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11. 发明授权

US08361546B2 Facilitating adhesion between substrate and patterned layer 有权
标题翻译：促进基材和图案层之间的粘附
公开(公告)号：US08361546B2
公开(公告)日：2013-01-29
申请号：US12606588
申请日：2009-10-27
申请人： Edward B. Fletcher , Zhengmao Ye , Dwayne L. LaBrake , Frank Y. Xu
发明人： Edward B. Fletcher , Zhengmao Ye , Dwayne L. LaBrake , Frank Y. Xu
IPC分类号： B05D5/10
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , H01J37/32431 , Y10T428/30 , Y10T428/31663
摘要： Systems and methods for adhering a substrate to a patterned layer are described. Included are in situ cleaning and conditioning of the substrate, and the application of an adhesion layer between the substrate and the patterned layer, as well as forming an intermediate layer between adhesion materials and the substrate.
摘要翻译：描述了将基板粘合到图案层上的系统和方法。包括基材的原位清洁和调理，以及在基材和图案化层之间施加粘合层，以及在粘合材料和基材之间形成中间层。

12. 发明申请

US20120187085A1 CRITICAL DIMENSION CONTROL DURING TEMPLATE FORMATION 有权
标题翻译：模式形成过程中的关键尺寸控制
公开(公告)号：US20120187085A1
公开(公告)日：2012-07-26
申请号：US13441500
申请日：2012-04-06
申请人： Cynthia B. Brooks , Dwayne L. LaBrake , Niyaz Khusnatdinov , Michael N. Miller , Sidlgata V. Sreenivasan , David James Lentz , Frank Y. Xu
发明人： Cynthia B. Brooks , Dwayne L. LaBrake , Niyaz Khusnatdinov , Michael N. Miller , Sidlgata V. Sreenivasan , David James Lentz , Frank Y. Xu
IPC分类号： B44C1/22
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： Thickness of a residual layer may be altered to control critical dimension of features in a patterned layer provided by an imprint lithography process. The thickness of the residual layer may be directly proportional or inversely proportional to the critical dimension of features. Dispensing techniques and material selection may also provide control of the critical dimension of features in the patterned layer.
摘要翻译：可以改变残余层的厚度以控制由压印光刻工艺提供的图案化层中的特征的临界尺寸。残余层的厚度可以与特征的临界尺寸成正比或成反比。分配技术和材料选择也可以提供图案化层中特征的临界尺寸的控制。

13. 发明授权

US08152511B2 Composition to reduce adhesion between a conformable region and a mold 有权
标题翻译：组合物以减少适形区域和模具之间的粘附
公开(公告)号：US08152511B2
公开(公告)日：2012-04-10
申请号：US12404024
申请日：2009-03-13
申请人： Frank Y. Xu , Michael N. Miller
发明人： Frank Y. Xu , Michael N. Miller
IPC分类号： B29C33/62 , B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography mold assembly includes a mold having a surface, a substrate having a surface, and a polymerizable composition disposed between the surface of the mold and the surface of the substrate. The polymerizable composition includes a bulk material and a non-ionic surfactant having a first end and a second end. The first end of the non-ionic surfactant has an affinity for the bulk material, and the second end of the non-ionic surfactant is fluorinated.
摘要翻译：压印光刻模具组件包括具有表面的模具，具有表面的基底和设置在模具表面和基底表面之间的可聚合组合物。可聚合组合物包括本体材料和具有第一端和第二端的非离子表面活性剂。非离子表面活性剂的第一端对本体材料具有亲和性，非离子表面活性剂的第二端被氟化。

14. 发明授权

US08142702B2 Solvent-assisted layer formation for imprint lithography 有权
标题翻译：用于压印光刻的溶剂辅助层形成
公开(公告)号：US08142702B2
公开(公告)日：2012-03-27
申请号：US12139911
申请日：2008-06-16
申请人： Weijun Liu , Frank Y. Xu , Edward Brian Fletcher
发明人： Weijun Liu , Frank Y. Xu , Edward Brian Fletcher
IPC分类号： B29C59/00 , H01L21/027
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A solid layer is formed by applying a multiplicity of discrete portions of a fluid composition onto a surface of an imprint lithography substrate, and allowing the discrete portions of the composition to spontaneously spread on the surface of the substrate to form a substantially continuous layer. The composition includes a solvent and a solid or a solvent and a polymerizable material. The composition can be a solution or a dispersion. At least some of the solvent is evaporated from the composition, and a solid layer is formed (e.g., polymerized or dried) on the substrate. The solid layer is substantially free of interstitial voids.
摘要翻译：通过将多个离散部分的流体组合物施加到压印光刻基板的表面上并使组合物的离散部分自发地扩散在基板的表面上以形成基本上连续的层而形成固体层。该组合物包括溶剂和固体或溶剂以及可聚合材料。组合物可以是溶液或分散体。至少一些溶剂从组合物中蒸发，并在基材上形成固体层（例如聚合或干燥）。固体层基本上不含间隙。

15. 发明授权

US08021594B2 Preserving filled features when vacuum wiping 有权
标题翻译：真空擦拭时保存充满的功能
公开(公告)号：US08021594B2
公开(公告)日：2011-09-20
申请号：US12488642
申请日：2009-06-22
申请人： Steven C. Shackleton , Pankaj B. Lad , Ian Matthew McMackin , Frank Y. Xu , Sidlgata V. Sreenivasan
发明人： Steven C. Shackleton , Pankaj B. Lad , Ian Matthew McMackin , Frank Y. Xu , Sidlgata V. Sreenivasan
IPC分类号： B29C35/08 , B29C59/02
CPC分类号： G03F7/0002 , B29C43/003 , B29C43/021 , B29C43/34 , B29C2043/025 , B29C2043/142 , B29C2043/3438 , B29K2105/0002 , B82Y10/00 , B82Y40/00
摘要： A method/process for curing imprint on a template prior to contact with a substrate. A curing process is used to adhere the imprint to a wafer or substrate. Monomer is deposited on a template and then partially cured using a UV exposure. The exposure is controlled so that the imprint is cured past the gel point, but still retains a thin liquid layer of uncured monomer at the surface that will bond with the wafer. Further, this partially cured layer enables the alignment adjustments between the template and the substrate to be performed after contact between the two without pulling any monomer out of the features.
摘要翻译：在与基底接触之前在模板上固化印模的方法/方法。使用固化过程将印记粘附到晶片或基板上。将单体沉积在模板上，然后使用UV曝光部分固化。控制曝光使得印迹经过凝胶点固化，但仍然保留在将与晶片结合的表面上的未固化单体的薄液体层。此外，这种部分固化的层使得能够在两者之间接触之后进行模板和基板之间的对准调整，而不将任何单体拉出特征。

16. 发明授权

US07906180B2 Composition for an etching mask comprising a silicon-containing material 有权
标题翻译：包含含硅材料的蚀刻掩模的组合物
公开(公告)号：US07906180B2
公开(公告)日：2011-03-15
申请号：US11508765
申请日：2006-08-23
申请人： Frank Y. Xu , Michael N. Miller , Michael P. C. Watts
发明人： Frank Y. Xu , Michael N. Miller , Michael P. C. Watts
IPC分类号： B05D3/02 , C08L9/04
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： The present invention includes a composition for a silicon-containing material used as an etch mask for underlying layers. More specifically, the silicon-containing material may be used as an etch mask for a patterned imprinted layer comprising protrusions and recessions. To that end, in one embodiment of the present invention, the composition includes a hydroxyl-functional silicone component, a cross-linking component, a catalyst component, and a solvent. This composition allows the silicon-containing material to selectively etch the protrusions and the segments of the patterned imprinting layer in superimposition therewith, while minimizing the etching of the segments in superposition with the recessions, and therefore allowing an in-situ hardened mask to be created by the silicon-containing material, with the hardened mask and the patterned imprinting layer forming a substantially planarized profile.
摘要翻译：本发明包括用作下层的蚀刻掩模的含硅材料用组合物。更具体地，含硅材料可以用作包括突起和凹陷的图案化印记层的蚀刻掩模。为此，在本发明的一个实施方案中，组合物包括羟基官能的硅氧烷组分，交联组分，催化剂组分和溶剂。该组合物允许含硅材料与图案化压印层的突起和段的叠加选择性地蚀刻，同时最小化与凹陷叠加的段的蚀刻，并且因此允许形成原位硬化的掩模通过含硅材料，硬化的掩模和图案化的压印层形成基本平坦化的轮廓。

17. 发明申请

US20100109195A1 RELEASE AGENT PARTITION CONTROL IN IMPRINT LITHOGRAPHY 审中-公开
标题翻译：释放代理分割控制在印刷图
公开(公告)号：US20100109195A1
公开(公告)日：2010-05-06
申请号：US12612527
申请日：2009-11-04
申请人： Frank Y. Xu , Weijun Liu
发明人： Frank Y. Xu , Weijun Liu
IPC分类号： B29C59/02 , C07C233/18 , C07D237/08 , G03F7/004 , C23C8/80
CPC分类号： C07D237/24 , B82Y10/00 , B82Y40/00 , C07C233/18 , G03F7/0002
摘要： Release agents with increased affinity toward nano-imprint lithography template surfaces interact strongly with the template during separation of the template from the solidified resist in a nano-imprint lithography process. The strong interaction between the surfactant and the template surface reduces the amount of surfactant pulled off the template surface during separation of a patterned layer from the template in an imprint lithography cycle. Maintaining more surfactant associated with the surface of the template after the separation of the patterned layer from the template may reduce the amount of surfactant needed in a liquid resist to achieve suitable release of the solidified resist from the template during an imprint lithography process. Strong association of the release agent with the surface of the template facilitates the formation of ultra-thin residual layers and dense fine features in nano-imprint lithography.
摘要翻译：在纳米压印光刻工艺中将模板与固化的抗蚀剂分离期间，与纳米压印光刻模板表面的亲和性增加的脱模剂与模板相互作用强烈。表面活性剂和模板表面之间的强相互作用减少了在压印光刻循环中将图案化层与模板分离期间从模板表面上拉出的表面活性剂的量。在将图案化层与模板分离之后，维持与模板表面相关的更多表面活性剂可以减少液体抗蚀剂中所需的表面活性剂的量，以在压印光刻过程中从模板中实现固化的抗蚀剂的合适释放。脱模剂与模板表面的强相关有助于在纳米压印光刻中形成超薄的残余层和致密的精细特征。

18. 发明申请

US20100104852A1 Fabrication of High-Throughput Nano-Imprint Lithography Templates 审中-公开
标题翻译：高通量纳米压印光刻模板的制作
公开(公告)号：US20100104852A1
公开(公告)日：2010-04-29
申请号：US12604094
申请日：2009-10-22
申请人： Edward B. Fletcher , Frank Y. Xu , Weijun Liu , Fen Wan , Marlon Menezes , Kosta S. Selinidis
发明人： Edward B. Fletcher , Frank Y. Xu , Weijun Liu , Fen Wan , Marlon Menezes , Kosta S. Selinidis
IPC分类号： B32B3/26 , B05D3/10 , B01D3/00 , C23C16/00 , B05D3/06
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/0017 , Y10T428/249978 , Y10T428/268
摘要： An imprint lithography template includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. The porous material includes silicon and oxygen, and a ratio of Young's modulus (E) to relative density of the porous material with respect to fused silica (pporous/pfused silica) is at least about 10:1. A refractive index of the porous material is between about 1.4 and 1.5. The porous material may form an intermediate layer or a cap layer of an imprint lithography template. The template may include a pore seal layer between a porous layer and a cap layer, or a pore seal layer on top of a cap layer.
摘要翻译：压印光刻模板包括限定平均孔径至少约0.4nm的多个孔的多孔材料。多孔材料包括硅和氧，并且杨氏模量（E）与多孔材料相对于熔融二氧化硅的相对密度（磷/二氧化硅）的比例为至少约10:1。多孔材料的折射率在约1.4和1.5之间。多孔材料可以形成压印光刻模板的中间层或盖层。模板可以包括在多孔层和盖层之间的孔密封层，或者在盖层的顶部上的孔密封层。

19. 发明申请

US20100072671A1 NANO-IMPRINT LITHOGRAPHY TEMPLATE FABRICATION AND TREATMENT 审中-公开
标题翻译： NANO-IMPRINT LITHOGRAPHY模板制造和处理
公开(公告)号：US20100072671A1
公开(公告)日：2010-03-25
申请号：US12567275
申请日：2009-09-25
申请人： Gerard M. Schmid , Weijun Liu , Edward Brian Fletcher , Frank Y. Xu , Fen Wan
发明人： Gerard M. Schmid , Weijun Liu , Edward Brian Fletcher , Frank Y. Xu , Fen Wan
IPC分类号： B29C43/02 , B29C35/00
CPC分类号： G03F7/0002 , B29C33/06 , B29C33/10 , B29C43/003 , B29C43/021 , B29C2043/025 , B82Y10/00 , B82Y40/00
摘要： A nano-imprint lithography template includes a rigid support layer, a cap layer, and a flexible cushion layer positioned between the support layer and the cap layer. Treating an imprint lithography template includes heating the template to desorb gases from the template. Heating the template includes radiating the template at a selected wavelength with, for example, infrared radiation. The selected wavelength may correspond to a wavelength at which the template material is strongly absorbing.
摘要翻译：纳米压印光刻模板包括刚性支撑层，盖层和位于支撑层和盖层之间的柔性缓冲层。处理压印光刻模板包括加热模板以从模板解吸气体。加热模板包括用例如红外辐射以选定的波长辐射模板。所选择的波长可以对应于模板材料强烈吸收的波长。

20. 发明授权

US07531025B2 Method of creating a turbulent flow of fluid between a mold and a substrate 失效
标题翻译：在模具和基材之间产生流体紊流的方法
公开(公告)号：US07531025B2
公开(公告)日：2009-05-12
申请号：US10898034
申请日：2004-07-23
申请人： Ian M. McMackin , Nicholas A. Stacey , Daniel A. Babbs , Duane J. Voth , Mathew P. C. Watts , Van N. Truskett , Frank Y. Xu , Ronald D. Voisin , Pankaj B. Lad
发明人： Ian M. McMackin , Nicholas A. Stacey , Daniel A. Babbs , Duane J. Voth , Mathew P. C. Watts , Van N. Truskett , Frank Y. Xu , Ronald D. Voisin , Pankaj B. Lad
IPC分类号： B01D19/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S425/06 , Y10S425/815 , Y10S438/909
摘要： The present invention is directed toward a method of controlling a turbulent flow of a fluid between a substrate and a template, and more specifically, controlling a turbulent flow of a fluid between droplets disposed on a substrate and a template. To that end, the method further comprises the ingression and egression of the fluid through a first and second aperture, and in a further embodiment, a plurality of apertures, to create such a turbulent flow of the fluid.
摘要翻译：本发明涉及一种控制衬底和模板之间的流体的紊流的方法，更具体地说，控制流体在设置在衬底和模板上的液滴之间的紊流。为此，该方法还包括流体通过第一和第二孔的进入和流出，并且在另一实施例中，多个孔，以产生流体的这种湍流。

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