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11. 发明专利

JP2008274022A Pigment, pigment dispersion composition, curable composition, color filter, and its manufacturing method 审中-公开
标题翻译：颜料，颜料分散组合物，可固化组合物，彩色滤光片及其制造方法
公开(公告)号：JP2008274022A
公开(公告)日：2008-11-13
申请号：JP2007115978
申请日：2007-04-25
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： AIZAWA TAEKO , SHIMADA KAZUTO , FUJIMORI TORU
IPC分类号： C09B67/54 , C09B67/46 , C09D17/00 , G02B5/20
摘要： PROBLEM TO BE SOLVED: To provide a pigment excellent in dispersion stability, excellent in transparency and capable of reducing generation of a pinhole even if a coating film is formed, a pigment dispersion composition excellent in dispersion stability, a curable composition excellent in storage stability, coatability, sensitivity, non-exposure part developability, substrate adhesion property and a pattern shape, a color filter, and its manufacturing method. SOLUTION: The pigment washed with an organic solvent having at least one hetero atom in a molecule, the pigment dispersion composition containing at least (A) the pigment, (B) a dispersing agent and (C) a solvent, the curable composition formulated with the pigment dispersion composition, the color filter using the curable composition, and its manufacturing method are provided. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：为了提供分散稳定性优异的透明性，即使形成涂膜也能够减少针孔产生的颜料，分散稳定性优异的颜料分散组合物，优异的固化性组合物保存稳定性，可涂布性，灵敏度，非曝光部分显影性，基材粘合性和图案形状，滤色器及其制造方法。溶液：颜料用分子中具有至少一个杂原子的有机溶剂洗涤，颜料分散体组合物至少含有（A）颜料，（B）分散剂和（C）溶剂，可固化提供了配合颜料分散组合物的组合物，使用该固化性组合物的滤色器及其制造方法。版权所有（C）2009，JPO＆INPIT

12. 发明专利

JP2008083416A Photosensitive colored curable composition, color filter and method for producing the same 审中-公开
标题翻译：感光性着色固化性组合物，彩色滤光片及其制造方法
公开(公告)号：JP2008083416A
公开(公告)日：2008-04-10
申请号：JP2006263581
申请日：2006-09-27
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： MIZUKAWA HIROKI , SETO NOBUO , TAKAKUWA HIDEKI , FUJIMORI TORU
IPC分类号： G03F7/004 , C09B23/00 , C09B29/42 , C09B67/22 , G02B5/20 , G02B5/22
摘要： PROBLEM TO BE SOLVED: To provide a photosensitive red colored curable composition excellent in color purity of red, having such a high absorbance index as to enable formation of a thinner layer and excellent in fastness, a color filter and a method for producing the same. SOLUTION: The photosensitive colored curable composition contains as a colorant a dipyromethene metal complex compound obtained from a dipyromethene compound represented by formula (I) and a metal or metal compound, and a compound represented by formula (A). In formula (I), R 1 -R 6 each represent H or a substituent; and R 7 represents H, halogen, an alkyl group, an aryl group or a heterocyclic group. In formula (A), R 50 represents H or a substituent; R 51 represents an alkyl group, an alkenyl group, an aryl group, a heterocyclic group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a carbamoyl group, an alkylsulfonyl group, an arylsulfonyl group or a sulfamoyl group; X 1 represents -C(R 52 )= or -N=, R 52 represents H or a substituent; and A represents a coupler residue. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了提供具有如下特性的具有如此高的吸光度指数的红色的颜色纯度的感光性红色固化性组合物，能够形成更薄的层并具有优异的耐光性，滤色器和制造方法一样。光敏着色固化性组合物含有由式（I）表示的二亚甲基吡啶化合物和金属或金属化合物以及式（A）表示的化合物得到的二亚甲基金属络合物作为着色剂。在式（I）中，R 1和R 2各自表示H或取代基; R 7表示H，卤素，烷基，芳基或杂环基。在式（A）中，R 30代表H或取代基; R 51表示烷基，烯基，芳基，杂环基，酰基，烷氧基羰基，芳氧基羰基，氨基甲酰基，烷基磺酰基，芳基磺酰基或氨磺酰基; X 1 表示-C（R SP 52）=或-N =，R SP 52表示H或取代基; A表示成色剂残基。版权所有（C）2008，JPO＆INPIT

13. 发明专利

JP2008003164A Negative dye-containing curable composition, and color filter and method for producing the same 有权
标题翻译：含阴离子可固化组合物和颜色过滤器及其生产方法
公开(公告)号：JP2008003164A
公开(公告)日：2008-01-10
申请号：JP2006170527
申请日：2006-06-20
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： FUJIMORI TORU , SASAKI TOMOYA
IPC分类号： G03F7/031 , G02B5/20 , G03F7/004 , G03F7/027
摘要： PROBLEM TO BE SOLVED: To provide a negative dye-containing curable composition which is capable of forming a rectangular fine pattern with high sensitivity and achieves high in-plane uniformity of a film in coating. SOLUTION: The negative dye-containing curable composition contains the dye, a photopolymerization initiator and a radical polymerizable monomer, wherein a compound represented by formula (1) is used as the photopolymerization initiator. In the formula (1), R 1 represents a phenyl group; R 2 represents a 1-20C alkyl group or a 5-8C cycloalkyl group; and R 3 represents a 1-4C alkyl group. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供能够以高灵敏度形成矩形精细图案并实现涂层中膜的高平面均匀性的含负染料的可固化组合物。解决方案：含阴离子染料的可固化组合物含有染料，光聚合引发剂和可自由基聚合的单体，其中使用由式（1）表示的化合物作为光聚合引发剂。在式（1）中，R“SP”表示苯基; R 2表示1-20C烷基或5-8C环烷基; 并且R“3”表示1-4C烷基。版权所有（C）2008，JPO＆INPIT

14. 发明专利

JP2007219467A Dye-containing negative working curable composition, color filter and method of producing thereof 有权
标题翻译：含负离子的可固化组合物，彩色滤光片及其生产方法
公开(公告)号：JP2007219467A
公开(公告)日：2007-08-30
申请号：JP2006135522
申请日：2006-05-15
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： FUJIMORI TORU
IPC分类号： G03F7/027 , G02B5/20 , G03F7/004
摘要： PROBLEM TO BE SOLVED: To form a fine pattern having a rectangular cross section with high sensitivity. SOLUTION: A dye-containing negative working curable composition is used which contains, as a radical polymerizable monomer, an acidic group-containing polyfunctional (meth)acrylic compound having an acid value of ≥25 mgKOH/g, together with a dye and a photopolymerization initiator. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：形成具有高灵敏度的矩形截面的精细图案。解决方案：使用含有酸值为≥25mgKOH/ g的酸性基团的多官能（甲基）丙烯酸化合物作为自由基聚合性单体的含染料的负极固化性组合物，与染料和光聚合引发剂。版权所有（C）2007，JPO＆INPIT

15. 发明专利

JP2012137565A Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, and pattern formation method 审中-公开
标题翻译：化学敏感性或辐射敏感性树脂组合物，使用它们的耐腐蚀膜和图案形成方法
公开(公告)号：JP2012137565A
公开(公告)日：2012-07-19
申请号：JP2010288928
申请日：2010-12-24
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： TOMIGA TAKAMITSU , FUJIMORI TORU
IPC分类号： G03F7/039 , C08F212/14 , G03F7/004 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition capable of suppressing occurrence of standing waves, having high sensitivity, having a large depth of focus (DOF) and having excellent in-plane uniformity (CDU) of a linewidth when a highly reflective substrate is directly used without using an antireflection film, and a resist film using the composition, and a pattern formation method.SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition comprises: (A) a sulfonium compound producing an acid with an acid strength pKof -2 to 3 through irradiation with actinic rays or radiation; (B) a basic compound with a basic strength pKof 5 to 10; and (C) a resin including repeating units respectively represented by general formulae (I) and (II) and having solubility in an alkali developer increased due to the action of an acid. In general formula (II), Rindicates a hydrogen atom or an alkyl group.
摘要翻译：要解决的问题：提供能够抑制具有高灵敏度，具有大的聚焦深度（DOF）并且具有优异的面内均匀性（DOF）的驻波的发生的光化射线敏感或辐射敏感性树脂组合物 CDU），而不使用抗反射膜直接使用高反射性基板，使用该组合物的抗蚀剂膜和图案形成方法。光敏射线敏感性或辐射敏感性树脂组合物包含：（A）产生酸强度为-2〜3的酸的锍化合物，其酸度为pK a 通过光化射线或辐射照射; （B）具有5〜10的基本强度pK b 的碱性化合物; 和（C）包含分别由通式（I）和（II）表示的重复单元并且在碱性显影剂中具有溶解性的树脂由于酸的作用而增加。在通式（II）中，R 1 表示氢原子或烷基。版权所有（C）2012，JPO＆INPIT

16. 发明专利

JP2012003071A Chemically amplified resist composition, and resist film and pattern forming method using the composition 审中-公开
标题翻译：化学稳定性组合物，耐蚀膜和图案使用组合物的方法
公开(公告)号：JP2012003071A
公开(公告)日：2012-01-05
申请号：JP2010138514
申请日：2010-06-17
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： FUJIMORI TORU , YAMADA MASAMI , TOMIGA TAKAMITSU
IPC分类号： G03F7/004 , C08F20/10 , C08F212/14 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a chemically amplified resist composition exhibiting improved perpendicular property of a side wall in a pattern when a contact hole pattern is formed, an increased EDW (exposure defocus window), and improved side lobe durability, and significant reduction of an increase of particles in a resist solution after stored for a long period of time, and to provide a resist film and a pattern forming method using the composition.SOLUTION: A chemically amplified resist composition contains (A) a resin whose solubility in an alkali developing solution is increased by an action of an acid, (B) a compound which generates an acid upon irradiation with actinic rays or radiation, and (C) a benzoimidazole-based basic compound having a specific structure including a sulfur atom. The resist film and the pattern forming method use the resist composition.
摘要翻译：要解决的问题：提供一种化学放大型抗蚀剂组合物，当形成接触孔图案时，具有改进的图案侧壁的垂直特性，增加的EDW（曝光散焦窗）和改进的旁瓣耐久性，以及在长时间储存之后显着降低抗蚀剂溶液中的颗粒增加，并提供使用该组合物的抗蚀剂膜和图案形成方法。解决方案：化学放大抗蚀剂组合物含有（A）其在碱性显影液中的溶解度通过酸的作用而增加的树脂，（B）在用光化射线或辐射照射时产生酸的化合物，以及（C）具有硫原子的特定结构的苯并咪唑类碱性化合物。抗蚀剂膜和图案形成方法使用抗蚀剂组合物。版权所有（C）2012，JPO＆INPIT

17. 发明专利

JP2011186340A Active ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same 有权
标题翻译：活性敏感性或辐射敏感性树脂组合物，以及使用其的耐蚀膜和图案形成方法
公开(公告)号：JP2011186340A
公开(公告)日：2011-09-22
申请号：JP2010053844
申请日：2010-03-10
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： FUJII KANA , TOMIGA TAKAMITSU , FUJIMORI TORU
IPC分类号： G03F7/004 , G03F7/039 , G03F7/38 , H01L21/027
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/16 , G03F7/2041
摘要： PROBLEM TO BE SOLVED: To provide an active ray-sensitive or radiation-sensitive resin composition which is excellent in sensitivity, exposure dependence, resolution, roughness characteristics, and focus latitude, which reduces scum, and which forms a pattern with an adequate shape, and to provide a resist film and a pattern forming method using the same.
SOLUTION: The active ray-sensitive or radiation-sensitive resin composition containing: (A) a resin which is decomposed by the action of an acid and as a result the solubility of which in an alkali developer increases; (B) a compound which generates an acid with emission of an active ray or radiation; (C) a basic compound; and (D) a specified compound having at least two specified alicyclic hydrocarbon groups substituted for a hydroxyl group, and the resist film and the pattern forming method using the same are provided.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供灵敏度，曝光依赖性，分辨率，粗糙度特性和聚焦纬度优异的活性射线敏感或辐射敏感性树脂组合物，其减少浮渣，并且形成具有并且提供抗蚀剂膜和使用其的图案形成方法。解决方案：活性射线敏感或辐射敏感性树脂组合物，其包含：（A）通过酸的作用而分解的结果，并且其在碱性显影剂中的溶解度增加的树脂; （B）产生具有发射活性射线或辐射的酸的化合物; （C）碱性化合物; 和（D）具有取代羟基的至少两个指定脂环族烃基的规定化合物，并且提供抗蚀剂膜和使用其的图案形成方法。版权所有（C）2011，JPO＆INPIT

18. 发明专利

JP2010181729A Actinic ray-sensitive or radiation-sensitive resin composition and method for forming pattern by using the same 有权
标题翻译：化学敏感性或辐射敏感性树脂组合物及其使用形成图案的方法
公开(公告)号：JP2010181729A
公开(公告)日：2010-08-19
申请号：JP2009026414
申请日：2009-02-06
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： FUJII KANA , DOBASHI TORU , FUJIMORI TORU
IPC分类号： G03F7/039 , G03F7/004 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition satisfying demands for a wide exposure latitude, reduction of a skirt-like pattern profile, favorable pattern features and excellent dry etching durability, and allowing formation of a pattern having fewer defects after development, and to provide a method for forming a pattern by using the composition.
SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition contains: (A) a resin containing repeating units expressed by formulae (I), (II) and (III) and changing into soluble with an alkali developer by an action of an acid; and (B) two or more kinds of compounds generating an acid by irradiation with actinic rays or radiation.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供满足宽曝光宽容度要求的光化射线敏感或辐射敏感性树脂组合物，减少裙状图案轮廓，有利的图案特征和优异的干蚀刻耐久性，并且允许形成显影后具有较少缺陷的图案，并提供通过使用该组合物形成图案的方法。光敏射线敏感性树脂组合物含有：（A）含有式（I），（II）和（III）表示的重复单元的树脂，酸的作用和（B）通过用光化射线或辐射照射产生酸的两种或更多种化合物。版权所有（C）2010，JPO＆INPIT

19. 发明专利

JP2009265518A Photosensitive composition, photosensitive composition for solid-state imaging element, light-shielding color filter for solid-state imaging element, and solid-state imaging element 有权
标题翻译：用于固体成像元件的光敏组合物，用于固态成像元件的光屏蔽彩色滤光片和固态成像元件的光敏组合物
公开(公告)号：JP2009265518A
公开(公告)日：2009-11-12
申请号：JP2008117499
申请日：2008-04-28
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： SHIMADA KAZUTO , TSUCHIMURA TOMOTAKA , FUJIMORI TORU , MARUYAMA YOICHI , KANEKO YUJI , ENAGA HIROYUKI
IPC分类号： G03F7/004 , G02B5/20 , G03F7/027 , G03F7/038
摘要： PROBLEM TO BE SOLVED: To provide a photosensitive composition having a light-shielding property in a broad range from a UV region to an IR region, having high sensitivity and a small side edge, and to provide a photosensitive composition for a solid-state imaging element, a light-shielding color filter for a solid-state imaging element, and a solid-state imaging element using the above composition. SOLUTION: The photosensitive composition contains (A) a polymerizable compound, (B) a binder polymer, (C) a photopolymerization initiator and (D) a titanium black dispersion, wherein a mass ratio of the (A) polymerizable compound and the (B) binder polymer is not more than 1.0. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供具有高的灵敏度和小的边缘的从UV区域到IR区域的宽范围内的具有遮光性的光敏组合物，并提供用于固体的光敏组合物状态成像元件，用于固态成像元件的遮光滤色器，以及使用上述组成的固态成像元件。光敏组合物含有（A）可聚合化合物，（B）粘合剂聚合物，（C）光聚合引发剂和（D）钛黑分散体，其中（A）可聚合化合物和（B）粘合剂聚合物不大于1.0。版权所有（C）2010，JPO＆INPIT

20. 发明专利

JP2009265372A Polymerizable composition, light-shielding color filter, and solid-state image sensor 有权
标题翻译：聚合物组合物，遮光颜色过滤器和固体状态图像传感器
公开(公告)号：JP2009265372A
公开(公告)日：2009-11-12
申请号：JP2008115184
申请日：2008-04-25
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： TSUCHIMURA TOMOTAKA , MARUYAMA YOICHI , SHIMADA KAZUTO , FUJIMORI TORU , KANEKO YUJI , ENAGA HIROYUKI
IPC分类号： G03F7/004 , G02B5/20 , G03F7/031
摘要： PROBLEM TO BE SOLVED: To provide a polymerizable composition having high curing sensitivity, with which a high-precision light-shielding film pattern can be formed while decrease in the light-shielding performance in a peripheral portion is suppressed and generation of residual matter in an unexposed portion is suppressed, and to provide a light-shielding color filter having a colored region formed by using the polymerizable composition, and to provide a solid-state image sensor having the light-shielding color filter. SOLUTION: The polymerizable composition contains (A) a titanium black dispersion containing titanium black and an alkali-soluble resin having at least one unsaturated double bond, (B) a polymerizable compound, and (C) a photopolymerization initiator. The light-shielding color filter has a colored region formed by using the polymerizable composition. The solid-state image sensor has the light-shielding color filter. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种具有高固化灵敏度的可聚合组合物，其中可以形成高精度遮光膜图案，同时抑制周边部分的遮光性能的降低，并产生残留抑制未曝光部分的物质，并且提供具有通过使用可聚合组合物形成的着色区域的遮光滤色器，并提供具有遮光滤色器的固态图像传感器。解决方案：聚合性组合物含有（A）含有钛黑的钛黑分散体和具有至少一个不饱和双键的碱溶性树脂，（B）可聚合化合物和（C）光聚合引发剂。遮光滤色器具有通过使用可聚合组合物形成的着色区域。固态图像传感器具有遮光滤色器。版权所有（C）2010，JPO＆INPIT

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