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    • 12. 发明授权
    • Very small image sensor
    • 非常小的图像传感器
    • US08193479B2
    • 2012-06-05
    • US12429413
    • 2009-04-24
    • François RoyBenoît Ramadout
    • François RoyBenoît Ramadout
    • H01L27/00H01L31/101
    • H01L27/14687H01L27/1463H01L27/14641H01L27/14643
    • An image sensor formed in a semiconductor stack of a lower region of a first conductivity type and of an upper region of a second conductivity type, including: a photodiode formed of a first portion of the stack; a read area formed of a second portion of the stack; a trench with insulated walls filled with a conductive material, the trench surrounding the photodiode and the read area and being interrupted, all along its height, on a portion facing the photodiode and the read area; and first connection mechanism associated with the conductive material of the trench and capable of being connected to a reference bias voltage.
    • 一种形成在第一导电类型的下区域和第二导电类型的上区域的半导体堆叠中的图像传感器,包括:由所述堆叠的第一部分形成的光电二极管; 由堆叠的第二部分形成的读取区域; 具有填充有导电材料的绝缘壁的沟槽,围绕光电二极管和读取区域的沟槽,并且全部沿其高度中断面对光电二极管和读取区域的部分; 以及与沟槽的导电材料相关联并且能够连接到参考偏置电压的第一连接机构。
    • 15. 发明授权
    • Photodetector array
    • 光电检测器阵列
    • US07279729B2
    • 2007-10-09
    • US10849094
    • 2004-05-19
    • François Roy
    • François Roy
    • H01L31/113
    • H01L27/14603H01L27/14632H01L27/14636
    • A photodetector array made in monolithic form, in which transistors are formed in a semiconductor substrate coated with several metallization levels and photodiodes are formed above a last metallization level, each photodiode having an upper region of a first conductivity type common to all photodiodes and an individual lower region forming a junction with the upper region in contact with a metallization of the last level, wherein each lower region is separated from the neighboring lower regions by an insulating material and is connected to the metallization through a via formed in at least one insulating layer.
    • 在最后的金属化水平上形成以单体形式制成的光电检测器阵列,其中晶体管形成在涂覆有若干金属化水平的半导体衬底和光电二极管中,每个光电二极管具有所有光电二极管共同的第一导电类型的上部区域和个体 下部区域与上部区域形成与最后一层的金属化接触的结,其中每个下部区域通过绝缘材料与相邻的下部区域分离,并且通过在至少一个绝缘层中形成的通孔连接到金属化层 。
    • 18. 发明授权
    • Image sensor with vertical transfer gate
    • 具有垂直传输门的图像传感器
    • US08531567B2
    • 2013-09-10
    • US12910176
    • 2010-10-22
    • François RoyFrédéric Barbier
    • François RoyFrédéric Barbier
    • H04N3/14H04N5/335
    • H01L27/14603H01L27/14612H01L27/1463H01L27/14641H01L27/14683
    • An image sensor including a first pixel positioned between second and third pixels, each of the first, second and third pixels comprising a photodiode region surrounded by an isolation trench; a first charge transfer gate comprising a first column electrode surrounded by an insulating layer and positioned in an opening of the isolation trench between the first and second pixels, the first column electrode being configured to receive a first transfer voltage signal; and a second charge transfer gate including a second column electrode surrounded by an insulating layer and positioned in an opening of the isolation trench between the first and third pixels, the second column electrode being configured to receive a second transfer voltage signal.
    • 一种图像传感器,包括位于第二和第三像素之间的第一像素,第一,第二和第三像素中的每一个包括由隔离沟槽包围的光电二极管区域; 第一电荷传输门,包括由绝缘层包围并位于第一和第二像素之间的隔离沟槽的开口中的第一列电极,第一列电极被配置为接收第一转印电压信号; 以及第二电荷转移栅极,包括由绝缘层包围并位于第一和第三像素之间的隔离沟槽的开口中的第二列电极,第二列电极被配置为接收第二转印电压信号。