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    • 14. 发明公开
    • SCHOTTKY DIODE
    • 肖特基二极管
    • EP3240043A1
    • 2017-11-01
    • EP17176898.9
    • 2012-09-07
    • Cree, Inc.
    • HENNING, Jason PatrickZHANG, QingchunRYU, Sei-HyungAGARWAL, Anant KumarPALMOUR, John WilliamsALLEN, Scott
    • H01L29/872H01L29/06H01L29/16
    • H01L29/872H01L29/0619H01L29/0661H01L29/1608H01L29/8611H01L2224/04042H01L2224/05554H01L2224/05567H01L2224/05624H01L2224/05639H01L2224/05644H01L2924/00014H01L2924/12032H01L2924/1301H01L2924/1305H01L2924/13055H01L2924/00H01L2224/05552
    • A semiconductor device (10) comprises a drift layer (22) having a first surface with an active region (14) and a plurality of junction barrier element recesses (40), the drift layer being doped with a doping material of a first conductivity type and associated with an edge termination region (16) that is substantially laterally adjacent the active region. A Schottky layer (24) is over the active region of the first surface to form a Schottky junction. A plurality of first doped regions (30) extend into the drift layer about corresponding ones of the plurality of junction barrier element recesses (40) wherein the plurality of first doped regions are doped with a doping material of a second conductivity type, which is opposite the first conductivity type, and form an array of junction barrier elements in the drift layer below the Schottky junction. A well (34) ia formed in the drift layer in the edge termination region, the well having guard rings (36) and being doped with the doping material of the second conductivity type where the plurality of guard rings are formed in the well, wherein the guard rings are coplanar with the junction barrier element recesses.
    • 一种半导体器件(10)包括具有第一表面和第二表面的漂移层(22),所述第一表面具有有源区(14)和多个结势垒元件凹槽(40),所述漂移层掺杂有第一导电类型的掺杂材料 并且与基本横向邻近有源区域的边缘终端区域(16)相关联。 肖特基层(24)位于第一表面的有源区上以形成肖特基结。 多个第一掺杂区域(30)围绕所述多个结势垒元件凹部(40)中的对应的一个延伸到所述漂移层中,其中所述多个第一掺杂区域掺杂有第二导电类型的掺杂材料,所述第二导电类型的掺杂材料相反 第一导电类型,并在肖特基结下方的漂移层中形成结势垒元件的阵列。 形成在边缘终端区域中的漂移层中的阱(34),阱具有保护环(36)并且掺杂有第二导电类型的掺杂材料,其中多个保护环形成在阱中,其中 保护环与接合屏障元件凹部共面。