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11. 发明专利

JP2003015324A Exposure device 有权
标题翻译：曝光装置
公开(公告)号：JP2003015324A
公开(公告)日：2003-01-17
申请号：JP2001195802
申请日：2001-06-28
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： SUZUKI KOJI
IPC分类号： G03F9/00 , H01J9/14
摘要： PROBLEM TO BE SOLVED: To provide an exposure device for photolithography, which is used for exposing and forming a picture of a photomask on a photosensitive material provided on the surface part of a base material to be processed as a latent image by exposing from the rear surface side where the picture of the photomask is not formed in such a state in which a large size photomask is attached to a supporting frame in a standing condition in nearly vertical direction, and with which the positions in the lateral direction of the photomask in the supporting frame is determined with a good precision.
SOLUTION: In the supporting frame, a positioning pin for determining the positions in the lateral direction of the photomask along the supporting frame is provided, and one side face part in the lateral direction of the photomask is brought into contact with the positioning pin in such a state in which the positions in the lengthwise direction of the photomask, being the vertical direction, are kept at predetermined positions, and further, an actuator is provided so as to press the other side face part in the lateral direction of the photomask, which side face part opposes to the side face part in the lateral direction of the photomask mentioned above so that the photomask is pressed to the positioning pin for determining the positions in the lateral direction of the photomask and held.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：提供一种用于光刻的曝光装置，其用于在设置在待处理基材的表面部分上的感光材料上曝光和形成光掩模，作为潜像，通过从后方曝光表面侧，其中光掩模的图像未形成在大尺寸光掩模在大致垂直方向上的立场状态下附着到支撑框架的状态下，并且光掩模的横向方向上的位置在确定支撑框架的精度。解决方案：在支撑框架中，设置用于沿着支撑框架确定光掩模的横向位置的定位销，并且使光掩模的横向方向上的一个侧面部分与定位销接触其中将沿着垂直方向的光掩模的长度方向上的位置保持在预定位置的状态，并且还提供致动器以沿光掩模的横向挤压另一侧面部分，侧面部分与上述光掩模的横向方向上的侧面部分相对，使得光掩模被按压到定位销，以确定光掩模的横向位置并保持。

12. 发明专利

JP2008284495A Groove coating device for plate product with groove 有权
标题翻译：用于具有栅格的板产品的铺设涂层装置
公开(公告)号：JP2008284495A
公开(公告)日：2008-11-27
申请号：JP2007133426
申请日：2007-05-18
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： SUZUKI KOJI , SHIMIZU MASABUMI
IPC分类号： B05C5/00 , B05C11/02
摘要： PROBLEM TO BE SOLVED: To provide a groove coating device which can supply a coating liquid stably into a groove without running over to the outside of the groove in the coating of the inside surface of the groove on the plate product with groove, and has a simple structure.
SOLUTION: When the coating liquid 13 is supplied in the groove while moving a dispenser nozzle 8 continuously discharging the coating liquid 3, relatively to the groove 4 of the plate product 1 with groove, an assistant guide 9 comprising a piano wire or the like is attached to the dispenser nozzle 8 so that the tip is inserted into the groove 4 to send the coating liquid discharged from the dispenser nozzle to the groove along the assistant guide 9.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：解决问题的方案为了提供一种槽涂装置，其能够在没有在槽的板状产品的槽内的内表面的涂层中向槽的外侧稳定地供给涂布液，并且结构简单。解决方案：当移动分配喷嘴8连续排出涂布液3时，相对于具有凹槽的板产品1的凹槽4移动涂布液13时，辅助引导件9包括钢琴丝或类似物附接到分配器喷嘴8，使得尖端插入槽4中以将从分配器喷嘴排出的涂布液沿着辅助引导件9传送到凹槽。版权所有（C）2009，JPO＆INPIT

13. 发明专利

JP2008284494A Method and apparatus for coating groove of grooved plate material 审中-公开
标题翻译：涂覆板材料的方法和装置
公开(公告)号：JP2008284494A
公开(公告)日：2008-11-27
申请号：JP2007133425
申请日：2007-05-18
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： SUZUKI KOJI , SHIMIZU MASABUMI
IPC分类号： B05D5/06 , B05C1/02 , B05C5/00 , E04F21/08
摘要： PROBLEM TO BE SOLVED: To provide a method for coating the groove of a grooved plate material by which the inside surface of the groove can be neatly coated even to the edge of the groove and to provide a simple-structured groove coating apparatus for practicing the method.
SOLUTION: The opening of the groove 4 of a grooved plate material 1 is closed with a mask 8. A coating fluid 10 is fed into the inside of the groove 4 through a through-hole 9 formed in the mask 8. The extra coating fluid is sucked and removed through the through-hole 9. Thereafter, the mask 8 is detached from the groove 4 by elevating it while keeping the inside pressure of the groove 4 negative so as to prevent the coating fluid from oozing from the inside of the groove 4 by capillary action when the mask 8 is elevated. Thus, it becomes possible to neatly coat only the inside surface of the groove 4.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：为了提供一种用于涂覆带槽板材的槽的方法，通过该方法，槽的内表面甚至能够均匀地涂覆到槽的边缘，并且提供简单的结构化的槽涂装置练习方法。解决方案：带槽板材1的槽4的开口用掩模8封闭。涂布液10通过形成在掩模8中的通孔9进入槽4的内部。通过通孔9吸引除去额外的涂布液。此后，通过使掩模8通过升高而将凹槽4从凹槽4的内部压力保持为负，从而防止涂布液从内部渗出当掩模8升高时通过毛细管作用产生凹槽4。因此，可以仅仅整齐地涂覆凹槽4的内表面。版权所有（C）2009，JPO＆INPIT

14. 发明专利

JP2007281262A Manufacturing apparatus and manufacturing method of wiring board unit 审中-公开
标题翻译：接线板单元制造设备及制造方法
公开(公告)号：JP2007281262A
公开(公告)日：2007-10-25
申请号：JP2006106991
申请日：2006-04-07
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： SUZUKI KOJI
IPC分类号： H05K3/36 , H05K1/14 , H05K3/00
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing apparatus and a manufacturing method of a wiring board unit capable of improving electrical connection reliability and productivity, when manufacturing the wiring board unit where a plurality of wiring boards are formed into units.
SOLUTION: The manufacturing apparatus 1 of wiring board units comprises: a flexible position measurement camera 17 and a rigid position measurement camera 10 for detecting the position of a conductive bump 51 on a flexible substrate 27, and that of a land 53 on a rigid substrate 23; a rigid hand 11 and a flexible hand 9 for positioning the rigid substrate 23 and the flexible substrate 27, so that the conductive bump 51 and the land 53 of which positions are detected are brought into contact each other; a continuity inspection apparatus 12 for inspecting the electrical continuity between the conductive bump 51 of the positioned rigid substrate 23 and the flexible substrate 27, and the land 53; and a heating device 19 for temporary locking that fixes the rigid substrate 23 and the flexible substrate 27 of which the electrical continuity between terminals is confirmed mutually.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了提供一种能够提高电连接可靠性和生产率的布线基板单元的制造装置和制造方法，在将多个布线板形成为单元的布线基板单元的制造中。解决方案：布线板单元的制造装置1包括：柔性位置测量相机17和用于检测柔性基板27上的导电凸块51的位置的刚性位置测量相机10以及接地板53的位置刚性基板23; 用于定位刚性基板23和柔性基板27的刚性手11和柔性手9，使得检测位置的导电凸起51和平台53彼此接触; 连续性检查装置12，用于检查定位的刚性基板23的导电凸块51与柔性基板27之间的电连续性;以及凸台53; 以及用于临时锁定的加热装置19，其固定刚性基板23和其上确定端子之间的电连续性的柔性基板27。版权所有（C）2008，JPO＆INPIT

15. 发明专利

JP2007276065A Substrate adsorption holding device and manufacturing device of wiring substrate unit 审中-公开
标题翻译：基板吸附保持装置及配线基板的制造装置
公开(公告)号：JP2007276065A
公开(公告)日：2007-10-25
申请号：JP2006106988
申请日：2006-04-07
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： SUZUKI KOJI
IPC分类号： B25J15/06
摘要： PROBLEM TO BE SOLVED: To surely adsorb and hold a substrate in such a state that the surface shape of a flexible substrate is made to be flatter.
SOLUTION: A flexible hand 9 provided on a manufacturing device 1 of a wiring substrate unit has a substrate adsorption surface 63 where a substrate abutment surface 64 for bringing a main surface 12 of one side of the flexible substrate into contact with, and a substrate abutment member 33 where an intake hole 34 opened to the substrate abutment surface 64 is formed, and is disposed in the intake hole 34 in such a state that the substrate adsorption surface 63 is projected from the opening end of the intake hole 34. The flexible hand is equipped with a substrate adsorption member 32 made of a contractible sponge rubber by an intake action and an intake mechanism 71 which performs air intake in the intake hole 34 so that the substrate adsorption surface 63 which sucks the substrate adsorption member 32 and absorbs a flexible substrate 27 is the same flat surface to the substrate abutment surface 64.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：使柔性基板的表面形状更平坦的状态下可靠地吸附和保持基板。解决方案：设置在布线基板单元的制造装置1上的柔性手9具有基板吸附面63，基板抵接面64使柔性基板一侧的主面12接触，基板抵接构件33，其形成有与基板抵接面64开口的吸入孔34，并且以从基板吸附面63从吸气孔34的开口端突出的状态配置在吸气孔34中。灵活的手装有由进气动作的可收缩海绵橡胶制成的基板吸附部件32和进气机构71，进气机构71在进气孔34中进行进气，从而吸附基板吸附部件32的基板吸附面63和吸收柔性基底27是与基底邻接表面64相同的平坦表面。版权所有（C）2008，JPO＆INPIT

16. 发明专利

JP2006010762A Peeling device and peeling method 审中-公开
标题翻译：剥离装置和剥离方法
公开(公告)号：JP2006010762A
公开(公告)日：2006-01-12
申请号：JP2004183783
申请日：2004-06-22
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： KANEDA TAKUYA , SUZUKI KOJI , NAKAMURA HIDENORI
IPC分类号： G02B5/20
摘要： PROBLEM TO BE SOLVED: To provide a peeling device or the like in which a transfer object is not affected by a change in peeling angle in a peeling start part and a peeling end. SOLUTION: The peeling is performed in a way that a peeling angle change region 35 generated as a result of raising a transfer sheet 15 by a peeling roller 17 at the start of peeling comes to the inside of a region 37 not-drawn with a pattern of a substrate. Since the peeling angle 39 is changed when the transfer sheet 15 performs suction, unevenness occurs intrinsically but the pattern is not drawn in the region 37 not drawn with the region 37 and therefore the effect of the unevenness does not appear in the pattern. The same holds true at the end of the peeling. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种剥离装置等，其中转印对象不受剥离开始部分和剥离端部中的剥离角度的变化的影响。解决方案：以剥离开始时通过剥离辊17升高转印片15而产生的剥离角度变化区域35进行剥离的方式，到未被拉伸的区域37的内部具有基底的图案。由于当转印纸15进行抽吸时剥离角度39发生变化，所以在本体上发生不均匀，但是在未被区域37绘制的区域37中不绘制图案，因此在图案中不会出现不均匀的影响。在剥离结束时也是如此。版权所有（C）2006，JPO＆NCIPI

17. 发明专利

JP2006010761A Lithography system and lithography method 审中-公开
标题翻译： LITHOGRAPHY系统和LITHOGRAPHY方法
公开(公告)号：JP2006010761A
公开(公告)日：2006-01-12
申请号：JP2004183780
申请日：2004-06-22
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： KANEDA TAKUYA , SUZUKI KOJI , NAKAMURA HIDENORI
IPC分类号： G03F9/00 , G06T1/00
摘要： PROBLEM TO BE SOLVED: To provide a laser lithograph system and the like which are high in accuracy, capable of performing correction corresponding to environmental elements, and which is reduced in the variation in accuracy of position, and reduced in working man-hours.
SOLUTION: For each lithography, a length measuring calculating unit 7a etc., measure the shape drawn on the substrate 11 and a correction data calculating unit 35 generates correction data. A lithography unit 23 performs drawing based on the accumulated correction data. Also, an environmental unit automatically performs measurement of the environmental data for each lithography. Based on the accumulated environmental data, the lithography unit 23 performs lithography.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了提供精度高的激光平版印刷系统等，能够进行与环境要素对应的校正，并且降低了位置精度的变化，小时。解决方案：对于每个光刻，长度测量计算单元7a等测量在基板11上绘制的形状，并且校正数据计算单元35产生校正数据。光刻单元23基于累积校正数据进行绘图。此外，环境单元自动执行每个光刻的环境数据的测量。基于积累的环境数据，光刻单元23进行光刻。版权所有（C）2006，JPO＆NCIPI

18. 发明专利

JPH11274389A Electrodeposition treatment equipment and method therefor 失效
标题翻译：电沉积处理设备及其方法
公开(公告)号：JPH11274389A
公开(公告)日：1999-10-08
申请号：JP9391798
申请日：1998-03-24
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： SUZUKI KOJI , ONOZAWA KIYOSHI , KOTANI KEIICHI , MOMOSE TERUHISA , SAKIHAMA NOBUHIRO
IPC分类号： H01L23/50 , C25D5/02 , C25D7/12 , C25D13/00
CPC分类号： H01L2224/48091 , H01L2224/48247 , H01L2924/00014
摘要： PROBLEM TO BE SOLVED: To suppress the generation of pits on an electrodeposited resist by dividing an electrodeposition bath in the progressing direction of a material to be electrodeposited and providing at least one electrodeposition solution communication blocking body consisting of a nonconductor having an opening part. SOLUTION: An electrodeposition bath 120 is divided into a plurality of divisions 121-123 in the progressing direction of a material 110 to be electrodeposited to almost block the communication of electrodeposition solution 140 in each division, and at least one of electrodeposition solution communication blocking bodies 161-163 is provided. In each of the divisions 121-123 divided by the electrodeposition solution communication block bodies 161-163, each electrode 130 separated by sections is provided for all or part of the sections so as to independently apply a desired electrodeposition voltage through division. Furthermore, an electrodeposition voltage can be adjusted for electrodeposition and the generation of bubbles due to electrolysis can be controlled to be less. As a result, adhesion of bubbles on the material to be electrodeposited can be reduced, and the generation of pits on an electrodeposited resist can be reduced.
摘要翻译：要解决的问题：通过在待电沉积材料的前进方向上分割电沉积浴并提供由具有开口部分的非导体组成的至少一个电沉积溶液连通阻塞体来抑制电沉积抗蚀剂上的凹坑的产生。解决方案：电沉积浴120在材料110的进行方向上被划分为多个分段121-123，以便电沉积几乎阻挡每个分区中的电沉积溶液140的连通，以及至少一个电沉积溶液通道阻挡体 161-163。在电沉积溶液通信块体161-163分割的每个分割部121-123中，为了全部或部分部分设置由各部分隔开的各电极130，通过分割独立地施加所需的电沉积电压。此外，可以调节电沉积电压以进行电沉积，并且可以将由电解产生的气泡控制得较小。结果，能够降低电沉积材料上的气泡的附着，能够降低电沉积抗蚀剂上的凹坑的产生。

19. 发明专利

JP2003050468A Exposure system 审中-公开
标题翻译：曝光系统
公开(公告)号：JP2003050468A
公开(公告)日：2003-02-21
申请号：JP2001239109
申请日：2001-08-07
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： SUZUKI KOJI
IPC分类号： G03F7/20 , H01J9/14
摘要： PROBLEM TO BE SOLVED: To provide an exposure system capable of achieving relative positioning of a support frame and a photomask with a high degree of precision as an exposure system for photolithography for forming the pattern of a large- sized photomask as a latent image in a photosensitive material disposed on the surface of a substrate for working by irradiating the photomask from the rear face side with no formed pattern after the photomask is erected in a nearly vertical direction and attached to a support frame.
SOLUTION: An attraction part for fixing a photomask is disposed on a support frame along the frame shape over the whole circumference of the frame, and a photomask is attracted and fixed over the whole periphery by the attraction part. The attraction part comprises flat platelike packing, the attraction face that attracts the photomask is flat and attraction holes for evacuation are pierced in the attraction part up to the attraction face over the whole circumference of the support frame.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：提供一种能够以高精度实现支撑框架和光掩模的相对定位的曝光系统，作为用于光刻的曝光系统，用于形成大尺寸光掩模的图案作为潜像感光材料设置在基板的表面上，用于通过在光掩模竖立在几乎垂直方向上并且附接到支撑框架之后从背面侧照射光掩模而没有形成图案来进行加工。解决方案：用于固定光掩模的吸引部件在框架的整个圆周上沿着框架形状设置在支撑框架上，并且光掩模被吸引部分吸引并固定在整个周边上。吸引部分包括平板状包装，吸引光掩模的吸引面平坦，吸引部分的吸引孔在支撑框架的整个圆周上穿过吸引面。

20. 发明专利

JP2003015308A Exposure device 有权
标题翻译：曝光装置
公开(公告)号：JP2003015308A
公开(公告)日：2003-01-17
申请号：JP2001195829
申请日：2001-06-28
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： SUZUKI KOJI
IPC分类号： G03F1/00 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To provide an exposure device for photolithography, which is used for exposing and forming a picture of a photomask on a photosensitive material provided on the surface part of a base material to be processed as a latent image by exposing from the rear surface side where the picture of the photomask is not formed, in such a state in which a large size photomask is attached to a supporting frame, and with which the load of a worker is reduced in comparison with a conventional exposure device when a large size photomask is attached to or detached from the supporting frame and the sticking of dust to the photomask during working is reduced. SOLUTION: The exposure device for photolithography has a photomask discharging section which receives a used photomask in such a state in which the used photomask is arranged in a standing condition in nearly vertical direction from the supporting frame while nearly horizontally moving at the photomask hand-over position, holds and discharge the used photomask to a predetermined position when the photomask is exchanged, and a photomask feeding section which provides a photomask to be used next, conveys the photomask to a photomask receiving position and mounting the photomask on the supporting frame mentioned above in such a state in which the photomask is arranged in a standing condition in nearly vertical direction while nearly horizontally moving, when the photomask is used.
摘要翻译：要解决的问题：提供一种用于光刻的曝光装置，其用于在设置在待处理基材的表面部分上的感光材料上曝光和形成光掩模，作为潜像，通过从后方曝光在没有形成光掩模的图像的表面侧，在大尺寸光掩模附着到支撑框架上的状态下，与常规曝光装置相比，工作人员的负载与之相比减小了大尺寸光掩模附着到支撑框架上或从支撑框架拆卸，并且在工作期间将灰尘粘附到光掩模被减少。解决方案：用于光刻的曝光装置具有光掩模放电部分，该光掩模放电部分以这样的状态接收所使用的光掩模，其中使用的光掩模在距离支撑框架几乎垂直方向的立场状态下布置，而在光掩模移交期间几乎水平移动在更换光掩模时将所使用的光掩模放置并保持并放电到预定位置，以及提供接下来使用的光掩模的光掩模馈送部分将光掩模传送到光掩模接收位置并将光掩模安装在上述支撑框架上在使用光掩模的情况下，在近似水平移动的情况下，在近似垂直方向上放置光掩模的状态。

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