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    • 11. 发明授权
    • Static-random-access memory cell
    • 静态随机存取存储单元
    • US5489790A
    • 1996-02-06
    • US380772
    • 1995-01-30
    • Craig S. Lage
    • Craig S. Lage
    • H01L21/8244H01L29/76
    • H01L27/11Y10S257/903
    • An SRAM cell includes a pair of cross-coupled inverters where each inverter includes vertical n-channel and p-channel transistors having a gate electrode that is shared between the transistors that make up each inverter. The gate electrodes for the inverters laterally surround the channel regions of the p-channel load transistors to achieve a relatively high beta ratio without occupying a large amount of substrate surface area. Also, the gate electrodes increase the amount of capacitance of the storage nodes and decreases the soft error rate. The active regions of the latch transistors are electrically isolated from the substrate by a buried oxide layer, thereby decreasing the chances of latch-up.
    • SRAM单元包括一对交叉耦合的反相器,其中每个反相器包括垂直的n沟道和p沟道晶体管,其具有在构成每个反相器的晶体管之间共享的栅电极。 用于逆变器的栅电极横向围绕p沟道负载晶体管的沟道区域,以实现相对高的β比例而不占据大量的衬底表面积。 此外,栅电极增加了存储节点的电容量并降低了软错误率。 锁存晶体管的有源区通过掩埋氧化物层与衬底电隔离,由此降低闩锁的可能性。
    • 14. 发明授权
    • Semiconductor memory cell having a trench structure
    • 具有沟槽结构的半导体存储单元
    • US5285093A
    • 1994-02-08
    • US955781
    • 1992-10-05
    • Craig S. LageRichard D. Sivan
    • Craig S. LageRichard D. Sivan
    • H01L27/11H01L29/786H01L29/10H01L27/02H01L29/78
    • H01L29/78642H01L27/1108Y10S257/903
    • In one embodiment, a semiconductor memory cell (10) having a trench (24) and access transistor (54) formed in a well region (20). The trench (24) substantially contains an inverter (60) which is electrically coupled to ground and power signals by buried layers (12, 18) in the substrate (11). The inverter (60) has a toroidal, shared-gate electrode (40) which electrically controls a driver transistor (32) in the wall (26) of the trench (24), and a thin-film load transistor (42) in the central portion of the trench (24). A portion of the toroidal, shared gate electrode extends to an adjacent well region (20') and contacts well region (20') at cell node (13'). A ground signal is provided to load transistor (42) at the bottom surface (28) of the trench (42). A supply signal is provided by a buried layer (18) which is integral with driver transistor (32).
    • 在一个实施例中,具有形成在阱区(20)中的沟槽(24)和存取晶体管(54)的半导体存储单元(10)。 沟槽(24)基本上包含逆变器(60),其通过衬底(11)中的掩埋层(12,18)电耦合到接地和功率信号。 逆变器(60)具有环形共用栅电极(40),其对沟槽(24)的壁(26)中的驱动晶体管(32)进行电控制,以及薄膜负载晶体管(42) 沟槽(24)的中心部分。 环形共享栅电极的一部分延伸到相邻的阱区(20'),并在单元节点(13')处接触阱区(20')。 提供接地信号以在沟槽(42)的底表面(28)处负载晶体管(42)。 电源信号由与驱动晶体管(32)成一体的掩埋层(18)提供。