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11. 发明申请

US20100224393A1 Display device 审中-公开
标题翻译：显示设备
公开(公告)号：US20100224393A1
公开(公告)日：2010-09-09
申请号：US12659455
申请日：2010-03-09
申请人： Kenta Kamoshida , Hideshi Nomura , Yasuko Gotoh
发明人： Kenta Kamoshida , Hideshi Nomura , Yasuko Gotoh
IPC分类号： H05K1/00
CPC分类号： G02F1/1345 , G02F1/13452
摘要： A display device with signal lines formed on a substrate and an organic insulation film which covers the signal lines and is formed over an upper layer side of the substrate, the display device further includes a terminal portion on which a conductive film is formed in a state that the conductive film covers portions of the signal lines which are exposed through openings formed in the organic insulation film, wherein the organic insulation film sets a film thickness thereof at a periphery of the terminal portion smaller than the film thickness at other portions, and a surface of small-film-thickness portion arranged in peripheries of the openings is formed into an uneven surface.
摘要翻译：具有形成在基板上的信号线的显示装置和覆盖信号线并形成在基板的上层侧的有机绝缘膜，显示装置还包括端子部，导电膜形成在该端子部的状态导电膜覆盖通过形成在有机绝缘膜中的开口暴露的信号线的部分，其中有机绝缘膜在其端部分的周边设置小于其它部分的膜厚度的膜厚，并且布置在开口周边的小膜厚部分的表面形成为不平坦的表面。

12. 发明申请

US20060152663A1 Display device 审中-公开
标题翻译：显示设备
公开(公告)号：US20060152663A1
公开(公告)日：2006-07-13
申请号：US11329243
申请日：2006-01-11
申请人： Kenta Kamoshida , Hideshi Nomura , Yasuko Gotoh
发明人： Kenta Kamoshida , Hideshi Nomura , Yasuko Gotoh
IPC分类号： G02F1/1345
CPC分类号： G02F1/1345 , G02F1/13452
摘要： A display device with signal lines formed on a substrate and an organic insulation film which covers the signal lines and is formed over an upper layer side of the substrate, the display device further includes a terminal portion on which a conductive film is formed in a state that the conductive film covers portions of the signal lines which are exposed through openings formed in the organic insulation film, wherein the organic insulation film sets a film thickness thereof at a periphery of the terminal portion smaller than the film thickness at other portions, and a surface of small-film-thickness portion arranged in peripheries of the openings is formed into an uneven surface.
摘要翻译：具有形成在基板上的信号线的显示装置和覆盖信号线并形成在基板的上层侧的有机绝缘膜，显示装置还包括端子部，导电膜形成在该端子部的状态导电膜覆盖通过形成在有机绝缘膜中的开口暴露的信号线的部分，其中有机绝缘膜在其端部分的周边设置小于其它部分的膜厚度的膜厚，并且布置在开口周边的小膜厚部分的表面形成为不平坦的表面。

13. 发明授权

US06927002B2 Photomask, the manufacturing method, a patterning method, and a semiconductor device manufacturing method 有权
标题翻译：光掩模，制造方法，图案化方法和半导体器件制造方法
公开(公告)号：US06927002B2
公开(公告)日：2005-08-09
申请号：US10026973
申请日：2001-12-27
申请人： Takashi Hattori , Yasuko Gotoh , Hidetoshi Satoh , Toshihiko Tanaka , Hiroshi Shiraishi
发明人： Takashi Hattori , Yasuko Gotoh , Hidetoshi Satoh , Toshihiko Tanaka , Hiroshi Shiraishi
IPC分类号： G03F7/004 , G03F1/00 , G03F1/26 , G03F1/30 , G03F1/32 , G03F1/40 , G03F1/42 , G03F1/54 , G03F1/56 , G03F1/60 , G03F1/68 , G03F1/70 , G03F1/80 , G03F7/20 , H01L21/027 , G03F9/00
CPC分类号： G03F1/32 , G03F1/26 , G03F1/30 , G03F1/56
摘要： To develop a small quantity of various kinds of semiconductor devices in a short time and to realize a photomask suitable to be manufactured at a low cost. A shade pattern of a photomask is constituted by containing nanoparticles such as carbon in an organic film such as a photoresist film. A pattern is transferred to a photoresist on a semiconductor wafer by means of the reduction projection exposure using the photomask. At the time of the above exposure, it is possible to select exposure light within a range of wide wavelengths including i-line, KrF excimer laser beam, ArF excimer laser beam, or the like.
摘要翻译：为了在短时间内开发少量的各种半导体器件，并且实现了适合以低成本制造的光掩模。光掩模的阴影图案通过在诸如光致抗蚀剂膜的有机膜中含有诸如碳的纳米颗粒而构成。通过使用光掩模的还原投影曝光将图案转印到半导体晶片上的光刻胶上。在上述曝光时，可以选择宽波长范围内的曝光光，包括i线，KrF准分子激光束，ArF准分子激光束等。

14. 发明授权

US07939830B2 Display device 有权
标题翻译：显示设备
公开(公告)号：US07939830B2
公开(公告)日：2011-05-10
申请号：US12477981
申请日：2009-06-04
申请人： Hiroki Takahashi , Shigeru Ohno , Kunihiko Watanabe , Junichi Uehara , Tsuyoshi Uchida , Yasuko Gotoh
发明人： Hiroki Takahashi , Shigeru Ohno , Kunihiko Watanabe , Junichi Uehara , Tsuyoshi Uchida , Yasuko Gotoh
IPC分类号： H01L23/52 , H01L23/535
CPC分类号： H01L27/124 , H01L27/1288
摘要： An object of the present invention is to provide a display device where a semiconductor layer pattern formed between a pair of electrodes can be formed to a predetermined size, even in the case where the distance between the electrodes on top of a semiconductor layer pattern is relatively large in elements formed in accordance with a photoresist reflow technology. The present invention provides a display device where elements are formed on an insulating substrate, characterized in that the above described elements comprise: a semiconductor layer pattern formed on a main surface of the above described insulating substrate or an insulating film layer formed on the main surface; and a number of electrodes provided in parallel at a distance from each other on the above described semiconductor layer pattern, the above described number of electrodes are a first electrode, a second electrode and dummy electrodes located between the first electrode and the second electrode, and the above described number of electrodes are patterned so that a protrusion is formed, in which the above described electrodes are aligned at on least one end side of at least one of the facing sides.
摘要翻译：本发明的目的是提供一种显示装置，其中形成在一对电极之间的半导体层图案可以形成为预定尺寸，即使在半导体层图案顶部的电极之间的距离相对较小的情况下大量的元件根据光致抗蚀剂回流技术形成。本发明提供了一种在绝缘基板上形成元件的显示装置，其特征在于，上述元件包括：形成在上述绝缘基板的主表面上的半导体层图案或形成在主表面上的绝缘膜层 ; 以及在上述半导体层图案上彼此平行设置的多个电极，上述数量的电极是位于第一电极和第二电极之间的第一电极，第二电极和虚设电极，将上述数量的电极图案化，从而形成突起，其中上述电极在至少一个相对侧的至少一个端侧对齐。

15. 发明申请

US20090302320A1 Display Device 有权
标题翻译：显示设备
公开(公告)号：US20090302320A1
公开(公告)日：2009-12-10
申请号：US12477981
申请日：2009-06-04
申请人： Hiroki TAKAHASHI , Shigeru Ohno , Kunihiko Watanabe , Junichi Uehara , Tsuyoshi Uchida , Yasuko Gotoh
发明人： Hiroki TAKAHASHI , Shigeru Ohno , Kunihiko Watanabe , Junichi Uehara , Tsuyoshi Uchida , Yasuko Gotoh
IPC分类号： H01L33/00 , H01L29/786
CPC分类号： H01L27/124 , H01L27/1288
摘要： An object of the present invention is to provide a display device where a semiconductor layer pattern formed between a pair of electrodes can be formed to a predetermined size, even in the case where the distance between the electrodes on top of a semiconductor layer pattern is relatively large in elements formed in accordance with a photoresist reflow technology. The present invention provides a display device where elements are formed on an insulating substrate, characterized in that the above described elements comprise: a semiconductor layer pattern formed on a main surface of the above described insulating substrate or an insulating film layer formed on the main surface; and a number of electrodes provided in parallel at a distance from each other on the above described semiconductor layer pattern, the above described number of electrodes are a first electrode, a second electrode and dummy electrodes located between the first electrode and the second electrode, and the above described number of electrodes are patterned so that a protrusion is formed, in which the above described electrodes are aligned at on least one end side of at least one of the facing sides.
摘要翻译：本发明的目的是提供一种显示装置，其中形成在一对电极之间的半导体层图案可以形成为预定尺寸，即使在半导体层图案顶部的电极之间的距离相对较小的情况下大量的元件根据光致抗蚀剂回流技术形成。本发明提供了一种在绝缘基板上形成元件的显示装置，其特征在于，上述元件包括：形成在上述绝缘基板的主表面上的半导体层图案或形成在主表面上的绝缘膜层 ; 以及在上述半导体层图案上彼此平行设置的多个电极，上述数量的电极是位于第一电极和第二电极之间的第一电极，第二电极和虚设电极，将上述数量的电极图案化，从而形成突起，其中上述电极在至少一个相对侧的至少一个端侧对齐。

16. 发明授权

US07466389B2 Display device having contact holes' taper angle larger in display region than in terminal region 有权
标题翻译：显示装置的显示区域的接触孔的锥角比端子区域大
公开(公告)号：US07466389B2
公开(公告)日：2008-12-16
申请号：US11054315
申请日：2005-02-10
申请人： Hideshi Nomura , Yasuko Gotoh , Toshiki Kaneko , Kenta Kamoshida
发明人： Hideshi Nomura , Yasuko Gotoh , Toshiki Kaneko , Kenta Kamoshida
IPC分类号： G02F1/1345 , G02F1/1333
CPC分类号： G02F1/13458 , G02F1/1345 , G02F1/136227
摘要： A display device is provided with a first contact hole formed in a display region and a second contact hole formed in a terminal region, and a first insulating layer and a second insulating layer formed in that order. The taper angle of the first insulating layer at the first contact hole is larger than the taper angle of the first insulating layer at the second contact hole, and the taper angle of the second insulating layer at the first contact hole is larger than the taper angle of the second insulating layer around the second contact hole.
摘要翻译：显示装置设置有形成在显示区域中的第一接触孔和形成在端子区域中的第二接触孔，以及依次形成的第一绝缘层和第二绝缘层。第一接触孔处的第一绝缘层的锥角大于第二接触孔处的第一绝缘层的锥角，第一接触孔处的第二绝缘层的锥角大于锥角在第二接触孔周围的第二绝缘层。

17. 发明申请

US20070007526A1 Display panel and display device 有权
标题翻译：显示面板和显示设备
公开(公告)号：US20070007526A1
公开(公告)日：2007-01-11
申请号：US11481974
申请日：2006-07-07
申请人： Saori Sugiyama , Yasuko Gotoh
发明人： Saori Sugiyama , Yasuko Gotoh
IPC分类号： H01L29/04 , G02F1/1345
CPC分类号： G02F1/1345 , H05K1/0306 , H05K1/117 , H05K3/244 , H05K3/361 , H05K2201/0326 , H05K2201/0969 , Y10T29/49121
摘要： The proceeding of peeling of a conductive layer in the vicinity of terminals is prevented. A display panel includes a conductive layer extending to the outside of terminals, and the conductive layer has slits extending in directions from one end face to the other end face alternately at two end faces along the extending direction of the conductive layer.
摘要翻译：阻止在端子附近剥离导电层的过程。显示面板包括延伸到端子外部的导电层，并且导电层具有在沿着导电层的延伸方向的两个端面处交替地从一个端面到另一个端面的方向上延伸的狭缝。

18. 发明授权

US06225011B1 Method for manufacturing semiconductor devices utilizing plurality of exposure systems 失效
标题翻译：利用多个曝光系统制造半导体器件的方法
公开(公告)号：US06225011B1
公开(公告)日：2001-05-01
申请号：US09294428
申请日：1999-04-20
申请人： Yasuko Gotoh , Norio Hasegawa , Naoko Asai , Katsuya Hayano , Takashi Matsuzaka , Katsuhiro Kawasaki
发明人： Yasuko Gotoh , Norio Hasegawa , Naoko Asai , Katsuya Hayano , Takashi Matsuzaka , Katsuhiro Kawasaki
IPC分类号： G03F900
CPC分类号： G03F7/7045 , H01J37/3045 , H01J2237/3175 , Y10S430/143
摘要： A pattern can be written in accordance with a distortion which changes depending upon exposure conditions of the optical exposure system and exposed pattern features, and a pattern can be written with a high alignment accuracy by the optical exposure system and an electron beam lithography system or two optical exposure systems. A pattern which is exposed by optical exposure system divided into very small areas shown by broken lines, and pattern feature amounts (fx), (fy) at each area are calculated. A correction amount is obtained by using the pattern feature amount and the position within an exposure field as parameters based on exposure distortion examined by a standard pattern predeterminedly.
摘要翻译：可以根据根据光学曝光系统的曝光条件和曝光图案特征而变化的失真来写入图案，并且可以通过光学曝光系统和电子束光刻系统或两个方式以高对准精度写入图案光学曝光系统计算出被分为由虚线示出的非常小的区域的光学曝光系统曝光的图案，以及每个区域的图案特征量（fx），（fy）。通过使用图案特征量和曝光区域内的位置作为基于通过标准图案检查的曝光失真的参数来获得校正量。

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