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    • 20. 发明申请
    • Photosensitive compositions based on polycyclic polymers
    • 基于多环聚合物的光敏组合物
    • US20060167197A1
    • 2006-07-27
    • US11324738
    • 2006-01-03
    • Edmund ElceTakashi HiranoJeffrey KrotineLarry RhodesBrian GoodallSaiKumar JayaramanW. McDougallShenliang Sun
    • Edmund ElceTakashi HiranoJeffrey KrotineLarry RhodesBrian GoodallSaiKumar JayaramanW. McDougallShenliang Sun
    • C08F132/08
    • G03F7/0382C08G59/3218C08G61/02C08G61/06
    • A copolymer composition including a copolymer having repeat units of structural formula I: where X is selected from —CH2—, —CH2—CH2— and O; m is an integer from 0 to 5; and each occurrence of R1-R4 are independently selected from H; C1 to C25 linear, branched, and cyclic alkyl, aryl, aralkyl, alkaryl, alkenyl and alkynyl that can include one or more hetero atoms selected from O, N, and Si; a group that contains an epoxy functionality; —(CH2)nC(O)OR5; —(CH2)nC(O)OR; —(CH2)nOR6; —(CH2)nOC(O)R6; —(CH2)nC(O)R6; —(CH2)nOC(O)OR6; and any combination of two of R1, R2, R3, and R4 linked together by a linking group. A portion of the repeat units having structural formula I contain at least one epoxy functional pendant group. The copolymer composition can be included with a material that photonically forms a catalyst in a photodefinable dielectric composition, which can be used to form a photodefinable layer on a substrate.
    • 一种共聚物组合物,其包含具有结构式I的重复单元的共聚物:其中X选自-CH 2 - , - CH 2 -CH 2 > - 和O; m是0至5的整数; 并且每次出现的R 1 -R 4独立地选自H; C 1至C 25直链,支链和环状的烷基,芳基,芳烷基,烷芳基,烯基和炔基,其可以包括一个或多个选自O,N, 和Si; 含有环氧官能团的基团; - (CH 2)2 C(O)OR 5; - (CH 2)2 C(O)OR; - (CH 2 2)n - 或 - 6 - - (CH 2)n OC(O)R 6; - (CH 2 CH 2)n C(O)R 6; - (CH 2)n OC(O)OR 6; 并且R 1,R 2,R 3,R 4和R 4中的两个的任何组合通过 连接组。 具有结构式I的重复单元的一部分含有至少一个环氧官能侧基。 该共聚物组合物可以包含在可光致定影的电介质组合物中光子形成催化剂的材料,该组合物可用于在基底上形成光可定义层。