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    • 11. 发明授权
    • Multiple-chromatic light emitting device
    • 多色发光装置
    • US07417260B2
    • 2008-08-26
    • US11169565
    • 2005-06-28
    • Dong-Sing WuuRay-Hua Horng
    • Dong-Sing WuuRay-Hua Horng
    • H01L29/20H01L29/22
    • H01L25/0753H01L33/508H01L2224/48091H01L2224/49107H01L2224/73265H01L2924/00014
    • A light emitting device includes: a first LED that emits a first primary light in a first primary wavelength range when activated; a second LED that emits a second primary light in a second primary wavelength range when activated, the second primary wavelength range differing from the first primary wavelength range; and a semiconductor photon-recycling member associated with the first LED in such a manner to convert a portion of the first primary light into a secondary light in a secondary wavelength range through photon-recycling mechanism and to permit the remainder of the first primary light to pass therethrough. The secondary wavelength range is different from the first and second primary wavelength ranges, thereby enabling the light emitting device to emit a multiple-chromatic light.
    • 发光装置包括:第一LED,其在被激活时发射在第一主要波长范围内的第一初级光; 第二LED,其在被激活时发射在第二主要波长范围内的第二原色光,所述第二主要波长范围不同于所述第一主要波长范围; 以及与第一LED相关联的半导体光子再循环元件,以这样的方式,通过光子再循环机构将第一原色光的一部分转变成次级波长范围内的次级光,并允许第一主光的剩余部分 通过。 次级波长范围不同于第一和第二主要波长范围,从而使得发光器件能够发射多色光。
    • 13. 发明申请
    • Light emitting device
    • 发光装置
    • US20060267025A1
    • 2006-11-30
    • US11129307
    • 2005-05-16
    • Dong-Sing WuuRay-Hua HorngWoei-Kai Wang
    • Dong-Sing WuuRay-Hua HorngWoei-Kai Wang
    • H01L33/00
    • H01L33/007H01L33/12H01L33/20H01L33/22
    • A light emitting device includes a substrate having a patterned surface and formed with a plurality of spaced apart cavities, and an epitaxial layer formed on the patterned surface of the substrate, having a patterned surface that is in face-to-face contact with the patterned surface of the substrate, and formed with a plurality of protrusions that protrude from the patterned surface of the epitaxial layer and that are respectively received in the cavities. Each of the protrusions is polygonal in shape and defines a plurality of vertices. The vertices of each of the protrusions contact the cavity-defining wall of the respective one of the cavities so as to form a plurality of closed pores between each of the protrusions and the cavity-defining wall of the respective one of the cavities.
    • 发光器件包括具有图案化表面并且形成有多个间隔开的空腔的衬底,以及形成在衬底的图案化表面上的外延层,其具有与图案面对面接触的图案化表面 并且形成有从外延层的图案化表面突出并分别容纳在空腔中的多个突起。 每个突起的形状是多边形并且限定多个顶点。 每个突起的顶点接触相应一个空腔的空腔限定壁,以便在每个突起和相应的一个空腔的空腔限定壁之间形成多个闭合孔。
    • 14. 发明授权
    • Method for manufacturing a light emitting device
    • 制造发光器件的方法
    • US07118930B1
    • 2006-10-10
    • US11205213
    • 2005-08-17
    • Dong-Sing WuuRay-Hua Horng
    • Dong-Sing WuuRay-Hua Horng
    • H01L21/00
    • H01L33/0079Y10S438/928Y10S438/977
    • A method for manufacturing a light emitting device includes (a) preparing a semiconductor element formed with a crystalline substrate, and a temporary element, the temporary element including a laser-transmissive substrate and a laser-dissociable layer formed on the laser-transmissive substrate, (b) attaching the laser-dissociable layer of the temporary element to the epitaxial layer of the semiconductor element through a adhesive layer, (c) thinning the crystalline substrate, (d) applying a laser beam to the temporary element so as to dissociate the laser-dissociable layer of the temporary element, and removing the temporary element from the adhesive layer, and (e) removing the adhesive layer from the epitaxial layer of the semiconductor element.
    • 一种制造发光器件的方法包括:(a)制备形成有晶体衬底的半导体元件和临时元件,所述临时元件包括激光透射衬底和形成在激光透射衬底上的激光可解离层, (b)通过粘合剂层将临时元件的激光可分离层附着到半导体元件的外延层,(c)使晶体基板变薄;(d)将激光束施加到临时元件上, 所述临时元件的激光离解层,以及从所述粘合剂层移除所述临时元件,以及(e)从所述半导体元件的外延层去除所述粘合剂层。
    • 15. 发明授权
    • Method for forming a light emitting diode
    • 形成发光二极管的方法
    • US07998768B1
    • 2011-08-16
    • US12903872
    • 2010-10-13
    • Ray-Hua HorngDong-Sing Wuu
    • Ray-Hua HorngDong-Sing Wuu
    • H01L33/22
    • H01L33/22H01L33/0079H01L33/46
    • A method for forming a light emitting diode includes: (a) growing epitaxially an epitaxial film over an epitaxial substrate; (b) roughening an upper surface of the epitaxial film; (c) forming a top electrode on the roughened upper surface of the epitaxial film; (d) detachably attaching a temporary substrate over the roughened upper surface of the epitaxial film; (e) roughening the lower surface of the epitaxial film; (f) disposing the roughened lower surface of the epitaxial film on a reflective top surface of an electrically conductive permanent substrate; (g) filling an optical adhesive in a gap between the roughened lower surface of the epitaxial film and the reflective top surface of the permanent substrate; and (h) after the step (g), removing the temporary substrate from the epitaxial film.
    • 一种形成发光二极管的方法包括:(a)在外延衬底上外延生长外延膜; (b)使外延膜的上表面粗糙化; (c)在所述外延膜的粗糙化的上表面上形成顶部电极; (d)在外延薄膜的粗糙化的上表面上可拆卸地将临时衬底附着; (e)使外延膜的下表面粗糙化; (f)将外延膜的粗糙化的下表面设置在导电永久基板的反射顶表面上; (g)将光学粘合剂填充在外延膜的粗糙化的下表面与永久性基板的反射顶表面之间的间隙中; 和(h)步骤(g)之后,从外延膜去除临时衬底。
    • 20. 发明授权
    • Method for fabricating semiconductor devices
    • 制造半导体器件的方法
    • US08853057B2
    • 2014-10-07
    • US13242362
    • 2011-09-23
    • Dong-Sing WuuRay-Hua Horng
    • Dong-Sing WuuRay-Hua Horng
    • H01L21/00H01L29/06H01L33/00H01L23/31H01L21/683H01L21/78H01L21/02
    • H01L21/6835H01L21/02639H01L21/78H01L23/3171H01L33/007H01L33/0079H01L33/0095H01L2924/0002H01L2924/00
    • A method for fabricating semiconductor devices includes: (a) forming a layered structure that includes a temporary substrate, a plurality of spaced apart sacrificial film regions on the temporary substrate, and a plurality of valley-and-peak areas among the sacrificial film regions; (b) growing laterally and epitaxially an epitaxial film layer over the sacrificial film regions and the valley-and-peak areas, wherein gaps are formed among the epitaxial film layer and the valley-and-peak areas; (c) forming a conductive layer to contact the epitaxial film layer; (d) forming a plurality of grooves to divide the epitaxial film layer and the conductive layer into a plurality of epitaxial structures on the temporary substrate; and (e) removing the temporary substrate and the sacrificial film regions from the epitaxial structures by etching the sacrificial film regions through the gaps and the grooves.
    • 一种制造半导体器件的方法包括:(a)形成层叠结构,其包括临时衬底,临时衬底上的多个间隔的牺牲膜区域和牺牲膜区域中的多个谷 - 峰区域; (b)横向和外延生长在牺牲膜区域和谷 - 峰区域上的外延膜层,其中在外延膜层和谷 - 峰区域之间形成间隙; (c)形成与外延膜层接触的导电层; (d)形成多个沟槽以将外延膜层和导电层分成临时衬底上的多个外延结构; 以及(e)通过蚀刻通过间隙和沟槽的牺牲膜区域,从外延结构去除临时衬底和牺牲膜区域。