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11. 发明专利

JP2005195525A Small hole diameter automatic measuring instrument, small hole diameter measuring method, and shower plate manufacturing method 有权
标题翻译：小孔直径自动测量仪器，小孔直径测量方法和淋浴板制造方法
公开(公告)号：JP2005195525A
公开(公告)日：2005-07-21
申请号：JP2004003718
申请日：2004-01-09
申请人： Fujikin Inc , Tadahiro Omi , 忠弘大見 , 株式会社フジキン
发明人： OMI TADAHIRO , NAGASE MASAAKI , DOI RYOSUKE , NISHINO KOJI , NAKAMURA OSAMU , UNO TOMIO , IKEDA SHINICHI
IPC分类号： G01B13/10
CPC分类号： G01B13/10 , Y10T29/49432
摘要： PROBLEM TO BE SOLVED: To continuously, highly efficiently, and accurately, measure the diameter or cross section area of each of a plurality of small holes formed in a plate while determining and reporting small holes having diameter errors exceeding a set value. SOLUTION: This small hole diameter automatic measuring instrument comprises: a flow measuring part B mainly composed of an automatic pressure controller 4 for supplying a fluid to the inlet side of the small holes 8 with a set inlet side pressure P 1 controlled at a desired value while keeping an outlet side pressure P 2 of the small holes 8 in a plate 7 and an inlet side pressure P 1 of the small holes 8 in a critical state of the fluid; a plate supporter 12 for rotatably supporting the plate 7; a test probe supporter 13 thereabove for supporting a test probe 6 in an ascendable/descendable and traversable manner, the test probe 6 supplying the fluid from the measuring part B by making close contact airtightly with the inlet side of the small holes 8; a plate hold part C comprising controllers 14 and 15 for the two supporters 12 and 13; and a control part C equipped with a calculation/determination part C 2 for calculating the diameter or cross section area of each of the small holes 8 in process of supplying the fluid based on flow measurement values from the measuring part B, and an external output part C 3 for outputting relevant calculation values to the exterior. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了连续，高效，准确地测量形成在板中的多个小孔中的每一个的直径或横截面积，同时确定和报告具有超过设定值的直径误差的小孔。
解决方案：该小孔径自动测量仪器包括：主要由自动压力控制器4组成的流量测量部分B，该自动压力控制器4用于将流体供应到小孔8的入口侧，设定的入口侧压力P 1 控制在期望值，同时保持板7中的小孔8的出口侧压力P 2 和入口侧压力P 1 处于临界状态的小孔8; 用于可旋转地支撑板7的板支撑件12; 测试探针支撑件13，用于以可升降/可移动的方式支撑测试探针6，测试探针6通过与小孔8的入口侧紧密接触而从测量部分B供应流体; 包括用于两个支撑件12和13的控制器14和15的板保持部分C; 以及配备有计算/确定部件C 2 的控制部件C，用于根据来自测量装置的流量测量值计算供给流体的每个小孔8的直径或横截面面积部分B和用于将相关计算值输出到外部的外部输出部分C 3 。版权所有（C）2005，JPO＆NCIPI

12. 发明专利

JP2005010108A Automatic zero point correction device for pressure sensor, pressure control device and pressure type flow control device 有权
标题翻译：压力传感器自动零点校正装置，压力控制装置和压力型流量控制装置
公开(公告)号：JP2005010108A
公开(公告)日：2005-01-13
申请号：JP2003177135
申请日：2003-06-20
申请人： Fujikin Inc , Tadahiro Omi , Tokyo Electron Ltd , 忠弘大見 , 東京エレクトロン株式会社 , 株式会社フジキン
发明人： OMI TADAHIRO , SUGIYAMA KAZUHIKO , HINO SHOICHI , TAKAHASHI EIJI , SAEGUSA SHIN , IKEDA SHINICHI , NISHINO KOJI , DOI RYOSUKE , UENOYAMA TOYOMI , SUGITA KATSUYUKI
IPC分类号： G01L19/02 , G01L19/00 , G01L19/04
CPC分类号： G01L19/02 , G01L9/065 , G01L19/0023 , G05D7/0635
摘要： PROBLEM TO BE SOLVED: To provide a pressure sensor capable of detecting accurately the pressure regardless of its using period by correcting automatically the temporal zero point drift of the pressure sensor, and a pressure control device and a flow control device using it. SOLUTION: This pressure sensor using a semiconductor pressure-sensitive element for measuring liquid pressure is operated as follows: a sensor output voltage from the pressure sensor is outputted to the outside through an amplifier; the sensor output voltage is inputted into a temporal zero point drift correction means of the pressure sensor through a D/A converter; it is determined whether the sensor output voltage is larger than a set value or not by a sensor output determination means in the temporal zero point drift correction means; an operation condition of the pressure sensor is determined by an operation condition determination means in the temporal zero point drift correction means; and when the sensor output voltage is larger than the set value and the operation condition of the pressure sensor is under the operation condition set beforehand, a zero point correction voltage having the same voltage as the sensor output voltage and the reverse polarity thereto is inputted into an offset terminal of the amplifier through the D/A converter and the temporal zero point drift of the pressure sensor is deleted. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种能够通过自动校正压力传感器的时间零点漂移以及使用该压力传感器的压力控制装置和流量控制装置来精确地检测压力而不管其使用周期的压力传感器。解决方案：使用半导体压敏元件测量液体压力的压力传感器如下操作：来自压力传感器的传感器输出电压通过放大器输出到外部; 传感器输出电压通过D / A转换器输入压力传感器的时间零点漂移校正装置; 通过时间零点漂移校正装置中的传感器输出确定装置确定传感器输出电压是否大于设定值; 压力传感器的操作条件由时间零点漂移校正装置中的操作条件确定装置确定; 并且当传感器输出电压大于设定值并且压力传感器的操作条件处于预先设置的操作条件下时，将具有与传感器输出电压相同的电压和与其相反极性的零点校正电压输入到通过D / A转换器的放大器的偏移端子和压力传感器的时间零点漂移被删除。版权所有（C）2005，JPO＆NCIPI

13. 发明专利

JP2004265928A Valve for evacuation system 有权
公开(公告)号：JP2004265928A
公开(公告)日：2004-09-24
申请号：JP2003034762
申请日：2003-02-13
申请人： Fujikin Inc , Tadahiro Omi , 忠弘大見 , 株式会社フジキン
发明人： OMI TADAHIRO , IKEDA SHINICHI , YAMAJI MICHIO , KITANO MASASHI , MORIMOTO AKIHIRO
IPC分类号： H01L21/205 , F16K7/14 , F16K27/00 , F16K51/02
CPC分类号： F16K7/14 , F16K27/003 , F16K51/02
摘要： PROBLEM TO BE SOLVED: To provide a valve to prevent internal corrosion or clogging, sheet leak, and the like, due to deposition of dissociated products resulting from decomposition of gas as the scale of an evacuation system facility is reduced and the diameter of the piping in the evacuation system is decreased in order to reduce the cost and to shorten the evacuation time. SOLUTION: The valve for evacuation system comprises a body 2 provided with a valve seat 8 on the bottom face of a valve chamber 7 communicating with an inflow channel 5 and an outflow channel 6, a valve element seated in the valve seat or unseated therefrom, and a drive means 4 for seating the valve element in the valve seat or unseating it therefrom. In the valve 1 for controlling flow of fluid by seating the valve element in the valve seat or unseating it therefrom thereby interrupting or opening the channel, at least the surface of the body 2 touching the fluid is subjected to aluminium passivation. COPYRIGHT: (C)2004,JPO&NCIPI

14. 发明专利

JP2004199109A Flow control method for fluid using pressure-type flow controller 有权
公开(公告)号：JP2004199109A
公开(公告)日：2004-07-15
申请号：JP2002363221
申请日：2002-12-16
申请人： Fujikin Inc , 株式会社フジキン
发明人： IKEDA SHINICHI , MORIMOTO AKIHIRO , DOI RYOSUKE , NISHINO KOJI , UNO TOMIO
IPC分类号： G01F1/36 , G01F1/50 , G01F25/00 , G05D7/06
摘要： PROBLEM TO BE SOLVED: To easily find the specific flow factor of a type of gas with high accuracy even if the physical properties of the type of gas are unknown in the case of a pressure-type flow controller. SOLUTION: This pressure-type flow controller calculates an actual flow Qg of an arbitrary fluid according to Qg = Qb×SFF when the arbitrary fluid Gg is assumed to be a flow-controlled fluid (where, Qb is a measured flow of the arbitrary fluid in the flow controller assuming that the flow-controlled fluid is a reference fluid Gb, and SFF is the specific flow factor of the arbitrary fluid Gg relative to the reference fluid Gb). The flow factor SFF is operated according to SFF = Δt(Gb)/Δt(Gg)×T(Gb)/T(Gg), (where, Δt(Gb) is time for which a pressure drop reaches an arbitrary set value under the pressure attenuation characteristic of an orifice with respect to the reference fluid Gb, Δt(Gg) is time for which a pressure drop reaches an arbitrary set value ΔP under the pressure attenuation characteristic of the orifice with respect to the arbitrary fluid Gg, T(Gb) is the temperature of the reference fluid Gb, and T(Gg) is the temperature of the arbitrary fluid Gg). COPYRIGHT: (C)2004,JPO&NCIPI

15. 发明专利

JP2003074767A Pipe joint 有权
标题翻译：管接头
公开(公告)号：JP2003074767A
公开(公告)日：2003-03-12
申请号：JP2002237374
申请日：2002-08-16
申请人： Fujikin Inc , Tadahiro Omi , 忠弘大見 , 株式会社フジキン
发明人： OMI TADAHIRO , SHINOHARA TSUTOMU , YAMAJI MICHIO , IKEDA SHINICHI , YAMAMOTO KANETSUGU
IPC分类号： F16L19/03
摘要： PROBLEM TO BE SOLVED: To provide a pipe joint without a recessed part wherein liquid collects after completion of fastening, by doing away with the recessed part caused by deformation of a gasket and respective gasket-pressing annular protrusions.
SOLUTION: This pipe joint has inner circumferential faces 33a, 34a wherein the gasket-pressing annular protrusions 33, 34 of respective joint members 31, 32 are continued to the inner circumferential faces of the respective joint members 31, 32, and seal faces 33b, 34b closely contacting with end faces of the gasket 20 radially outside the inner circumferential faces 33a, 34a. An internal diameter of the gasket 20 is equalized to internal diameters of the respective joint members 31, 32 before the fastening, while the seal faces 33b, 34b are most projected radially outside the inner edges. When most projecting ends P of the seal faces 33b, 34b abut on the end faces of the gasket 20, gaps G1 are formed between portions radially inside the most projecting ends P of the seal faces 33b, 34b and portions radially inside the end faces of the gasket 20, and the portions radially inside the end faces of the gasket 20 are axially deformed in the completion of the fastening to eliminate the gaps G1.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：提供一种没有凹部的管接头，其中，在完成紧固之后液体收集，通过消除由垫圈和相应的垫圈压紧环形突起引起的变形引起的凹部。解决方案：该管接头具有内周面33a，34a，其中各接头构件31,32的垫圈压紧环形突起33,34连续于各接头构件31,32的内周面和密封面33b， 34b在内周面33a，34a的径向外侧与垫圈20的端面紧密接触。垫圈20的内径在紧固之前与各个接头构件31,32的内径相等，而密封面33b，34b最大程度地径向向内侧延伸。当密封面33b，34b的大部分突出端部P与垫片20的端面抵接时，在密封面33b，34b的最突出端部P的径向内侧的部分的径向内侧的部分的径向内侧形成有间隙G1，垫圈20，并且在紧固完成时，垫圈20的端面径向内侧的部分轴向变形以消除间隙G1。

16. 发明专利

JP2013232101A Gas distributary supply device for semiconductor manufacturing device 有权
标题翻译：用于半导体制造设备的气体分配供应装置
公开(公告)号：JP2013232101A
公开(公告)日：2013-11-14
申请号：JP2012103857
申请日：2012-04-27
申请人： Fujikin Inc , 株式会社フジキン
发明人： NISHINO KOJI , DOI RYOSUKE , HIRATA KAORU , SUGITA KATSUYUKI , IKEDA SHINICHI
IPC分类号： G05D7/06
CPC分类号： G05D7/0641 , G05D7/0664 , Y10T137/87772
摘要： PROBLEM TO BE SOLVED: To achieve the sharp downsizing, cost reduction, and accuracy enhancement of a gas distributary supply device of a semiconductor manufacturing device.SOLUTION: The gas distributary supply device of a semiconductor manufacturing device includes: a control valve 3 constituting a pressure type flow rate control part connected to a process gas inlet 11; a plurality of branch pipe lines 9a and 9n connected in parallel with the downstream side of a gas supply main pipe 8; branch pipe line opening/closing valves 10a and 10n interposed in the respective branch pipe lines; orifices 6a and 6n disposed at the downstream side of the branch pipe line opening/closing valves; a temperature sensor 4 disposed in the neighborhood of a process gas passage between the control valve and the orifices; a pressure sensor 5 disposed in the process gas passage between the control valve and the orifices; and an arithmetic control part 7 constituted of a pressure type flow rate arithmetic control part to which a pressure signal from the pressure sensor and a temperature signal from the temperature sensor are input, which calculates a total flow rate Q of process gas circulating through the orifices, and which outputs a control signal for controlling the control valve to perform an opening/closing operation in a direction in which a difference between the calculated flow rate value and a set flow rate value is decreased to a valve driving part 3a.
摘要翻译：要解决的问题：为了实现半导体制造装置的气体分配供给装置的急剧的小型化，降低成本和精度提高。解决方案：半导体制造装置的气体分配供给装置包括：控制阀3，其构成压力连接到处理气体入口11的流量控制部分; 与气体供给主管8的下游侧并联连接的多根分支管路9a，9n; 分支管路开/关阀10a和10n插入各支管中; 设置在分支管路开/关阀的下游侧的孔口6a和6n; 设置在控制阀和孔之间的处理气体通道附近的温度传感器4; 设置在控制阀和喷嘴之间的处理气体通道中的压力传感器5; 以及运算控制部7，其由输入来自压力传感器的压力信号和来自温度传感器的温度信号的压力型流量运算控制部构成，计算出通过该孔流动的处理气体的总流量Q 并且输出用于控制控制阀的控制信号，以在计算出的流量值和设定流量值之间的差减小到阀驱动部3a的方向上执行打开/关闭操作。

17. 发明专利

JP2013178709A Gas diversion supply device and gas diversion supply method using the same 有权
标题翻译：气体供应装置和气体分配供应方法
公开(公告)号：JP2013178709A
公开(公告)日：2013-09-09
申请号：JP2012043090
申请日：2012-02-29
申请人： Fujikin Inc , 株式会社フジキン
发明人： SAWADA YOHEI , IKEDA SHINICHI , DOI RYOSUKE , NISHINO KOJI
IPC分类号： G05D7/06
CPC分类号： G05D7/0641 , G05D7/0664 , Y10T137/0368 , Y10T137/776
摘要： PROBLEM TO BE SOLVED: To prevent an occurrence of gas overshoot in a diversion path when introducing gases in a gas diversion supply device for performing diversion supply of gas flow from a pressure flow rate controller through a plurality of diversion paths.SOLUTION: A gas diversion supply device is provided with: a pressure flow rate controller 4; a plurality of diversion paths Lto Lwhich are connected in parallel and perform diversion supply of gases from the pressure flow rate controller 4 to a process chamber 15; thermal type flow rate sensors 6a to 6n mediated in the respective diversion paths Lto L; motor-operated valves 7a to 7n provided on the downstream side of the thermal flow rate sensors 6a to 6n; and switching controllers 16a to 16n for controlling opening/closing of the respective motor-operated valves 7a to 7n. The switching controllers 16a to 16n are switchable between valve opening degree control for holding the motor-operated valves 7a to 7n by a valve opening degree control command signal Sp to a prescribed fixed valve opening degree and diversion flow rate control for adjusting opening degree of the motor-operated valves 7a to 7n by feedback control based on a flow rate detection signal Sm of the thermal type flow rate sensor 6 by a diversion flow rate control command signal Ss.
摘要翻译：要解决的问题：为了防止在通过多个引导路径从压力流量控制器进行气体流动的导流供气装置中引入气体时在引流路径中发生气体过冲。解决方案：气体导流供给装置设置有：压力流量控制器4; 多个并联连接的引导路径LtoL，并且执行从压力流量控制器4向处理室15分配气体供给; 在各导流路径Lto L中介导的热式流量传感器6a〜6n; 设置在热流量传感器6a〜6n的下游侧的电动阀7a〜7n; 以及用于控制各个电动阀7a至7n的打开/关闭的开关控制器16a至16n。开关控制器16a〜16n可以通过阀开度控制指令信号Sp保持电动阀7a〜7n的阀开度控制到规定的固定阀开度，以及用于调节开度控制指令通过基于热式流量传感器6的流量检测信号Sm的转向流量控制指令信号Ss进行的反馈控制，来实现电动阀7a〜7n的动作。

18. 发明专利

JP2013055303A Raw material vaporization supply device with raw material concentration detection mechanism 有权
标题翻译：原材料浓缩装置原料浓度检测机理
公开(公告)号：JP2013055303A
公开(公告)日：2013-03-21
申请号：JP2011194285
申请日：2011-09-06
申请人： Fujikin Inc , 株式会社フジキン
发明人： NAGASE MASAAKI , HIRATA KAORU , HIDAKA ATSUSHI , NISHINO KOJI , IKEDA SHINICHI , NAKAMURA TAKESHI
IPC分类号： H01L21/205 , C23C16/455
CPC分类号： F17D3/00 , C23C16/4482 , C23C16/45561 , G05D11/135 , Y10T137/8158
摘要： PROBLEM TO BE SOLVED: To provide a raw material vaporization supply device including a raw material concentration detection mechanism which allows for stable supply to a process chamber under high accuracy flow control, while adjusting the raw material concentration in a mixed gas accurately.SOLUTION: In the raw material vaporization supply device which supplies a carrier gas Gthrough a master flow controller 3 into a source tank 5, and supplies the saturation steam G of a raw material 4, generated while holding at a constant temperature in a thermostatic section, to a process chamber, an automatic pressure regulating device 8 is provided in the outflow path of a mixed gas Gfrom the source tank, and a mass flow meter 9 is provided on te downstream side thereof. Internal pressure Po of the source tank 5 is controlled to a predetermined value by performing open/close control of the control valve 8a of the automatic pressure regulating device 8. The detection values of flow rate Qof carrier gas G, and the source tank inner pressure Po by the master flow controller 3, and the flow rate Qof a mixed gas Gs of the mass flow meter 9 are input to a raw material concentration operation unit where the flow rate Qof the raw material 4 and the raw material concentration K are operated and displayed.
摘要翻译：解决的问题：提供一种原料蒸发供给装置，其包括原料浓度检测机构，其能够在精确地调整混合气体中的原料浓度的同时，在高精度流量控制下稳定地供给处理室。解决方案：在通过主流量控制器3将载气G K 供给源罐5的原料蒸发供给装置中，在恒温区域保持恒定温度下产生的原料4到处理室，在混合气体G S“的流出路径中设置有自动调压装置8， SB>，并且在其下游侧设置质量流量计9。通过执行自动压力调节装置8的控制阀8a的打开/关闭控制，将源箱5的内部压力Po控制到预定值。流量Q 1的检测值 / SB>载气G K ，由主流量控制器3输出源罐内压Po，流量Q S < 质量流量计9的混合气体Gs / SB>输入原料浓度运转单元，原料浓度运转单元中原料4的流量Q 2 浓度K被操作和显示。版权所有（C）2013，JPO＆INPIT

19. 发明专利

JP2012146321A Corrosion-resistant pressure type flow rate controller for reference pressure type flow rate controller constituting pressure control type flow rate reference unit 有权
标题翻译：用于参考压力类型流量控制器的耐腐蚀压力类型流量控制器构成压力控制类型流量参考单元
公开(公告)号：JP2012146321A
公开(公告)日：2012-08-02
申请号：JP2012055216
申请日：2012-03-13
申请人： Fujikin Inc , Tokyo Electron Ltd , 東京エレクトロン株式会社 , 株式会社フジキン
发明人： MORIYA SHUJI , OKASE WATARU , SHINOHARA TSUTOMU , IKEDA SHINICHI , YAMAJI MICHIO , HAYASHI KYOTAKA , YOSHIDA TOSHIHIDE , OMATA YASUYUKI
IPC分类号： G05D7/00
CPC分类号： G01F25/0007 , G01F25/003 , G01F25/0053 , G05D7/0635
摘要： PROBLEM TO BE SOLVED: To provide a reference pressure type flow rate controller that easily performs flow rate calibration of a flow rate controller targeting corrosive gas, is inexpensive and high in flow rate control precision, and has corrosion resistance.SOLUTION: A reference pressure type flow rate controller, used for a pressure control type flow rate reference unit, comprises a control valve provided on the upstream side of an orifice, a pressure detector provided between the control valve and orifice, and an operation control device computing a flow rate from detected pressure of the pressure detector and outputting a difference between a flow rate command signal and the computed flow rate signal as a control signal to a driving part of the control valve, and then controls a fluid flow rate on the orifice downstream side by adjusting orifice upstream-side pressure by opening and closing the control valve in a state in which the ratio of the upstream-side pressure and downstream-side pressure of the orifice is held at the critical pressure ratio of a fluid to be controlled or below. The reference pressure type flow rate controller has a gold plating coating formed over the entire surface of a part that the fluid in the reference pressure type flow rate controller comes into contact with to obtain a corrosion-resistant pressure type flow rate controller 9.
摘要翻译：要解决的问题：为了提供一种便于执行针对腐蚀性气体的流量控制器的流量校准的基准压力型流量控制器，流量控制精度低廉且具有耐腐蚀性。解决方案：用于压力控制型流量参考单元的参考压力型流量控制器包括设置在孔上游侧的控制阀，设置在控制阀和孔之间的压力检测器，以及操作控制装置从压力检测器的检测压力计算流量，并将流量指令信号和计算出的流量信号之间的差作为控制信号输出到控制阀的驱动部分，然后控制流体流量在孔口下游侧通过在孔口的上游侧压力和下游侧压力的比率保持在流体的临界压力比的状态下打开和关闭控制阀来调节孔口上游侧压力被控制或低于。参考压力型流量控制器具有形成在基准压力型流量控制器中的流体接触到的部分的整个表面上的镀金涂层，以获得耐腐蚀压力型流量控制器9.
版权所有（C）2012，JPO＆INPIT

20. 发明专利

JP2012033188A Variable flow rate range type flow control device 有权
标题翻译：可变流量范围流量控制装置
公开(公告)号：JP2012033188A
公开(公告)日：2012-02-16
申请号：JP2011219478
申请日：2011-10-03
申请人： Fujikin Inc , Tohoku Univ , Tokyo Electron Ltd , 国立大学法人東北大学 , 東京エレクトロン株式会社 , 株式会社フジキン
发明人： OMI TADAHIRO , SIATO MASAHITO , HINO SHOICHI , SHIMAZU TSUYOSHI , MIURA KAZUYUKI , NISHINO KOJI , NAGASE MASAAKI , SUGITA KATSUYUKI , HIRATA KAORU , DOI RYOSUKE , HIROSE TAKASHI , SHINOHARA TSUTOMU , IKEDA SHINICHI , IMAI TOMOKAZU , YOSHIDA TOSHIHIDE , TANAKA HISASHI
IPC分类号： G05D7/06
摘要： PROBLEM TO BE SOLVED: To miniaturize a flow control device and reduce equipment cost by enabling a single flow control device to highly accurately control a wider flow rate range of fluids.SOLUTION: In a pressure type flow rate control device which calculates a flow rate of a fluid flowing through an orifice using either pressures at an upstream side of the orifice Pand at a downstream side of the orifice or at least the pressure at the upstream side of the orifice P, a fluid passage between the downstream side of a first valve 2 of the pressure type flow rate control device and a fluid supply pipe conduit 5 is bifurcated into two parallel fluid passages, one fluid passage 5c provided with a second valve 34 and a first orifice 8c and the other fluid passage 5g provided with no valve and a second orifice 8a. The one fluid passage 5c is controlled by an opening and closing of the second valve 34 and allows the fluid in a large flow rate range to flow to the first orifice 8c. The other fluid passage 5g is continuous all the time and allows the fluid in a small flow rate range to flow to the second orifice 8a.
摘要翻译：要解决的问题：通过使单个流量控制装置能够高精度地控制流体的更宽的流量范围，来使流量控制装置小型化并降低设备成本。解决方案：在压力式流量控制装置中，使用压力在孔口P 1 的上游侧计算流过孔口的流体的流量，以及在孔口的下游侧或孔口的上游侧的压力至少为压力类型的第一阀2的下游侧之间的流体通路流量控制装置和流体供给管道5分成两个平行的流体通道，一个流体通道5c设置有第二阀34和第一孔口8c，另一个流体通道5g没有设置阀和第二孔口8a。通过第二阀34的打开和关闭来控制一个流体通道5c，并允许大流量范围内的流体流向第一孔口8c。另一个流体通道5g始终是连续的，并允许流体在小流量范围内流到第二孔口8a。版权所有（C）2012，JPO＆INPIT

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