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11. 发明申请

US20060194982A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same 有权
标题翻译：适用于酸产生剂的盐和含有它的化学放大抗蚀剂组合物
公开(公告)号：US20060194982A1
公开(公告)日：2006-08-31
申请号：US11353010
申请日：2006-02-14
申请人： Yukako Harada , Ichiki Takemoto , Kouji Toishi
发明人： Yukako Harada , Ichiki Takemoto , Kouji Toishi
IPC分类号： C07C309/12
CPC分类号： C07C309/17 , C07C381/12 , C07C2603/74
摘要： The present invention provides a salt of the formula (I) wherein X represents —OH or —Y—OH, n shows an integer of 1 to 9, A+ represents an organic counter ion, Y represents a divalent saturated aliphatic hydrocarbon group having 1 to 6 carbon atoms. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).
摘要翻译：本发明提供式（I）的盐，其中X表示-OH或-Y-OH，n表示1〜9的整数，A +表示有机抗衡离子，Y表示具有1至6个碳原子的二价饱和脂族烃基。本发明还提供了包含式（I）的盐的化学放大抗蚀剂组合物。

12. 发明授权

US06245478B1 Resist composition 有权
标题翻译：抗蚀组成
公开(公告)号：US06245478B1
公开(公告)日：2001-06-12
申请号：US09398998
申请日：1999-09-17
申请人： Yasunori Uetani , Ichiki Takemoto
发明人： Yasunori Uetani , Ichiki Takemoto
IPC分类号： G03F7023
CPC分类号： G03F7/0045 , G03F7/0085 , G03F7/0226 , G03F7/038 , G03F7/039 , Y10S430/121
摘要： A resist composition exhibiting an improved profile performance without impairing the resolution, the sensitivity, etc. which comprises a binder component; a radiation-sensitive component; and a succinimide compound represented by the following formula (I): wherein Q1 represents an alkyl group which may be optionally substituted with alkoxy, halogen or nitro, an alicyclic hydrocarbon residue, an aryl group, or an aralkyl group; and Q2, which may be the same as or different from Q1, represents hydrogen, an alkyl group which may be optionally substituted with alkoxy, halogen or nitro, an alicyclic hydrocarbon residue, an aryl group, or an aralkyl group.
摘要翻译：抗蚀剂组合物，其表现出改进的轮廓性能，而不损害包括粘结剂成分的分辨率，灵敏度等; 辐射敏感组件; 和由下式（I）表示的琥珀酰亚胺化合物：其中Q1表示可任选被烷氧基，卤素或硝基取代的烷基，脂环族烃残基，芳基或芳烷基; 和可以与Q1相同或不同的Q2表示氢，可以任选被烷氧基，卤素或硝基取代的烷基，脂环族烃残基，芳基或芳烷基。

13. 发明授权

US4835286A 2-Substituted phenyl-4,5,6,7-tetrahydro-2H-indazoles 失效
标题翻译： 2-取代的苯基-4,5,6,7-四氢-2H-吲唑
公开(公告)号：US4835286A
公开(公告)日：1989-05-30
申请号：US23386
申请日：1987-03-09
申请人： Eiki Nagano , Ichiki Takemoto , Masayuki Fukushima , Ryo Yoshida , Hiroshi Matsumoto
发明人： Eiki Nagano , Ichiki Takemoto , Masayuki Fukushima , Ryo Yoshida , Hiroshi Matsumoto
IPC分类号： C07D231/54 , A01N43/56 , C07D231/56
CPC分类号： C07D231/56 , A01N43/56 , C07C243/00
摘要： Various intermediates useful in the production of herbicidal 2-substituted phenyl-4,5,6,7-tetrahydro-2H-indazole compounds are disclosed. These intermediates have the following formulas: ##STR1## wherein X is chlorine or bromine, Z is chlorine or methyl, and A is amino, hydroxyl, or nitro; ##STR2## wherein B is nitro or hydroxy, and X is chlorine or bromine.

14. 发明授权

US4309212A Herbicidal compositions and methods employing urea derivatives 失效
标题翻译：使用尿素衍生物的除草组合物和方法
公开(公告)号：US4309212A
公开(公告)日：1982-01-05
申请号：US952775
申请日：1978-10-19
申请人： Ichiki Takemoto , Seizo Sumida , Ryo Yoshida , Katsuzo Kamoshita
发明人： Ichiki Takemoto , Seizo Sumida , Ryo Yoshida , Katsuzo Kamoshita
IPC分类号： A01N47/30 , C07C275/34 , C07C275/64
CPC分类号： C07C275/64 , A01N47/30 , C07C275/34
摘要： Novel N'-phenyl-N-methylurea derivatives of the formula: ##STR1## wherein R.sub.1 is a hydrogen atom, a methyl group or a methoxy group, R.sub.2 is a hydrogen atom or a lower alkyl group, R.sub.3, which may be the same or different, is a halogen atom, a lower alkyl group, a lower alkoxy group, a lower alkylthio group or a trifluoromethyl group, n is an integer of 0 to 5, X is a hydrogen atom or a halogen atom, Y is an oxygen atom or a sulfur atom and Z is a straight or branched C.sub.1 -C.sub.8 alkylene group which may have no less than one atom of oxygen and/or sulfur at the terminal of and/or inside the carbon chain, which shows a pronounced herbicidal activity against a wide variety of weeds in the cultivation of crop plants as well as a notable fungicidal activity against a wide variety of phytopathogenic fungi causing plant diseases to crop plants without any material toxicity to mammals and fish or any chemical injury to said crop plants.
摘要翻译：新颖的下式的N-苯基-N-甲基脲衍生物：其中R1是氢原子，甲基或甲氧基，R2是氢原子或低级烷基，R3可以相同或不同的是卤素原子，低级烷基，低级烷氧基，低级烷硫基或三氟甲基，n为0〜5的整数，X为氢原子或卤素原子，Y为氧原子或硫原子，Z是在碳链末端和/或内部可以具有不少于一个氧原子和/或硫原子的直链或支链C 1 -C 8亚烷基，其显示出明显的除草活性栽培作物的各种杂草以及针对各种植物病原真菌的显着的杀真菌活性，其对植物病害造成植物病害而对哺乳动物和鱼没有任何物质毒性或对所述作物的任何化学损伤。

15. 发明授权

US4263219A Production of substituted phenylurea 失效
标题翻译：取代苯脲的生产
公开(公告)号：US4263219A
公开(公告)日：1981-04-21
申请号：US13610
申请日：1979-02-21
申请人： Fumio Fujita , Hiroshi Kishida , Nobushige Itaya , Ichiki Takemoto
发明人： Fumio Fujita , Hiroshi Kishida , Nobushige Itaya , Ichiki Takemoto
IPC分类号： C07C205/37 , C07C273/18 , C07C275/64 , C07C69/76
CPC分类号： C07C275/64 , C07C205/37 , C07C273/1854
摘要： A compound of the formula: ##STR1## which is useful as a herbicide, is effectively produced by reacting a compound of the formula: ##STR2## with dimethyl sulfate in a two phase reaction medium consisting of water and a hydrophobic organic solvent in the presence of a phase transfer catalyst, or produced through a novel intermediate of the formula: ##STR3##
摘要翻译：有用的除草剂的下式化合物可以通过下列方式有效地制备：在水和疏水性有机溶剂组成的两相反应介质中，使式的相转移催化剂，或通过下式的新型中间体制备：

16. 发明授权

US08071270B2 Polyhydric compound and chemically amplified resist composition containing the same 有权
标题翻译：多羟基化合物和含有它们的化学放大抗蚀剂组合物
公开(公告)号：US08071270B2
公开(公告)日：2011-12-06
申请号：US12391165
申请日：2009-02-23
申请人： Ichiki Takemoto , Nobuo Ando
发明人： Ichiki Takemoto , Nobuo Ando
IPC分类号： G03F7/00 , G03F7/004 , C07C69/74
CPC分类号： C07C309/17 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/111 , Y10S430/114 , Y10S430/115
摘要： The present invention provides a polyhydric compound represented by the formula (I): wherein R51 to R67 each independently represent a hydrogen atom etc., at least one selected from the group consisting of R1 to R5 is a group represented by the formula (II): wherein Q1 and Q2 each independently represent a fluorine atom etc., U represents a C1-C20 divalent hydrocarbon group etc., and A+ represents an organic counter ion, and the others are hydrogen atoms or groups represented by the formula (III): wherein X1 to X4 each independently represent a hydrogen atom etc., n represents an integer of 0 to 3, W represents any one of the following groups: Z1 represents a C1-C6 alkyl group etc., and ring Y represents a C3-C20 alicyclic hydrocarbon group, and a chemically amplified resist composition containing the same.
摘要翻译：本发明提供由式（I）表示的多元化合物：其中R 51〜R 67各自独立地表示氢原子等，选自由R 1至R 5组成的组中的至少一个为由式（II）表示的基团，：其中Q1和Q2各自独立地表示氟原子等，U表示C1-C20二价烃基等，A +表示有机抗衡离子，其余为氢原子或式（III）表示的基团：其中X1至X4各自独立地表示氢原子等，n表示0至3的整数，W表示以下基团中的任一个：Z1表示C1-C6烷基等，环Y表示C3-C20 脂环族烃基和含有它们的化学放大抗蚀剂组合物。

17. 发明申请

US20100279226A1 RESIST PROCESSING METHOD 审中-公开
标题翻译：电阻加工方法
公开(公告)号：US20100279226A1
公开(公告)日：2010-11-04
申请号：US12810793
申请日：2008-12-22
申请人： Mitsuhiro Hata , Yoshiyuki Takata , Satoshi Yamaguchi , Ichiki Takemoto , Takayuki Miyagawa , Yusuke Fuji
发明人： Mitsuhiro Hata , Yoshiyuki Takata , Satoshi Yamaguchi , Ichiki Takemoto , Takayuki Miyagawa , Yusuke Fuji
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： H01L21/0275 , G03F7/0035 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/40
摘要： The present invention has the object of providing a method of manufacturing a resist pattern in which an extremely fine and highly accurate resist pattern can be formed which is obtained using the resist composition for forming a first resist pattern in a multi-patterning method such as a double patterning method. The resist processing method comprising; forming a first resist film by applying a first resist composition onto a substrate and drying, the first resist composition comprising a resin (A), a photo acid generator (B) and a cross-linking agent (C), the resin (A) having an acid-labile group, being insoluble or poorly soluble in alkali aqueous solution but of being rendered soluble in alkali aqueous solution through the action of an acid; prebaking; exposure processing; post-exposure baking; developing; hard-baking the first resist pattern; and obtaining a second resist film; pre-baking; exposure processing; post-exposure baking; developing to obtain a second resist pattern.
摘要翻译：本发明的目的是提供一种制造抗蚀剂图案的方法，其中可以形成极细和高精度的抗蚀剂图案，该抗蚀剂图案是使用多图案化方法中形成第一抗蚀剂图案的抗蚀剂组合物获得的，双重图案化方法抗蚀剂处理方法包括：通过将第一抗蚀剂组合物施加到基材上并干燥来形成第一抗蚀剂膜，所述第一抗蚀剂组合物包含树脂（A），光酸产生剂（B）和交联剂（C），树脂（A）具有酸不稳定基团，在碱性水溶液中不溶或难溶，但通过酸的作用使其溶于碱水溶液中; 预烘烤曝光处理; 曝光后烘烤; 发展; 硬烘烤第一抗蚀剂图案; 得到第二抗蚀膜; 预烘烤; 曝光处理; 曝光后烘烤; 显影以获得第二抗蚀剂图案。

18. 发明授权

US07794914B2 Chemically amplified positive resist composition 有权
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US07794914B2
公开(公告)日：2010-09-14
申请号：US11705138
申请日：2007-02-12
申请人： Nobuo Ando , Yusuke Fuji , Ichiki Takemoto
发明人： Nobuo Ando , Yusuke Fuji , Ichiki Takemoto
IPC分类号： G03F7/039
CPC分类号： G03F7/0397 , G03F7/0046 , Y10S430/108 , Y10S430/111 , Y10S430/122 , Y10S430/126
摘要： The present invention provides a chemically amplified resist composition comprising: a resin (A) which contains no fluorine atom and a structural unit (a1) having an acid-labile group, a resin (B) which contains a structural unit (b2) having a fluorine-containing group and at least one structural unit selected from a structural unit (b1) having an acid-labile group, a structural unit (b3) having a hydroxyl group and a structural unit (b4) having a lactone structure, and an acid generator.
摘要翻译：本发明提供一种化学放大抗蚀剂组合物，其包含：不含氟原子的树脂（A）和具有酸不稳定基团的结构单元（a1），含有结构单元（b2）的树脂（B）具有氟系基团和选自具有酸不稳定基团的结构单元（b1），具有羟基的结构单元（b3）和具有内酯结构的结构单元（b4）的至少一种结构单元和酸发电机。

19. 发明申请

US20080248417A1 Polyhydric phenol compound and chemically amplified resist composition containing the same 失效
标题翻译：多元酚化合物和含有它的化学放大抗蚀剂组合物
公开(公告)号：US20080248417A1
公开(公告)日：2008-10-09
申请号：US11976197
申请日：2007-10-22
申请人： Ichiki Takemoto , Nobuo Ando , Junji Shigematsu
发明人： Ichiki Takemoto , Nobuo Ando , Junji Shigematsu
IPC分类号： G03F7/004 , C07C39/12
CPC分类号： C07C39/15 , C07C67/31 , C07C69/712 , G03F7/0045 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： The present invention provides a polyhydric phenol compound represented by the formula (I): wherein at least one selected from R1, R2, R3, R4, and R5 is a group represented by the formula (II): wherein X1, X2, X3 and X4 each independently represent a hydrogen atom or a C1-C4 alkyl group, n represents an integer of 0 to 3, Z1 represents a C1-C6 alkyl group or a C3-C12 cycloalkyl group, and ring Y represents an alicyclic hydrocarbon group, and the others are hydrogen atoms, and a chemically amplified resist composition containing the same.
摘要翻译：本发明提供由式（I）表示的多元酚化合物：其中选自R 1，R 2，R 3，O， >，R 4，R 5和R 5是由式（II）表示的基团：其中X 1，X 2， X 3，X 3和X 4各自独立地表示氢原子或C 1 -C 4烷基，n表示0〜3的整数，Z < 1表示C1-C6烷基或C3-C12环烷基，Y表示脂环族烃基，其余为氢原子，含有该烷氧基的化学放大型抗蚀剂组合物。

20. 发明申请

US20070218401A1 Chemically amplified positive resist composition 有权
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US20070218401A1
公开(公告)日：2007-09-20
申请号：US11705138
申请日：2007-02-12
申请人： Nobuo Ando , Yusuke Fuji , Ichiki Takemoto
发明人： Nobuo Ando , Yusuke Fuji , Ichiki Takemoto
IPC分类号： G03C1/00
CPC分类号： G03F7/0397 , G03F7/0046 , Y10S430/108 , Y10S430/111 , Y10S430/122 , Y10S430/126
摘要： The present invention provides a chemically amplified resist composition comprising: a resin (A) which contains no fluorine atom and a structural unit (a1) having an acid-labile group, a resin (B) which contains a structural unit (b2) having a fluorine-containing group and at least one structural unit selected from a structural unit (b1) having an acid-labile group, a structural unit (b3) having a hydroxyl group and a structural unit (b4) having a lactone structure, and an acid generator.
摘要翻译：本发明提供一种化学放大抗蚀剂组合物，其包含：不含氟原子的树脂（A）和具有酸不稳定基团的结构单元（a1），含有结构单元（b2）的树脂（B）具有氟系基团和选自具有酸不稳定基团的结构单元（b1），具有羟基的结构单元（b3）和具有内酯结构的结构单元（b4）的至少一种结构单元和酸发电机。

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