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11. 发明申请

US20050230350A1 In-situ dry clean chamber for front end of line fabrication 审中-公开
标题翻译：用于前端制造的原位干洗室
公开(公告)号：US20050230350A1
公开(公告)日：2005-10-20
申请号：US11063645
申请日：2005-02-22
申请人： Chien-Teh Kao , Jing-Pei Chou , Chiukin Lai , Sal Umotoy , Joel Huston , Son Trinh , Mei Chang , Xiaoxiong Yuan , Yu Chang , Xinliang Lu , Wei Wang , See-Eng Phan
发明人： Chien-Teh Kao , Jing-Pei Chou , Chiukin Lai , Sal Umotoy , Joel Huston , Son Trinh , Mei Chang , Xiaoxiong Yuan , Yu Chang , Xinliang Lu , Wei Wang , See-Eng Phan
IPC分类号： H01L21/28 , C23C16/455 , C23F1/00 , H01J37/32 , H01L21/00 , H01L21/302 , H01L21/3065 , H01L21/3205 , H01L21/8238 , H01L23/12 , H01L23/52
CPC分类号： H01L21/02104 , C23C14/022 , C23C14/50 , C23C14/541 , H01J37/32082 , H01J37/32357 , H01J37/3244 , H01J37/32522 , H01J37/32541 , H01J37/32568 , H01J37/32862 , H01J2237/2001 , H01L21/67069 , H01L21/67109 , H01L2924/0002 , H01L2924/00
摘要： A method and apparatus for removing native oxides from a substrate surface is provided. In one aspect, the chamber comprises a chamber body and a support assembly at least partially disposed within the chamber body and adapted to support a substrate thereon. The support assembly includes one or more fluid channels at least partially formed therein and capable of cooling the substrate. The chamber further comprises a lid assembly disposed on an upper surface of the chamber body. The lid assembly includes a first electrode and a second electrode which define a plasma cavity therebetween, wherein the second electrode is adapted to connectively heat the substrate.
摘要翻译：提供了一种从衬底表面去除天然氧化物的方法和装置。在一个方面，腔室包括室主体和至少部分地设置在腔体内并适于在其上支撑衬底的支撑组件。支撑组件包括至少部分地形成在其中并能够冷却基底的一个或多个流体通道。所述室还包括设置在所述室主体的上表面上的盖组件。盖组件包括在其间限定等离子体腔的第一电极和第二电极，其中第二电极适于连接地加热衬底。

12. 发明授权

US06277199B1 Chamber design for modular manufacturing and flexible onsite servicing 失效
标题翻译：室内设计用于模块化制造和灵活现场维修
公开(公告)号：US06277199B1
公开(公告)日：2001-08-21
申请号：US09233391
申请日：1999-01-19
申请人： Lawrence Chung-Lai Lei , Son Trinh
发明人： Lawrence Chung-Lai Lei , Son Trinh
IPC分类号： C23C1600
CPC分类号： H01L21/67161 , C23C14/568 , H01L21/67184 , H01L21/6719 , H01L21/67196
摘要： The present invention provides a semiconductor fabrication process and cluster tool utilizing individual gas boxes for each of the processing chambers. These individual gas boxes provide an enclosure where groupings of related gas components may be positioned above and/or adjacent to the semiconductor processing chamber requiring those objects or components. The proximity of the individual gas boxes to the respective processing chambers facilitates the delivery of gases to the chamber as needed. Furthermore, the individual gas panels enable a modular design comprising a processing chamber and gas panel combination. This modular design allows individual chambers and their respective gas panels to be run through various pre-installation tests.
摘要翻译：本发明提供一种半导体制造工艺和集束工具，其利用用于每个处理室的各个气体箱。这些单独的气体箱提供外壳，其中相关气体组分的分组可以位于需要这些物体或部件的半导体处理室的上方和/或邻近。各个气体箱到各个处理室的接近有助于根据需要将气体输送到室。此外，单独的气体面板能够实现包括处理室和气体面板组合的模块化设计。这种模块化设计允许单独的室及其各自的气体面板通过各种预安装测试运行。

13. 发明授权

US6050446A Pivoting lid assembly for a chamber 失效
标题翻译：用于室的枢轴盖组件
公开(公告)号：US6050446A
公开(公告)日：2000-04-18
申请号：US893410
申请日：1997-07-11
申请人： Lawrence Lei , Son Trinh , Gwo-Chuan Tzu , Mark Johnson
发明人： Lawrence Lei , Son Trinh , Gwo-Chuan Tzu , Mark Johnson
IPC分类号： H01L21/00 , B65D43/24
CPC分类号： H01L21/67017
摘要： A lid assembly for a process chamber. The lid assembly includes a hinge having a hinge mount affixed to the chamber and a hinge arm. A pin extends from the hinge mount through an elongated slot in the hinge arm allowing both rotational and longitudinal motion of the hinge arm relative to the hinge mount. A support frame attached to the hinge arm has two side arms that extend perpendicularly from the hinge arms toward the front of the chamber. The lid is pivotally connected to the side arms by a pivot connection aligned with the center of mass of the lid. A detent extends from the lid through a slot in the side arm at a position offset from the pivot connection. The detent and slot serve to limit the allowable rotation of the lid relative to the lid support frame. Thus, the lid is allowed to float over the opening of the chamber as the lid is closed so that the lid may be positioned in parallel alignment relative to the opening of the chamber before being secured to the chamber.
摘要翻译：用于处理室的盖组件。盖组件包括铰链，铰链具有固定到腔室的铰链座和铰链臂。销从铰链座延伸通过铰链臂中的细长槽，允许铰链臂相对于铰链座的旋转和纵向运动。附接到铰链臂的支撑框架具有从铰链臂朝向腔室的前部垂直延伸的两个侧臂。盖通过与盖的质心对准的枢转连接件枢转地连接到侧臂。制动器在从枢轴连接偏离的位置处从盖子延伸穿过侧臂中的狭槽。制动器和狭槽用于限制盖相对于盖支撑框架的允许旋转。因此，当盖被关闭时，允许盖在室的开口上浮动，使得盖可以在被固定到室之前相对于室的开口平行对准地定位。

14. 发明授权

US5968276A Heat exchange passage connection 失效
标题翻译：热交换通道连接
公开(公告)号：US5968276A
公开(公告)日：1999-10-19
申请号：US893859
申请日：1997-07-11
申请人： Lawrence Lei , Son Trinh , Mark Johnson
发明人： Lawrence Lei , Son Trinh , Mark Johnson
IPC分类号： H01L21/205 , C23C16/44 , C23C16/455 , H01L21/285 , C23C16/00
CPC分类号： C23C16/45565 , C23C16/455 , C23C16/45572
摘要： The present invention provides a method and apparatus for improving thermal management of gas being delivered to a chemical vapor deposition chamber. Thermal management is accomplished using a heat transfer fluid in thermal communication with the deposition gas passageways delivering the gases to the chamber for deposition. The gas injection manifold includes gas passageways and coolant liquid passageways, wherein the gas passageways extend through a constant voltage gradient gas feedthrough and the coolant liquid passageways extend through a gas input manifold coupled to the inlet end of the constant voltage gradient gas feedthrough. This arrangement provides for increase coolant liquid flow and allows maintenance or disassembly of the constant voltage gradient gas feedthrough without breaking the seal on the coolant liquid system.
摘要翻译：本发明提供一种用于改善被输送到化学气相沉积室的气体的热管理的方法和装置。使用与沉积气体通道热连通的传热流体将气体输送到室以进行沉积来实现热管理。气体注入歧管包括气体通道和冷却剂液体通道，其中气体通道延伸通过恒定电压梯度气体馈通，并且冷却剂液体通道延伸通过耦合到恒定电压梯度气体馈通的入口端的气体输入歧管。这种布置提供了增加冷却剂液体流量并允许恒定电压梯度气体馈通的维护或拆卸而不破坏冷却剂液体系统上的密封。

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