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11. 发明申请

US20050175776A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20050175776A1
公开(公告)日：2005-08-11
申请号：US10986178
申请日：2004-11-12
申请人： Bod Streefkerk , Johannes Baselmans , Richard Bruls , Marcel Mathijs Dierichs , Sjoerd Donders , Christiaan Hoogendam , Hans Jansen , Erik Loopstra , Jeroen Johannes Mertens , Johannes Mulkens , Ronald Severijns , Sergei Shulepov , Herman Boom , Timotheus Sengers
发明人： Bod Streefkerk , Johannes Baselmans , Richard Bruls , Marcel Mathijs Dierichs , Sjoerd Donders , Christiaan Hoogendam , Hans Jansen , Erik Loopstra , Jeroen Johannes Mertens , Johannes Mulkens , Ronald Severijns , Sergei Shulepov , Herman Boom , Timotheus Sengers
IPC分类号： H01L21/027 , B05D3/12 , G03F7/20
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70908 , G03F7/70958
摘要： An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
摘要翻译：公开了一种浸没式光刻投影装置，其中液体设置在装置的投影系统和基板之间。为了防止在液体中形成气泡，有助于减少与液体接触后的元件上的残留物，就可以在设备的各种元件上使用液体和液体两层。

12. 发明申请

US20070247605A1 Optical element for correction of aberration, and a lithographic apparatus comprising same 有权
标题翻译：用于校正像差的光学元件，以及包括其的光刻设备
公开(公告)号：US20070247605A1
公开(公告)日：2007-10-25
申请号：US11410282
申请日：2006-04-25
申请人： Erik Loopstra , Paul Graupner , Johannes Mulkens
发明人： Erik Loopstra , Paul Graupner , Johannes Mulkens
IPC分类号： G03B27/52
CPC分类号： G03B27/52 , G02B27/0068 , G03F7/70266
摘要： An optical element for correcting aberrations in an optical apparatus has a casing. The casing is filled with liquid and has a support layer and a cover layer designed to pass light of a predetermined wavelength range. The casing accommodates several actuators. Each actuator has a first end supporting the cover layer and a second end supporting the support layer. Each actuator is able to locally change a local distance between the support layer and the cover layer to correct for local aberrations in a light beam directed to the optical element by providing local phase shifts. The optical element may be used in a lithographic apparatus.
摘要翻译：用于校正光学装置中的像差的光学元件具有壳体。壳体充满液体并具有支撑层和设计成使预定波长范围的光通过的覆盖层。外壳容纳几个执行器。每个致动器具有支撑覆盖层的第一端和支撑支撑层的第二端。每个致动器能够局部地改变支撑层和覆盖层之间的局部距离，以通过提供局部相移来校正指向光学元件的光束中的局部像差。光学元件可以用在光刻设备中。

13. 发明申请

US20070216881A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20070216881A1
公开(公告)日：2007-09-20
申请号：US11377636
申请日：2006-03-17
申请人： Harmen Van Der Schoot , Erik Loopstra , Fransicus Jacobs , Godfried Franciscus Geelen
发明人： Harmen Van Der Schoot , Erik Loopstra , Fransicus Jacobs , Godfried Franciscus Geelen
IPC分类号： G03B27/42
CPC分类号： G03B27/42 , G03F7/70341 , G03F7/70716 , G03F7/70733
摘要： A moveable member is provided which extends the top surface of a substrate table, in plan, beyond a bumper which protects the substrate table during collision. The moveable member may be retracted to a retracted position in which it no longer extends beyond the bumper. In this way it is possible to move two substrate tables together and to allow the retractable member to pass under a liquid supply system which normally provides liquid between the projection system and a substrate without turning off of the liquid supply system.
摘要翻译：提供了可移动构件，其以平面方式延伸衬底台的顶表面超过在碰撞期间保护衬底台的保险杠。可移动构件可以缩回到缩回位置，在缩回位置，其不再延伸超过保险杠。以这种方式，可以将两个基板台移动到一起，并允许可伸缩构件在液体供应系统之下通过，该液体供应系统通常在投影系统和基板之间提供液体而不关闭液体供应系统。

14. 发明申请

US20070139629A1 Lithographic apparatus and method for manufacturing a device 有权
标题翻译：光刻设备及其制造方法
公开(公告)号：US20070139629A1
公开(公告)日：2007-06-21
申请号：US11312660
申请日：2005-12-21
申请人： Timotheus Sengers , Nicolaas Johannes Van Asten , Wilhelmus Box , Tjarko Van Empel , Leon Levasier , Erik Loopstra , Marcel Hubertus Muitjens , Luberthus Ouwehand , Leon Van Den Schoor , Marcel Beckers , Rob Jansen , Elke Van Loenhout
发明人： Timotheus Sengers , Nicolaas Johannes Van Asten , Wilhelmus Box , Tjarko Van Empel , Leon Levasier , Erik Loopstra , Marcel Hubertus Muitjens , Luberthus Ouwehand , Leon Van Den Schoor , Marcel Beckers , Rob Jansen , Elke Van Loenhout
IPC分类号： G03B27/42
CPC分类号： G03F7/70883 , G03F7/7075 , G03F7/70858 , G03F9/7011 , G03F9/7034
摘要： A lithographic apparatus is disclosed. The apparatus includes a substrate table constructed to hold a substrate. The substrate table is moveable to transfer the substrate between a substrate measuring position and a substrate processing position. The apparatus also includes a measuring system configured to measure at least one aspect or characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is configured to direct at least one measuring beam and/or field towards a surface of the substrate. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate when the substrate table holds the substrate in the substrate processing position, and a conditioning system is configured to supply a conditioning fluid to at least part of a path of the measuring beam and/or field of the measuring system to condition the part of the path.
摘要翻译：公开了一种光刻设备。该装置包括构造成保持基板的基板台。衬底台可移动以在衬底测量位置和衬底处理位置之间传送衬底。该装置还包括测量系统，其被配置为当衬底台将衬底保持在测量位置时，测量衬底的至少一个方面或特征。测量系统被配置为将至少一个测量光束和/或场朝向衬底的表面引导。投影系统被配置为当衬底台将衬底保持在衬底处理位置时将图案化的辐射束投射到衬底的目标部分上，并且调节系统被配置为将调节流体提供给至少部分路径测量系统的测量光束和/或场来调节路径的一部分。

15. 发明申请

US20060280829A1 Imprint lithography 有权
标题翻译：印刷光刻
公开(公告)号：US20060280829A1
公开(公告)日：2006-12-14
申请号：US11150465
申请日：2005-06-13
申请人： Yvonne Kruijt-Stegeman , Aleksey Kolesnychenko , Erik Loopstra , Johan Dijksman , Helmar Santen , Sander Wuister
发明人： Yvonne Kruijt-Stegeman , Aleksey Kolesnychenko , Erik Loopstra , Johan Dijksman , Helmar Santen , Sander Wuister
IPC分类号： B28B11/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A lithographic apparatus is disclosed that has an imprint template or a template holder configured to hold an imprint template, and a substrate table arranged to receive a substrate, the apparatus further comprising walls which together with the substrate table and the imprint template or the template holder, are configured to form an enclosed space which is substantially sealed from a surrounding area.
摘要翻译：公开了一种光刻设备，其具有构造成保持压印模板的压印模板或模板保持器，以及布置成接收衬底的衬底台，该设备还包括与衬底台和压印模板或模板保持器一起的壁被构造成形成从周围区域基本密封的封闭空间。

16. 发明申请

US20060266244A1 Imprint lithography 有权
标题翻译：印刷光刻
公开(公告)号：US20060266244A1
公开(公告)日：2006-11-30
申请号：US11139991
申请日：2005-05-31
申请人： Yvonne Kruijt-Stegeman , Aleksey Kolensnychenko , Helmar Santen , Erik Loopstra
发明人： Yvonne Kruijt-Stegeman , Aleksey Kolensnychenko , Helmar Santen , Erik Loopstra
IPC分类号： B41F1/34
CPC分类号： B41F1/34 , B41F1/18 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/00 , G03F9/7042 , G03F9/7084 , H05K1/0269 , H05K3/0008 , H05K2201/09918 , H05K2203/0108
摘要： An imprint lithography apparatus is disclosed that has a substrate table configured to hold a substrate, a template holder configured to hold an imprint template, the imprint template or the template holder having a template alignment mark configured to be imprinted onto the substrate table or onto a substrate to form an imprinted alignment mark, the imprint template having a functional pattern, and the template alignment mark and the functional pattern having a known spatial relationship, and an alignment sensor configured to determine the location of the imprinted alignment mark.
摘要翻译：公开了一种压印光刻设备，其具有被配置为保持基板的基板台，配置成保持压印模板的模板保持器，压印模板或模板保持器，其具有被配置为印刷到基板台上的模板对准标记基板以形成压印的对准标记，所述印模模板具有功能图案，并且所述模板对准标记和所述功能图案具有已知的空间关系，以及对准传感器，其被配置为确定所述打印的对准标记的位置。

17. 发明授权

US07136214B2 Active faceted mirror system for lithography 有权
标题翻译：用于光刻的主动分面镜系统
公开(公告)号：US07136214B2
公开(公告)日：2006-11-14
申请号：US10986076
申请日：2004-11-12
申请人： Erik Loopstra , Stephen Roux
发明人： Erik Loopstra , Stephen Roux
IPC分类号： G02B26/00
CPC分类号： G02B27/0977 , G02B7/1827 , G02B27/0905 , G03F7/70116 , G03F7/702 , G03F7/70291
摘要： An active faceted mirror system is disclosed. The active faceted mirror system includes a set of active facet mirror devices, a base plate and a set of pins for mounting the active facet mirror devices to the base plate. Each of the active facet mirror devices includes a mirror substrate with a reflective surface and a bearing hole on the reverse side for mounting. Additionally, each of the active facet mirror devices includes at least three actuator targets located on the back side of the mirror substrate, a jewel bearing and a flexure for supporting the mirror substrate. The base plate includes a series of bearing holes for mounting the active facet mirror devices and at least three actuators for each of the active facet mirror devices. A set of facet controllers located on the base plate can be used to control the positioning of the active facet mirror devices to produce a desired illumination effect.
摘要翻译：公开了一种主动刻面镜系统。主动分面镜系统包括一组主动分面镜装置，底板和一组用于将活动小面镜装置安装到基板的销。每个活性刻面镜装置包括具有反射表面的反射镜基板和用于安装的反面上的轴承孔。此外，每个活动刻面镜装置包括位于镜基板背面的至少三个致动器目标，宝石轴承和用于支撑镜面基板的挠曲件。基板包括用于安装主动分面镜装置的一系列轴承孔和用于每个主动分面镜装置的至少三个致动器。可以使用位于基板上的一组小面控制器来控制活动小面镜装置的定位以产生期望的照明效果。

18. 发明申请

US20060077372A1 Correcting variations in the intensity of light within an illumination field without distorting the telecentricity of the light 有权
标题翻译：校正照明场中光强度的变化，而不会使光的远心变形
公开(公告)号：US20060077372A1
公开(公告)日：2006-04-13
申请号：US10962550
申请日：2004-10-13
申请人： Stephen Roux , Erik Loopstra , Michael Nelson
发明人： Stephen Roux , Erik Loopstra , Michael Nelson
IPC分类号： G03B27/72
CPC分类号： G03F7/70558 , G03F7/70066
摘要： An apparatus for changing an aggregate intensity of a light within an illumination field of a photolithography system comprising a blade structure and a first actuator. The blade structure is configured to be positioned along an optical path of the photolithography system between an illumination system of the photolithography system and a reticle stage of the photolithography system so that, when the illumination system provides the light having the illumination field, the blade structure is substantially at a center of the illumination field and a first portion of the light within the illumination field impinges upon the blade structure. The blade structure is either translucent to a wavelength of the light or opaque to the wavelength. The first portion of the light has a first area. The first actuator is coupled between a first portion of the blade structure and a frame of the photolithography system and is configured to move at least the first portion of the blade structure in a first direction so that, when the illumination system provides the light having the illumination field, a second portion of the light within the illumination field impinges upon the blade structure. The second portion of the light has a second area. The second area is different from the first area.
摘要翻译：一种用于改变包括叶片结构和第一致动器的光刻系统的照明场内的光聚集强度的装置。刀片结构被配置为沿着光刻系统的光路定位在光刻系统的照明系统和光刻系统的光罩台之间，使得当照明系统提供具有照明场的光时，叶片结构基本上在照明场的中心，并且照明场内的光的第一部分撞击在叶片结构上。叶片结构对于光的波长是半透明的或对于波长是不透明的。光的第一部分具有第一区域。第一致动器耦合在叶片结构的第一部分和光刻系统的框架之间，并且构造成在第一方向上至少移动叶片结构的第一部分，使得当照明系统提供具有照明场，照明场内的光的第二部分照射在叶片结构上。光的第二部分具有第二区域。第二个区域与第一个区域不同。

19. 发明申请

US20060023194A1 Lithographic apparatus and method for calibrating the same 有权
标题翻译：平版印刷设备及其校准方法
公开(公告)号：US20060023194A1
公开(公告)日：2006-02-02
申请号：US10899295
申请日：2004-07-27
申请人： Erik Loopstra , Leon Levasier , Rene Oesterholt
发明人： Erik Loopstra , Leon Levasier , Rene Oesterholt
IPC分类号： G03B27/58
CPC分类号： G03F7/70775 , G03F7/70458 , G03F7/70516 , G03F9/7011 , G03F9/7019
摘要： Lithographic apparatus includes a substrate table and a motion control system for controlling a movement of the substrate table. The motion control system includes at least 3 position detectors constructed for detecting a position of the substrate table. For measuring a position and orientation of the substrate table, each position detector comprises an optical encoder of a single dimensional or multi dimensional type, the optical encoders being arranged for providing together at least 6 position values, at least one position value being provided for each of the 3 dimensions. 3 or more of the at least 3 optical encoders being connected to the substrate table at different locations in the 3 dimensional coordinate system. The motion control system is arranged to calculate the position of the substrate table in the 3 dimensional coordinate system from a subset of at least 3 of the 6 position values and to calculate an orientation of the substrate table with respect to the coordinate system from another subset of at least 3 of the 6 position values. Further, a method for calibrating the position detectors is described.
摘要翻译：光刻设备包括用于控制衬底台的移动的衬底台和运动控制系统。运动控制系统包括构造用于检测衬底台的位置的至少3个位置检测器。为了测量衬底台的位置和取向，每个位置检测器包括一维或多维类型的光学编码器，光学编码器被布置为一起提供至少6个位置值，为每个位置值提供至少一个位置值的三维。所述至少3个光学编码器中的3个或更多个在所述三维坐标系中的不同位置连接到所述基板台。运动控制系统被布置为从6个位置值中的至少3个的子集计算三维坐标系中的衬底台的位置，并且从另一个子集计算相对于坐标系的衬底台的取向至少6个位置值中的3个。此外，描述了用于校准位置检测器的方法。

20. 发明申请

US20060017894A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060017894A1
公开(公告)日：2006-01-26
申请号：US10896000
申请日：2004-07-22
申请人： Tjarko Adriaan Van Empel , Erik Loopstra , Antonius Van Der Net , Yuri Johannes Van De Vijver , Bernhard Gellrich , Bauke Jansen , Rens Sanderse
发明人： Tjarko Adriaan Van Empel , Erik Loopstra , Antonius Van Der Net , Yuri Johannes Van De Vijver , Bernhard Gellrich , Bauke Jansen , Rens Sanderse
IPC分类号： G03B27/52
CPC分类号： G03F7/70933 , G03F7/70908
摘要： A lithographic apparatus is disclosed. The apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system includes a housing and a plurality of optical elements arranged in the housing. The apparatus also includes an inlet for feeding conditioned gas to the housing and a gas exhaust for exhausting the conditioned gas from the housing for providing a gas conditioned environment in the housing. At least one gate is provided for providing communication of the gas conditioned environment with ambient atmosphere. The gate is arranged to provide a predetermined leakage of the conditioned gas to the ambient atmosphere.
摘要翻译：公开了一种光刻设备。该装置包括投影系统，其配置成将图案化的辐射束投影到基板的目标部分上。投影系统包括壳体和布置在壳体中的多个光学元件。该设备还包括用于将调节气体供给到壳体的入口和用于从壳体排出调节气体的排气口，以在壳体中提供气体调节环境。提供至少一个门，用于提供气体环境与环境气氛的通信。门被设置成将经调节的气体预定的泄漏提供给环境大气。

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