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11. 发明申请

US20090152103A1 Sputtering apparatus and method of manufacturing flat display device using the sputtering apparatus 审中-公开
标题翻译：溅射装置及使用溅射装置制造平面显示装置的方法
公开(公告)号：US20090152103A1
公开(公告)日：2009-06-18
申请号：US12230596
申请日：2008-09-02
申请人： Kyoung-Won Nam
发明人： Kyoung-Won Nam
IPC分类号： C23C14/00
CPC分类号： C23C14/042 , C23C14/18
摘要： Provided is a sputtering apparatus which can check a short-circuit of a mask during a non-discharge period, the sputtering apparatus including: a substrate support, which is installed inside a chamber and supports a substrate; a target, which includes a target material that is to be deposited on the substrate; a mask, which is spaced apart from the substrate so as to surround the peripheral part of the substrate; a shield, which supports the mask and is connected to ground; an insulating member, which combines the mask and the shield and includes an insulating material; and a short-circuit detecting apparatus for detecting a short-circuit of the mask during a non-discharge period of the sputtering apparatus.
摘要翻译：本发明提供一种溅射装置，其可以在非放电期间检查掩模的短路，所述溅射装置包括：基板支撑体，其安装在室内并支撑基板; 靶，其包括要沉积在基底上的靶材料; 掩模，其与衬底间隔开以围绕衬底的周边部分; 一个屏蔽，支持面罩并连接到地面; 绝缘构件，其组合所述掩模和所述屏蔽并且包括绝缘材料; 以及用于在溅射装置的非放电期间检测掩模的短路的短路检测装置。

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