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    • 16. 发明授权
    • High stability and high capacity precursor vapor generation for thin film deposition
    • 用于薄膜沉积的高稳定性和高容量前驱蒸气产生
    • US08603580B2
    • 2013-12-10
    • US11605204
    • 2006-11-28
    • Benjamin Y. H. Liu
    • Benjamin Y. H. Liu
    • C23C16/00F22B23/00B01D47/00
    • C23C16/4482C23C16/4481
    • A method for vaporizing a liquid for subsequent thin film deposition on a substrate. The method comprises vaporizing a liquid which is disposed within a tubular porous metal body. The porous metal body comprises a first surface defining a first carrier gas flow path and a second surface defining a second carrier gas flow path in a substantially opposite direct to the first carrier flow path. Vapor is generated from the liquid and added to a carrier gas that passes sequentially in direct contact along the first and second surfaces of the porous metal body to form a gas/vapor mixture with the carrier gas first flowing along the first surface and then along the second surface thereby providing a gas/vapor mixture for thin film deposition.
    • 一种用于蒸发用于随后的薄膜沉积在基底上的液体的方法。 该方法包括使设置在管状多孔金属体内的液体蒸发。 多孔金属体包括限定第一载气流动路径的第一表面和限定与第一载体流动路径基本上相反的第二载气流动路径的第二表面。 从液体中产生蒸气,并加入到沿着多孔金属体的第一和第二表面直接接触地顺序通过的载气,以形成气体/蒸气混合物,载气首先沿着第一表面流动,然后沿着 从而提供用于薄膜沉积的气体/蒸汽混合物。
    • 17. 发明授权
    • Method and apparatus for liquid precursor atomization
    • 液体前体雾化的方法和装置
    • US08132793B2
    • 2012-03-13
    • US12557980
    • 2009-09-11
    • Benjamin Y. H. Liu
    • Benjamin Y. H. Liu
    • B01F3/04
    • B05B7/168B05B7/0475B05B7/066B05B7/1686Y10S261/65
    • An apparatus for atomizing a precursor liquid for vapor generation and thin film deposition on a substrate. The precursor liquid is atomized by a carrier gas to form a droplet aerosol composed of small precursor liquid droplets suspended in the carrier gas. The droplet aerosol is then heated to form vapor, producing a gas/vapor mixture that can be introduced into a deposition chamber to form thin films on a substrate. The liquid is introduced into the atomizing apparatus in such a manner as to avoid excessive heating that can occur or lead to the formation of undesirable by-products due to material degradation as result of thermal decomposition. The apparatus is particularly suited for vaporizing high molecular weight substances with a low vapor pressure that requires a high vaporization temperature for the liquid to vaporize. The apparatus can also be used to vaporize solid precursors dissolved in a solvent for vaporization.
    • 一种用于在衬底上雾化用于蒸气产生和薄膜沉积的前体液体的装置。 前体液体被载气雾化以形成由悬浮在载气中的小前体液滴组成的液滴气溶胶。 然后将液滴气雾剂加热以形成蒸气,产生气体/蒸气混合物,其可以引入沉积室以在基底上形成薄膜。 以这样的方式将液体引入雾化装置中,以避免可能发生的过度加热或导致由于热分解导致的材料劣化而形成不期望的副产物。 该装置特别适用于蒸发具有低蒸气压的高分子量物质,其需要高的汽化温度以使液体蒸发。 该装置也可用于蒸发溶解在溶剂中的固体前体进行蒸发。
    • 19. 发明授权
    • Compact, high-efficiency condensation nucleus counter
    • 紧凑,高效的冷凝核计数器
    • US06829044B2
    • 2004-12-07
    • US10131366
    • 2002-04-24
    • Benjamin Y. H. Liu
    • Benjamin Y. H. Liu
    • G01N100
    • G01N15/065
    • A condensation nucleus counter has a series of flow passageways forming a flow path, including a first passageway for carrying the gas stream having the particles to be detected which is preferably preheated A saturator is positioned to receive the flow of the gas stream and is made of a porous material of a controlled pore size having a portion immersed in a liquid working fluid. The liquid working fluid moves by capillary action along the length of the saturator. Vapor from the working liquid will be transferred to the gas stream as it moves through the saturator. The gas stream then passes to a condenser that reduces the temperature of the gas stream and causes the working fluid vapor to condense on the particles in the gas stream to form droplets that can be detected and counted.
    • 冷凝核计数器具有形成流路的一系列流动通道,包括用于承载具有待检测颗粒的气流的第一通道,其优选地被预热。饱和器被定位成接收气流的流动并由 具有受控孔径的多孔材料,其具有浸没在液体工作流体中的部分。 液体工作液体沿毛细作用沿着饱和器的长度移动。 来自工作液体的蒸汽在移动通过饱和器时将被转移到气流中。 气流然后传递到冷凝器,其降低气流的温度并使工作流体蒸气冷凝在气流中的颗粒上以形成可被检测和计数的液滴。