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11. 发明授权

US4901113A Image-forming device 失效
标题翻译：图像形成装置
公开(公告)号：US4901113A
公开(公告)日：1990-02-13
申请号：US263366
申请日：1988-10-27
申请人： Noboru Sawayama , Shinichi Kamiyama , Hideo Yuh , Masayuki Takashima , Tadayuki Sekiya
发明人： Noboru Sawayama , Shinichi Kamiyama , Hideo Yuh , Masayuki Takashima , Tadayuki Sekiya
IPC分类号： G03G15/01 , G03G15/041 , G03G15/08
CPC分类号： G03G15/041 , G03G15/0126 , G03G15/0896
摘要： An image forming device having a mechanism for conducting variable magnification by moving a mirror, and lenses, which includes an optical system having six mirrors and a mechanism for moving the fourth mirror and the fifth mirror which are disposed behind the lenses.
摘要翻译：一种具有通过移动反射镜进行可变放大的机构的图像形成装置，以及包括具有六个反射镜的光学系统和设置在透镜后面的第四反射镜和第五反射镜的移动机构的透镜。

12. 发明授权

US4814821A Image-forming device 失效
标题翻译：图像形成装置
公开(公告)号：US4814821A
公开(公告)日：1989-03-21
申请号：US73480
申请日：1987-07-15
申请人： Noboru Sawayama , Shinichi Kamiyama , Hideo Yuh , Masayuki Takashima , Tadayuki Sekiya
发明人： Noboru Sawayama , Shinichi Kamiyama , Hideo Yuh , Masayuki Takashima , Tadayuki Sekiya
IPC分类号： G03G15/01 , G03G15/041 , G03G15/08
CPC分类号： G03G15/041 , G03G15/0126 , G03G15/0896
摘要： An image forming device having a mechanism for conducting variable magnification by moving plurality of mirrors and lenses, which includes, an optical system having six mirrors and a mechanism for moving the fourth mirror and the fifth mirror which are disposed behind the lenses.
摘要翻译：一种具有通过移动多个反射镜和透镜来进行可变放大的机构的图像形成装置，其包括具有六个反射镜的光学系统和用于移动设置在透镜后面的第四反射镜和第五反射镜的机构。

13. 发明授权

US07176173B2 Washing liquid for semiconductor substrate and method of producing semiconductor device 有权
标题翻译：用于半导体衬底的洗涤液及其制造方法
公开(公告)号：US07176173B2
公开(公告)日：2007-02-13
申请号：US10659190
申请日：2003-09-10
申请人： Masayuki Takashima
发明人： Masayuki Takashima
IPC分类号： C11D1/62
CPC分类号： H01L21/02074 , C11D3/221 , C11D7/06 , C11D11/0047 , C23G1/24
摘要： An object of the present invention is to provide washing liquid for semiconductor substrate capable of removing grinding grains of silica, alumina or the like in a polishing agent and polishing trashes of copper, and capable of leaving little organic substance due to an additive used for preventing corrosion of copper on the surface of a copper wiring after washing, while corrosion of copper is suppressed, and a method of producing a semiconductor device using this washing liquid. The object is achieved by washing liquid for a semiconductor substrate having a copper wiring, comprising a basic compound and at least one selected from the group consisting of sugar alcohols and saccharides. Also the present invention provides a method of producing a semiconductor device comprising a step of forming a copper wiring by chemical mechanical polishing and washing it with washing liquid for a semiconductor substrate containing a basic compound and at least one selected from the group consisting of sugar alcohols and saccharides.
摘要翻译：本发明的目的是提供一种用于半导体衬底的洗涤液，其能够除去研磨剂中的二氧化硅，氧化铝等的研磨颗粒，并抛光铜的抛光物质，并且由于用于预防的添加剂而能够留下少量有机物质洗涤后铜线表面的铜的腐蚀，同时铜的腐蚀被抑制，以及使用该洗涤液的半导体装置的制造方法。该目的是通过洗涤具有铜布线的半导体衬底的液体来实现的，其包括碱性化合物和选自糖醇和糖类的至少一种。本发明还提供一种半导体器件的制造方法，其包括通过化学机械抛光形成铜布线并用含有碱性化合物的半导体基板的洗涤液和从糖醇中选择的至少一种和糖。

14. 发明申请

US20050287480A1 Photoresist stripper composition 审中-公开
标题翻译：光刻胶剥离剂组合物
公开(公告)号：US20050287480A1
公开(公告)日：2005-12-29
申请号：US11096681
申请日：2005-03-31
申请人： Masayuki Takashima
发明人： Masayuki Takashima
IPC分类号： G03F7/42 , G03C5/00 , H01L21/027 , H01L21/304
CPC分类号： G03F7/423
摘要： (Problem) It is to provide a stripper having excellent ability to suppress corrosion or damage to the copper wiring or the low-k film, and having excellent photoresist residue removability after ashing. (Solution) The invention provides a photoresist stripper composition characterized in containing salts of at least two different inorganic acids, surfactants and a corrosion inhibitor for metal, and having a pH in the range of 3-10; and a process for preparation of semiconductor devices characterized in that the photoresist residues generated during the preparation of semiconductor devices which employs copper or a copper-dominant alloy as the material for wiring is stripped using said photoresist stripper.
摘要翻译：（问题）提供具有优异的抑制铜布线或低k膜的腐蚀或损坏的能力的剥离器，并且在灰化后具有优异的光致抗蚀剂残留物去除性。（溶液）本发明提供一种光致抗蚀剂剥离剂组合物，其特征在于含有至少两种不同的无机酸，表面活性剂和金属腐蚀抑制剂的盐，并且pH在3-10的范围内; 以及半导体器件的制备方法，其特征在于，使用所述光致抗蚀剂剥离剂剥离在制备半导体器件期间产生的光致抗蚀剂残留物，其使用铜或铜主导合金作为布线材料。

15. 发明授权

US4949123A Toner supply device for a developing apparatus 失效
标题翻译：用于显影装置的调色剂供应装置
公开(公告)号：US4949123A
公开(公告)日：1990-08-14
申请号：US317564
申请日：1989-03-01
申请人： Masayuki Takashima
发明人： Masayuki Takashima
IPC分类号： G03G15/08
CPC分类号： G03G15/0872 , G03G2215/0665 , G03G2215/0675 , Y10S222/01
摘要： A toner supply device for supplying a toner to a developing apparatus of an electrophotographic copier or similar image recorder is implemented by a cylindrical toner tank mounted on the apparatus and a toner cartridge filled with a toner and removably loaded in the toner tank. A hook-like yieldable stop is fitted on the toner tank, while lugs having contiguous inclined surface are provided on the toner cartridge for urging the stop when the cartridge is inserted into the tank. The stop and lugs allow only a toner cartridge of exclusive kind associated with the image recorder to be inserted into the toner tank.
摘要翻译：用于向电子照相复印机或类似图像记录器的显影装置供应调色剂的调色剂供应装置通过安装在设备上的圆柱形调色剂罐和填充有调色剂并可移除地装载在调色剂罐中的调色剂盒来实现。在调色剂盒上安装有钩形可屈服的止动件，而当墨盒插入墨盒时，具有相邻倾斜表面的凸耳设置在调色剂盒上用于推动止动件。止动件和接片仅允许将与图像记录器相关的专有墨粉盒插入墨粉盒。

16. 发明申请

US20120080053A1 METHOD FOR CLEANING OF SEMICONDUCTOR SUBSTRATE AND ACIDIC SOLUTION 审中-公开
标题翻译：清洗半导体衬底和酸性溶液的方法
公开(公告)号：US20120080053A1
公开(公告)日：2012-04-05
申请号：US13266255
申请日：2010-04-30
申请人： Makoto Hidaka , Taku Ogura , Maiko Kikuchi , Motohiro Kageyama , Masayuki Takashima
发明人： Makoto Hidaka , Taku Ogura , Maiko Kikuchi , Motohiro Kageyama , Masayuki Takashima
IPC分类号： B08B3/08 , C11D7/60 , C23G1/02
CPC分类号： C11D3/046 , C11D3/2075 , C11D3/33 , C11D3/3947 , C11D7/10 , C11D7/265 , C11D7/3245 , C11D11/0047 , H01L21/02052
摘要： Disclosed is a cleaning method which can remove, particularly, all of an organic contaminant, a particle contaminant, and a metal contaminant adhered to a semiconductor substrate at a high cleaning level, and which can realize the reduction in environmental load caused by the cleaning. The method of cleaning the semiconductor substrate includes a first cleaning process of cleaning the semiconductor substrate with a cleaning composition including a transition-metal-containing water-soluble salt (A), a chelating agent (B1), and a peroxide (C), a ratio of the chelating agent (B1) to the transition-metal-containing water-soluble salt (A) being 0.5 molar equivalent or more; and a second cleaning process of cleaning the semiconductor substrate, which is cleaned through the first cleaning process, with an acidic solution containing a chelating agent (B2).
摘要翻译：公开了一种可以清除特别是全部有机污染物，颗粒污染物和在高清洁水平附着于半导体衬底上的金属污染物的清洁方法，并且能够实现由清洁引起的环境负荷的降低。清洗半导体衬底的方法包括用包含含过渡金属的水溶性盐（A），螯合剂（B1）和过氧化物（C）的清洁组合物清洗半导体衬底的第一清洁工艺，螯合剂（B1）与过渡金属的水溶性盐（A）的比例为0.5摩尔当量以上; 以及通过第一清洗处理清洗半导体衬底的第二清洁工艺，其中含有螯合剂（B2）的酸性溶液。

17. 发明授权

US07566666B2 Composition for removing an insulation material and related methods 有权
标题翻译：去除绝缘材料的组成和相关方法
公开(公告)号：US07566666B2
公开(公告)日：2009-07-28
申请号：US11500434
申请日：2006-08-08
申请人： Chun-Deuk Lee , Jung-Jea Myung , Myun-Kyu Park , Dong-Min Kang , Byoung-Woo Son , Masayuki Takashima , Young-Nam Kim , Hyun-Joon Kim
发明人： Chun-Deuk Lee , Jung-Jea Myung , Myun-Kyu Park , Dong-Min Kang , Byoung-Woo Son , Masayuki Takashima , Young-Nam Kim , Hyun-Joon Kim
IPC分类号： H01L21/461
CPC分类号： H01L21/31111 , H01L21/02079
摘要： A composition for removing an insulation material and related methods of use are disclosed. The composition comprises about 1 to 50 percent by weight of an oxidizing agent, about 0.1 to 35 percent by weight of a fluorine-containing compound, and water. The insulation material comprises at least one of a low-k material and a protection material.
摘要翻译：公开了一种用于除去绝缘材料的组合物和相关使用方法。该组合物包含约1-50重量％的氧化剂，约0.1-35重量％的含氟化合物和水。绝缘材料包括低k材料和保护材料中的至少一种。

18. 发明授权

US07485612B2 Electronic parts cleaning solution 失效
标题翻译：电子零件清洗液
公开(公告)号：US07485612B2
公开(公告)日：2009-02-03
申请号：US11174061
申请日：2005-06-30
申请人： Masayuki Takashima
发明人： Masayuki Takashima
IPC分类号： H01L21/00
CPC分类号： C11D11/0047 , H01L21/02052 , H01L21/02068
摘要： (Object) To provide a new electronic parts cleaning solution that inhibits the corrosion of silicon or metals other than the silicon, and that efficiently cleans off fine dust or organic matters adhered on the surface of electronic parts, and that does not have white turbidity easily.(Solution) An electronic parts clearing solution which is characterized in containing an anionic surfactant, hydroxide, metal corrosion inhibitor, water, and a nonionic surfactant represented by formula (I) and/or a nonionic surfactant represented by formula (II): HO-((EO)x—(PO)y)z—H (I) R-[((EO)a—(PO)b)c—H]m (II) (EO is an oxyethylene group, and PO is an oxypropylene group. x and y, and a and b are positive number, which x(x+y) and a(a+b) are 0.05 to 0.5 respectively, and z and c are positive integers. R is a residue group wherein hydrogen atoms are removed from hydroxyl group of alcohol or amine represented by a group having valency of 1˜4).
摘要翻译：（目的）提供抑制硅或金属以外的硅腐蚀的新的电子部件清洗液，能够有效地清除附着在电子部件表面的细小尘埃或有机物，并且不容易发生白浊。（溶液）一种电子部件清除液，其特征在于含有式（I）所示的阴离子表面活性剂，氢氧化物，金属缓蚀剂，水和非离子表面活性剂和/或式（II）表示的非离子性表面活性剂：在线公式描述=“在线公式”end =“lead”？HO - （（EO）x-（PO）y）zH（I）<？in-line-formula description =“In-line 公式“end =”tail“？> <？in-line-formula description =”In-line Formulas“end =”lead“？> R - [（（EO）a-（PO）b）cH] m （EO是氧化乙烯基，PO是氧化亚丙基）x和y，a和b是正数，其中 x（x + y）和a（a + b）分别为0.05〜0.5，z和c为正整数，R为残基，其中氢原子由醇或胺的羟基除去， 1〜4）。

19. 发明授权

US07199091B2 Photoresist stripper 失效
标题翻译：光阻剥离器
公开(公告)号：US07199091B2
公开(公告)日：2007-04-03
申请号：US11110533
申请日：2005-04-19
申请人： Masayuki Takashima
发明人： Masayuki Takashima
IPC分类号： C11D1/02 , C11D3/26 , C11D3/30
CPC分类号： C11D3/046 , C11D3/042 , C11D3/044 , C11D3/30 , C11D11/0047
摘要： Recently, use is made of copper wiring as the wiring material for semiconductor devices, and of low dielectric constant films as the insulating film between the lines of wiring. In this connection, a photoresist stripper is in need which can inhibit corrosion or damage on the copper wiring or the Low-k film, and which has excellent property of removing ashed photoresist residues. The invention provides a photoresist stripper (hereinafter, referred to as the stripper of the invention) characterized in containing a tertiary amine compound, an alkaline compound, a fluoro compound, and an anionic surfactant; and a process for preparation of semiconductor devices using the stripper of the invention.
摘要翻译：近来，使用铜布线作为半导体器件的布线材料，并且使用作为布线之间的绝缘膜的低介电常数膜。在这方面，需要能够抑制对铜布线或Low-k膜的腐蚀或损伤的光致抗蚀剂剥离剂，其具有除去灰化的光致抗蚀剂残留物的优异性能。本发明提供一种特征在于含有叔胺化合物，碱性化合物，氟化合物和阴离子表面活性剂的光致抗蚀剂剥离剂（以下称为本发明的剥离剂）以及使用本发明的脱模剂制备半导体器件的方法。

20. 发明授权

US07186354B2 Anticorrosive treating concentrate 有权
标题翻译：防腐处理浓缩液
公开(公告)号：US07186354B2
公开(公告)日：2007-03-06
申请号：US09797587
申请日：2001-03-05
申请人： Hidemitsu Aoki , Hiroaki Tomimori , Masayuki Takashima
发明人： Hidemitsu Aoki , Hiroaki Tomimori , Masayuki Takashima
IPC分类号： C09K3/00 , C23F11/00
CPC分类号： H01L21/02071 , C23G1/26 , H01L21/32134
摘要： According to the present invention, there is provided an anticorrosive treating concentrate usable for an exposed surface of a metal (e.g. copper or a copper alloy), containing an anticorrosive agent and a precipitation inhibitor and having a pH of 4 to 12 when used in the form of an aqueous solution, in which concentrate the anticorrosive agent is a triazole type compound and/or a derivative thereof and is contained in a concentration of 0.05 to 20% by weight and the precipitation inhibitor is a compound having at least one nitrogen atom but no metal atom in the molecule.
摘要翻译：根据本发明，提供了一种用于金属（例如铜或铜合金）的暴露表面的防腐蚀处理浓缩物，其含有防腐剂和沉淀抑制剂，并且当用于形式的水溶液，其中防腐剂为三唑型化合物和/或其衍生物，浓度为0.05〜20重量％，沉淀抑制剂为具有至少一个氮原子的化合物，但为分子中没有金属原子。

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