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    • 11. 发明授权
    • N-glucoside compounds having an inhibitory activity against sodium-dependent glucose transporter
    • 对钠依赖性葡萄糖转运蛋白具有抑制活性的N-葡萄糖苷化合物
    • US07521430B2
    • 2009-04-21
    • US10566585
    • 2004-07-30
    • Sumihiro NomuraToshiaki SakamotoKiichiro Ueta
    • Sumihiro NomuraToshiaki SakamotoKiichiro Ueta
    • A01N43/04A61K31/70C07H5/06C07H19/00
    • C07H15/203C07H5/04C07H17/02
    • A compound of the formula: wherein Ring A and Ring B are (1) Ring A is an optionally substituted unsaturated monocyclic heterocyclic ring, and Ring B is an optionally substituted unsaturated monocyclic heterocyclic ring, an optionally substituted unsaturated fused heterobicyclic ring, or an optionally substituted benzene ring, (2) Ring A is an optionally substituted benzene ring, and Ring B is an optionally substituted unsaturated monocyclic heterocyclic ring, an optionally substituted unsaturated fused heterobicyclic ring, or an optionally substituted benzene ring, or (3) Ring A is an optionally substituted unsaturated fused heterobicyclic ring, wherein —NR— group and —CH2— group are both on the same ring of the unsaturated fused heterobicyclic ring, and Ring B is an optionally substituted monocyclic unsaturated heterocyclic ring, an optionally substituted unsaturated fused heterobicyclic ring, or an optionally substituted benzene ring; and R is a hydrogen atom, a lower alkyl group, a lower alkanoyl group or a lower alkoxycarbonyl group, or a pharmaceutically acceptable salt thereof, or a prodrug thereof.
    • 下式的化合物:其中环A和环B是(1)环A是任选取代的不饱和单环杂环,环B是任选取代的不饱和单环杂环,任选取代的不饱和稠合杂双环或任选地 取代的苯环,(2)环A是任选取代的苯环,环B是任选取代的不饱和单环杂环,任选取代的不饱和稠合杂双环或任选取代的苯环,或(3)环A是 任选取代的不饱和稠合杂双环,其中-NR-基和-CH2-基都在不饱和稠合杂双环的相同环上,环B是任选取代的单环不饱和杂环,任选取代的不饱和稠合杂双环 ,或任选取代的苯环; 或其前体药物,R为氢原子,低级烷基,低级烷酰基或低级烷氧基羰基,或其药学上可接受的盐。
    • 13. 发明申请
    • Novel compounds
    • 新型化合物
    • US20070060545A1
    • 2007-03-15
    • US10566585
    • 2004-07-30
    • Sumihiro NomuraToshiaki SakamotoKiichiro Ueta
    • Sumihiro NomuraToshiaki SakamotoKiichiro Ueta
    • A61K31/7008C07H5/04
    • C07H15/203C07H5/04C07H17/02
    • A compound of the formula: wherein Ring A and Ring B are (1) Ring A is an optionally substituted unsaturated monocyclic heterocyclic ring, and Ring B is an optionally substituted unsaturated monocyclic heterocyclic ring, an optionally substituted unsaturated fused heterobicyclic ring, or an optionally substituted benzene ring, (2) Ring A is an optionally substituted benzene ring, and Ring B is an optionally substituted unsaturated monocyclic heterocyclic ring, an optionally substituted unsaturated fused heterobicyclic ring, or an optionally substituted benzene ring, or (3) Ring A is an optionally substituted unsaturated fused heterobicyclic ring, wherein —NR— group and —CH2— group are both on the same ring of the unsaturated fused heterobicyclic ring, and Ring B is an optionally substituted monocyclic unsaturated heterocyclic ring, an optionally substituted unsaturated fused heterobicyclic ring, or an optionally substituted benzene ring; and R is a hydrogen atom, a lower alkyl group, a lower alkanoyl group or a lower alkoxycarbonyl group, or a pharmaceutically acceptable salt thereof, or a prodrug thereof.
    • 下式的化合物:其中环A和环B是(1)环A是任选取代的不饱和单环杂环,环B是任选取代的不饱和单环杂环,任选取代的不饱和稠合杂双环或任选取代的不饱和单环杂环 取代的苯环,(2)环A是任选取代的苯环,环B是任选取代的不饱和单环杂环,任选取代的不饱和稠合杂双环或任选取代的苯环,或(3)环A是 任选取代的不饱和稠合杂双环,其中-NR-基团和-CH 2 - 基团都在不饱和稠合杂双环环的相同环上,环B是任选取代的单环不饱和杂环 ,任选取代的不饱和稠合杂双环,或任选取代的苯环; 或其前体药物,R为氢原子,低级烷基,低级烷酰基或低级烷氧基羰基,或其药学上可接受的盐。
    • 15. 发明申请
    • Cationic electrodeposition coating composition and coated article therewith
    • 阳离子电沉积涂料组合物及其涂覆制品
    • US20070029200A1
    • 2007-02-08
    • US11498727
    • 2006-08-04
    • Toshiaki SakamotoMasaru SakamotoYoshinori HiraharaTsutomu Shigenaga
    • Toshiaki SakamotoMasaru SakamotoYoshinori HiraharaTsutomu Shigenaga
    • C25B7/00C25D13/00
    • C25D13/02C25D13/10C25D13/12
    • The present invention relates to a cationic electrodeposition coating composition comprising silica particles having pore volume of 0.44 to 1.8 ml/g and average particle size of no more than 10 μm, the composition showing square root of diffusion coefficient (√Tc) of no less than 2.5 upon diffusing a solution onto a coating film therewith; a cationic electrodeposition coating composition comprising silica particles having pore volume of 0.44 to 1.8 ml/g and average particle size of no more than 10 μm, wherein the composition shows minimum deposition pH of 11.90 to 12.00 during electrodeposition coating, and film resistance of 1,000 to 1,500 kΩ·cm2 at film thickness of 15 μm and applied voltage of 240 V; and an article coated with such cationic electrodeposition coating composition. Therefore, the present invention can also provide a coating film formed with the cationic electrodeposition coating composition which can ensure higher corrosion resistance and higher throwing power in addition to other excellent coating properties, even if the resulting coating has extremely thin film thickness (e.g., about 7 μm).
    • 本发明涉及一种阳离子电沉积涂料组合物,其包含孔体积为0.44〜1.8ml / g,平均粒径为10μm以下的二氧化硅粒子,扩散系数平方根(√Tc)的组成不小于 将溶液扩散到其上的涂膜上; 包含孔体积为0.44〜1.8ml / g,平均粒径为10μm以下的二氧化硅粒子的阳离子电沉积涂料组合物,其中组合物在电沉积涂布期间显示最小沉积pH为11.90至12.00,膜电阻为1000〜 薄膜厚度为15μm,施加电压为240V时为1500kOgg·cm 2·2; 和涂有这种阳离子电沉积涂料组合物的制品。 因此,本发明还可以提供一种形成有阳离子电沉积涂料组合物的涂膜,除了其它优异的涂料性能外,还可以确保更高的耐腐蚀性和更高的抛光力,即使所得到的涂层具有非常薄的膜厚度(例如约 7个妈妈)。