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11. 发明授权

US5189084A Process for incorporating o-hydroxyphenyl-s-triazines in organic polymers 失效
标题翻译：在有机聚合物中加入邻羟基苯基-s-三嗪的方法
公开(公告)号：US5189084A
公开(公告)日：1993-02-23
申请号：US841907
申请日：1992-02-26
申请人： Jean-Luc Birbaum , Jean Rody , Mario Slongo , Andreas Valet
发明人： Jean-Luc Birbaum , Jean Rody , Mario Slongo , Andreas Valet
IPC分类号： C07D251/24 , C08F8/30 , C08F246/00
CPC分类号： C07D251/24 , C08F246/00 , C08F8/30 , C08F2800/20
摘要： o-Hydroxyohenyl-s-triazines containing suitable functional groups are incorporated in polymers by copolymerisation, copolycondensation, copolyaddition or by polymer-analogous reaction. The modified polymers so obtained have excellent stability to degradation induced by light, oxygen and heat. They can also be used as stabilisers.
摘要翻译：含有合适官能团的邻羟基苯基-s-三嗪通过共聚，共缩聚，共聚加成或通过聚合物 - 类似反应引入聚合物中。如此获得的改性聚合物对由光，氧和热引起的降解具有优异的稳定性。它们也可以用作稳定剂。

12. 发明授权

US5376710A Compositions stabilized by o-hydroxyphenyl-1,3,5-triazines and sterically hindered amines 失效
标题翻译：由邻羟基苯基-1,3,5-三嗪和空间位阻胺稳定的组合物
公开(公告)号：US5376710A
公开(公告)日：1994-12-27
申请号：US29213
申请日：1993-03-10
申请人： Mario Slongo , Jean-Luc Birbaum , Jean Rody , Andreas Valet
发明人： Mario Slongo , Jean-Luc Birbaum , Jean Rody , Andreas Valet
IPC分类号： C07D491/113 , C07D401/12 , C07D401/14 , C07D471/10 , C07D491/22 , C07D498/10 , C08K5/3477 , C08K5/3492 , C08K5/35 , C08K5/353 , C09D7/12 , C08K5/34
CPC分类号： C07D401/12 , C07D401/14 , C08K5/34926 , C09D7/1241
摘要： Compounds which comprise at least one group of the formula I or II ##STR1## and at least one polyalkylpiperidine group of the formula III ##STR2## in which R and R.sub.1 to R.sub.6 have the meaning indicated in claim 1, are effective stabilizers for organic materials against damage by light, oxygen and heat.
摘要翻译：包含至少一种式I或II（I）的化合物（II）和至少一种式III（III）的聚烷基哌啶基团，其中R和R 1至R 6具有权利要求1中所示的含义是有机材料的有效稳定剂，以防止光，氧和热的损害。

13. 发明授权

US06608122B1 Stabilized organic material 有权
标题翻译：稳定有机材料
公开(公告)号：US06608122B1
公开(公告)日：2003-08-19
申请号：US09679777
申请日：2000-10-05
申请人： Jean-Luc Birbaum , Jean Rody , Mario Slongo , Andreas Valet , Roland A. E. Winter
发明人： Jean-Luc Birbaum , Jean Rody , Mario Slongo , Andreas Valet , Roland A. E. Winter
IPC分类号： C08K534
CPC分类号： C07D405/12 , C07D251/24 , C07F9/6521 , C08K5/3435 , C08K5/3492 , C08K5/34926 , C09D7/48
摘要： o-Hydroxyphenyl-s-triazines of the formula I in which n is 1 to 4 and R1 to R7 are as defined in claim 1, can be used, in combination with sterically hindered amines of the polyalkylpiperidine type, for stabilizing organic polymers. Some of these compounds are novel and can also be used without polyalkylpiperidine.
摘要翻译： n为1至4且R 1至R 7如权利要求1所定义的式Iin的邻羟基苯基-s-三嗪可与聚烷基哌啶类型的空间位阻胺一起用于稳定有机聚合物。这些化合物中的一些是新的，也可以不使用聚烷基哌啶来使用。

14. 发明授权

US5736597A Stabilized organic material 失效
标题翻译：稳定有机材料
公开(公告)号：US5736597A
公开(公告)日：1998-04-07
申请号：US143525
申请日：1993-10-26
申请人： Jean-Luc Birbaum , Jean Rody , Mario Slongo , Andreas Valet , Roland A. E. Winter
发明人： Jean-Luc Birbaum , Jean Rody , Mario Slongo , Andreas Valet , Roland A. E. Winter
IPC分类号： C07D251/24 , C07D405/12 , C07F9/6521 , C08K5/3435 , C08K5/3492 , C09D7/12 , C08K5/34
CPC分类号： C07D405/12 , C07D251/24 , C07F9/65212 , C08K5/3435 , C08K5/3492 , C09D7/1241 , C08K5/34926
摘要： o-Hydroxyphenyl-s-triazines of the formula I ##STR1## in which n is 1 to 4 and R.sub.1 to R.sub.7 are as defined in claim 1, can be used, in combination with sterically hindered amines of the polyalkylpiperidine type, for stabilizing organic polymers. Some of these compounds are novel and can also be used without polyalkylpiperidine.
摘要翻译：其中n为1至4且R 1至R 7如权利要求1中所定义的式I的O-羟基苯基-s-三嗪可与聚烷基哌啶类型的空间位阻胺一起用于稳定化有机聚合物。这些化合物中的一些是新的，也可以不使用聚烷基哌啶来使用。

15. 发明授权

US5502189A Compounds formed from o-hydroxyphenyl-1,3,5-triazines and sterically hindered amines 失效
标题翻译：由邻羟基苯基-1,3,5-三嗪和空间位阻胺形成的化合物
公开(公告)号：US5502189A
公开(公告)日：1996-03-26
申请号：US319835
申请日：1994-10-06
申请人： Mario Slongo , Jean-Luc Birbaum , Jean Rody , Andreas Valet
发明人： Mario Slongo , Jean-Luc Birbaum , Jean Rody , Andreas Valet
IPC分类号： C07D491/113 , C07D401/12 , C07D401/14 , C07D471/10 , C07D491/22 , C07D498/10 , C08K5/3477 , C08K5/3492 , C08K5/35 , C08K5/353 , C09D7/12 , C07D251/24
CPC分类号： C07D401/12 , C07D401/14 , C08K5/34926 , C09D7/1241
摘要： Compounds which comprise at least one group of the formula I or II ##STR1## and at least one polyalkylpiperidine group of the formula III ##STR2## in which R and R.sub.1 to R.sub.6 have the meaning indicated in claim 1, are effective stabilisers for organic materials against damage by light, oxygen and heat.
摘要翻译：包含至少一种式I或II（I）的化合物（II）和至少一种式III（III）的聚烷基哌啶基团，其中R和R 1至R 6具有权利要求1中所示的含义是有机材料的有效稳定剂，以防止光，氧和热的损害。

16. 发明授权

US08012672B2 Sulphonium salt photoinitiators 有权
标题翻译：锍盐光引发剂
公开(公告)号：US08012672B2
公开(公告)日：2011-09-06
申请号：US12442823
申请日：2007-09-24
申请人： Pascal Hayoz , Jean-Luc Birbaum , Stephan Ilg
发明人： Pascal Hayoz , Jean-Luc Birbaum , Stephan Ilg
IPC分类号： C07C381/12 , G03F7/004 , G03F7/039 , G03C1/73
CPC分类号： C07C381/12 , B33Y70/00 , B33Y80/00 , C07C2601/14 , C08K5/375 , C09D7/63 , G03F7/0045 , G03F7/038
摘要： Compounds of the formula (I), wherein L1, L2, L3 and L4 independently of one another are hydrogen or an organic substituent; R is for example C1-C20alkyl, C5-C12cycloalkyl, C2-C20alkenyl, substituted C1-C20alkyl; X is O, S, NRa or NCORa; Ra is for example hydrogen or C1-C20alkyl; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.
摘要翻译：式（I）的化合物，其中L1，L2，L3和L4彼此独立地是氢或有机取代基; R是例如C 1 -C 20烷基，C 5 -C 12环烷基，C 2 -C 20烯基，取代的C 1 -C 20烷基; X为O，S，NRa或NCORa; R a是例如氢或C 1 -C 20烷基; Y为无机或有机阴离子; 适合作为光潜酸产生剂。

17. 发明授权

US07901867B2 Sulphonium salt initiators 有权
标题翻译：锍盐引发剂
公开(公告)号：US07901867B2
公开(公告)日：2011-03-08
申请号：US11922444
申请日：2006-06-21
申请人： Jean-Pierre Wolf , Attila Latika , Jean-Luc Birbaum , Stephan Ilg , Pascal Hayoz
发明人： Jean-Pierre Wolf , Attila Latika , Jean-Luc Birbaum , Stephan Ilg , Pascal Hayoz
IPC分类号： G03F7/004 , G03F7/30 , C07C381/12
CPC分类号： C07D209/88 , B33Y70/00 , C07C309/06 , C07C381/12 , G03F7/0045 , G03F7/038 , Y10S430/122
摘要： Compounds of the formula (I), (II), (III), (IV) and wherein, R is hydrogen, C1-C20alkyl; C2-C20alkyl interrupted by one or more O; is -L-X—R2 or -L-R2; R1 has for example one of the meanings as given for R; R2 is a monovalent sensitizer or photoinitiator moiety; Ar1 and Ar2 for example independently of one another are phenyl substituted by C1-C20alkyl, halogen or OR3; or are unsubstituted naphthyl, anthryl, phenanthryl or biphenylyl; or are naphthyl, anthryl, phenanthryl or biphenylyl substituted by C1-C20alkyl, OH or OR3; or are —Ar4-A-Ar3; Ar3 is unsubstituted phenyl naphthyl, anthryl, phenanthryl or biphenylyl; or is phenyl, naphthyl, anthryl, phenanthryl or biphenylyl substituted by C1-C20alkyl, OR3 or benzoyl; Ar4 is phenylene, naphthylene, anthrylene or phenanthrylene; A is a direct bond, S, O or C1-C20alkylene; X is CO, C(O)O, OC(O), O, S or NR3; L is C1-C20alkylene or C2-C20alkylene interrupted by one or more O; R3 is C1-C20alkyl or C1-C20hydroxyalkyl; and Y is an anion, are suitable as photolatent acid generators.
摘要翻译：式（I），（II），（III），（IV）的化合物，其中R是氢，C 1 -C 20烷基; 被一个或多个O中断的C 2 -C 20烷基; 是-L-X-R2或-L-R2; R1具有例如R给出的含义之一; R2是单价敏化剂或光引发剂部分; Ar 1和Ar 2例如彼此独立地是被C 1 -C 20烷基，卤素或OR 3取代的苯基; 或未取代的萘基，蒽基，菲基或联苯基; 或被C 1 -C 20烷基，OH或OR 3取代的萘基，蒽基，菲基或联苯基; 或为-Ar4-A-Ar3; Ar 3是未取代的苯基萘基，蒽基，菲基或联苯基; 或由C 1 -C 20烷基，OR 3或苯甲酰基取代的苯基，萘基，蒽基，菲基或联苯基; Ar4是亚苯基，亚萘基，亚蒽基或菲基; A是直接键合，S，O或C1-C20亚烷基; X是CO，C（O）O，OC（O），O，S或NR 3; L是被一个或多个O中断的C 1 -C 20亚烷基或C 2 -C 20亚烷基; R3是C1-C20烷基或C1-C20羟烷基; 并且Y是阴离子，适合作为光潜酸产生剂。

18. 发明授权

US06512020B1 Oxime derivatives and the use thereof as latent acids 有权
标题翻译：肟衍生物及其作为潜伏酸的用途
公开(公告)号：US06512020B1
公开(公告)日：2003-01-28
申请号：US09820115
申请日：2001-03-28
申请人： Toshikage Asakura , Hitoshi Yamato , Masaki Ohwa , Jean-Luc Birbaum , Kurt Dietliker , Junichi Tanabe
发明人： Toshikage Asakura , Hitoshi Yamato , Masaki Ohwa , Jean-Luc Birbaum , Kurt Dietliker , Junichi Tanabe
IPC分类号： C08J328
CPC分类号： G03F7/0045 , B33Y70/00 , C07C251/62 , C07C309/00 , C07C309/65 , C07C317/32 , C07C323/47 , C07C381/00 , C07C2602/42 , C07D319/18 , C07D333/22
摘要： Compounds of formula I, II and III, wherein wherein R1 is for example hydrogen, C1-C12alkyl, C3-C30cycloalkyl, C2-C12alkenyl, C4-C8cycloalkenyl, phenyl, which is unsubstituted or substituted, naphthyl, anthracyl or phenanthryl, unsubstituted or substituted, heteroaryl radical which is unsubstituted or substituted; wherein all radicals R1 with the exception of hydrogen can additionally be substituted by a group having a —O—C-bond or a —O—Si-bond which cleaves upon the action of an acid; R′1 is for example phenylene, naphthylene, diphenylene or oxydiphenylene, wherein these radicals are unsubstituted or substituted; R2 is halogen or C1-C10haloalkyl; R3 is for example C1-C18alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, wherein the groups are unsubstituted or substituted, or R3 is e.g. C2-C6haloalkanoyl, or halobenzoyl, R′3 is for example phenylenedisulfonyl, naphthylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl, wherein these radicals are unsubstituted or substituted, X is halogen; are especially suitable as photosensitive acid-donors in chemically amplified resist formulations.
摘要翻译：式I，II和III的化合物，其中R1是例如氢，C1-C12烷基，C3-C30环烷基，C2-C12链烯基，C4-C8环烯基，苯基，未取代或取代的萘基，蒽基或菲基，未取代或取代的，未取代或取代的杂芳基; 其中除氢之外的所有基团R1可以另外被具有在酸作用下切割的-O-C键或-O-Si键的基团取代; R'1是例如亚苯基，亚萘基，亚二苯基或氧联二苯基，其中这些基团是未取代的或被取代的; R2是卤素或C1-C10卤代烷基; R3是例如C1-C18烷基磺酰基，苯基磺酰基，萘基磺酰基，蒽磺酰基或菲基磺酰基，其中基团是未取代的或被取代的，或者R3是例如。 C 2 -C 6卤代烷酰基或卤代苯甲酰基，R'3是例如亚苯基二磺酰基，萘基二磺酰基，二苯基二磺酰基或氧基二苯基二磺酰基，其中这些基团是未取代的或被取代的，X是卤素; 在化学放大抗蚀剂配方中特别适合用作光敏酸供体。

19. 发明授权

US06485886B1 Oxime derivatives and the use thereof as latent acids 失效
标题翻译：肟衍生物及其作为潜伏酸的用途
公开(公告)号：US06485886B1
公开(公告)日：2002-11-26
申请号：US09830248
申请日：2001-04-24
申请人： Hitoshi Yamato , Toshikage Asakura , Jean-Luc Birbaum , Kurt Dietliker
发明人： Hitoshi Yamato , Toshikage Asakura , Jean-Luc Birbaum , Kurt Dietliker
IPC分类号： G03C173
CPC分类号： C07C255/64 , B33Y70/00 , C07D333/36 , Y10S430/114 , Y10S430/117 , Y10S430/12
摘要： New oxime derivatives of formula (I) or. (II), wherein m is 0 or 1; R1 inter alia is phenyl, naphthyl, anthracyl, phenanthryl or a heteroaryl radical; R′1 is for example C2-C12alkylene, phenylene, naphthylene; R2 is CN; R3 is C2-C6haloalkanoyl, halobenzoyl, a phosphoryl or an organosilyl group; R4, R5, R10 and R11 inter alia are hydrogen, C1-C6alkyl, C1-C6alkoxy; R6 inter alia is hydrogen phenyl, C1-C12alkyl; R7 and R8 inter alia are hydrogen, C1-C12alkyl; or R7 and R8, together with the nitrogen atom to which they are bonded, form a 5-, 6 or 7-membered ring; R9 is for example C1-C12alkyl; and A inter alia is S, O, NR7a; are useful as latent acids, especially in photoresist applications.
摘要翻译：式（I）的新肟衍生物或。（II），其中m为0或1; R1特别是苯基，萘基，蒽基，菲基或杂芳基; R'1例如为C 2 -C 12亚烷基，亚苯基，亚萘基; R2为CN; R3是C2-C6卤代烷酰基，卤代苯甲酰基，磷酰基或有机甲硅烷基; R4，R5，R10和R11尤其是氢，C1-C6烷基，C1-C6烷氧基; R6尤其是氢苯基，C1-C12烷基; R 7和R 8尤其是氢，C 1 -C 12烷基; 或R 7和R 8与它们所键合的氮原子一起形成5-，6-或7-元环; R 9为例如C 1 -C 12烷基; A特别是S，O，NR7a; 可用作潜酸，特别是在光致抗蚀剂中。

20. 发明申请

US20090208872A1 Sulphonium Salt Initiators 有权
标题翻译：锍盐引发剂
公开(公告)号：US20090208872A1
公开(公告)日：2009-08-20
申请号：US11922444
申请日：2006-06-21
申请人： Jean-Pierre Wolf , Attila Latika , Jean-Luc Birbaum , Stephan Ilg , Pascal Hayoz
发明人： Jean-Pierre Wolf , Attila Latika , Jean-Luc Birbaum , Stephan Ilg , Pascal Hayoz
IPC分类号： G03F7/20 , G03F7/004 , C07D209/88 , C07C321/30
CPC分类号： C07D209/88 , B33Y70/00 , C07C309/06 , C07C381/12 , G03F7/0045 , G03F7/038 , Y10S430/122
摘要： Compounds of the formula (I), (II), (III), (IV) and wherein, R is hydrogen, C1-C20alkyl; C2-C20alkyl interrupted by one or more O; is -L-X—R2 or -L-R2; R1 has for example one of the meanings as given for R; R2 is a monovalent sensitizer or photoinitiator moiety; Ar1 and Ar2 for example independently of one another are phenyl substituted by C1-C20alkyl, halogen or OR3; or are unsubstituted naphthyl, anthryl, phenanthryl or biphenylyl; or are naphthyl, anthryl, phenanthryl or biphenylyl substituted by C1-C20alkyl, OH or OR3; or are —Ar4-A-Ar3; Ar3 is unsubstituted phenyl naphthyl, anthryl, phenanthryl or biphenylyl; or is phenyl, naphthyl, anthryl, phenanthryl or biphenylyl substituted by C1-C20alkyl, OR3 or benzoyl; Ar4 is phenylene, naphthylene, anthrylene or phenanthrylene; A is a direct bond, S, O or C1-C20alkylene; X is CO, C(O)O, OC(O), O, S or NR3; L is C1-C20alkylene or C2-C20alkylene interrupted by one or more O; R3 is C1-C20alkyl or C1-C20hydroxyalkyl; and Y is an anion, are suitable as photolatent acid generators.
摘要翻译：式（I），（II），（III），（IV）的化合物，其中R是氢，C 1 -C 20烷基; 被一个或多个O中断的C 2 -C 20烷基; 是-L-X-R2或-L-R2; R1具有例如R给出的含义之一; R2是单价敏化剂或光引发剂部分; Ar 1和Ar 2例如彼此独立地是被C 1 -C 20烷基，卤素或OR 3取代的苯基; 或未取代的萘基，蒽基，菲基或联苯基; 或被C 1 -C 20烷基，OH或OR 3取代的萘基，蒽基，菲基或联苯基; 或为-Ar4-A-Ar3; Ar 3是未取代的苯基萘基，蒽基，菲基或联苯基; 或由C 1 -C 20烷基，OR 3或苯甲酰基取代的苯基，萘基，蒽基，菲基或联苯基; Ar4是亚苯基，亚萘基，亚蒽基或菲基; A是直接键合，S，O或C1-C20亚烷基; X是CO，C（O）O，OC（O），O，S或NR 3; L是被一个或多个O中断的C1-C20亚烷基或C2-C20亚烷基; R3是C1-C20烷基或C1-C20羟烷基; 并且Y是阴离子，适合作为光潜酸产生剂。

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