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11. 发明授权

US08563206B2 Developer, development device, image forming device and method of forming developer 有权
标题翻译：显影剂，显影装置，成像装置和显影剂的形成方法
公开(公告)号：US08563206B2
公开(公告)日：2013-10-22
申请号：US13221008
申请日：2011-08-30
申请人： Yuki Matsuura
发明人： Yuki Matsuura
IPC分类号： G03G9/08
CPC分类号： G03G21/1814 , G03G9/0827 , G03G9/09708 , G03G9/09725 , G03G9/09733 , G03G9/0975
摘要： A negatively chargeable developer includes: negatively chargeable toner mother particles including at least binding resin and colorant; and an external additive that is externally added to a surface of the toner mother particles, wherein the external additive includes polymethyl methacrylate that is within a range from approximately 0.4 parts by weight to approximately 0.8 parts by weight inclusive per 100 parts by weight of the toner mother particles and that has positive chargeability.
摘要翻译：负电荷显影剂包括：至少包含结合树脂和着色剂的带负电荷的调色剂母粒; 和外部添加剂，其外部添加到调色剂母粒子的表面，其中外部添加剂包括聚对甲基丙烯酸甲酯，其在约每100重量份调色剂约0.4重量份至约0.8重量份的范围内母粒，具有正带电性。

12. 发明授权

US07917068B2 Developing device and image forming apparatus 有权
标题翻译：显影装置和图像形成装置
公开(公告)号：US07917068B2
公开(公告)日：2011-03-29
申请号：US12216748
申请日：2008-07-10
申请人： Yuki Matsuura
发明人： Yuki Matsuura
IPC分类号： G03G15/08
CPC分类号： G03G15/0818
摘要： A developing device is disposed facing an image bearing body that bears a latent image. The developing device includes a developer bearing body that bears a developer for developing the latent image. The developer includes mother particles and external additives. A liberation amount T (weight parts) of the external additives liberated from the mother particles with respect to 100 weight parts of the mother particles, a surface roughness Rz (m) of the developer bearing body, and a circumferential speed Vd (mm/s) of the developer bearing body satisfy the following relationships: 1.326×10−1≦T≦2.142×10−1 (weight parts), 7.1×10−6≦Rz≦15.0×10−6 (m), 161.5≦Vd≦189.2 (mm/s), and 4.98×10−6≦(T×Rz/Vd)≦1.99×10−5 (s).
摘要翻译：显影装置被设置为面向承载潜像的图像承载体。显影装置包括承载用于显影潜像的显影剂的显影剂承载体。显影剂包括母体颗粒和外部添加剂。从母粒子释放的外部添加剂相对于100重量份母粒子的释放量T（重量份），显影剂承载体的表面粗糙度Rz（μm）和圆周速度Vd（mm / s ）满足以下关系：1.326×10-1＆nlE; T＆nlE; 2.142×10-1（重量份），7.1×10-6＆amp; NlE; Rz＆amp; N1; 15.0×10-6（m），161.5＆ ; 189.2（mm / s），4.98×10-6＆nlE;（T×Rz / Vd）＆nlE; 1.99×10-5（s）。

13. 发明申请

US20090016782A1 Developing device and image forming apparatus 有权
标题翻译：显影装置和图像形成装置
公开(公告)号：US20090016782A1
公开(公告)日：2009-01-15
申请号：US12216748
申请日：2008-07-10
申请人： Yuki Matsuura
发明人： Yuki Matsuura
IPC分类号： G03G15/08
CPC分类号： G03G15/0818
摘要： A developing device is disposed facing an image bearing body that bears a latent image. The developing device includes a developer bearing body that bears a developer for developing the latent image. The developer includes mother particles and external additives. A liberation amount T (weight parts) of the external additives liberated from the mother particles with respect to 100 weight parts of the mother particles, a surface roughness Rz (m) of the developer bearing body, and a circumferential speed Vd (mm/s) of the developer bearing body satisfy the following relationships: 1.326×10−1≦T≦2.142×10−1(weight parts), 7.1×10−6≦Rz≦15.0×10−6(m), 161.5≦Vd≦189.2(mm/s), and 4.98×10−6≦(T×Rz/Vd)≦1.99×10−5(s).
摘要翻译：显影装置被设置为面向承载潜像的图像承载体。显影装置包括承载用于显影潜像的显影剂的显影剂承载体。显影剂包括母体颗粒和外部添加剂。从母粒子释放的外部添加剂相对于100重量份母粒子的释放量T（重量份），显影剂承载体的表面粗糙度Rz（μm）和圆周速度Vd（mm / s ）<？in-line-formula description =“In-line formula”end =“lead”？> 1.326x10-1 <= T <= 2.142×10-1（重量份），<？in-line-formula description =“In-line Formulas”end =“tail”？> <？in-line-formula description =“In-line formula”end =“lead”？> 7.1x10-6 < = Rz <= 15.0×10-6（m），<？in-line-formula description =“In-line Formulas”end =“tail”？> <？in-line-formula description =“In-line Formulas”end =“lead”？> 161.5 <= Vd <= 189.2（mm / s），<？in-line-formula description =“In-line Formulas”end =“tail”？> <？in-line-formula description =“In-line Formulas”end =“lead”？> 4.98x10-6 <=（TxRz / Vd）<= 1.99×10-5（s）<？in-line-formula description =“In-line Formulas” end =“tail”？>

14. 发明授权

US08710498B2 Display device and method of manufacturing the same 有权
标题翻译：显示装置及其制造方法
公开(公告)号：US08710498B2
公开(公告)日：2014-04-29
申请号：US13329545
申请日：2011-12-19
申请人： Tetsuya Shibata , Hajime Watakabe , Atsushi Sasaki , Yuki Matsuura , Muneharu Akiyoshi , Hiroyuki Watanabe
发明人： Tetsuya Shibata , Hajime Watakabe , Atsushi Sasaki , Yuki Matsuura , Muneharu Akiyoshi , Hiroyuki Watanabe
IPC分类号： H01L29/72
CPC分类号： H01L27/1225 , H01L29/66969 , H01L29/78606 , H01L29/7869
摘要： According to one embodiment, a method of manufacturing a thin-film transistor circuit substrate including forming an oxide semiconductor thin film above an insulative substrate, forming a gate insulation film and a gate electrode which are stacked on a first region of the oxide semiconductor thin film, and exposing from the gate insulation film a second region and a third region of the oxide semiconductor thin film, the second region and the third region being located on both sides of the first region of the oxide semiconductor thin film, forming an interlayer insulation film of silicon nitride including dangling bonds of silicon, the interlayer insulation film covering the second region and the third region of the oxide semiconductor thin film, the gate insulation film and the gate electrode, and forming a source electrode and a drain electrode.
摘要翻译：根据一个实施例，制造薄膜晶体管电路衬底的方法包括在绝缘衬底上形成氧化物半导体薄膜，形成栅极绝缘膜和栅电极，所述栅极绝缘膜和栅电极层叠在氧化物半导体薄膜的第一区域上并且从所述栅极绝缘膜暴露所述氧化物半导体薄膜的第二区域和第三区域，所述第二区域和所述第三区域位于所述氧化物半导体薄膜的所述第一区域的两侧，形成层间绝缘膜包括硅的悬挂键，覆盖第二区域的层间绝缘膜和氧化物半导体薄膜的第三区域，栅极绝缘膜和栅电极，以及形成源电极和漏电极。

15. 发明授权

US07061019B2 Semiconductor circuit array substrate with a photo-electric sensor portion 失效
标题翻译：具有光电传感器部分的半导体电路阵列基板
公开(公告)号：US07061019B2
公开(公告)日：2006-06-13
申请号：US10888755
申请日：2004-07-12
申请人： Arichika Ishida , Masayoshi Fuchi , Yuki Matsuura , Norio Tada
发明人： Arichika Ishida , Masayoshi Fuchi , Yuki Matsuura , Norio Tada
IPC分类号： H01L31/036
CPC分类号： H01L27/3269 , H01L27/14643 , H01L31/1055
摘要： A circuit array substrate is provided with thin-film transistors 4 and 5 and PIN diode 6 formed on insulation substrate 3. Active layer 11 and photo-electric sensor portion 21 are made of poly-silicon films. Impurities are doped into active layer 11 and photo-electric sensor portion 21 in the same process chamber, if necessary, to make their impurity concentrations different from each other. Thin-film transistors 4 and 5 with prescribed characteristics and PIN diode 6 with improved photosensitivity can be simultaneously, easily manufactured on insulation substrate 3 with a lesser number of processes.
摘要翻译：电路阵列基板设置有形成在绝缘基板3上的薄膜晶体管4,5和PIN二极管6。有源层11和光电传感器部分21由多晶硅膜制成。如果需要，将杂质掺杂到相同处理室中的有源层11和光电传感器部分21中，以使它们的杂质浓度彼此不同。具有规定特性的薄膜晶体管4和5以及具有改善光敏性的PIN二极管6可以同时以较少的工艺制造在绝缘基板3上。

16. 发明授权

US06194023B1 Method of manufacturing a poly-crystalline silicon film 有权
标题翻译：制造多晶硅膜的方法
公开(公告)号：US06194023B1
公开(公告)日：2001-02-27
申请号：US09160360
申请日：1998-09-25
申请人： Hiroshi Mitsuhashi , Yuki Matsuura , Takashi Fujimura , Nobuo Imai , Yasumasa Goto
发明人： Hiroshi Mitsuhashi , Yuki Matsuura , Takashi Fujimura , Nobuo Imai , Yasumasa Goto
IPC分类号： B05D306
CPC分类号： H01L21/02686 , C23C16/24 , C23C16/56 , H01L21/02532 , H01L21/02691 , H01L21/2026 , H01L29/66757 , H01L29/78675
摘要： A method of manufacturing a poly-crystalline silicon (p-Si) film includes the steps in which an excimer laser anneals an amorphous silicon (a-Si) film deposited on a glass substrate and makes the same into the poly-crystalline silicon while the glass substrate is moved in a moving direction relative to the laser. Prior to carrying out the annealing step, a couple of the laser pulses are applied to different places of the a-Si film, provided that each of the laser pulses has different energy fluence and one pulse at a time is applied to the a-Si film. The pulse applied area is divided into two sections by a reference line perpendicular to the moving direction of the glass substrate. Average grain sizes of the p-Si film in the two sections are compared to each other to determine the moving direction.
摘要翻译：制造多晶硅（p-Si）膜的方法包括以下步骤：其中准分子激光器退火沉积在玻璃基板上的非晶硅（a-Si）膜，并将其制成多晶硅，同时玻璃基板相对于激光器在移动方向上移动。在进行退火步骤之前，将一对激光脉冲施加到a-Si膜的不同位置，只要每个激光脉冲具有不同的能量通量，并且一次将一个脉冲施加到a-Si 电影。脉冲施加区域由垂直于玻璃基板的移动方向的参考线分成两部分。将两部分中的p-Si膜的平均晶粒尺寸彼此进行比较以确定移动方向。

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