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    • 11. 发明授权
    • Linear motion guiding apparatus
    • 直线运动引导装置
    • US06305846B1
    • 2001-10-23
    • US09639340
    • 2000-08-16
    • Hidekazu MichiokaKatsuya IidaMasahiro YoshihashiHiroaki MochizukiTadashi Hirokawa
    • Hidekazu MichiokaKatsuya IidaMasahiro YoshihashiHiroaki MochizukiTadashi Hirokawa
    • F16C2906
    • F16C29/0642F16C29/0607F16C29/0609F16C29/0611F16C29/0635F16C29/065F16C29/0692F16C29/0695F16C33/3825F16C33/506
    • A linear motion guiding apparatus comprises a guide rail provided with a ball running groove, and a movable block movably arranged along the guide rail through balls. The movable block is provided with a ball running counter-groove, a ball returning passage arranged away from the ball running counter-groove and direction changing passages for connecting these members. A resin-formed body for forming a ball circulation passage comprises a pair of ball passage forming portions, a returning passage forming portion and a pair of direction changing passage-inner guide forming portions. The resin-formed body is separately formed from a body of the movable block. At least two portions of (a) the ball passage forming portions, (b) the returning passage forming portion, (c) one of the direction changing passage-inner guide forming portions and (d) another of the of direction changing passage-inner guide forming portions are connected with each other through integral forming so that the resin-formed body can be built in the body of the movable block.
    • 线性运动引导装置包括设置有滚珠行进槽的导轨和沿着导轨通过滚珠可移动地设置的可动块。 可动块设置有球运行的相对槽,与球运行的相对槽相隔离的球返回通道和用于连接这些构件的方向转换通道。 用于形成球循环通道的树脂成型体包括一对球通道形成部分,返回通道形成部分和一对方向改变通道 - 内部引导件形成部分。 树脂成型体与可动块的主体分开形成。 (a)球通道形成部分的至少两部分,(b)返回通道形成部分,(c)方向改变通道 - 内部引导件形成部分之一和(d)方向改变通道内部 引导形成部分通过整体成型彼此连接,使得树脂成形体可以内置在可动块的主体中​​。
    • 13. 发明授权
    • Lot processing start determining method and control unit
    • 批处理开始确定方法和控制单元
    • US08463415B2
    • 2013-06-11
    • US12770016
    • 2010-04-29
    • Hiroaki Mochizuki
    • Hiroaki Mochizuki
    • G06F19/00
    • H01L21/67276
    • A lot processing start determining method includes: storing, in a memory, processing conditions of each lot in a first substrate vessel and a maximum usable number of dummy substrates in a second substrate vessel; counting the used number the dummy substrates in the second substrate vessel; and calculating the number of dummy substrates required to process all substrates of a next lot in the first substrate vessel based on the processing conditions of each lot which are stored in the memory, adding the calculated number of the dummy substrates of the next lot to the counted used number of the dummy substrates, and determining whether the added value exceeds the maximum usable number of the dummy substrates stored in the memory. The method further includes prohibiting start of processing the next lot when the added value is determined to exceed the maximum usable number of the dummy substrate.
    • 大量处理开始确定方法包括:在存储器中存储第一衬底容器中每批的处理条件和第二衬底容器中的最大可用数量的虚设衬底; 对所述第二基板容器中的所述虚设基板进行计数; 以及基于存储在存储器中的每个批次的处理条件来计算处理第一基板容器中的下一个批次的所有基板所需的虚拟基板的数量,将计算出的下一个批次的虚设基板的数量加到 计数所使用的虚拟基板的数量,并且确定附加值是否超过存储在存储器中的虚拟基板的最大可用数量。 所述方法还包括当所述相加值被确定为超过所述虚设基板的最大可用数量时,禁止开始处理下一批次。
    • 14. 发明授权
    • Substrate processing apparatus and substrate transfer method adopted therein
    • 基板处理装置及基板转印方法
    • US08145339B2
    • 2012-03-27
    • US12418869
    • 2009-04-06
    • Kiyohito IijimaHiroaki MochizukiMasahiro Numakura
    • Kiyohito IijimaHiroaki MochizukiMasahiro Numakura
    • G06F19/00
    • H01L21/67748H01L21/67253H01L21/67754
    • As an interrupt start button is depressed while control, under which product wafers Wp and dummy wafers Wd are transferred in an order defined in a normal transfer pattern, is repeatedly executed, a decision is made based upon wafer transfer history as to whether or not the most recent transfer pattern cycle has ended. If the cycle is determined to have ended, the operation immediately proceeds to the subsequent cycle to transfer interrupt wafers Wf and Wd in an order defined in the interrupt transfer pattern achieved by replacing Wp in the normal transfer pattern with Wf, whereas if the cycle is determined to be incomplete, the wafer transfer based upon the normal transfer pattern is carried on until the cycle ends and then the operation proceeds to the next cycle to transfer Wf and Wd in the order defined in the interrupt transfer pattern.
    • 当按照正常传送模式中定义的顺序传送产品晶片Wp和虚拟晶片Wd的控制下按下中断启动按钮时,基于晶片传送历史来决定是否 最近的转移模式周期已经结束。 如果确定该周期已经结束,则操作立即进行到随后的周期,以按照以Wf代替正常转移模式中的Wp而实现的以中断转移模式中定义的顺序传送中断晶片Wf和Wd,而如果周期为 确定为不完全,基于正常转移模式的晶片传送被继续进行,直到循环结束,然后操作进行到下一个周期,以按照中断传送模式中定义的顺序传送Wf和Wd。
    • 18. 发明授权
    • Motion guide device
    • 运动导向装置
    • US06592261B2
    • 2003-07-15
    • US09781991
    • 2001-02-14
    • Hiroaki Mochizuki
    • Hiroaki Mochizuki
    • F16C2906
    • F16C29/082B23Q1/58B23Q11/08F16C29/065F16C2322/39
    • A motion guide device generally includes a track member having a horizontal surface and two side surfaces continuous to the horizontal surface, a movable member mounted to the track member to be relatively movable with respect to the track member to be relatively movable with respect to the track member along a longitudinal direction thereof, and a cover member covering the horizontal surface of the track member along an entire width direction thereof. The track member is formed with undercut portions formed to side edge portions of the side surfaces of the track member on the horizontal surface sides, and the undercut portions are recessed towards a central side of the track member in the width direction thereof. The cover member includes a central flat portion and engaging portions formed at both end portions in the width direction thereof to be engaged with the undercut portions, respectively, so as to clamp the track member therebetween in the width direction.
    • 运动引导装置通常包括具有水平表面和与水平表面连续的两个侧表面的轨道构件,安装到轨道构件以相对于轨道构件相对可移动以相对于轨道相对移动的可动构件 沿着其长度方向构成的构件,以及覆盖所述轨道构件的水平面沿着其整个宽度方向的盖构件。 轨道构件形成有在水平表面侧上形成在轨道构件的侧表面的侧边缘部分的底切部分,并且底切部分沿轨道构件的宽度方向朝向轨道构件的中心侧凹陷。 盖构件包括中央平坦部分和形成在其宽度方向上的两个端部处以分别与底切部分接合的接合部分,以便沿宽度方向夹紧轨道构件。
    • 19. 发明授权
    • Method for recovering object to be treated after interruption
    • 中断后恢复待处理物体的方法
    • US6162010A
    • 2000-12-19
    • US99784
    • 1998-06-19
    • Shigeru IshizawaTatsuya OgiHiroaki Mochizuki
    • Shigeru IshizawaTatsuya OgiHiroaki Mochizuki
    • B65G49/07C23C16/54H01L21/00H01L21/677H01L21/02
    • H01L21/67167C23C16/54H01L21/67276Y10S414/137Y10S414/139
    • To a common transfer chamber 102 of a treatment system 100, a treatment chamber 104a of an etching system 104, treatment chambers 106a and 108a of first and second CVD systems 106 and 108, a cooling chamber (a post-treatment chamber) 110a of a cooling system 110, and first and second cassette chambers 112 and 114 are connected. In the common transfer chamber 102, a transport arm 118 and a positioning system 120 are arranged. When the treatment system 100 is restarted after being stopped during a treatment, wafers W are sequentially recovered into a cassette 116 on the basis of the control of an operation storage device, which stores therein the origin data and destination data of the wafers W. At this time, the wafers W heated to a very high temperature by a thin film deposition treatment are sequentially recovered into a cassette 116 after being cooled (post-treated), and other wafers W are sequentially recovered directly into the cassette 116. Thus, there is provided a method for recovering an object to be treated, into a cassette in a desired state when a treatment system is restarted after being stopped during a treatment.
    • 对于处理系统100的公共传送室102,蚀刻系统104的处理室104a,第一和第二CVD系统106和108的处理室106a和108a,以及第一和第二CVD系统106和108的冷却室(后处理室)110a 冷却系统110和第一和第二盒室112和114连接。 在公共传送室102中布置有传送臂118和定位系统120。 当处理系统100在处理期间停止之后重新启动处理系统100时,基于操作存储装置的控制,将晶片W依次回收到盒116中,操作存储装置存储有晶片W的原始数据和目的地数据。 此时,通过薄膜沉积处理被加热到非常高的温度的晶片W在冷却(后处理)之后被顺序地回收到盒116中,并且其它晶片W被顺序地直接回收到盒116中。因此,在那里 提供了一种在处理期间停止后重新开始处理系统时将待处理物体回收到期望状态的盒中的方法。
    • 20. 发明授权
    • Electric actuator with shock absorbing mechanism
    • 具有减震机构的电动执行机构
    • US09447855B2
    • 2016-09-20
    • US13991558
    • 2011-12-19
    • Hiroaki MochizukiHiroomi Kuribayashi
    • Hiroaki MochizukiHiroomi Kuribayashi
    • F16H25/20H02K7/06B63H20/10F16F9/32
    • F16H25/20B63H20/10F16F9/32F16H25/2021H02K7/06Y10T74/18576
    • An electric actuator is capable of easily achieving reduction in weight and size when compared to a hydraulic cylinder device, capable of being used in place of the hydraulic cylinder device, and capable of freely extending in response to a suddenly-applied impact load. An electric actuator converts rotation of an electric motor into advancing/retracting motion of an output rod using a screw shaft and a nut member mounted to the screw shaft. The output rod includes: a drive cylinder, to which the nut member is provided, the drive cylinder being arranged around the screw shaft; and a movable cylinder arranged to overlap the drive cylinder around the screw shaft and freely advancing and retreating with respect to the drive cylinder. The electric actuator further includes a releasing mechanism provided between the drive cylinder and the movable cylinder, for engaging the movable cylinder with the drive cylinder.
    • 与液压缸装置相比,电动执行器能够容易地实现重量和尺寸的减小,液压缸装置能够代替液压缸装置,并且能够响应于突然施加的冲击载荷而自由延伸。 电动执行器使用螺钉轴和安装到螺杆轴上的螺母构件将电动机的旋转转换成输出杆的前进/后退运动。 所述输出杆包括:驱动缸,所述螺母构件设置在所述驱动缸上,所述驱动缸围绕所述螺杆轴布置; 以及可动缸,其布置成围绕所述螺杆轴重叠所述驱动缸并相对于所述驱动缸自由地前进和后退。 电致动器还包括设置在驱动气缸和可动气缸之间的释放机构,用于将可动气缸与驱动气缸接合。