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    • 13. 发明授权
    • Method and apparatus for measuring the dimensions of patterned features
on a lithographic photomask
    • 用于测量光刻光掩模上的图案特征的尺寸的方法和装置
    • US5184021A
    • 1993-02-02
    • US719519
    • 1991-06-24
    • Ian R. Smith
    • Ian R. Smith
    • G01B9/04G01B11/02G01C3/06G03F7/20
    • G03F7/70625G01B11/02G03F7/70633
    • A system for inspecting and measuring the dimensions of patterned features on lithographic photomasks includes a confocal scanning microscope beneath which is mounted the photomask to be inspected. The photomask is moved to permit the imaging beam from the microscope to record reflectivity information at closely spaced points along a scan line at the metal-substrate interface within the photomask, and the unpatterned side of the mask is positioned facing the microscope so that the imaging beam passes through the transparent substrate material of the mask to the desired measurement plane. An objective lens specially corrected for imaging through transparent materials is used in the optical system, and compensating glass plates may be selectively placed between the objective lens and the photomask when the substrate of the mask is thinner than the thickness of transparent material for which the objective lens was corrected.
    • 用于检查和测量光刻光掩模上的图案特征的尺寸的系统包括共焦扫描显微镜,其下安装有待检查的光掩模。 移动光掩模以允许来自显微镜的成像光束沿着光掩模内的金属 - 衬底界面处的扫描线的紧密间隔的点记录反射率信息,并且掩模的未图案化侧面朝向显微镜定位,使得成像 光束通过掩模的透明基板材料到期望的测量平面。 在光学系统中使用专门用于通过透明材料进行成像的物镜校正的物镜,并且当掩模的基底比目标的透明材料的厚度薄时,可以将补偿玻璃板选择性地放置在物镜和光掩模之间 镜头被纠正。
    • 14. 发明授权
    • Method and apparatus for reading or measuring magneto-optical storage
media using pinhole aperture
    • 使用针孔进行读取或测量磁光存储介质的方法和装置
    • US4847823A
    • 1989-07-11
    • US63668
    • 1987-06-19
    • James T. LindowSimon D. BennettIan R. Smith
    • James T. LindowSimon D. BennettIan R. Smith
    • G11B11/105
    • G11B11/10515G11B11/10543
    • A scanning confocal optical imaging system is utilized to read or measure data magnetically recorded on a magneto-optic disk. The system includes a laser for producing a linearly polarized beam and a beam splitter for directing the transmitted beam to the disk and for deflecting a portion of the reflected return beam from the disk to a photodetector. A pinhole plate is placed between the beam splitter and the disk for restricting the size of the transmitted and reflected beams, and a polarizer is positioned between the beam splitter and the photodetector to receive the deflected return beam and provide an output that discriminates between the differing directions of rotation of the polarization plane of the transmitted beam by the magnetized area on the disk so that the direction of magnetization of the magnetized area can be read by the photodetector.
    • 扫描共焦光学成像系统用于读取或测量磁记录在磁光盘上的数据。 该系统包括用于产生线性偏振光束的激光器和用于将透射光束引导到光盘并将反射回波束的一部分从光盘偏转到光电检测器的分束器。 针孔板放置在分束器和盘之间,用于限制透射和反射光束的尺寸,并且偏振器位于分束器和光电检测器之间,以接收偏转的返回光束并提供输出,其区分不同的 通过磁盘上的磁化区域的透射光束的偏振面的旋转方向,从而可以由光电检测器读取磁化区域的磁化方向。
    • 19. 发明授权
    • Method and apparatus for measuring surface profiles
    • 用于测量表面轮廓的方法和装置
    • US4707610A
    • 1987-11-17
    • US850983
    • 1986-04-11
    • James T. LindowSimon D. BennettIan R. Smith
    • James T. LindowSimon D. BennettIan R. Smith
    • H01L21/66G01B11/02G01B11/24G01N21/88G01N21/956G02B21/00G01V9/04
    • G01B11/24G01B11/02G02B21/0052G02B21/006
    • A system for determining surface profiles of specimens such as semiconductor wafers and for making linewidth measurements thereon includes a drive for mounting the wafer for oscillatory movement along a line and an optical imaging system overlying the wafer for focusing a beam on a small spot on the wafer and including a photodetector for detecting the reflected spot from the wafer. The spot is scanned along the line on the wafer while the focal depth of the imaging system is progressively changed while the photodetector and connected digital circuitry generate a plurality of spaced output signals for each scan along the line so that data comprised of a series of spaced signals are provided at a plurality of focus levels extending through the surface profile of the wafer. Computer means are provided for analyzing the data and providing a graphical output of the surface profile from which accurate linewidth measurements are made. Such computer means also provides an adjustment factor for measuring a linewidth in the same area while making a scan only at a single focus level so that the remainder of the area can be scanned rapidly.
    • 用于确定诸如半导体晶片的样品的表面轮廓和用于进行线宽测量的系统包括用于沿着线安装用于振荡运动的晶片的驱动器和覆盖晶片的光学成像系统,用于将光束聚焦在晶片上的小点上 并且包括用于检测来自晶片的反射点的光电检测器。 沿着晶片上的线扫描点,同时成像系统的焦深逐渐改变,同时光电检测器和连接的数字电路为沿着该线的每次扫描产生多个间隔的输出信号,使得由一系列间隔开的数据组成 信号被提供在延伸穿过晶片的表面轮廓的多个聚焦水平。 提供计算机装置用于分析数据并提供表面轮廓的图形输出,从该图形输出进行精确的线宽测量。 这样的计算机装置还提供用于在相同区域中测量线宽的调整因子,同时仅在单个焦点水平进行扫描,使得可以快速扫描该区域的其余部分。