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    • 13. 发明申请
    • LIGHT EXPOSURE DEVICE
    • 灯光曝光装置
    • WO1993009472A1
    • 1993-05-13
    • PCT/DE1991000860
    • 1991-10-30
    • FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ...VOGT, HolgerKÜCK, HeinzHESS, GüntherGEHNER, Andreas
    • FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ...
    • G03F07/20
    • G03F7/70283G03F7/70291G03F7/70358
    • A light exposure device for directly exposing photosensitive layers has a light source (2) and a pattern generator (3). The pattern generator (3) has an optical schlieren system (14) and an active, matrix-addressable surface light modulator (13). The schlieren system (14) has a schlieren objective (15) and a projection objective (16), as well as a reflecting device (17) arranged between both objectives that directs the light from the light source (2) onto the surface (19) of the surface light modulator (13). A filtering device (17, 17b) filters out diffracted light and lets through non diffracted light from the surface light modulator (13) to the projection objective (16). The structure to be exposed is secured on a movable positioning table (7). The surface light modulator is (13) addressed so that its non-addressed surface areas (19a, 19b, ...) correspond to the projection areas of the structure to be exposed.
    • 用于直接曝光感光层的曝光装置具有光源(2)和图案发生器(3)。 图案发生器(3)具有光学施胶系统(14)和有源矩阵寻址表面光调制器(13)。 所述分光镜系统(14)具有分光镜(15)和投影物镜(16),以及布置在两个物镜之间的反射装置(17),其将来自光源(2)的光引导到表面(19) )表面光调制器(13)。 过滤装置(17,17b)滤出衍射光并通过来自表面光调制器(13)到投影物镜(16)的非衍射光。 要暴露的结构被固定在可动定位台(7)上。 表面光调制器(13)被寻址,使得其未寻址的表面区域(19a,19b,...)对应于要暴露的结构的投影区域。