18G11C13/0007G11C2211/4013G11C2213/31G11C2213/71G11C2213/72H01L27/2409H01L27/2481H01L45/06H01L45/1233
    • A memory device has a semiconductor substrate; a plurality of cell arrays stacked above the substrate, each cell array having memory cells, bit lines each commonly connecting one ends of plural cells arranged along a first direction and word lines each commonly connecting the other ends of plural cells arranged along a second direction; a read/write circuit formed on the substrate as underlying the cell arrays; first and second vertical wirings disposed on both sides of each cell array in the first direction to connect the bit lines to the read/write circuit; and third vertical wirings disposed on both sides of each cell array in the second direction to connect the word lines to the read/write circuit.
    • 存储器件具有半导体衬底; 多个单元阵列,堆叠在基板上方,每个单元阵列具有存储单元,每个通常连接沿着第一方向布置的多个单元的一端的位线和每个共同连接沿着第二方向布置的多个单元的另一端的字线; 在基板上形成的读/写电路,位于单元阵列下面; 第一和第二垂直布线,沿着第一方向设置在每个单元阵列的两侧,以将位线连接到读/写电路; 以及在第二方向上设置在每个单元阵列两侧的第三垂直布线,以将字线连接到读/写电路。
    • 14. 发明授权
    • Sense amplifier and semiconductor memory device with the same
    • 感应放大器和半导体存储器件相同
    • US07522462B2
    • 2009-04-21
    • US11563408
    • 2006-11-27
    • Toshiaki EdahiroHaruki Toda
    • Toshiaki EdahiroHaruki Toda
    • G11C7/00
    • G11C7/065G11C16/28
    • A sense amplifier includes: NMOS transistors, drains thereof being coupled to output nodes, gates thereof being coupled to the output nodes, sources thereof being coupled in common to the ground potential node; PMOS transistors, drains thereof being coupled to the drains of the NMOS transistors, sources thereof being coupled to the input nodes; PMOS transistors, drains thereof being coupled to the input nodes, gates thereof being coupled to the output nodes, sources thereof being coupled to the power supply node via a current source device; and NMOS transistors disposed between the output nodes and the ground potential node to be turned on before sensing; and an equalizing transistor disposed between the output nodes.
    • 读出放大器包括:NMOS晶体管,其漏极耦合到输出节点,其栅极耦合到输出节点,其源极共同耦合到地电位节点; PMOS晶体管,其漏极耦合到NMOS晶体管的漏极,其源极耦合到输入节点; PMOS晶体管,其漏极耦合到输入节点,其栅极耦合到输出节点,其源极经由电流源装置耦合到电源节点; 并且设置在所述输出节点和所述接地电位节点之间的NMOS晶体管将在感测之前导通; 以及设置在输出节点之间的均衡晶体管。
    • 15. 发明申请
    • RESISTANCE CHANGE MEMORY DEVICE
    • 电阻变化存储器件
    • US20080310211A1
    • 2008-12-18
    • US12140818
    • 2008-06-17
    • Haruki TodaKoichi Kubo
    • Haruki TodaKoichi Kubo
    • G11C11/00
    • G11C13/0007G11C13/0004G11C13/0011G11C13/0014G11C13/0016G11C13/004G11C2013/0042G11C2213/31G11C2213/32G11C2213/55G11C2213/56G11C2213/71G11C2213/72
    • A resistance change memory device including: a semiconductor substrate; at least one cell array formed above the semiconductor substrate, each memory cell having a stack structure of a variable resistance element and an access element, the access element having such an off-state resistance value in a certain voltage range that is ten times or more as high as that in a select state; and a read/write circuit formed on the semiconductor substrate as underlying the cell array, wherein the variable resistance element comprises a recording layer formed of a first composite compound expressed by AxMyOz (where “A” and “M” are cation elements different from each other; “O” oxygen; and 0.5≦x≦1.5, 0.5≦y≦2.5 and 1.5≦z≦4.5) and a second composite compound containing at least one transition element and a cavity site for housing a cation ion.
    • 一种电阻变化存储器件,包括:半导体衬底; 形成在所述半导体衬底上的至少一个单元阵列,每个存储单元具有可变电阻元件和存取元件的堆叠结构,所述存取元件具有在十倍或更多的一定电压范围内的截止电阻值 与选择状态一样高; 以及形成在半导体基板上的读/写电路,其形成在单元阵列的下方,其中可变电阻元件包括由由AxMyOz表示的第一复合化合物形成的记录层(其中“A”和“M”是每个不同的阳离子元素 另一个;“O”氧;和0.5 <= x <= 1.5,0.5 <= y <= 2.5和1.5 <= z <= 4.5)和第二复合化合物,其含有至少一个过渡元素和用于容纳 阳离子离子