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11. 发明专利

DE102011120412A1 Excimerlampe mit einer Emissionswellenlänge von 172 nm 未知
公开(公告)号：DE102011120412A1
公开(公告)日：2013-06-13
申请号：DE102011120412
申请日：2011-12-08
申请人： HERAEUS QUARZGLAS , HERAEUS NOBLELIGHT GMBH
发明人： ARNOLD ERICH , WITZKE HANS-DIETER , NEUMANN CHRISTIAN , SCHILLING FRANZ-JOSEF , STAMMINGER MARK , KUEHN BODO , SCHREIBER ANDREAS
IPC分类号： H01J65/04 , C03C3/06 , H01J61/30
摘要： Excimerlampe haben ein Entladungsgefäß, das einen Entladungsraum einschließt, der ein Xenon-haltiges Füllgas enthält, welches bei dielektrischer Entladung Excimermoleküle mit einer Emissionswellenlänge von 172 nm erzeugt, wobei das Entladungsgefäß mindestens im Bereich eines Emissionsfensters aus synthetisch erzeugtem Quarzglas besteht. Um hiervon ausgehend das Emissionsfenster mit hoher Strahlenbeständigkeit auszustatten, die sich insbesondere darin in einer geringe zeitliche Veränderung der UV-Emission zeigt, wird erfindungsgemäß vorgeschlagen, dass das Quarzglas des Emissionsfensters durch Flammenhydrolyse eines siliziumhaltigen Einsatzmaterials und Direktverglasen erzeugt ist und einen mittleren Gehalt an Hydroxylgruppen von mindestens 900 Gew.-ppm, einen mittleren Wasserstoffgehalt von weniger als 2 × 1018 Molekülen/cm3, einen mittleren Gehalt an Chlor von weniger als 1 Gew.-ppm und eine fiktive Temperatur unterhalb von 1050°C aufweist.

12. 发明专利

DE102004018887B4 未知
公开(公告)号：DE102004018887B4
公开(公告)日：2009-04-16
申请号：DE102004018887
申请日：2004-04-15
申请人： HERAEUS QUARZGLAS
发明人： SCHREIBER ANDREAS , KUEHN BODO , SCHILLING FRANZ-JOSEF , ARNOLD ERICH , WITZKE HANS-DIETER
IPC分类号： C03C3/06 , C03B19/01 , C03B19/14 , C03B20/00 , C03B32/00 , C03C4/00 , H01J9/24 , H01J61/30 , H01J61/94 , H01J65/04
摘要： In a known method, a quartz glass component is produced for a UV radiation source by melting SiO 2 -containing grain. Starting therefrom, to indicate an inexpensive method by means of which a quartz glass component is obtained that is characterized by high radiation resistance, it is suggested according to the invention that synthetically produced quartz crystals are molten to obtain a pre-product which consists of quartz glass containing hydroxyl groups in a number greater than the number of SiH groups, and that for the elimination of SiH groups the pre-product is subjected to an annealing treatment at a temperature of at least 850° C., whereby the quartz glass component is obtained. In the quartz glass component of the invention, the quartz glass is molten from synthetically produced quartz crystals, and it has a content of SiH groups of less than 5x10 17 molecules/cm 3 .

13. 发明专利

DE102006010236A1 Immersion lithography projection objective material, comprising high refractive index, alkaline earth metal-containing phosphate glass, is obtained using deposition burner in presence of oxygen-containing gas 未知
$Immersion lithography projection objective material, comprising high refractive index, alkaline earth metal-containing phosphate glass, is obtained using deposition burner in presence of oxygen-containing gas$
公开(公告)号：DE102006010236A1
公开(公告)日：2007-09-06
申请号：DE102006010236
申请日：2006-03-02
申请人： HERAEUS QUARZGLAS
发明人： KUEHN BODO , OCHS STEFAN , TROMMER MARTIN , WIEDEMANN KARL-HEINZ
IPC分类号： B29D11/00 , G02B1/00 , G03F7/20
摘要： Production of an immersion lithography projection objective material (A), consisting of alkaline earth metal-containing phosphate glass of refractive index at least 1.6 at 193 nm, involves supplying an oxidizable synthetic phosphorus compound (B) and an alkaline earth metal compound (C) to a reaction zone (4) aligned with a deposition burner (1), where amorphous oxide particles (D) are formed in presence of oxygen-containing gas; and depositing (D) on a carrier.

14. 发明专利

AT278642T 未知
公开(公告)号：AT278642T
公开(公告)日：2004-10-15
申请号：AT02027127
申请日：2002-12-04
申请人： HERAEUS QUARZGLAS
发明人： KUEHN BODO , UEBBING BRUNO DR
IPC分类号： C03B20/00 , C03B19/14 , C03C3/06 , C03C4/00
摘要： Quartz glass blank has a glass structure without oxygen defect sites, a hydrogen content of 3 x 1017 to 2.0 x 1018 molecules/cm3, a hydroxyl content of 500-1000 wt. ppm, a silicon hydrogen group content of less than 2 x 1017 molecules/cm3, a chlorine content of 60-120 wt. ppm, an inhomogenity in refractive index DELTAn of less than 2 ppm and voltage birefringence of less than 2 nm/cm. Preferred Features: The hydroxyl (OH) content is 600-900, preferably 750-950 wt. ppm. The hydrogen content is 5 x 1017 to 1.0 x 1018 molecules/cm3. The chlorine content is 80-100 wt. ppm.

15. 发明专利

DE10302914A1 未知
公开(公告)号：DE10302914A1
公开(公告)日：2004-08-12
申请号：DE10302914
申请日：2003-01-24
申请人： HERAEUS QUARZGLAS
发明人： TROMMER MARTIN , OCHS STEFAN , SCHAEFER JUERGEN , KUEHN BODO , UEBBING BRUNO , BAUSCHER HEINZ
IPC分类号： C03B19/14 , C03B19/01 , C03B20/00 , C03C3/06
摘要： The invention relates to a previously known method for producing synthetic silica glass, comprising the following steps: a gas stream containing a vaporizable initial substance, which can be converted into SiO 2 by means of oxidation or flame hydrolysis, is formed; the gas stream is delivered to a reaction zone in which the initial substance is converted so as to form amorphous SiO 2 particles; the amorphous SiO 2 particles are deposited on a support so as to form an SiO 2 layer; and the SiO 2 is vitrified during or following deposition of the SiO 2 particles in order to obtain the silica glass. The aim of the invention is to create an economical method for producing synthetic silica glass, which is characterized by a favorable damaging behavior towards short-wave UV radiation while being particularly suitable for producing an optical component used for transmitting high-energy ultraviolet radiation having a wavelength of 250 nm or less. Said aim is achieved by using a mixture of a monomeric silicon compound containing a singular Si atom and an oligomeric silicon compound containing several Si atoms as an initial substance, provided that the oligomeric silicon compound in the mixture contributes less than 70 percent to the total silicon content.

16. 发明专利

DE10159962A1 未知
公开(公告)号：DE10159962A1
公开(公告)日：2003-07-03
申请号：DE10159962
申请日：2001-12-06
申请人： HERAEUS QUARZGLAS
发明人： KUEHN BODO , UEBBING BRUNO , TROMMER MARTIN , OCHS STEFAN , FISCHER GERO , HOLST ULLA
IPC分类号： C03B8/04 , C03B19/14 , C03B20/00 , C03C3/06 , C03C4/00 , C03B19/01
摘要： Quartz glass blank for optical component for transmission of ultraviolet radiation with wavelength of 250 nm or shorter has glass structure that is free of oxygen defect sites, hydrogen content of 0.1x10 power 16-4x10 power 16 molecules/cm3, hydroxyl group-content of 125-450 wt-ppm, silicon hydride group-content of less than 5x10 power 16 molecules/cm3, refractive index inhomogeneity, DELTAn, of less than 2 ppm, and stress birefringence of less than 2 nm/cm. An Independent claim is also included for a procedure for the manufacture of a quartz glass blank comprising generating a mixed quartz glass with a mean OH-content of 125-450 wt-ppm by mixing first and second quartz glasses, which are manufactured by flame hydrolysis of a silicon-containing compound, the first and second quartz glasses differing in their OH-contents.

17. 发明专利

DE10159959A1 Quartz glass blank used for an optical component for transferring ultraviolet radiation in microlithography e.g. for the production of highly integrated circuits has a glass structure without oxygen defect sites 未知
公开(公告)号：DE10159959A1
公开(公告)日：2003-06-26
申请号：DE10159959
申请日：2001-12-06
申请人： HERAEUS QUARZGLAS
发明人： UEBBING BRUNO , KUEHN BODO
IPC分类号： C03B20/00 , C03B19/14 , C03C3/06 , C03C4/00 , G02B1/00
摘要： Quartz glass blank has a glass structure without oxygen defect sites, a hydrogen content of 3 x 10 to 2.0 x 10 molecules/cm , a hydroxyl content of 500-1000 wt. ppm, a silicon hydrogen group content of less than 2 x 10 molecules/cm , a chlorine content of 60-120 wt. ppm, an inhomogenity in refractive index DELTA n of less than 2 ppm and voltage birefringence of less than 2 nm/cm. Preferred Features: The hydroxyl (OH) content is 600-900, preferably 750-950 wt. ppm. The hydrogen content is 5 x 10 to 1.0 x 10 molecules/cm . The chlorine content is 80-100 wt. ppm.

18. 发明专利

DE102011120412B4 Excimerlampe mit Emissionsfenster aus Quarzglas mit einem bestimmten Gehalt an Hydroxylgruppen, Wasserstoff und Chlor 未知
公开(公告)号：DE102011120412B4
公开(公告)日：2018-03-08
申请号：DE102011120412
申请日：2011-12-08
申请人： HERAEUS QUARZGLAS , HERAEUS NOBLELIGHT GMBH
发明人： ARNOLD ERICH , WITZKE HANS DIETER , SCHILLING FRANZ JOSEF , NEUMANN CHRISTIAN , STAMMINGER MARK , KUEHN BODO , SCHREIBER ANDREAS
IPC分类号： H01J65/04 , C03C3/06 , H01J61/30
摘要： Excimerlampe mit einem Entladungsgefäß, das einen Entladungsraum (3) einschließt, der ein Xenon-haltiges Füllgas enthält, welches bei dielektrischer Entladung Excimermoleküle mit einer Emissionswellenlänge von 172 nm erzeugt, wobei das Entladungsgefäß mindestens im Bereich eines Emissionsfensters (1) aus synthetisch erzeugtem Quarzglas besteht, das Hydroxylgruppen enthält, wobei das Quarzglas des Emissionsfensters (1) durch Flammenhydrolyse eines siliziumhaltigen Einsatzmaterials und Direktverglasen erzeugt ist und einen mittleren Gehalt an Hydroxylgruppen von mindestens 900 Gew.-ppm, einen mittleren Wasserstoffgehalt von we niger als 2 × 1018 Molekülen/cm3, einen mittleren Gehalt an Chlor von weniger als 0,1 Gew.-ppm und eine fiktive Temperatur unterhalb von 1050 °C aufweist.

19. 发明专利

IN4288CHN2014A METHOD FOR PRODUCING SYNTHETIC QUARTZ GLASS AND QUARTZ GLASS FOR USE AS A SHEATH MATERIAL FOR AN OPTICAL FIBRE 未知
公开(公告)号：IN4288CHN2014A
公开(公告)日：2015-09-04
申请号：IN4288CHN2014
申请日：2014-06-10
申请人： HERAEUS QUARZGLAS
发明人： TROMMER MARTIN , ZWARG STEFFEN , SATTMANN RALPH , KUEHN BODO
IPC分类号： C03B37/014
摘要： 2Known is a method for producing synthetic quartz glass comprising the following method steps: (a) reacting a carbonic silicon compound containing raw material with oxygen in a reaction zone into SiOparticles (b) precipitating the SiO2 particles on a sedimentation area by forming a porous SiO2 soot body containing hydrogen and hydroxyl groups (c) drying the porous SiO2 soot body and (d) glazing to the synthetic quartz glass by heating the soot body up to a glazing temperature. In order to indicate a method proceeding therefrom which facilitates a cost efficient production of quartz glass by means of pyrolysing or hydrolysing a carbon containing silicon compound using a carbon containing raw material the invention describes the production of a soot body with a carbon content within the range of 1 ppm by weight to 50 ppm by weight.

20. 发明专利

DE112008003728T5 Verfahren zur Herstellung eines optischen Bauteils aus Quarzglas 未知
公开(公告)号：DE112008003728T5
公开(公告)日：2011-03-03
申请号：DE112008003728
申请日：2008-02-27
申请人： HERAEUS QUARZGLAS
发明人： TROMMER MARTIN , OCHS STEFAN , ZWARG STEFFEN , KUEHN BODO
IPC分类号： C03B19/14 , C03C3/06

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