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11. 发明专利

JPH0547886A DETERMINATION OF OPTIMUM THRESHOLD VALUE FOR DETECTING FOREIGN MATTER 失效
公开(公告)号：JPH0547886A
公开(公告)日：1993-02-26
申请号：JP22883391
申请日：1991-08-14
申请人： HITACHI ELECTR ENG
发明人： JINGU TAKAHIRO
IPC分类号： G01B11/24 , G01N21/88 , G01N21/94 , G01N21/956 , G03F1/84 , H01L21/027 , H01L21/66
摘要： PURPOSE:To provide a method for determining an optimum threshold value rapidly by computerized processing using a statistic technique in a wear foreign matter inspector. CONSTITUTION:At every stage of the process of IC chips, optional adjacent chips on a wafer surface are selected for testing as test chips. These are tested by a foreign matter inspector and subjected to computerized processing to prepare a frequency distribution of pixel count Ng to the level Lv of each pixel signal, and an approximation curve f (Lv) approximate to this frequency distribution is determined. The level of a pixel signal with an approximation curve of 0 is calculated to be an optimum threshold value Vth. This enables an optimum threshold value at every stage of the process to test chips to be determined by computerized processing and the optimum threshold value to be applied for IC chips at every stage of the process, thereby eliminating influences of patterns to detect foreign matters satisfactorily.

12. 发明专利

JPH0547901A ALIGNMENT METHOD OF WAFER 失效
公开(公告)号：JPH0547901A
公开(公告)日：1993-02-26
申请号：JP22883491
申请日：1991-08-14
申请人： HITACHI ELECTR ENG
发明人： JINGU TAKAHIRO
IPC分类号： H01L21/66 , G01B11/00 , G05D3/12 , H01L21/68
摘要： PURPOSE:To provide a method wherein, in a foreign matter inspection equipment using a comparison method of adjacent chips, corresponding same patterns are correctly selected from the similar shape patterns of two symmetrical IC chips, X, Y coordinate values of high precision are obtained from image data whose pattern is indistinct, and high precision alignment of a wafer is enabled. CONSTITUTION:Image data of the same parts selected from patterns PTa, PTb of two IC chips are compared by a pattern matching unit 6f, and the identity is confirmed. Image data of perpendicularly intersecting parts of both of the confirmed same parts are processed by a filing unit 6g, and the respective contour curves S1, S2 are extracted. From these curves, the angle deviation of wafers are calculated, by obtaining X, Y coordinate (xa, ya), (xb, yb) of perpendicularly intersecting points Pa, Pb of both of the perpendiclarly intersecting parts. The wafer is rotated by the angle deviation amount, and IC chip rows in the X-direction are aligned in the X-axis direction.

13. 发明专利

JPH07140082A METHOD FOR SETTING DISCRIMINATION THRESHOLD BETWEEN FOREIGN MATTER AND PATTERN 失效
公开(公告)号：JPH07140082A
公开(公告)日：1995-06-02
申请号：JP30991393
申请日：1993-11-16
申请人： HITACHI ELECTR ENG
发明人： JINGU TAKAHIRO , CHIKAMATSU SHUICHI
IPC分类号： G01B11/24 , G01B11/245 , G01N21/88 , G01N21/93 , G01N21/94 , G01N21/956 , G06T1/00 , G06T7/00 , H01L21/66
摘要： PURPOSE:To make possible the setting of threshold value that properly discriminates foreign matters from a pattern by, with a clear test sample, generating 2-D distribution figure for both photo-detection voltages of P.S polarized light of a pattern wiring and multiple standard particles of different diameters corresponding to the foreign matter. CONSTITUTION:Against the test sample with no sticking foreign matters, both photo-detection voltages Vp and Vs are measured for P and S polarized components of a wiring pattern. They are digitized with an A/D convertors 51a.51b and stored in the memory area of a RAM 53. Then standard particles of 1mum and 2mum in diameter are stuck to a glass plate in plural pieces, and both voltages Vp and Vs against them are measured and stored in the RAM 53. Then, the data in RAM 53 are read by the micro processor MPU 52, and 2-D distribution figure is outputted to an output device 54. In the distribution figure, the boarder line separating the standard particles from the distributed area of pattern wiring is set, and that is used as the threshold value which discriminates foreign matters from a wiring pattern.

14. 发明专利

JPH0545296A FOREIGN MATTER INSPECTING DEVICE FOR WAFER 失效
公开(公告)号：JPH0545296A
公开(公告)日：1993-02-23
申请号：JP22883591
申请日：1991-08-14
申请人： HITACHI ELECTR ENG
发明人： JINGU TAKAHIRO
IPC分类号： G01B11/30 , G01N21/88 , G01N21/94 , G01N21/956 , H01L21/66
摘要： PURPOSE:To make sensing of foreign matters over the whole surface of wafer by furnishing an edge foreign matter sensing means to sense foreign matters attached to the peripheral edges of a wafer and the inter-IC chip edge parts, producing a photo-receiving signal for the diffusive light at the edge parts, and sensing existence of foreign matters through comparison of the photo- receiving signal with the threshold. CONSTITUTION:When a wafer 1 is scanned with a laser beam Lx, a position signal exhibiting the X-Y coordinates for the scanning position is emitted and fed to a control signal generation part 5a, which issues control signals Cr, Ck. The control signal Cr corresponds to the coordinates Xs, Xt for intersections s, t of the laser beam Lx with the chip outsides at two ends while the control signal Ck corresponds the coordinates Xr, Xu for intersections r, u of the laser beam with the wafer periphery 1a. Threshold Ve and chip threshold Vth are stored in a threshold register. The differential data from a differential circuit 4c is subjected to comparison, and foreign matters in the chip are sensed. Thus, sensing of foreign matters over the whole wafer surface is made practicable by furnishing a simple foreign matter sensing means applicable to the edge parts as embodied in the structure as described above.

15. 发明专利

JPH07306154A METHOD FOR DETECTING FOREIGN MATTER ON WAFER 失效
公开(公告)号：JPH07306154A
公开(公告)日：1995-11-21
申请号：JP11969794
申请日：1994-05-10
申请人： HITACHI ELECTR ENG
发明人： JINGU TAKAHIRO
IPC分类号： G01N21/88 , G01N21/93 , G01N21/94 , G01N21/956 , H01L21/66
摘要： PURPOSE:To satisfactorily detect foreign matter adhering to a wafer by eliminating the scattered light front a light spot caused by the wiring pattern of various kinds of IC chips. CONSTITUTION:A light receiving system 4 composed of a plurality of optical fibers 42 and photoelectric conversion sensors 43 respectively connected to the fibers 42, MPU 61 which prepares data about scattered light by processing the detecting signals of the sensors 43, and MEM 62 having memory cells mS corresponding to the fibers 42 are provided and a test wafer 1' is scanned with a light spot in advance so as to prepare the luminescent point data of scattered light LR' caused by a wiring pattern PT. The prepared luminescent point data are stored in the memory cells mS. Dust particle data are obtained by eliminating those which are coincident with the luminescent point data stored in the memory cells mS from the scattered light data obtained by scanning a wafer 1 to be inspected and calculating the sum total of the remaining scattered light data.

16. 发明专利

JPH0547885A SYSTEM FOR INSPECTING WAFER FOREIGN MATTER BY COMPARISON WITH ADJACENT CHIPS 失效
公开(公告)号：JPH0547885A
公开(公告)日：1993-02-26
申请号：JP22883191
申请日：1991-08-14
申请人： HITACHI ELECTR ENG
发明人： JINGU TAKAHIRO
IPC分类号： G01N21/88 , G01N21/93 , G01N21/94 , G01N21/956 , H01L21/66 , H01L21/68 , H01S3/00
摘要： PURPOSE:To provide an inspection system which prevents the inspection omission of both end chips in a foreign matter inspective device by system for comparion adjacent chips. CONSTITUTION:When scanning with a laser beam is in the positive direction (LR) of X, the polarity of differential data of the chip at the foremost position (A) and at its following position (B) of a X-directional chip array 11X is reversed; when in the negative direction of X, the polarity of differential data of the chip at the final position (N) and at its preceding position (M) of the chip array is reversed: results are compared with the threshold value Vth of positive pole to detect foreign matters of both end chips at the foremost position (A) and the final position (N). Chips (B)-(M) other than those at both ends of the chip array have foreign matters detected as the prior art by comparing the differential data of + pole of detected data of the chip at the rear position and at the fore position with the threshold value V.. of positive pole, whereas both end chips have foreign matters detected regardless of the scanning direction of a laser beam by reversing the polarity of their differential data to-with the result that all the chips are inspected.

17. 发明专利

JPH0546737A METHOD FOR SETTING UP FOREIGN SUBSTANCE DETECTING THRESHOLD 失效
公开(公告)号：JPH0546737A
公开(公告)日：1993-02-26
申请号：JP22883291
申请日：1991-08-14
申请人： HITACHI ELECTR ENG
发明人： JINGU TAKAHIRO
IPC分类号： G01N21/88 , G01N21/94 , G01N21/956 , G03F1/84 , G06T1/00 , H01L21/027 , H01L21/66
摘要： PURPOSE:To rapidly find out a proper detection threshold for the difference data of adjacent chips by computer processing in a foreign substance inspecting device based upon an adjacent chip comparing method. CONSTITUTION:Optional adjacent chips are selected as test chips in each step of a chip process and scanned with laser beams and respective picture element signals g on the whole surface of each chip are respectively stored in corresponding areas 6a, 6b of a video RAM. Respective stored picture element signals are successively read out by the processing of a computer 4e, the difference data (Sa-Sb) of picture element signals corresponding to both chips is formed by a difference circuit 6c and respective picture element signals of the difference data are detected by a variable threshold vth obtained from a variable threshold circuit 6g and mapped on a CRT 6f. A threshold allowing an operator to observe only the image of a foreign substance p by erasing the image of a residual pattern R left in the difference data is found out by changing the variable threshold and set up in a foreign substance detecting part 4d as a proper detection threshold [Vth] for respective adjacent chips in the process step.

18. 发明专利

JPH0545294A FOREIGN MATTER SENSING SYSTEM USING FLOATING THRESHOLD 失效
公开(公告)号：JPH0545294A
公开(公告)日：1993-02-23
申请号：JP22882991
申请日：1991-08-14
申请人： HITACHI ELECTR ENG
发明人： JINGU TAKAHIRO
IPC分类号： G01B11/30 , G01N21/88 , G01N21/93 , G01N21/94 , G01N21/956 , H01L21/66
摘要： PURPOSE:To provide a foreign matter inspecting device due to the adjoining chip comparison method which excludes both the picture element signal of edge diffusion light and the residual pattern of differential data for two chips using a floating threshold varying in pursuit of the picture element signal for each chip. CONSTITUTION:That of the two corresponding picture element signals of adjoining chips which is the smallest (g1-g5, etc.) is salected, and the selected picture element signal is multiplied with a certain factor (k) smaller than 1 to produce No.1 threshold vth1. That of the differentiation signals da, db obtained through differentiation of the two picture element signals which is the smaller, db, is selected, and this db is multiplied with a non-liner factor eta which is greater as the size of the signal increases, to produce No.2 threshold vth2. The two values are added together to produce a floating threshold vthf, and with this each picture element signal of the differential data ¦(Sa-Sb)¦ is compared to serve for sensing of foreign matters (p).

19. 发明专利

JP2004184142A Defect inspection method and apparatus therefor 审中-公开
标题翻译：缺陷检查方法及其设备
公开(公告)号：JP2004184142A
公开(公告)日：2004-07-02
申请号：JP2002349357
申请日：2002-12-02
申请人： Hitachi Electronics Eng Co Ltd , Hitachi Ltd , 日立電子エンジニアリング株式会社 , 株式会社日立製作所
发明人： HAMAMATSU REI , NOGUCHI MINORU , NISHIYAMA HIDETOSHI , OSHIMA YOSHIMASA , JINGU TAKAHIRO , UTO YUKIO
IPC分类号： G01B11/30 , G01N21/956 , G06T1/00 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To efficiently separate a signal from a pattern from a signal from a defect, in a technique for inspecting a micro circuit pattern using an image formed by irradiation with a white light, a laser beam or an electron beam.
SOLUTION: This inspection apparatus for a semiconductor device is provided with a function for shielding selectively diffracted light of the circuit pattern existing on an object to be inspected.
COPYRIGHT: (C)2004,JPO&NCIPI

20. 发明专利

JP2004177377A Inspecting method and inspecting apparatus 审中-公开
公开(公告)号：JP2004177377A
公开(公告)日：2004-06-24
申请号：JP2002347134
申请日：2002-11-29
申请人： Hitachi Electronics Eng Co Ltd , Hitachi Ltd , 日立電子エンジニアリング株式会社 , 株式会社日立製作所
发明人： HAMAMATSU REI , NOGUCHI MINORU , NISHIYAMA HIDETOSHI , OSHIMA YOSHIMASA , JINGU TAKAHIRO , UTO YUKIO
IPC分类号： G01B11/30 , G01N21/88 , G01N21/94 , G01N21/95 , G01N21/956 , H01L21/66
CPC分类号： G01N21/8806 , G01N21/94 , G01N21/9501 , G01N21/95623
摘要： PROBLEM TO BE SOLVED: To efficiently separate a signal from a pattern from a signal from a defect, in a technology of inspecting a micro circuit pattern using an image formed by irradiating with a white light, a laser beam, or an electronic beam.
SOLUTION: In this inspecting apparatus 91 of a semiconductor device, a space filter on which a Fourier transformation image of a circuit pattern on an inspected object is printed is disposed in a detection optical system 200, and a diffracted light of the circuit pattern existing on the inspected object is shielded selectively. Using the space filter on which the Fourier transformation image of the pattern on a wafer 1 is printed, a foreign matter and a defect can be detected with high accuracy and high sensitivity.
COPYRIGHT: (C)2004,JPO

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