会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 19. 发明专利
    • Plasma display panel
    • 等离子显示面板
    • JP2009146803A
    • 2009-07-02
    • JP2007324455
    • 2007-12-17
    • Hitachi Ltd株式会社日立製作所
    • TSUJI KAZUTAKAINOUE AKIRAMORI SHUNSUKEKOMATSU MASAAKIMIYAKE TATSUYASUZUKI KEIZOMOMOSE HIDETOKA KIRIN
    • H01J11/02H01J9/02H01J11/12H01J11/22H01J11/24H01J11/26H01J11/34H01J11/36H01J11/38H01J11/40H01J11/42H01J11/50
    • H01J11/40H01J11/12
    • PROBLEM TO BE SOLVED: To provide a high-quality long-life plasma display panel by making compatible priming-electron emission characteristics and other characteristics such as sputtering resistance, secondary electron emission characteristics, and wall charge retention.
      SOLUTION: A dielectric layer 2 is so formed as to cover transparent electrodes 4a and 5a and bus electrodes 4b and 5b provided on the inner side of a front substrate 1. A first protective film 3a doped with Sc to generate predetermined excitation light by the incidence of ultraviolet light covers the dielectric layer 2, and a second protective film 3b doped with Si to emit electrons to the discharge space by the excitation light is disposed on the side closer to the discharge space than the first protective layer. By this structure, it is possible to obtain a plasma display device in which a discharge delay is small, and thereby fluctuation hardly occurs.
      COPYRIGHT: (C)2009,JPO&INPIT
    • 要解决的问题:通过提供兼容的起动电子发射特性和诸如溅射电阻,二次电子发射特性和壁电荷保持的其它特性来提供高质量的长寿命等离子体显示面板。 解决方案:电介质层2被形成为覆盖设置在前基板1的内侧上的透明电极4a和5a以及总线电极4b和5b。第一保护膜3a掺杂有Sc以产生预定的激发光 通过紫外线的入射覆盖电介质层2,并且通过激发光将掺杂有Si的第二保护膜3b放电到放电空间,配置在比第一保护层更靠近放电空间的一侧。 通过这种结构,可以获得放电延迟小的等离子体显示装置,从而几乎不发生波动。 版权所有(C)2009,JPO&INPIT
    • 20. 发明专利
    • Wiring-defect correcting method, and apparatus thereof
    • 接线错误校正方法及其装置
    • JP2009064876A
    • 2009-03-26
    • JP2007230025
    • 2007-09-05
    • Hitachi Ltd株式会社日立製作所
    • MOMOSE HIDETOHORIUCHI NAOHIROKANAE TATSUTOSHI
    • H05K3/22G02F1/13G02F1/1343G09F9/00H01J9/02H01J9/50H01J11/02H01J11/20H01J11/22H01J11/34
    • Y02W30/828
    • PROBLEM TO BE SOLVED: To provide a correcting method and a correcting apparatus thereof which give the good firing condition of a corrected wiring and largely suppress the damage of normal wiring in the correction of the open defect of the metal wiring formed on a wiring substrate. SOLUTION: A conductive paste 9 is applied to the open-defect portion of a metal wiring 7 formed on a substrate 8. One or whole of a laser-beam irradiating unit 11 is moved so that any normal wiring portion is not irradiated with a laser beam 1a having a large intensity. The spot diameter of the laser beam 1a is controlled to be nearly consistent with the applying length of the conductive paste 9 in its defocusing state, and at the same moment, power of the laser beam 1a is corrected to perform the irradiation of the firing laser beam. COPYRIGHT: (C)2009,JPO&INPIT
    • 解决的问题:为了提供校正方法和校正装置,其校正布线的良好的烧制条件,并且在校正形成在金属布线的金属布线的开放缺陷的情况下,大大地抑制了正常布线的损坏 布线基板。 解决方案:将导电浆料9施加到形成在基板8上的金属布线7的开放缺陷部分。激光束照射单元11的一个或全部移动,使得任何正常布线部分不被照射 具有大的强度的激光束1a。 激光束1a的光斑直径被控制为与其散焦状态下的导电膏9的施加长度几乎一致,并且同时激光束1a的功率被校正以执行激光激光器的照射 光束。 版权所有(C)2009,JPO&INPIT