专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

11. 发明授权

EP1354325B1 KOLLEKTOR MIT UNGENUTZTEM BEREICH FÜR BELEUCHTUNGSSYSTEME MIT EINER WELLENLÄNGE KLEINER ODER GLEICH 193 nm. 有权
标题翻译：未使用的区域，且在波长小于或等于193nm的照明系统收集器。
公开(公告)号：EP1354325B1
公开(公告)日：2010-04-14
申请号：EP02722029.2
申请日：2002-01-23
申请人： Carl Zeiss SMT AG
发明人： SINGER, Wolfgang , EGLE, Wilhelm , WEISS, Markus , HAINZ, Joachim , WIETZORREK, Jochen , MELZER, Frank , WANGLER, Johannes
IPC分类号： G21K1/06
CPC分类号： G21K1/06 , B82Y10/00 , G02B5/09 , G02B17/006 , G02B19/0014 , G02B19/0019 , G02B19/0023 , G02B19/0047 , G02B19/0095 , G03F7/70108 , G03F7/70158 , G03F7/70166 , G03F7/70175 , G03F7/702 , G03F7/70233 , G03F7/70825 , G21K2201/065 , G21K2201/067
摘要： The invention relates to a collector for lighting systems having a wavelength ≤ 193 nm, preferably ≤ 126 nm, more preferably EUV wavelengths for receiving light from a light source via an aperture on the side of the object, and for illuminating a region on an image plane, comprising a plurality of rotationally symmetrical mirror shells respectively comprising at least one first mirror segment having one first optical surface,said mirror shells being arranged about a common axis of rotation and an annular aperture element of the aperture on the side of the object being associated with each mirror shell; a beginning and end point on a meridional plane are associated with the first optical surface, the meridional plane is a plane which includes the axis of rotation and the beginning point of the first optical surface on the meridional plane defines an outer edge beam and the endpoint of the first optical surface defines an inner edge beam, the inner and outer edge beams when rotated about the axis of rotation defining a brush discharge which is reflected on at least the first optical surface of the mirror shells and which runs through the collector from the aperture on the side of the object to the plane to be illuminated. The brush discharge defines a used area between at least two adjacent mirror shells. The invention is characterized in that the surface parameters and the position of the mirror shells are selected in such a way that at least one unused area is formed between at least two adjacent mirror shells.

12. 发明公开

EP1442330A1 TILTING MIRROR 审中-公开
标题翻译： KIPPSPIEGEL
公开(公告)号：EP1442330A1
公开(公告)日：2004-08-04
申请号：EP02785265.6
申请日：2002-10-22
申请人： Carl Zeiss SMT AG
发明人： SINGER, Wolfgang , WEISS, Markus , SEIFERT, Andreas , MELZER, Frank , MANN, Heinz
IPC分类号： G02B7/182 , G02B6/08 , G02B5/09
CPC分类号： G03F7/70075 , G02B5/09 , G02B7/1821 , G02B7/1824 , G02B26/0833 , G03F7/70141 , G03F7/70175 , G03F7/702
摘要： A tilting mirror, in particular as mirror facet (2) for a facet mirror (1) comprising a plurality of these tilting mirrors (2), is provided with a mirror surface (5) and a bearing device. The mirror surface (5) is constructed as the surface in a recess (4) in a spherical member (3), the spherical member (3) being mounted in the bearing device.

13. 发明公开

EP1642173A1 FACET MIRRORS AND A METHOD FOR PRODUCING MIRROR FACETS 审中-公开
标题翻译：镜面及其制造方法
公开(公告)号：EP1642173A1
公开(公告)日：2006-04-05
申请号：EP04740785.3
申请日：2004-07-08
申请人： Carl Zeiss SMT AG
发明人： SEIFERT, Andreas , MELZER, Frank , HEISLER, Andreas , MANN, Heinz , ROMEYN, Gerhard
IPC分类号： G03F7/20 , G02B5/09 , G02B5/04 , B24B13/00
CPC分类号： G03F7/70075 , G02B5/08 , G02B5/09 , G03F7/70141 , G03F7/702 , G03F7/70825 , G21K2201/06
摘要： In a method for producing mirror facets (1) for facet mirrors in illuminating devices or projection exposure machines in microlithography by using radiation in the extreme ultraviolet range, individual tilting angles are recessed into an optical surface (2) of the mirror facet (1), preferably a surface with tilting angles relative to a reference surface of the mirror facet (1) is machined into or on said optical surface.

14. 发明公开

EP1472562A1 FACETTENSPIEGEL MIT MEHREREN SPIEGELFACETTEN 有权
标题翻译：具有多面FACETS镜子镜子
公开(公告)号：EP1472562A1
公开(公告)日：2004-11-03
申请号：EP02806742.9
申请日：2002-12-23
申请人： Carl Zeiss SMT AG
发明人： HOLDERER, Hubert , WEISS, Markus , SINGER, Wolfgang , SEIFERT, Andreas , HEISLER, Andreas , MELZER, Frank , MANN, Heinz , FALTUS, Jürgen
IPC分类号： G02B7/182 , G02B5/09
CPC分类号： G03F7/70075 , G02B5/09 , G02B7/1821 , G02B7/1824 , G02B7/198 , G02B26/0833 , G03F7/70108 , G03F7/70141 , G03F7/70175 , G03F7/702
摘要： The invention relates to a faceted mirror (10) which comprises a plurality of facets (11) and is used in lighting equipment (3) for projection installations (1) in microlithography, especially in EUV lithography. Each mirror facet (11) is provided with a spherical body (17). A mirror surface (12) is arranged in a recess (18) of the spherical body (17). The side of the spherical body (17) opposite to said mirror surface (12) is positioned in a bearing device (15). In a device for adjusting one such faceted mirror (10), a lever element (23) is arranged on each of the mirror facets (11), on the side of the spherical body (17) opposite to the mirror surface (12). An adjustment system (27) engages in a region opposing the spherical body (17), on the lever element (23), enabling the spherical body (17) to be displaced about its central axis.

15. 发明公开

EP1354325A2 KOLLEKTOR MIT UNGENUTZTEM BEREICH FÜR BELEUCHTUNGSSYSTEME MIT EINER WELLENLÄNGE KLEINER ODER GLEICH 193 nm. 有权
标题翻译：未使用的区域，且在波长小于或等于193nm的照明系统收集器。
公开(公告)号：EP1354325A2
公开(公告)日：2003-10-22
申请号：EP02722029.2
申请日：2002-01-23
申请人： Carl Zeiss SMT AG
发明人： SINGER, Wolfgang , EGLE, Wilhelm , WEISS, Markus , HAINZ, Joachim , WIETZORREK, Jochen , MELZER, Frank , WANGLER, Johannes
IPC分类号： G21K1/06
CPC分类号： G21K1/06 , B82Y10/00 , G02B5/09 , G02B17/006 , G02B19/0014 , G02B19/0019 , G02B19/0023 , G02B19/0047 , G02B19/0095 , G03F7/70108 , G03F7/70158 , G03F7/70166 , G03F7/70175 , G03F7/702 , G03F7/70233 , G03F7/70825 , G21K2201/065 , G21K2201/067
摘要： The invention relates to a collector for lighting systems having a wavelength ≤ 193 nm, preferably ≤ 126 nm, more preferably EUV wavelengths for receiving light from a light source via an aperture on the side of the object, and for illuminating a region on an image plane, comprising a plurality of rotationally symmetrical mirror shells respectively comprising at least one first mirror segment having one first optical surface,said mirror shells being arranged about a common axis of rotation and an annular aperture element of the aperture on the side of the object being associated with each mirror shell; a beginning and end point on a meridional plane are associated with the first optical surface, the meridional plane is a plane which includes the axis of rotation and the beginning point of the first optical surface on the meridional plane defines an outer edge beam and the endpoint of the first optical surface defines an inner edge beam, the inner and outer edge beams when rotated about the axis of rotation defining a brush discharge which is reflected on at least the first optical surface of the mirror shells and which runs through the collector from the aperture on the side of the object to the plane to be illuminated. The brush discharge defines a used area between at least two adjacent mirror shells. The invention is characterized in that the surface parameters and the position of the mirror shells are selected in such a way that at least one unused area is formed between at least two adjacent mirror shells.

16. 发明授权

EP1472562B1 FACETTENSPIEGEL MIT MEHREREN SPIEGELFACETTEN 有权
标题翻译：具有多面FACETS镜子镜子
公开(公告)号：EP1472562B1
公开(公告)日：2010-04-14
申请号：EP02806742.9
申请日：2002-12-23
申请人： Carl Zeiss SMT AG
发明人： HOLDERER, Hubert , WEISS, Markus , SINGER, Wolfgang , SEIFERT, Andreas , HEISLER, Andreas , MELZER, Frank , MANN, Heinz , FALTUS, Jürgen
IPC分类号： G02B7/182 , G02B5/09
CPC分类号： G03F7/70075 , G02B5/09 , G02B7/1821 , G02B7/1824 , G02B7/198 , G02B26/0833 , G03F7/70108 , G03F7/70141 , G03F7/70175 , G03F7/702

17. 发明公开

EP1550004A2 BELEUCHTUNGSSYSTEM MIT EINER VORRICHTUNG ZUR EINSTELLUNG DER LICHTINTENSIT T 审中-公开
标题翻译：与设备，用于设置光强Ť照明系统
公开(公告)号：EP1550004A2
公开(公告)日：2005-07-06
申请号：EP03807802.8
申请日：2003-08-23
申请人： Carl Zeiss SMT AG
发明人： SINGER, Wolfgang , ANTONI, Martin , MELZER, Frank , WANGLER, Johannes , HAINZ, Joachim , WIETZORREK, Joachim , MAUL, Manfred , WEISS, Markus
IPC分类号： G03F7/20
CPC分类号： G03F7/70558 , G03F7/7085
摘要： The invention relates to a lighting system for microlithography with wavelengths ≤ 157 nm, especially for EUV lithography, for illuminating an object plane, said system comprising: a radiation source which supplies a bundle of light rays, said bundle of light rays passing through the lighting system in a beam path from the radiation source to the object plane and having a light intensity; and a first optical component comprising at least one first optical element provided with a plurality of grid elements, said first optical element being arranged in the beam path between the radiation source and the object plane. The inventive lighting system is characterised in that a device for adjusting the light intensity for wavelengths ≤ 157 nm is arranged in the beam path from the radiation source to the object plane, between the radiation source and the first optical element.

18. 发明公开

EP1499925A2 BELEUCHTUNGSSYSTEM, INSBESONDERE F R DIE EUV-LITHOGRAPHIE 审中-公开
标题翻译：照明系统，尤其是对于EUV光刻
公开(公告)号：EP1499925A2
公开(公告)日：2005-01-26
申请号：EP03724973.7
申请日：2003-04-08
申请人： Carl Zeiss SMT AG
发明人： MELZER, Frank , SINGER, Wolfgang
IPC分类号： G03F7/20 , G02B26/08
CPC分类号： G03F7/70075 , G02B26/0816 , G03F7/70141 , G03F7/702
摘要： A lighting system, particularly for use in extreme ultraviolet (EUV) lithography, comprising a projection lens for producing semiconductor elements for wavelengths ≤ 193 nm is provided with a light source (1), an object plane (12), an exit pupil (15), a first optical element (5) having first screen elements (6) for producing light channels, and with a second optical element (7) having second screen elements (8). A screen element (8) of the second optical element (7) is assigned to each light channel that is formed by one of the first screen elements (6) of the first optical element (5). The screen elements (6) of the first optical element (5) and of the second optical element (7) can be configured or arranged so that they produce, for each light channel, a continuous beam course from the light source (1) up to the object plane (12). The angles of the first screen elements (6) of the first optical element (5) can be adjusted in order to modify a tilt. The location and/or angles of the second screen elements (8) of the second optical element (7) can be adjusted individually and independently of one another in order to realize another assignment of the first screen elements (6) of the first optical element (5) to the second screen elements (8) of the second optical element (7) by displacing and/or tilting the first and second screen elements (8).

19. 发明公开

EP1415199A2 KOLLEKTOR MIT BEFESTIGUNGSEINRICHTUNGEN ZUM BEFESTIGEN VON SPIEGELSCHALEN 审中-公开
标题翻译：带固定装置用于固定反射镜壳集热
公开(公告)号：EP1415199A2
公开(公告)日：2004-05-06
申请号：EP02758381.4
申请日：2002-07-23
申请人： Carl Zeiss SMT AG
发明人： SINGER, Wolfgang , EGLE, Wilhelm , WEISS, Markus , HAINZ, Joachim , WIETZORREK, Joachim , WANGLER, Johannes , MELZER, Frank
IPC分类号： G03F7/20
摘要： The invention relates to a collector for a projection printing installation, which is operated in a scanning mode along a scanning direction with a wavelength ≤ 193 nm, preferably ≤ 126 nm, more preferably with extreme UV wavelengths. According to the invention, said collector receives light from a light source on the object side and illuminates a region in an image plane, said plane being fixed by a local system of coordinates. The y-direction of the local system of coordinates is parallel to the scanning direction and the x-direction is perpendicular thereto. Said collector comprises a plurality of rotationally symmetrical mirror shells, each comprising at least one first mirror segment, which has a first optical surface, said mirror shells being arranged within each other about a common rotation axis. Said collector also comprises fastening devices, for fastening the plurality of rotationally symmetrical mirror shells, and said fastening devices comprise support spokes, which extend in the radial direction of the rotationally symmetrical mirror shells. The invention is characterized in that the support spokes are arranged, such that when they are projected in the plane to be illuminated on the image side, they are inclined in relation to the y-direction of the local system of coordinates in the image plane.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式