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11. 发明授权

US06628345B1 Automatic frequency tuning circuit 有权
标题翻译：自动频率调谐电路
公开(公告)号：US06628345B1
公开(公告)日：2003-09-30
申请号：US09708446
申请日：2000-11-09
申请人： Masanori Tachibana , Junji Suzuki
发明人： Masanori Tachibana , Junji Suzuki
IPC分类号： H04N550
CPC分类号： H03J7/065 , H04N5/50
摘要： A multiplier circuit multiplies a first output signal (fVCO) that has been generated by a conventional automatic phase-controlled loop circuit with a second output signal (fIF+fref) that has been generated by a phase-locked loop circuit based on a reference signal (fref). A phase difference detector circuit and an edge detector circuit receive a result of this multiplication, and carry out an edge detection (such as, for example, a pulse density corresponding to a frequency difference between a video intermediate frequency fIF and the first output signal fVCO). An automatic frequency tuning voltage is generated based on a result of this edge detection.
摘要翻译：乘法器电路将由常规自动相位控制环电路产生的第一输出信号（fVCO）与基于参考信号的锁相环电路产生的第二输出信号（fIF + fref）相乘（fref）。相位差检测器电路和边缘检测器电路接收该乘法的结果，并执行边缘检测（例如，对应于视频中频fIF与第一输出信号fVCO之间的频率差的脉冲密度）。基于该边缘检测的结果产生自动频率调谐电压。

12. 发明授权

US08700228B2 Beam scheduler and beam allocation method of beam scheduler 有权
标题翻译：光束调度器的光束调度器和光束分配方法
公开(公告)号：US08700228B2
公开(公告)日：2014-04-15
申请号：US13074631
申请日：2011-03-29
申请人： Masanori Tachibana , Yoshinori Yano
发明人： Masanori Tachibana , Yoshinori Yano
IPC分类号： H01H43/00 , G06F17/00 , H01J47/00 , G01J1/42 , G01T1/00 , G21G5/00 , A61N5/00
CPC分类号： A61N5/1079 , A61N2005/1074
摘要： A beam scheduler adds the maximum allowable waiting time until a beam is allocated to an irradiation chamber corresponding to an irradiation request when the irradiation request is received from one irradiation chamber of a plurality of irradiation chambers A to D; adds the irradiation request to the end of the order of a waiting list; determines whether or not the predicted waiting time until the beam is allocated to the one irradiation chamber exceeds the maximum allowable waiting time; and advances the order of the irradiation request on the waiting list, thereby allocating the beam to the irradiation chamber corresponding to the top irradiation request in the order of the waiting list, if it is determined that the predicted waiting time exceeds the maximum allowable waiting time.
摘要翻译：当从多个照射室A至D的一个照射室接收到照射请求时，光束调度器添加最大允许等待时间，直到光束被分配给与照射请求相对应的照射室; 将照射请求添加到等待列表的顺序结束处; 确定直到光束被分配给一个照射室的预测等待时间是否超过最大允许等待时间; 并且在等待列表上推进照射请求的顺序，从而如果确定预测的等待时间超过最大允许等待时间，则以等待列表的顺序将光束分配给与顶部照射请求对应的照射室。

13. 发明申请

US20090265917A1 METHOD OF MANUFACTURING THIN FILM MAGNETIC HEAD 审中-公开
标题翻译：制造薄膜磁头的方法
公开(公告)号：US20090265917A1
公开(公告)日：2009-10-29
申请号：US12333206
申请日：2008-12-11
申请人： Koichi Sugimoto , Masanori Tachibana , Kazuaki Satoh , Yoshiyuki Ikeda
发明人： Koichi Sugimoto , Masanori Tachibana , Kazuaki Satoh , Yoshiyuki Ikeda
IPC分类号： G11B5/187 , G11B5/255
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/3163 , Y10T29/49043 , Y10T29/49046 , Y10T29/49048
摘要： By the method of manufacturing a thin film magnetic head, a magnetic material having a suitable characteristic can be used for manufacturing a magnetic pole and corrosion of the magnetic pole can be prevented. The method comprises: a step of forming a multilayered magnetic pole; a step of forming a stopper layer on the magnetic pole; a step of forming an insulating layer on the stopper layer; a step of polishing the insulating layer, by chemical mechanical polishing process, until an upper face of the stopper layer is exposed; a step of removing the stopper layer, by dry etching process with a reactive gas, until an upper face of the magnetic head is exposed; a step of removing the upper face of the magnetic pole, by dry etching process with an inert gas, until reaching a prescribed depth; and a step of polishing the upper face of the magnetic pole, by chemical mechanical polishing process, until the upper face of the magnetic pole is flattened.
摘要翻译：通过制造薄膜磁头的方法，可以使用具有合适特性的磁性材料来制造磁极，并且可以防止磁极的腐蚀。该方法包括：形成多层磁极的步骤; 在磁极上形成阻挡层的步骤; 在阻挡层上形成绝缘层的步骤; 通过化学机械抛光工艺抛光绝缘层，直到暴露止动层的上表面; 通过用反应性气体的干蚀刻工艺除去止动层直到磁头的上表面露出的步骤; 通过用惰性气体的干法蚀刻工艺去除磁极的上表面直到达到规定深度的步骤; 以及通过化学机械抛光工艺抛光磁极的上表面的步骤，直到磁极的上表面变平。

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